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    • 2. 发明授权
    • Thin film capacitor and method of manufacturing the same
    • 薄膜电容器及其制造方法
    • US5406445A
    • 1995-04-11
    • US216966
    • 1994-03-24
    • Eiji FujiiAtsushi TomozawaHideo ToriiMasumi HattoriRyoichi TakayamaSatoru Fujii
    • Eiji FujiiAtsushi TomozawaHideo ToriiMasumi HattoriRyoichi TakayamaSatoru Fujii
    • H01G4/20H01L29/04H01L23/48
    • H01G4/20H01L2224/4918H01L2924/181
    • A NaCl oxide thin layer oriented to (100) face or a spinel oxide thin layer oriented to (100) face, a perovskite dielectric thin layer oriented to (100) face and a metal electrode are sequentially laminated on a metal electrode, thus providing a thin film capacitor. Or alternatively, a thin film capacitor is manufactured by sequentially laminating a NaCl oxide thin layer oriented to (100) face or a spinel oxide thin layer oriented to (100) face, a platinum thin layer as a lower electrode oriented to (100) face, a perovskite dielectric thin layer oriented to (100) face and a metal thin layer as an upper electrode on a substrate. A plasma-enhanced CVD method is applied to form a NaCl oxide thin layer, a spinel oxide thin layer and a perovskite dielectric thin layer while a vacuum deposition method, a sputtering method, a CVD method or a plasma-enhanced CVD method is applied for the formation of a metal electrode.
    • 将取向为(100)面的NaCl氧化物薄层或取向为(100)面的尖晶石氧化物薄层,朝向(100)面的钙钛矿电介质薄层和金属电极依次层压在金属电极上,从而提供 薄膜电容器。 或者,通过依次层叠取向于(100)面的氧化锌薄膜或取向为(100)面的尖晶石氧化物薄层,将铂薄层作为朝向(100)面的下部电极而制造薄膜电容器 取向为(100)面的钙钛矿电介质薄层和在基板上作为上部电极的金属薄层。 当采用真空沉积法,溅射法,CVD法或等离子体增强CVD法应用等离子体增强CVD法形成NaCl氧化物薄层,尖晶石氧化物薄层和钙钛矿电介质薄层 形成金属电极。
    • 8. 发明授权
    • Thin film thermistor element and method for the fabrication of thin film thermistor element
    • 薄膜热敏电阻元件及制造薄膜热敏电阻元件的方法
    • US06475604B1
    • 2002-11-05
    • US09584768
    • 2000-06-01
    • Eiji FujiiAtsushi TomozawaHideo ToriiRyoichi Takayama
    • Eiji FujiiAtsushi TomozawaHideo ToriiRyoichi Takayama
    • H01C700
    • H01C17/12H01C7/023Y10T428/24917
    • A thin film thermistor element 10 is formed by forming on a backing substrate 11 of alumina a thermistor thin film 12 and a pair of comb electrodes 13 and 14 formed of a thin film of Pt. The thermistor thin film 12, which is formed of, for example, complex oxide of Mn—Co—Ni, has either a spinel type crystal structure which is priority oriented or oriented mainly in a (100) surface or a bixbite type crystal structure which is priority oriented in a (100) or (111) surface. Alternatively, the thermistor thin film is formed of LaCoO3 and has a rhombohedral bixbite type crystal structure. This makes it possible to hold the variation in resistance value low thereby to achieve high accuracy, and the deterioration with time can be held low and the high temperature durability can be improved, for the achievement of high reliability.
    • 通过在氧化铝的背衬基板11上形成热敏电阻薄膜12和由Pt的薄膜形成的一对梳状电极13和14来形成薄膜热敏电阻元件10。 由例如Mn-Co-Ni的复合氧化物形成的热敏电阻薄膜12具有尖晶石型晶体结构,其优先取向或主要在(100)表面取向或双键型晶体结构中,其中, 在(100)或(111)表面优先考虑。 或者,热敏电阻薄膜由LaCoO 3形成,并且具有菱形双峰型晶体结构。 这使得可以将电阻值的变化保持为低,从而实现高精度,并且,为了实现高可靠性,能够将劣化随时间变低,提高耐高温性。
    • 9. 发明授权
    • Temperature sensor element and temperature sensor including the same
    • 温度传感器元件和温度传感器包括相同的
    • US06081182A
    • 2000-06-27
    • US970496
    • 1997-11-14
    • Atsushi TomozawaEiji FujiiHideo ToriiRyoichi Takayama
    • Atsushi TomozawaEiji FujiiHideo ToriiRyoichi Takayama
    • G01K7/22H01C7/04H01C17/30H01L7/02
    • G01K7/223H01C17/30H01C7/041H01C7/043
    • The present invention provides a temperature sensor element having excellent heat resistance, quick heat response, stable resistance, and high reliability with a less variation in resistance against time. The temperature sensor element includes a thermo-sensitive film mainly composed of a heat sensitive material having electrical resistance varies depending on the temperature; a pair of electrode films arranged to measure the electrical resistance in the direction of the thickness of the thermo-sensitive film, a base plate mainly composed of a heat-resistant insulating material for supporting the thermo-sensitive film and the electrode films, an anti-diffusion film interposed between the thermo-sensitive film and the electrode film in the vicinity of the base plate, and a film mainly composed of a heat-resistant insulating material for covering the thermo-sensitive film and the electrode films except the lead-connecting terminals of the electrode films. The thermo-sensitive film is composed of an oxide of corundum crystalline structure represented by the formula of (Al.sub.1-x-y Cr.sub.x Fe.sub.y).sub.2 O.sub.3, where 0.05.ltoreq.x+y.ltoreq.0.95, and 0.ltoreq.y/(x+y).ltoreq.0.6, and the anti-diffusion film is composed of an oxide of corundum crystalline structure represented by the formula of (Al.sub.1-x-y Cr.sub.x Fe.sub.y).sub.2 O.sub.3, where 0.ltoreq.x+y.ltoreq.0.95.
    • 本发明提供了一种具有优异的耐热性,快速热响应性,稳定的电阻和高可靠性的温度传感器元件,其耐时间变化较小。 温度传感器元件包括主要由具有根据温度而变化的电阻的热敏材料组成的热敏膜; 布置成测量热敏膜厚度方向上的电阻的一对电极膜,主要由用于支撑热敏膜的耐热绝缘材料和电极膜组成的基板,抗 介于热敏膜与基板附近的电极膜之间的扩散膜,以及主要由用于覆盖热敏膜的耐热绝缘材料和除引线连接之外的电极膜构成的膜 电极膜的端子。 热敏膜由(Al1-x-yCrxFey)2O3表示的刚玉结晶结构的氧化物组成,其中0.05