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    • 8. 发明授权
    • Silicon carbide large area device fabrication apparatus and method
    • 碳化硅大面积器件制造装置及方法
    • US06410356B1
    • 2002-06-25
    • US09520751
    • 2000-03-07
    • Robert John WojnarowskiErnest Wayne BalchLeonard Richard Douglas
    • Robert John WojnarowskiErnest Wayne BalchLeonard Richard Douglas
    • H01L2166
    • H01L22/20H01L23/34H01L2224/92144H01L2924/014H01L2924/1301H01L2924/00
    • A method for interconnecting high-temperature silicon carbide (SiC) devices enables such high-temperature devices to be used in fabricating electronic circuits of significant scale. This method comprises empirically measuring operational characteristics of a plurality of the devices to be interconnected, the operational characteristics comprising devices which are measured to be non-working and devices which are measured to be working; characterizing the operational characteristics in an operational characteristics map; designing interconnection paths between and among the devices that are characterized to be working by the operational characteristics map; and excluding from the interconnection paths, devices that are characterized to be non-working by the operational characteristics map. A preferred embodiment of this method further includes disposing a temporary polymer layer over the devices; forming via holes through the temporary polymer layer, to bonding pads of the devices; applying a current-balancing resistive metal over the temporary polymer layer; establishing connections between the current-balancing resistive metal and the bonding pads; designing the interconnection paths between and among the working devices by patterning the current-balancing resistive metal based on the operational characteristics map; and removing the temporary polymer layer.
    • 用于互连高温碳化硅(SiC)器件的方法使得这种高温器件能够用于制造具有显着规模的电子电路。 该方法包括经验地测量待互连的多个设备的操作特性,操作特性包括被测量为不工作的设备和被测量为工作的设备; 表征操作特征图中的操作特性; 设计特征在于通过操作特征图工作的设备之间的互连路径; 并且从互连路径中排除特征在于通过操作特性图不工作的设备。 该方法的优选实施例还包括在器件上设置临时聚合物层; 通过所述临时聚合物层形成通孔到所述装置的焊盘; 在临时聚合物层上施加电流平衡电阻金属; 建立电流平衡电阻金属和焊盘之间的连接; 通过基于操作特性图构图电流平衡电阻金属来设计工作装置之间和之间的互连路径; 并除去临时聚合物层。
    • 9. 发明授权
    • HDI chip attachment method for reduced processing
    • HDI芯片附件方法减少处理
    • US06284564B1
    • 2001-09-04
    • US09399461
    • 1999-09-20
    • Ernest Wayne BalchLeonard Richard DouglasThomas Bert Gorczyca
    • Ernest Wayne BalchLeonard Richard DouglasThomas Bert Gorczyca
    • H01L2144
    • H01L24/76H01L21/67138H01L24/24H01L24/82H01L24/86H01L2224/24225H01L2224/82039H01L2924/01005H01L2924/01006H01L2924/01013H01L2924/01033H01L2924/01058
    • A method according to an aspect of the invention, for interconnecting electrical contacts or electrodes (230be) of semiconductor chips (230a, 230b, 230c) in an HDI context, includes the step of applying laser energy to make a pattern of apertures through a dielectric film which corresponds to the ideal locations of electrodes of semiconductor chips properly placed on the film. This may be accomplished, in one mode of the method, by procuring an optical mask (20) defining an ideal pattern of electrodes of semiconductor chips properly aligned in an HDI structure. This mask may be sufficiently large to cover a plurality of HDI circuits being made on a substrate, or it may cover only one such HDI circuit. Laser energy (30) is applied to a dielectric film (10; 10, 17) through apertures or transparent regions (22) of the mask, to thereby make the ideal pattern of holes in the film. Semiconductor chips (230a, 230b, 230c) are mounted to a first side (10ls, 17ls) of the dielectric film, as by means of adhesive, with the electrodes (230be) in registry with the corresponding ones of the holes (22). This has the effect of mounting the semiconductor chips (230a, 230b, 230c) in their ideal locations. Electrically conductive material (310), such as metallization, is applied to a second side (10us) of the film (10) and to at least the sides of the holes (42a, 42b), so as to interconnect the electrodes (230be) with an interconnect pattern (320) of the electrically conductive material (310).
    • 根据本发明的一个方面,用于使HDI环境中的半导体芯片(230a,230b,230c)的电接触或电极(230be)互连的方法包括施加激光能量以通过电介质形成孔径图案的步骤 膜对应于半导体芯片的适当放置在膜上的电极的理想位置。 这可以在该方法的一种模式中通过采购限定在HDI结构中正确对准的半导体芯片的理想电极图案的光学掩模(20)来实现。 该掩模可能足够大以覆盖在衬底上制造的多个HDI电路,或者它可以仅覆盖一个这样的HDI电路。 通过掩模的孔或透明区域(22)将激光能量(30)施加到电介质膜(10; 10,17)上,从而在膜中形成理想的孔图案。 半导体芯片(230a,230b,230c)通过粘合剂安装到电介质膜的第一侧(10l,17ls)上,电极(230be)与对应的孔(22)对准。 这具有将半导体芯片(230a,230b,230c)安装在其理想位置的效果。 诸如金属化的导电材料(310)被施加到膜(10)的第二侧(10us)并且至少在孔(42a,42b)的侧面上,以将电极(230be) 具有导电材料(310)的互连图案(320)。