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    • 4. 发明申请
    • Methods for forming and cleaning photolithography reticles
    • 光刻掩模版的形成和清洁方法
    • US20080057411A1
    • 2008-03-06
    • US11515089
    • 2006-08-31
    • Craig M. CarpenterJames BaughSteve McDonaldRobert RasmussenJ. Brett RolfsonAzeddine Zerrade
    • Craig M. CarpenterJames BaughSteve McDonaldRobert RasmussenJ. Brett RolfsonAzeddine Zerrade
    • A47G1/12G03C5/00G03F1/14G03F1/00
    • G03F1/82G03F1/32G03F1/54G03F1/80
    • A method for removing impurities (e.g., atomic sulfur) from a reticle for use in photolithography is provided. In one embodiment, a reticle (or photomask) comprising a plate, a first layer over the plate, and a photoresist layer over the first layer is provided. The photoresist layer is removed with a first chemistry comprising a sulfur-containing compound. At least a portion of the first layer is removed with a second chemistry comprising a sulfur-containing etchant, thereby exposing portions of the plate. Removing the photoresist layer and/or at least a portion of the first layer leaves sulfur on at least portions of the reticle. In a cleaning step, the reticle is contacted with one or more excited species of oxygen to remove residual sulfur and other contaminants, such as carbon, sulfur and oxygen-containing species. Methods of embodiments can be used to clean, e.g., binary photomasks, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks.
    • 提供从用于光刻的掩模版中除去杂质(例如原子硫)的方法。 在一个实施例中,提供了包括板,板上的第一层和第一层上的光致抗蚀剂层的掩模版(或光掩模)。 用包含含硫化合物的第一化学物质除去光致抗蚀剂层。 用包含含硫蚀刻剂的第二化学物质除去第一层的至少一部分,从而暴露板的部分。 去除光致抗蚀剂层和/或第一层的至少一部分在掩模版的至少部分上留下硫。 在清洁步骤中,将掩模版与一种或多种激发的氧气接触以除去残留的硫和其它污染物,例如碳,硫和含氧物质。 实施例的方法可用于清洁例如二值光掩模,衰减相移掩模(APSM)和高透射衰减光掩模。
    • 5. 发明授权
    • Footwear for water sports
    • 水上运动鞋
    • US5771610A
    • 1998-06-30
    • US653542
    • 1996-05-24
    • Steve McDonald
    • Steve McDonald
    • A43B5/08A43B7/06A43B7/10
    • A43B5/08
    • An athletic water sports shoe. The water sports athletic shoe features a rubber outsole for a strong grip on wet surfaces. In addition to the rubber outsole, a rubber rand extends the rubber surface to the sides of the shoes such that sides of the wearers foot can be used as gripping surfaces. The sides of the shoes are constructed of a waterproof mesh that allows water to flow in and out of the shoe. The inside of the shoe features a neoprene gasket that forms a water-tight seal around the ankle of the wearer. The water-tight seal around the ankle of the wearer prevents sand from entering the shoe. Furthermore, the neoprene gasket protects the foot from bumps and scrapes.
    • 运动水上运动鞋。 水上运动鞋采用橡胶外底,在潮湿的表面上牢牢抓住。 除了橡胶外底之外,橡胶履带将橡胶表面延伸到鞋的两侧,使得佩戴者脚的侧面可以用作抓握表面。 鞋子的两侧由防水网构成,允许水流入和流出鞋子。 鞋的内部具有氯丁橡胶垫圈,其围绕佩戴者的脚踝形成水密封。 穿用者脚踝周围的防水密封防止沙子进入鞋内。 此外,氯丁橡胶垫圈可保护脚免受撞击和刮伤。
    • 7. 发明授权
    • Methods for forming and cleaning photolithography reticles
    • 光刻掩模版的形成和清洁方法
    • US07767365B2
    • 2010-08-03
    • US11515089
    • 2006-08-31
    • Craig M. CarpenterJames BaughSteve McDonaldRobert RasmussenJ. Brett RolfsonAzeddine Zerrade
    • Craig M. CarpenterJames BaughSteve McDonaldRobert RasmussenJ. Brett RolfsonAzeddine Zerrade
    • G03F1/00
    • G03F1/82G03F1/32G03F1/54G03F1/80
    • A method for removing impurities (e.g., atomic sulfur) from a reticle for use in photolithography is provided. In one embodiment, a reticle (or photomask) comprising a plate, a first layer over the plate, and a photoresist layer over the first layer is provided. The photoresist layer is removed with a first chemistry comprising a sulfur-containing compound. At least a portion of the first layer is removed with a second chemistry comprising a sulfur-containing etchant, thereby exposing portions of the plate. Removing the photoresist layer and/or at least a portion of the first layer leaves sulfur on at least portions of the reticle. In a cleaning step, the reticle is contacted with one or more excited species of oxygen to remove residual sulfur and other contaminants, such as carbon, sulfur and oxygen-containing species. Methods of embodiments can be used to clean, e.g., binary photomasks, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks.
    • 提供从用于光刻的掩模版中除去杂质(例如原子硫)的方法。 在一个实施例中,提供了包括板,板上的第一层和第一层上的光致抗蚀剂层的掩模版(或光掩模)。 用包含含硫化合物的第一化学物质除去光致抗蚀剂层。 用包含含硫蚀刻剂的第二化学物质除去第一层的至少一部分,从而暴露板的部分。 去除光致抗蚀剂层和/或第一层的至少一部分在掩模版的至少部分上留下硫。 在清洁步骤中,将掩模版与一种或多种激发的氧气接触以除去残留的硫和其它污染物,例如碳,硫和含氧物质。 实施例的方法可用于清洁例如二值光掩模,衰减相移掩模(APSM)和高透射衰减光掩模。