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1. 发明申请

WO2006094100A3 RETICLE POD WITH ISOLATION SYSTEM 审中-公开
标题翻译：具有隔离系统的物品
公开(公告)号：WO2006094100A3
公开(公告)日：2007-09-20
申请号：PCT/US2006007370
申请日：2006-02-27
申请人： ENTEGRIS INC , GREGERSON BARRY , HALBMAIER DAVID , SUMNER STEPHEN , WISEMAN BRIAN , TIEBEN ANTHONY MATHIUS , STRIKE JUSTIN
发明人： GREGERSON BARRY , HALBMAIER DAVID , SUMNER STEPHEN , WISEMAN BRIAN , TIEBEN ANTHONY MATHIUS , STRIKE JUSTIN
IPC分类号： B65D85/00
CPC分类号： H01L21/67353 , G03F1/66 , G03F7/70741 , H01L21/67359 , H01L21/67369 , H01L21/67376 , H01L21/67386
摘要： The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated.
摘要翻译：本发明提供了一种掩模版容器，其配备有容纳该掩模版并容纳在主容器中的二次容器。次级容器保持在具有冲击和隔振构件的主容器内，使得副容器在主容器内具有多个运动自由度。掩模版被固定在次级容器内，使得从掩模版容器到掩模版的冲击和振动传播被大大衰减。

2. 发明申请

WO2006093939A2 SUBSTRATE CONTAINER WITH PRESSURE EQUALIZATION 审中-公开
标题翻译：具有压力均衡的基体容器
公开(公告)号：WO2006093939A2
公开(公告)日：2006-09-08
申请号：PCT/US2006007033
申请日：2006-02-27
申请人： ENTEGRIS INC , GREGERSON BARRY , HALBMAIER DAVID , SUMNER STEPHEN , WISEMAN BRIAN , TIEBEN ANTHONY MATHIUS , STRIKE JUSTIN
发明人： GREGERSON BARRY , HALBMAIER DAVID , SUMNER STEPHEN , WISEMAN BRIAN , TIEBEN ANTHONY MATHIUS , STRIKE JUSTIN
CPC分类号： G03B27/58 , H01L21/67353 , H01L21/67376 , H01L21/67386 , H01L21/67393
摘要： The present invention is a pod for containing a particulate sensitive substrate and for providing pressure equalization between the exterior and an interior environment of the pod and for minimizing gaseous fluid flow inside adjacent to the particulate sensitive substrate. The pod comprises a primary pod, a diaphragm positioned in a cover, the diaphragm having a normal undeflected position, the diaphragm deflectable from the normal undeflected position. Preferably, the pod comprises a secondary pod disposed in the primary pod defining a second enclosure for containing the particulate sensitive substrate. The pod may comprise a filter attached to the pod and providing gaseous fluid communication between the exterior of the pod and the interior of the pod. The diaphragm is responsive to rapid pressure changes and the filter is responsive to slower pressure changes and allows the diaphragm to return to its normal undeflected position.
摘要翻译：本发明是用于容纳微粒敏感基材并用于在容器的外部和内部环境之间提供压力平衡并且用于最小化与颗粒敏感基材相邻的气态流体流动的容器的容器。所述荚包括主荚，位于盖中的隔膜，所述膈肌具有正常的未偏转位置，所述膈肌可偏离正常的未偏转位置。优选地，荚包括设置在主荚中的次荚，限定用于容纳微粒敏感基质的第二外壳。荚可以包括附接到荚果的过滤器，并且在荚的外部和荚的内部之间提供气态流体连通。隔膜响应于快速的压力变化，过滤器响应于较慢的压力变化，并允许隔膜返回其正常的未偏转位置。

3. 发明申请

WO2004006012A2 RETICLE CARRIER 审中-公开
公开(公告)号：WO2004006012A2
公开(公告)日：2004-01-15
申请号：PCT/US0320071
申请日：2003-06-26
申请人： ENTEGRIS INC , WISEMAN BRIAN , STRIKE JUSTIN
发明人： WISEMAN BRIAN , STRIKE JUSTIN
IPC分类号： G03B21/62 , G03F1/66 , G03F7/20 , G03F
CPC分类号： G03F7/70741 , G03B21/62 , G03F1/66 , G03F7/70983
摘要： A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticld positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.
摘要翻译：用于光刻半导体处理中的掩模版载体，具有基部和覆盖部分。基部具有多个掩模版支架和多个定位元件。盖部分适于与基部密封地配合，并且具有内表面，其具有多个间隔开的掩模版约束件和从其向内突出的一对光罩定位片。每个标线片定位突片具有对角边缘部分，并且被定向成使得当盖部分与基部配合时，对角边缘部分将搁置在掩模版支架上的光罩推向与光罩约束装置接合。

4. 发明申请

WO2004006012B1 A CARRIED FOR A RETICLE USED IN PHOTOLITHOGRAPHIC SEMICONDUCTOR 审中-公开
标题翻译：携带用于光刻半导体的反应物
公开(公告)号：WO2004006012B1
公开(公告)日：2004-05-27
申请号：PCT/US0320071
申请日：2003-06-26
申请人： ENTEGRIS INC , WISEMAN BRIAN , STRIKE JUSTIN
发明人： WISEMAN BRIAN , STRIKE JUSTIN
IPC分类号： G03B21/62 , G03F1/66 , G03F7/20 , G03B27/62
CPC分类号： G03F7/70741 , G03B21/62 , G03F1/66 , G03F7/70983
摘要： A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticld positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.
摘要翻译：用于光刻半导体处理中的掩模版载体，具有基部和覆盖部分。基部具有多个掩模版支架和多个定位元件。盖部分适于与基部密封地配合，并且具有内表面，其具有多个间隔开的掩模版约束件和从其向内突出的一对标线片定位接片。每个标线片定位突片具有对角边缘部分，并且被定向成使得当盖部分与基部配合时，对角边缘部分将搁置在掩模版支架上的光罩推向与标线保护装置接合。

5. 发明专利

AU2003281423A8 A carried for a reticle used in photolithographic semiconductor 未知
公开(公告)号：AU2003281423A8
公开(公告)日：2004-01-23
申请号：AU2003281423
申请日：2003-06-26
申请人： ENTEGRIS INC
发明人： STRIKE JUSTIN , WISEMAN BRIAN
IPC分类号： G03B21/62 , G03F1/66 , G03F7/20 , G03B27/62

6. 发明专利

AU2003281423A1 RETICLE CARRIER 未知
公开(公告)号：AU2003281423A1
公开(公告)日：2004-01-23
申请号：AU2003281423
申请日：2003-06-26
申请人： ENTEGRIS INC
发明人： WISEMAN BRIAN , STRIKE JUSTIN
IPC分类号： G03B21/62 , G03F1/66 , G03F7/20

7. 发明专利

MY139765A RETICLE CARRIER 未知
公开(公告)号：MY139765A
公开(公告)日：2009-10-30
申请号：MYPI20032445
申请日：2003-06-30
申请人： ENTEGRIS INC
发明人： WISEMAN BRIAN , STRIKE JUSTIN
IPC分类号： G03B27/62 , G03B21/62 , G03F1/66 , G03F7/20
摘要： A CARRIER (100) FOR A RETICLE USED IN PHOTOLITHOGRAPHIC SEMICONDUCTOR PROCESSING, HAVING A BASE PORTION (120) AND A COVER PORTION (140). THE BASE PORTION HAS A PLURALITY OF RETICLE SUPPORTS (122) AND A PLURALITY OF RETICLE POSITIONING MEMBERS (126, 128). THE COVER PORTION IS ADAPTED TO SEALINGLY MATE WITH THE BASE PORTION, AND HAS AN INNER SURFACE (141) WITH A PLURALITY OF SPACED APART RETICLE RESTRAINTS (142) AND A PAIR OF RETICLE POSITIONING TABS PROJECTING INWARDLY THEREFROM. EACH RETICLE POSITIONING TAB HAS A DIAGONAL EDGE PORTION, AND IS ORIENTED SO THAT THE DIAGONAL EDGE PORTION URGES A RETICLE RESTING ON THE RETICLE SUPPORTS INTO ENGAGEMENT WITH THE RETICLE RESTRAINTS WHEN THE COVER PORTION IS MATED WITH THE BASE PORTION.

8. 发明公开

EP1535112A4 RETICLE CARRIER 审中-公开
标题翻译： RETIKELTRûGER
公开(公告)号：EP1535112A4
公开(公告)日：2008-01-16
申请号：EP03742205
申请日：2003-06-26
申请人： ENTEGRIS INC
发明人： WISEMAN BRIAN , STRIKE JUSTIN
IPC分类号： G03B21/62 , G03F1/66 , G03F7/20 , G03B27/62
CPC分类号： G03F7/70741 , G03B21/62 , G03F1/66 , G03F7/70983
摘要： A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticld positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.
摘要翻译：一种用于光刻半导体处理中的掩模版的载体，具有基部和覆盖部。基座部分具有多个光罩支架和多个网格定位部件。盖部适于密封地与基部配合，并且具有内表面，该内表面具有多个间隔开的掩模版约束装置和从其向内突出的一对掩模版定位片。每个光罩定位翼片具有对角边缘部分，并且被定向为使得当罩盖部分与基部配合时，对角边缘部分促使搁置在光罩支架上的光罩与光罩约束件接合。

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