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    • 3. 发明申请
    • METHOD FOR A LITHOGRAPHIC APPARATUS
    • 一种平面设备的方法
    • US20120200838A1
    • 2012-08-09
    • US13446811
    • 2012-04-13
    • Laurentius Cornelius De WinterJozef Maria Finders
    • Laurentius Cornelius De WinterJozef Maria Finders
    • G03B27/52
    • G03B27/42G03F7/70308
    • A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second, different focal plane, wherein the transforming comprises: subjecting a phase of a first portion of a first diffracted beam and a phase of a corresponding first portion of a second diffracted beam to a phase change which results in an at least partial formation of the first phase-wavefront, and subjecting a phase of a second portion of the first diffracted beam and a phase of a corresponding second portion of the second diffracted beam to a phase change which results in an at least partial formation of the second phase-wavefront.
    • 公开了增加光刻设备的焦深的方法。 该方法包括使用图案形成装置图案形成衍射的辐射束; 以及将衍射光束的一部分的相位波前变换为具有用于所述光刻设备的第一焦平面的第一相位波前,以及具有第二不同焦平面的第二相位波前,其中所述变换包括:对 将第一衍射光束的第一部分的相位和第二衍射光束的对应的第一部分的相位相位改变为导致第一相位波段的至少部分形成,并且使第二部分的相位 并且所述第二衍射光束的对应的第二部分的相位变为导致第二相位波前的至少部分形成的相位变化。
    • 5. 发明授权
    • Lithographic apparatus and device manufacturing method
    • 光刻设备和器件制造方法
    • US07982856B2
    • 2011-07-19
    • US12488291
    • 2009-06-19
    • Jozef Maria Finders
    • Jozef Maria Finders
    • G03B27/72G03B27/54
    • G03F7/70141G03F7/70191G03F7/70466
    • A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into a number of first-order diffracted beams, one associated with a first pitch in the pattern, along a first direction, another associated with a second pitch along a different, second direction in the pattern. An area is identified where the first-order diffracted beam associated with the first pitch traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of this first-order diffracted beam in relation to the optical phase of the other first-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.
    • 光刻设备包括相位调节器,用于在曝光基板上的图案时调节穿过相位调节器的光学元件的光波的相位。 在一个实施例中,光学元件是光刻设备的投影系统中的热可控光学元件。 在使用中,用包括离轴辐射束的照明模式照亮图案。 该光束沿着第一方向被衍射成多个一阶衍射光束,一个与图案中的第一间距相关联,另一个与图案中沿着不同的第二方向的第二间距相关联。 识别与第一音调相关联的一阶衍射光束穿过光学元件的区域。 通过计算相对于其它一级衍射光束的光学相位的该一级衍射光束的期望光学相位来优化图案的图像的图像特性。 控制相位调节器以将期望的光学相位施加到一阶衍射光束。