专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2002103337A2 AN ELECTRON BEAM APPARATUS AND A DEVICE MANUFACTURING METHOD BY USING SAID ELECTRON BEAM APPARATUS 审中-公开
标题翻译：电子束装置和使用电子束装置的装置制造方法
公开(公告)号：WO2002103337A2
公开(公告)日：2002-12-27
申请号：PCT/JP2002/005786
申请日：2002-06-11
申请人： EBARA CORPORATION , NAKASUJI, Mamoru , KATO, Takao , NOJI, Nobuharu , SATAKE, Tohru , MURAKAMI, Takeshi , WATANABE, Kenji
发明人： NAKASUJI, Mamoru , KATO, Takao , NOJI, Nobuharu , SATAKE, Tohru , MURAKAMI, Takeshi , WATANABE, Kenji
IPC分类号： G01N23/00
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： ABSTRACTAn electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.
摘要翻译：电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度电子束发射与光轴方向不对准。

2. 发明申请

WO2004068529A2 MAPPING-PROJECTION-TYPE ELECTRON BEAM APPARATUS FOR INSPECTING SAMPLE BY USING ELECTRONS EMITTED FROM THE SAMPLE 审中-公开
标题翻译：用于通过使用从样品发出的电子检查样品的映射型投影型电子束装置
公开(公告)号：WO2004068529A2
公开(公告)日：2004-08-12
申请号：PCT/JP2004/000711
申请日：2004-01-27
申请人： EBARA CORPORATION , KABUSHIKI KAISHA TOSHIBA , WATANABE, Kenji , MURAKAMI, Takeshi , HATAKEYAMA, Masahiro , HIRABAYASHI, Yoshinao , SATAKE, Tohru , NOJI, Nobuharu , YAMAZAKI, Yuichiro , NAGAHAMA, Ichirota
发明人： WATANABE, Kenji , MURAKAMI, Takeshi , HATAKEYAMA, Masahiro , HIRABAYASHI, Yoshinao , SATAKE, Tohru , NOJI, Nobuharu , YAMAZAKI, Yuichiro , NAGAHAMA, Ichirota
IPC分类号： H01J37/244
CPC分类号： H01J37/32211 , G01N23/225 , H01J37/32357 , H01J2237/2441 , H01J2237/2446
摘要： An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for observing or evaluating a surface of the sample by irradiating the sample with a primary electron beam and forming on a detector an image of reflected electrons emitted from the sample. An electron impact-type detector such as an electron impact-type CCD or an electron impact-type TDI is used as the detector for detecting the reflected electrons. The reflected electrons are selectively detected from an energy difference between the reflected electrons and secondary electrons emitted from the sample. To eliminate charge-up caused on the sample surface by irradiation with the primary electron beam, the surface of the sample is covered with a cover placed above the sample and a gas is supplied to the space above the sample covered with the cover. The gas is brought into contact with the sample surface to reduce charge-up on the sample surface.
摘要翻译：提供了能够以高精度和可靠性以高产量检测样品上的图案的缺陷的装置，以及使用该缺陷的半导体制造方法。电子束装置是用于通过用一次电子束照射样品来观察或评价样品的表面的映射投影型电子束装置，并在检测器上形成从样品发射的反射电子的图像。作为检测反射电子的检测器，使用电子碰撞型CCD或电子碰撞型TDI等电子轰击型检测器。从反射电子和从样品发射的二次电子之间的能量差选择性地检测反射电子。为了通过照射一次电子束来消除样品表面上产生的电荷，样品的表面被放置在样品上方的盖子覆盖，并且将气体供应到覆盖有覆盖物的样品上方的空间。气体与样品表面接触以减少样品表面的充电。

3. 发明申请

WO2003087797A1 SAMPLE SURFACE INSPECTION APPARATUS AND METHOD 审中-公开
标题翻译：样品表面检查装置和方法
公开(公告)号：WO2003087797A1
公开(公告)日：2003-10-23
申请号：PCT/JP2003/004910
申请日：2003-04-17
申请人： EBARA CORPORATION , HATAKEYAMA, Masahiro , WATANABE, Kenji , MURAKAMI, Takeshi , SATAKE, Tohru , NOJI, Nobuharu
发明人： HATAKEYAMA, Masahiro , WATANABE, Kenji , MURAKAMI, Takeshi , SATAKE, Tohru , NOJI, Nobuharu
IPC分类号： G01N23/227
CPC分类号： G03F7/162 , G01N23/225 , H01J37/285 , H01J2237/204 , H01J2237/2812 , H01J2237/2814 , H01J2237/2855 , H01J2237/2857
摘要： The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t1 is first coated on a surface of a sample. Thereafter, a part of the resistive film having the arbitrarily determined thickness t1 is dissolved in a solvent, to thereby reduce the thickness of the resistive film to a desired level. This enables precise control of a value of resistance of the resistive film and suppresses distortion of an image to be detected.
摘要翻译：本发明提供了一种表面检查方法和装置，用于检查表面上涂覆有电阻膜的样品的表面，并且将光束照射到其上涂覆有电阻膜的表面，从而进行样品表面。在本发明的表面检查方法中，首先将具有任意确定的厚度t1的电阻膜涂覆在样品的表面上。此后，将具有任意确定的厚度t1的电阻膜的一部分溶解在溶剂中，从而将电阻膜的厚度减小到期望的水平。这能够精确地控制电阻膜的电阻值并抑制要检测的图像的失真。

4. 发明申请

WO2002093906A1 A TDI DETECTING DEVICE, A FEED-THROUGH EQUIPMENT AND ELECTRON BEAM APPARATUS USING THESE DEVICES 审中-公开
标题翻译： TDI检测装置，使用这些装置的进给设备和电子束装置
公开(公告)号：WO2002093906A1
公开(公告)日：2002-11-21
申请号：PCT/JP2002/004655
申请日：2002-05-14
申请人： EBARA CORPORATION , HATAKEYAMA, Masahiro , SATAKE, Tohru , MURAKAMI, Takeshi , WATANABE, Kenji , NOJI, Nobuharu
发明人： HATAKEYAMA, Masahiro , SATAKE, Tohru , MURAKAMI, Takeshi , WATANABE, Kenji , NOJI, Nobuharu
IPC分类号： H04N3/15
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor (64) and a feed-through device (50). The feed-through device has a socket contact (54) for interconnecting a pin (52) attached to a flanged (51) for separating different environments. The other pin (53) making a pair with the pin (52) and the socket contact (54) together construct a connecting block, and the socket contact (54) has an elastic member (61). The pin (53) is connected with the TDI sensor (64), in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.
摘要翻译：电子束装置包括TDI传感器（64）和馈通装置（50）。馈通装置具有用于互连连接到带法兰（51）的销（52）的插座触点（54），用于分离不同的环境。与销（52）和插座触头（54）成对配合的另一个销（53）构成连接块，并且插座触点（54）具有弹性部件（61）。引脚（53）与TDI传感器（64）连接，其中像素阵列已经基于图像投影光学系统的光学特性被自适应地配置。该传感器具有可以减少图像投影光学系统的视野的多个积分级。此外，可以确定积分级的数量，使得TDI传感器的数据速率不会降低，但是引脚的数量不会尽可能多地增加。优选地，行计数的数量可以几乎等于积分级数。

5. 发明申请

WO2003038858A2 A SEMICONDUCTOR MANUFACTURING APPARATUS HAVING A BUILT-IN INSPECTION APPARATUS AND A DEVICE MANUFACTURING METHOD USING SAID MANUFACTURING APPARATUS 审中-公开
标题翻译：具有内置检查装置的半导体制造装置和使用制造装置的装置制造方法
公开(公告)号：WO2003038858A2
公开(公告)日：2003-05-08
申请号：PCT/JP2002/011450
申请日：2002-11-01
申请人： EBARA CORPORATION , SATAKE, Tohru , NOJI, Nobuharu
发明人： SATAKE, Tohru , NOJI, Nobuharu
IPC分类号： H01L
CPC分类号： H01L21/67219 , B24B37/005 , G03F7/70616 , G03F7/70991 , H01J37/28 , H01J2237/2817 , H01L21/67288 , Y10T29/41
摘要： According to the present invention, a chemical and mechanical polishing apparatus (100) for a sample such as a wafer includes a built-in inspection apparatus (25) incorporated therein. The polishing apparatus (100) further comprises a load unit (21), a chemical and mechanical polishing unit (22), a cleaning unit (23), a drying unit (24) and an unload unit (26). The chemical and mechanical polishing apparatus (100) receives a sample from a preceding step (107), carries out respective processes for the sample by said respective units disposed within the polishing apparatus (100) and then transfers the processed sample to a subsequent step (109). Sample loading and unloading means and a sample transfer means are no more necessary for transferring the sample between respective units.
摘要翻译：根据本发明，用于诸如晶片的样品的化学和机械抛光装置（100）包括结合在其中的内置检查装置（25）。抛光装置（100）还包括加载单元（21），化学和机械抛光单元（22），清洁单元（23），干燥单元（24）和卸载单元（26）。化学和机械抛光装置（100）从前面的步骤（107）接收样品，通过设置在抛光装置（100）内的各个单元对样品进行各自的处理，然后将处理的样品转移到随后的步骤 109）。样品装载和取样装置和样品转移装置不再需要在各个单元之间转移样品。

6. 发明申请

WO2003038858A3 A SEMICONDUCTOR MANUFACTURING APPARATUS HAVING A BUILT-IN INSPECTION APPARATUS AND METHOD THEREFOR 审中-公开
公开(公告)号：WO2003038858A3
公开(公告)日：2003-05-08
申请号：PCT/JP2002/011450
申请日：2002-11-01
申请人： EBARA CORPORATION , SATAKE, Tohru , NOJI, Nobuharu
发明人： SATAKE, Tohru , NOJI, Nobuharu
IPC分类号： H01L21/00
摘要： According to the present invention, a chemical and mechanical polishing apparatus (100) for a sample such as a wafer includes a built-in inspection apparatus (25) incorporated therein. The polishing apparatus (100) further comprises a load unit (21), a chemical and mechanical polishing unit (22), a cleaning unit (23), a drying unit (24) and an unload unit (26). The chemical and mechanical polishing apparatus (100) receives a sample from a preceding step (107), carries out respective processes for the sample by said respective units disposed within the polishing apparatus (100) and then transfers the processed sample to a subsequent step (109). Sample loading and unloading means and a sample transfer means are no more necessary for transferring the sample between respective units.

7. 发明申请

WO2007032456A1 SEMICONDUCTOR DEVICES AND METHOD OF TESTING SAME 审中-公开
标题翻译：半导体器件及其测试方法
公开(公告)号：WO2007032456A1
公开(公告)日：2007-03-22
申请号：PCT/JP2006/318321
申请日：2006-09-08
申请人： EBARA CORPORATION , KAGA, Toru , NAITO, Yoshihiko , TSUNEOKA, Masatoshi , TERAO, Kenji , NOJI, Nobuharu , TAJIMA, Ryo
发明人： KAGA, Toru , NAITO, Yoshihiko , TSUNEOKA, Masatoshi , TERAO, Kenji , NOJI, Nobuharu , TAJIMA, Ryo
IPC分类号： H01L21/66 , G01R31/302 , H01L21/768 , H01L23/522
CPC分类号： G01R31/307 , G01R31/2884 , G11C29/02 , G11C29/025
摘要： There are provided a semiconductor device having a pattern which allows electric failures to be sensitively detected at high speeds, and a method of testing the same. In one embodiment, the semiconductor device comprises a pair of row wires including a plurality of first wires arranged in a first layer at predetermined intervals in a row direction, where the first wires have ends connected to second wires arranged in a second layer at a predetermined intervals through vias, and the first wire and second wire are at the same potential. In the pair of row wires, a first wire positioned at a right end of one row wire is connected to a first conductor, and a first wire positioned at a left end in the other row wire is connected to a second conductor. By sequentially scanning the first conductor and second conductor using an electron beam, a change in the amount of emitted secondary electrons due to a difference in potential between these conductors is detected to detect electric anomalies.
摘要翻译：提供一种半导体器件，其具有允许高速敏感地检测电故障的图案，以及测试方法。在一个实施例中，半导体器件包括一对行导线，其包括以行方向以预定间隔布置在第一层中的多个第一布线，其中第一布线的端部以预定的方式连接到布置在第二层中的第二布线通过通孔的间隔，并且第一线和第二线处于相同的电位。在一对行配线中，位于一排行的右端的第一配线与第一导体连接，位于另一行配线左端的第一配线与第二导体连接。通过使用电子束顺序扫描第一导体和第二导体，检测由于这些导体之间的电位差引起的发射二次电子量的变化，以检测电异常。

8. 发明公开

EP3089193A1 METHOD FOR DETECTING A FINE GEOMETRY 无效
标题翻译： VERFAHREN ZUR ERFASSUNG EINER FEINEN GEOMETRIE
公开(公告)号：EP3089193A1
公开(公告)日：2016-11-02
申请号：EP16172147.7
申请日：2002-09-10
申请人： Ebara Corporation
发明人： HATAKEYAMA, Masahiro , MURAKAMI, Takeshi , SATAKE, Tohru , NOJI, Nobuharu , NAGAHAMA, Ichirota , YAMAZAKI, Yuichiro
IPC分类号： H01J37/244 , H01J37/28 , H01J37/285
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446
摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
摘要翻译：一种用于检测样品表面上的精细几何形状的检测装置，其中照射束照射放置在不同于大气的不同环境中的样品，并且通过传感器检测从样品发出的二次辐射，并且其中传感器设置在不同环境的内部，处理来自传感器的检测信号的处理装置设置在不同环境的外部，并且传输装置将检测信号从传感器传送到处理装置。

9. 发明授权

EP1393546B1 A SOCKET CONTACT AND FEED-THROUGH DEVICE 有权
标题翻译：连接套管和单位KOPPEL
公开(公告)号：EP1393546B1
公开(公告)日：2008-11-05
申请号：EP02769596.4
申请日：2002-05-14
申请人： EBARA CORPORATION
发明人： HATAKEYAMA, Masahiro , SATAKE, Tohru , MURAKAMI, Takeshi , WATANABE, Kenji , NOJI, Nobuharu
IPC分类号： H04N3/15 , H01J37/26 , G01N21/956 , H01R13/00
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor (64) and a feed-through device (50). The feed-through device has a socket contact (54) for interconnecting a pin (52) attached to a flanged (51) for separating different environments. The other pin (53) making a pair with the pin (52) and the socket contact (54) together construct a connecting block, and the socket contact (54) has an elastic member (61). The pin (53) is connected with the TDI sensor (64), in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

10. 发明公开

EP1245896A1 METHOD AND DEVICE FOR FORMING REQUIRED GAS ATMOSPHERE 审中-公开
标题翻译： VERFAHREN UND VORRICHTUNG ZUR HERSTELLUNG VONCASATMOSPHÄRE
公开(公告)号：EP1245896A1
公开(公告)日：2002-10-02
申请号：EP00985814.3
申请日：2000-12-21
申请人： EBARA CORPORATION
发明人： SHINODA, Setsuji , NAKAZAWA, Toshiharu , NOJI, Nobuharu , AIYOSHIZAWA, Shunichi
IPC分类号： F17D1/02 , H01L21/68 , H01L21/02 , F24F7/06
CPC分类号： C23C16/45593 , C23C16/405 , C23C16/4402 , C23C16/4412 , H01L21/67017
摘要： The present invention provides an apparatus and a method for forming a desired gas atmosphere in an inner space of a casing.
This apparatus comprises a casing (1) having a gas introduction opening (3) for introducing a gas into the casing and a gas discharge opening (5) for discharging the gas from the casing, a gas circulating tube passage (8) communicated with the casing for effecting circulation of the gas, a circulating fan (11) for effecting circulation of the gas in the casing through the gas circulating tube passage and a valve (6, 7) switchable between a position for conducting the introducing and discharging of the gas into and from the casing through the gas introduction opening and the gas discharge opening and a position for effecting circulation of the gas in the casing through the gas circulating tube passage. The apparatus further comprises a trap (10), a filter (4) and a heat exchanger (9) for conducting a desired treatment with respect to the circulated gas, such as removal of particles.
In this apparatus, the introducing of gas into the casing and the discharging of gas from the casing are conducted at the same time, to thereby remove air which exits in the casing before operation and fill the casing with the introduced gas. When the casing is filled with the introduced gas, the introducing and discharging of the gas is stopped and the gas is subjected to circulation. The gas atmosphere in the casing is maintained in a predetermined condition.
摘要翻译：本发明提供一种在壳体的内部空间中形成所需气体气氛的装置和方法。该装置包括具有用于将气体引入壳体的气体导入口（3）和用于从壳体排出气体的气体排出口（5）的壳体（1），与该壳体连通的气体循环管路（8）用于实现气体循环的壳体，用于通过气体循环管通道使气体在壳体中循环的循环风扇（11）和可在气体的引入和排出的位置之间切换的阀（6,7）通过气体引入开口和气体排出口进入和离开壳体，以及通过气体循环管通道使气体在壳体中循环的位置。该装置还包括用于对循环气体进行所需处理的捕集器（10），过滤器（4）和热交换器（9），例如去除颗粒。在该装置中，同时导入气体进入壳体和排出气体，从而除去在操作之前在壳体中排出的空气，并且用引入的气体填充壳体。当壳体填充有引入的气体时，气体的引入和排出停止，并且气体被循环。壳体中的气体气氛保持在预定状态。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式