会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Grating-assisted co-directional vertical coupler optical filter having well-suppressed sidelobe characteristics and method of fabricating the same
    • 具有良好抑制旁瓣特性的光栅辅助同向垂直耦合器滤光器及其制造方法
    • US06597838B1
    • 2003-07-22
    • US09135730
    • 1998-08-18
    • Chan Yong ParkSeung Won LeeDug Bong KimKwang Ryong OhHong Man Kim
    • Chan Yong ParkSeung Won LeeDug Bong KimKwang Ryong OhHong Man Kim
    • G02B634
    • G02B6/12002G02B6/12007G02B2006/12107G02B2006/12147
    • The present invention relates to an optical filter whose a sidelobe disturbing a characteristic of an optical filter by weighting an optical coupling efficiency between waveguides is controlled upon applying a selective area growth method in a wavelength selective variable semiconductor optical filter and method of fabricating the same. The present invention can control the thickness of growth layer selectively by controlling the width of the dielectric thin film mask whose the growth is not achieved in the selective area growth method, can control the distance between two waveguides of the wavelength selective variable semiconductor optical filter by applying the result on the distance control between two waveguides. Accordingly, there can be changed an optical coupling efficiency between two waveguides spatially. Because the sidelobe characteristics is largely improved if the distance between two waveguides is controlled temporarily to be corresponded to one period of Hamming function, there can be fabricated a semiconductor optical filter whose the characteristic is very excellent when applying the present invention.
    • 本发明涉及一种滤光器,其通过在波长选择性可变半导体光学滤波器中应用选择性区域增长方法及其制造方法来控制通过对波导之间的光耦合效率进行加权来干扰滤光器的特性的旁瓣。 本发明可以通过控制在选择区域生长方法中未实现生长的电介质薄膜掩模的宽度来选择性地控制生长层的厚度,可以通过以下方式控制波长选择性可变半导体光学滤波器的两个波导之间的距离 将结果应用于两个波导之间的距离控制。 因此,可以在空间上改变两个波导之间的光耦合效率。 因为如果临时控制两个波导之间的距离以对应于汉明功能的一个周期,则旁瓣特性被大大改善,所以可以制造当应用本发明时其特性非常好的半导体滤光器。
    • 4. 发明授权
    • Substrate-processing apparatus and substrate-processing method for selectively inserting diffusion plates
    • 用于选择性地插入扩散板的基板处理装置和基板处理方法
    • US08771418B2
    • 2014-07-08
    • US13382812
    • 2010-07-02
    • Sung Tae JeChan Yong ParkKyoung Hun Kim
    • Sung Tae JeChan Yong ParkKyoung Hun Kim
    • C23C16/455C23F1/00H01L21/306C23C16/06C23C16/22
    • C23C16/45565
    • According to one embodiment of the present invention, a substrate-processing apparatus comprises: a lower chamber with an open top; an upper chamber which covers the top of the lower chamber, and which cooperates with the lower chamber to form an internal space for substrate-processing; a shower head arranged in a lower portion of the upper chamber to supply reaction gas to the internal space, and forming a buffer space between the shower head and the upper chamber; a gas supply port formed in the upper chamber to supply reaction gas to the buffer space; and a diffusion unit arranged in the buffer space to diffuse the reaction gas supplied through the gas supply port. The diffusion unit includes: a plurality of diffusion areas which are blocked from each other, in order to enable the reaction gas to be diffused therein; a plurality of diffusion holes for placing the gas supply port and the diffusion areas in communication; and one or more diffusion plates, the shapes of which correspond to the shapes of the diffusion areas, and which are selectively inserted into the respective diffusion areas.
    • 根据本发明的一个实施例,一种基板处理装置包括:具有开口顶部的下室; 上室,其覆盖下室的顶部,并与下腔室配合以形成用于衬底处理的内部空间; 淋浴头,其布置在所述上​​部腔室的下部,以将反应气体供应到所述内部空间;以及在所述淋浴喷头和所述上部腔室之间形成缓冲空间; 形成在上部室中的气体供给口,用于向缓冲空间供给反应气体; 以及布置在所述缓冲空间中的扩散单元,用于扩散通过所述气体供给口供给的反应气体。 扩散单元包括:多个彼此被阻挡的扩散区域,以使反应气体能够在其中扩散; 多个用于将气体供给口和扩散区域连通的扩散孔; 以及一个或多个扩散板,其形状对应于扩散区域的形状,并且被选择性地插入到相应的扩散区域中。
    • 8. 发明授权
    • Health care server and method of operating the same
    • 医疗服务器和操作方法相同
    • US08847767B2
    • 2014-09-30
    • US13550811
    • 2012-07-17
    • Joon-Ho LimChan Yong ParkSoo Jun Park
    • Joon-Ho LimChan Yong ParkSoo Jun Park
    • G08B23/00
    • G06F19/3418A61B5/0002A61B5/746G06F19/00G08B21/04G16H50/20
    • The inventive concept relates to a health care system, and more particularly, to a health care server of the health care system and a method of operating the same. The health care server includes a symptom collection module collecting clinical information of patient from a hospital server and health information of patient from an individual health record server; an alarm and reaction rule management module generating an alarm rule on the basis of the clinical information and the health information; and an alarm generation module monitoring the health information or the clinical information and generating an alarm when the monitored health information or the clinical information corresponding to the alarm rule. The health care server can provide a different alarm service to a patient having a different health state with reference to clinical information and health information of each patient.
    • 本发明的概念涉及医疗保健系统,更具体地,涉及医疗保健系统的保健服务器及其操作方法。 保健服务器包括从医院服务器收集患者的临床信息的症状收集模块和来自个人健康记录服务器的患者的健康信息; 警报和反应规则管理模块,根据临床信息和健康信息生成警报规则; 监视健康信息或临床信息的报警发生模块,并在监视到的健康信息或与该告警规则对应的临床信息时产生报警。 参考每个患者的临床信息和健康信息,医疗保健服务器可以向具有不同健康状态的患者提供不同的警报服务。
    • 9. 发明申请
    • SUBSTRATE-PROCESSING APPARATUS AND SUBSTRATE-PROCESSING METHOD FOR SELECTIVELY INSERTING DIFFUSION PLATES
    • 用于选择性插入扩散板的基板处理装置和基板处理方法
    • US20120135145A1
    • 2012-05-31
    • US13382812
    • 2010-07-02
    • Sung Tae JeChan Yong ParkKyoung Hun Kim
    • Sung Tae JeChan Yong ParkKyoung Hun Kim
    • C23C16/455
    • C23C16/45565
    • According to one embodiment of the present invention, a substrate-processing apparatus comprises: a lower chamber with an open top; an upper chamber which covers the top of the lower chamber, and which cooperates with the lower chamber to form an internal space for substrate-processing; a shower head arranged in a lower portion of the upper chamber to supply reaction gas to the internal space, and forming a buffer space between the shower head and the upper chamber; a gas supply port formed in the upper chamber to supply reaction gas to the buffer space; and a diffusion unit arranged in the buffer space to diffuse the reaction gas supplied through the gas supply port. The diffusion unit includes: a plurality of diffusion areas which are blocked from each other, in order to enable the reaction gas to be diffused therein; a plurality of diffusion holes for placing the gas supply port and the diffusion areas in communication; and one or more diffusion plates, the shapes of which correspond to the shapes of the diffusion areas, and which are selectively inserted into the respective diffusion areas.
    • 根据本发明的一个实施例,一种基板处理装置包括:具有开口顶部的下室; 上室,其覆盖下室的顶部,并与下腔室配合以形成用于衬底处理的内部空间; 淋浴头,其布置在所述上​​部腔室的下部,以将反应气体供应到所述内部空间;以及在所述淋浴喷头和所述上部腔室之间形成缓冲空间; 形成在上部室中的气体供给口,用于向缓冲空间供给反应气体; 以及布置在所述缓冲空间中的扩散单元,用于扩散通过所述气体供给口供给的反应气体。 扩散单元包括:多个彼此被阻挡的扩散区域,以使反应气体能够在其中扩散; 多个用于将气体供给口和扩散区域连通的扩散孔; 以及一个或多个扩散板,其形状对应于扩散区域的形状,并且被选择性地插入到相应的扩散区域中。