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1. 发明专利

JP2014112087A Inspection device using charged particle beam, and method of manufacturing device using the inspection device 有权
标题翻译：使用充电颗粒束的检查装置以及使用检查装置制造装置的方法
公开(公告)号：JP2014112087A
公开(公告)日：2014-06-19
申请号：JP2013253948
申请日：2013-12-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOJI NOBUHARU , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： G01N23/225 , H01J37/20 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To prevent unevenness of a charge amount on a substrate surface.SOLUTION: An electron beam inspection device for inspecting a substrate W by using an electron beam includes: an electron gun 59-6 for irradiating an inspected area of the substrate W; a detector 59-4 for detecting electrons emitted from the substrate W; and a pre-charge unit 59-5. The pre-charge unit 59-5 is at least one of: means of irradiating an area including an inspection area with an electron beam before irradiation of an electron beam; means of coating the area including the inspection area with a conductive film before irradiation of an electron beam; means of spraying negative gas of argon, oxygen or the like onto the surface of the substrate W during inspection; and means 59-21 of performing adjustment so as to be in a negative charge mode having irradiation energy of 3-5 keV; and means of performing adjustment so as to inspect a reflection electron in irradiation energy of 0.5-3 keV.
摘要翻译：要解决的问题：防止基板表面上的电荷量的不均匀。解决方案：用于通过使用电子束检查基板W的电子束检查装置包括：用于照射基板的检查区域的电子枪59-6 瓦; 用于检测从衬底W发射的电子的检测器59-4; 和预充电单元59-5。预充电单元59-5至少是以下中的至少一种：在电子束照射之前用电子束照射包括检查区域的区域的装置; 在电子束照射之前用导电膜涂覆包括检查区域的区域的装置; 在检查期间将氩气，氧气等的负气体喷射到基板W的表面上的方法; 以及进行调整以使其具有照射能量为3-5keV的负电荷模式的装置59-21; 以及进行调整以在0.5-3keV的照射能量下检查反射电子的装置。

2. 发明专利

JP2012119694A Inspection apparatus with charged particle beam and device manufacturing method using the same 有权
标题翻译：具有充电颗粒束的检查装置和使用其的装置制造方法
公开(公告)号：JP2012119694A
公开(公告)日：2012-06-21
申请号：JP2011283102
申请日：2011-12-26
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOMICHI SHINJI , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： H01L21/66 , H01J37/22 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a technology enabling an SEM device to accelerate inspection speed.SOLUTION: Device manufacturing method using the inspection apparatus with charged particle beam comprises the steps of: moving a stage so that a lower left corner of a first search die in a lower part of a wafer is positioned nearly at a center of a camera, and obtaining a pattern matching template image; when a second search die is in a right adjacent side of the first search die, and a third search die is in an upper adjacent side of the second search die, moving the stage and conducting automatic pattern matching using the template image so that exact coordinate values of patterns for the second search die and the third search die are obtained; calculating moving amount of motion to an upper adjacent die with reference to a relationship between the second search die pattern matching coordinate and the third search die pattern matching coordinate and moving the stage to a coordinate where a pattern of an upper adjacent die to the first search die is expected to exist; and conducting the pattern matching using the template image so that an exact coordinate value of a searching pattern is repeatedly updated and obtained. Consequently, accuracy is improved.
摘要翻译：要解决的问题：提供使SEM装置能够加快检测速度的技术。＆lt; P＆gt;解决方案：使用带有带电粒子束的检查装置的装置制造方法包括以下步骤：移动台，使得晶片下部的第一搜索管芯的左下角几乎位于晶片的中心相机，并获得模式匹配模板图像; 当第二搜索模具位于第一搜索模具的右侧，并且第三搜索模具位于第二搜索模具的上部相邻侧时，移动平台并使用模板图像进行自动模式匹配，使得精确坐标获得第二搜索模具和第三搜索模具的图案的值; 参考第二搜索模具匹配坐标和第三搜索模具匹配坐标之间的关系，将移动的运动量计算到上部相邻模具，并将平台移动到上部相邻模具的图案到第一次搜索的坐标死亡预计会存在; 并使用模板图像进行图案匹配，使得重复地更新并获得搜索图案的精确坐标值。因此，精度提高。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2014239050A 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法审中-公开
标题翻译：通过充电颗粒的检查装置和使用其的装置制造方法
公开(公告)号：JP2014239050A
公开(公告)日：2014-12-18
申请号：JP2014147706
申请日：2014-07-18
申请人：株式会社荏原製作所 , Ebara Corp
发明人： NOJI NOBUHARU , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： H01J37/20 , G01N23/225 , H01J37/29 , H01L21/66
摘要：【課題】試料表面の帯電量のむらを防止することができる検査装置を提供する。【解決手段】一次電子ビームを試料Wに照射していないときに、電極59.18と電荷検出器59.23とを切換スイッチ59.19を介して接続した状態で、該電極59.18の帯電量を電荷検出器59.23により検出し、その後、切換スイッチ59.19を切り換えて電極59.18と電圧発生器59.21とを接続して、帯電量の電荷を相殺するための電圧を電圧発生器59.21から発生して電極59.18に印加する。上記した処理は、検出系59.4のCCD59.16が画像の1走査分を補足した後の空き時間に実行される。【選択図】図59
摘要翻译：要解决的问题：提供一种能够防止产生样品表面的不一致充电量的检查装置。解决方案：当样品W未被一次电子束照射时，电极59.18的充电量由电荷检测器 59.23在电极59.18通过转换开关59.19与充电检测器59.23连接的状态下，转换开关59.19然后被切换，电极59.18与电压发生器59.21连接，以产生电压从电压发生器59.21取消充电量的电荷并将电压施加到电极59.18。在检测系统59.4的CCD 59.16补充一次扫描的图像之后的空闲时间期间执行上述处理。

4. 发明公开

EP1635374A4 ELECTRON BEAM DEVICE, ELECTRON BEAM INSPECTION METHOD, ELECTRON BEAM INSPECTION DEVICE, PATTERN INSPECTION METHOD AND EXPOSURE CONDITION DETERMINATION METHOD 审中-公开
标题翻译：电子装置，用于测定曝光条件分析的电子法，电子扫描设备，图案检查方法和步骤
公开(公告)号：EP1635374A4
公开(公告)日：2010-02-24
申请号：EP04729530
申请日：2004-04-26
申请人： EBARA CORP
发明人： NOJI NOBUHARU , SATAKE TOHRU , SOBUKAWA HIROSI , KIMBA TOSHIFUMI , HATAKEYAMA MASAHIRO , YOSHIKAWA SHOJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOHYAMA KEIICHI
IPC分类号： G01B15/00 , G01N23/225 , G01N23/20 , H01J37/05 , H01J37/06 , H01J37/09 , H01J37/12 , H01J37/147 , H01J37/153 , H01J37/16 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/29 , H01L21/66
CPC分类号： G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/2441 , H01J2237/2446 , H01J2237/2817
摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25·1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25·11.

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