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1. 发明授权

US06605513B2 Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processing 有权
标题翻译：使用一步快速热退火工艺和后端加工形成硅化镍的方法
公开(公告)号：US06605513B2
公开(公告)日：2003-08-12
申请号：US09729699
申请日：2000-12-06
申请人： Eric N. Paton , Ercan Adem , Jacques J. Bertrand , Paul R. Besser , Matthew S. Buynoski , John Clayton Foster , Paul L. King , George Jonathan Kluth , Minh Van Ngo , Christy Mei-Chu Woo
发明人： Eric N. Paton , Ercan Adem , Jacques J. Bertrand , Paul R. Besser , Matthew S. Buynoski , John Clayton Foster , Paul L. King , George Jonathan Kluth , Minh Van Ngo , Christy Mei-Chu Woo
IPC分类号： H01L21336
CPC分类号： H01L29/665 , H01L21/28061 , H01L21/28518 , H01L29/4933
摘要： A self-aligned silicide process that can accommodate a low thermal budget and form silicide regions of small dimensions in a controlled reaction. In a first temperature treatment, nickel metal or nickel alloy is reacted with a silicon material to form at least one high resistance nickel silicide region. Unreacted nickel is removed. A dielectric layer is then deposited over a high resistance nickel silicide regions. In a second temperature treatment, the at least one high resistance nickel silicide region and dielectric layer are reacted at a prescribed temperature to form at least one low resistance silicide region and process the dielectric layer. Bridging between regions is avoided by the two-step process as silicide growth is controlled, and unreacted nickel between silicide regions is removed after the first temperature treatment. The processing of the high resistance nickel silicide regions and the dielectric layer are conveniently combined into a single temperature treatment.
摘要翻译：自对准硅化物工艺，可以适应低热预算，并在受控反应中形成小尺寸的硅化物区域。在第一温度处理中，镍金属或镍合金与硅材料反应以形成至少一个高电阻镍硅化物区域。去除未反应的镍。然后将电介质层沉积在高电阻镍硅化物区域上。在第二温度处理中，至少一个高电阻镍硅化物区域和电介质层在规定温度下反应以形成至少一个低电阻硅化物区域并处理介电层。通过控制硅化物生长的两步法避免区域之间的桥接，并且在第一温度处理之后去除硅化物区域之间的未反应的镍。将高电阻镍硅化物区域和电介质层的处理方便地组合成单温度处理。

2. 发明授权

US06562718B1 Process for forming fully silicided gates 有权
标题翻译：完全硅化物门的制作工艺
公开(公告)号：US06562718B1
公开(公告)日：2003-05-13
申请号：US09729700
申请日：2000-12-06
申请人： Qi Xiang , Ercan Adem , Jacques J. Bertrand , Paul R. Besser , Matthew S. Buynoski , John C. Foster , Paul L. King , George J. Kluth , Minh V. Ngo , Eric N. Paton , Christy Mei-Chu Woo
发明人： Qi Xiang , Ercan Adem , Jacques J. Bertrand , Paul R. Besser , Matthew S. Buynoski , John C. Foster , Paul L. King , George J. Kluth , Minh V. Ngo , Eric N. Paton , Christy Mei-Chu Woo
IPC分类号： H01L2144
CPC分类号： H01L29/66507 , H01L21/28097
摘要： A method of forming a fully silicidized gate of a semiconductor device includes forming silicide in active regions and a portion of a gate. A shield layer is blanket deposited over the device. The top surface of the gate electrode is then exposed. A refractory metal layer is deposited and annealing is performed to cause the metal to react with the gate and fully silicidize the gate, with the shield layer protecting the active regions of the device from further silicidization to thereby prevent spiking and current leakage in the active regions.
摘要翻译：形成半导体器件的完全硅化栅极的方法包括在有源区和门的一部分中形成硅化物。屏蔽层被覆盖在该器件上。然后露出栅电极的顶表面。沉积难熔金属层并进行退火以使金属与栅极反应并使栅极完全硅化，屏蔽层保护器件的有源区不受另外的硅化，从而防止有源区中的峰值和电流泄漏。

3. 发明授权

US06764912B1 Passivation of nitride spacer 有权
标题翻译：氮化物间隔物钝化
公开(公告)号：US06764912B1
公开(公告)日：2004-07-20
申请号：US09919943
申请日：2001-08-02
申请人： John Clayton Foster , Eric N. Paton , Matthew S. Buynoski , Qi Xiang , Paul R. Besser , Paul L. King
发明人： John Clayton Foster , Eric N. Paton , Matthew S. Buynoski , Qi Xiang , Paul R. Besser , Paul L. King
IPC分类号： H01L21336
CPC分类号： H01L21/28194 , H01L29/51 , H01L29/511 , H01L29/513 , H01L29/517 , H01L29/518 , H01L29/665 , H01L29/6656
摘要： The formation of metal silicides in silicon nitride spacers on a gate electrode causes bridging between a gate electrode and the source and drain regions of a semiconductor device. The bridging is prevented by forming a thin layer of silicon oxide on the silicon nitride spacers prior to forming the metal silicide layers on the device.
摘要翻译：栅电极上的氮化硅间隔物中的金属硅化物的形成导致栅电极与半导体器件的源区和漏区之间的桥接。通过在器件上形成金属硅化物层之前在氮化硅间隔物上形成氧化硅薄层来防止桥接。

4. 发明授权

US06458679B1 Method of making silicide stop layer in a damascene semiconductor structure 有权
标题翻译：在大马士革半导体结构中制造硅化物阻挡层的方法
公开(公告)号：US06458679B1
公开(公告)日：2002-10-01
申请号：US09780454
申请日：2001-02-12
申请人： Eric N. Paton , Paul R. Besser , Matthew S. Buynoski , Qi Xiang , Paul L. King , John Clayton Foster
发明人： Eric N. Paton , Paul R. Besser , Matthew S. Buynoski , Qi Xiang , Paul L. King , John Clayton Foster
IPC分类号： H01L213205
CPC分类号： H01L29/66583 , H01L21/28052 , H01L29/4941
摘要： A damascene gate semiconductor structure that is formed utilizing a silicide stop layer. Initially, a gate opening is provided in an insulating layer on a substrate. A first dielectric layer is deposited in the gate opening over the substrate. A silicide stop layer is then deposited in the gate opening over the first silicon layer. A second silicon layer is then deposited in the gate opening over the silicide stop layer. A metal or alloy layer is then deposited over the insulating and the second silicon layer. The damascene semiconductor structure is then temperature treated to react the metal or alloy layer with the second silicon layer to form a silicide layer. Any unreated metal or alloy is then removed from the metal or alloy layer.
摘要翻译：利用硅化物停止层形成的镶嵌栅极半导体结构。首先，在基板上的绝缘层中设置栅极开口。第一介电层沉积在衬底上的栅极开口中。然后在第一硅层上的栅极开口中沉积硅化物阻挡层。然后在硅化物停止层上的栅极开口中沉积第二硅层。然后在绝缘层和第二硅层上沉积金属或合金层。然后对镶嵌半导体结构进行温度处理以使金属或合金层与第二硅层反应形成硅化物层。然后从金属或合金层中除去任何未反应的金属或合金。

5. 发明授权

US06784506B2 Silicide process using high K-dielectrics 失效
标题翻译：使用高K电介质的硅化物工艺
公开(公告)号：US06784506B2
公开(公告)日：2004-08-31
申请号：US09939744
申请日：2001-08-28
申请人： Qi Xiang , Paul R. Besser , Matthew S. Buynoski , John Clayton Foster , Paul L. King , Eric N. Paton
发明人： Qi Xiang , Paul R. Besser , Matthew S. Buynoski , John Clayton Foster , Paul L. King , Eric N. Paton
IPC分类号： H01L2976
CPC分类号： H01L29/4933 , H01L21/28167 , H01L21/28194 , H01L29/517 , H01L29/518 , H01L29/665
摘要： A method for preventing the thermal decomposition of a high-K dielectric layer of a gate electrode during the formation of a metal silicide on the gate electrode by using nickel as the metal component of the silicide.
摘要翻译：通过使用镍作为硅化物的金属成分，在栅电极形成金属硅化物期间防止栅电极的高K电介质层的热分解的方法。

6. 发明授权

US06387767B1 Nitrogen-rich silicon nitride sidewall spacer deposition 失效
标题翻译：富氮氮化硅侧壁间隔物沉积
公开(公告)号：US06387767B1
公开(公告)日：2002-05-14
申请号：US09781448
申请日：2001-02-13
申请人： Paul R. Besser , Minh Van Ngo , Christy Mei-Chu Woo , George Jonathan Kluth
发明人： Paul R. Besser , Minh Van Ngo , Christy Mei-Chu Woo , George Jonathan Kluth
IPC分类号： H01L21336
CPC分类号： H01L29/665
摘要： Salicide processing is implemented with nitrogen-rich silicon nitride sidewall spacers that allow a metal silicide layer e.g., NiSi, to be formed over the polysilicon gate electrode and source/drain regions using salicide technology without associated bridging between the metal silicide layer on the gate electrode and the metal silicide layers over the source/drain regions. Bridging between a metal silicide e.g., nickel silicide, layer on a gate electrode and metal silicide layers on associated source/drain regions is avoided by forming nitrogen-rich silicon nitride sidewall spacers with increased nitrogen, thereby eliminating free Si available to react with the metal subsequently deposited and thus avoiding the formation of metal silicide on the sidewall spacers.
摘要翻译：使用富含氮的氮化硅侧壁间隔物实现自杀处理，其允许使用硅化物技术在多晶硅栅极电极和源极/漏极区域上形成金属硅化物层，例如NiSi，而不会在栅极上的金属硅化物层之间相互桥接和源极/漏极区域之间的金属硅化物层。通过形成具有增加的富氮氮化硅侧壁间隔物，避免了金属硅化物（例如，硅化镍），栅极上的层和相关源极/漏极区域上的金属硅化物层之间的结合氮，从而消除可用于随后沉积的金属的游离Si，从而避免在侧壁间隔物上形成金属硅化物。

7. 发明授权

US06372673B1 Silicon-starved nitride spacer deposition 有权
标题翻译：缺硅氮化物间隔物沉积
公开(公告)号：US06372673B1
公开(公告)日：2002-04-16
申请号：US09781256
申请日：2001-02-13
申请人： Paul R. Besser , Minh Van Ngo , Christy Mei-Chu Woo , George Jonathan Kluth
发明人： Paul R. Besser , Minh Van Ngo , Christy Mei-Chu Woo , George Jonathan Kluth
IPC分类号： H01L21318
CPC分类号： H01L29/665 , H01L21/3185
摘要： Bridging between a metal silicide e.g., nickel silicide, layer on a gate electrode and metal silicide layers on associated source/drain regions is avoided by forming silicon-starved silicon nitride sidewall spacers having substantially no or significantly reduced Si available for reaction with deposited metal, e.g., nickel.
摘要翻译：通过形成具有基本上没有或显着减少的Si的硅绝缘氮化硅侧壁间隔物来避免金属硅化物（例如，硅化镍），栅极上的层和相关源极/漏极区域上的金属硅化物层之间的桥接，可用于与沉积金属反应，例如镍。

8. 发明授权

US06380057B1 Enhancement of nickel silicide formation by use of nickel pre-amorphizing implant 有权
标题翻译：通过使用镍前非晶化植入物来增强硅化镍的形成
公开(公告)号：US06380057B1
公开(公告)日：2002-04-30
申请号：US09781225
申请日：2001-02-13
申请人： Matthew S. Buynoski , George Jonathan Kluth , Paul R. Besser , Paul L. King
发明人： Matthew S. Buynoski , George Jonathan Kluth , Paul R. Besser , Paul L. King
IPC分类号： H01L213205
CPC分类号： H01L29/665 , H01L21/26506 , H01L21/28044 , H01L21/28052 , H01L21/28518
摘要： Nickel salicide processing is implemented by implanting nickel into the active regions, prior to depositing Ni, to catalyze the reaction of Ni and Si during annealing to form a NiSi layer on the polysilicon gate electrodes and source/drain regions without the formation of rough interfaces between the nickel silicide layers and underlying silicon and without conductive bridging between the metal silicide layer on the gate electrode and the metal silicide layers on associated source/drain regions, particularly in the presence of silicon nitride sidewall spacers.
摘要翻译：镍自杀化处理通过在沉积Ni之前将镍注入活性区域来实现，以在退火期间催化Ni和Si的反应，以在多晶硅栅极电极和源极/漏极区域上形成NiSi层，而不形成在硅化镍层和底层硅，并且在栅电极上的金属硅化物层与相关源极/漏极区域上的金属硅化物层之间没有导电桥接，特别是在存在氮化硅侧壁间隔物的情况下。

9. 发明授权

US06368950B1 Silicide gate transistors 有权
标题翻译：硅化物栅极晶体管
公开(公告)号：US06368950B1
公开(公告)日：2002-04-09
申请号：US09734186
申请日：2000-12-12
申请人： Qi Xiang , Paul R. Besser , Matthew S. Buynoski , John C. Foster , Paul L. King , Eric N. Paton
发明人： Qi Xiang , Paul R. Besser , Matthew S. Buynoski , John C. Foster , Paul L. King , Eric N. Paton
IPC分类号： H01L213205
CPC分类号： H01L29/66545 , H01L21/28097
摘要： A method for implementing a self-aligned metal silicide gate is achieved by confining amorphous silicon within a recess overlying a channel and annealing to cause the amorphous silicon with its overlying metal to interact to form the self-aligned metal silicide gate. A gate dielectric layer formed of oxynitride or a nitride/oxide stack is formed on the bottom and sidewalls of the recess prior to depositing the silicon. The silicon is removed except for the portion of the silicon in the recess. The remaining portions of the metal are removed by manipulating the etch selectivity between the metal and the self-aligned metal silicide gate.
摘要翻译：实现自对准金属硅化物栅极的方法是通过将非晶硅限制在覆盖沟道的凹槽中并退火以使非晶硅与其上覆金属相互作用以形成自对准金属硅化物栅极来实现的。在沉积硅之前，在凹陷的底部和侧壁上形成由氧氮化物或氮化物/氧化物堆叠形成的栅极电介质层。除了凹部中硅的部分之外，除去硅。通过操纵金属和自对准金属硅化物栅之间的蚀刻选择性来去除金属的剩余部分。

10. 发明授权

US06342414B1 Damascene NiSi metal gate high-k transistor 有权
标题翻译：大马士革NiSi金属栅极高k晶体管
公开(公告)号：US06342414B1
公开(公告)日：2002-01-29
申请号：US09734189
申请日：2000-12-12
申请人： Qi Xiang , Paul R. Besser , Matthew S. Buynoski , John C. Foster , Paul L. King , Eric N. Paton
发明人： Qi Xiang , Paul R. Besser , Matthew S. Buynoski , John C. Foster , Paul L. King , Eric N. Paton
IPC分类号： H01L218238
CPC分类号： H01L21/28194 , H01L21/28097 , H01L21/28114 , H01L29/495 , H01L29/4975 , H01L29/51 , H01L29/517 , H01L29/665 , H01L29/66545
摘要： A method for implementing a self-aligned low temperature metal silicide gate is achieved by confining a low temperature silicidation metal within a recess overlying a channel and annealing to cause the low temperature silicidation metal and its overlying silicon to interact to form the self-aligned low temperature metal silicide gate. A planarization step is performed to remove the remaining unreacted silicon by chemical mechanical polishing until no silicon is detected.
摘要翻译：实现自对准低温金属硅化物栅极的方法是通过将低温硅化金属限制在覆盖沟道的凹槽内并进行退火以使低温硅化金属及其上覆的硅相互作用以形成自对准低温度金属硅化物门。进行平面化步骤以通过化学机械抛光除去剩余的未反应的硅，直到没有检测到硅。

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