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    • 1. 发明授权
    • Rotating magnet array and sputter source
    • 旋转磁体阵列和溅射源
    • US06258217B1
    • 2001-07-10
    • US09406853
    • 1999-09-29
    • Edmond A. RichardsPaul R. FournierDavid JohnsonAbdul LateefDavid G. LishanShinzo OnishiMark D. Kenney
    • Edmond A. RichardsPaul R. FournierDavid JohnsonAbdul LateefDavid G. LishanShinzo OnishiMark D. Kenney
    • C23C1435
    • H01J37/3408C23C14/35H01J37/3455
    • A sputtering system and magnet array for depositing metal and metal-reactive gas coatings onto a substrate. The magnet array is designed for use in a rotating magnetron. The magnet array includes a plurality of magnets disposed on a plate. The plurality of magnets is arranged such that a closed-loop magnetic path is formed. The shape of the magnetic path is a double-lobe structure that includes first and second lobes that are symmetric to one another about an axis in the plane of the plate that intersects the center of rotation of the plate. The magnets are arranged in several rows. A first row of magnets has a double-lobe structure that corresponds to the first and second lobes of the magnetic path. Second and third rows of magnets are arranged in the shape of rings inside the first and second lobes of the magnetic path magnetic path. The lobe structure of the magnetic path can be circular or elliptical in shape. Using this design, a metal or metal-reactive gas coating can be deposited on the surface of the substrate at a high rate.
    • 用于将金属和金属反应性气体涂层沉积到衬底上的溅射系统和磁体阵列。 磁体阵列设计用于旋转磁控管。 磁体阵列包括设置在板上的多个磁体。 多个磁体被布置成使得形成闭环磁路。 磁路的形状是双瓣结构,其包括围绕板的平面中与轴的旋转中心相交的轴线彼此对称的第一和第二凸角。 磁铁排成几行。 第一排磁体具有对应于磁路的第一和第二凸角的双瓣结构。 第二和第三排磁体被布置成在磁路磁路的第一和第二凸角内的环形。 磁路的凸角结构可以是圆形或椭圆形。 使用这种设计,金属或金属反应性气体涂层可以高速沉积在基板的表面上。