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1. 发明专利

JP2010114415A Etchant composition, method of forming metal pattern using the same, and method of manufacturing thin-film transistor display panel 有权
标题翻译：蚀刻组合物，使用其的金属图案的形成方法以及制造薄膜晶体管显示面板的方法
公开(公告)号：JP2010114415A
公开(公告)日：2010-05-20
申请号：JP2009158508
申请日：2009-07-03
申请人： Dongwoo Fine-Chem Co Ltd , Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd. , 東友ファインケム株式会社Dongwoo Fine−Chem Co.,Ltd.
发明人： CHOI YOUNG-JOO , KIM BONG-KYUN , LEE BYEONG-JIN , CHOUNG JONG-HYUN , HONG SUN-YOUNG , SUH NAM-SEOK , BOKU KOSHOKU , KIM KY-SUB , LEE SEUNG-YONG , RI SHUNU , PARK YOUNG-CHUL , JIN YOUNG-JUN , YANG SEUNG-JAE , LEE HYUN-KYU , JANG SANG-HOON , LIM MIN-KI
IPC分类号： H01L21/306 , C23F1/18 , H01L21/28 , H01L21/308 , H01L21/3205 , H01L21/3213 , H01L21/336 , H01L23/52 , H01L29/786
CPC分类号： H01L21/32134 , C09K13/06 , H01L27/124 , H01L27/1288 , H01L29/66765
摘要： PROBLEM TO BE SOLVED: To provide: an etchant composition capable of keeping an etching characteristic of a wire well; a method of forming a metal pattern using the same; and a method of manufacturing a thin-film transistor display panel. SOLUTION: The etchant composition contains 40-65 wt.% of phosphoric acid, 2-5 wt.% of nitric acid, 2-20 wt.% of acetic acid, 0.1-2 wt.% of a compound containing phosphate, 0.1-2 wt.% of a compound containing an amino group and a carboxy group at the same time, and water to set the total weight of the whole composition at 100 wt.%. This invention also relates to the method of forming a metal pattern using the same, and the method of manufacturing a thin-film transistor display panel. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供：能够保持丝线的蚀刻特性的蚀刻剂组合物; 使用其形成金属图案的方法; 以及制造薄膜晶体管显示面板的方法。溶液：蚀刻剂组合物含有40-65重量％的磷酸，2-5重量％的硝酸，2-20重量％的乙酸，0.1-2重量％的含磷酸盐的化合物，0.1-2重量％的同时含有氨基和羧基的化合物和水，以使整个组合物的总重量为100重量％。本发明还涉及使用其形成金属图案的方法，以及制造薄膜晶体管显示面板的方法。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2006077241A Etching liquid composition for indium oxide-based transparent conductive film and etching method using the composition 有权
标题翻译：用于基于氧化物的透明导电膜的蚀刻液体组合物和使用该组合物的蚀刻方法
公开(公告)号：JP2006077241A
公开(公告)日：2006-03-23
申请号：JP2005243577
申请日：2005-08-25
申请人： Dongwoo Fine-Chem Co Ltd , Samsung Electronics Co Ltd , サムスンエレクトロニクスカンパニーリミテッド , 東友ファインケム株式会社
发明人： CHO HONG JE , LEE SEUNG-YONG , RI SHUNU , LEE JAE-YEON , CHON SEUNG-HWAN , CHOI YONG-SUK , PARK YOUNG-CHUL , KIM JIN-SU , KIM KYU-SANG , CHOI DONG-UK , RIN KANTAKU
IPC分类号： C09K13/04 , C09K13/06 , H01B13/00 , H01L21/306 , H01L21/3213
CPC分类号： C09K13/06
摘要： PROBLEM TO BE SOLVED: To provide an etching liquid composition improving the reproducibility of the selection ratio[an indicator representing the influence on films other than IZO film or ITO film, being the ratio of (the etching level of IZO film or ITO film):(the etching level of the other films)] and the etching step in etching an indium oxide-based transparent electrically conductive film laminated on e.g. the substrate of an electronic part, free of fume generation, and high in stability to temperature, and to provide an etching method for IZO film and ITO film.
SOLUTION: The etching liquid composition for indium oxide-based transparent conductive film comprises sulfuric acid as the main oxidizing agent, a compound selected from H
3 PO
4 , HNO
3 , CH
3 COOH, HClO
4 , H
2 O
2 and salts including potassium peroxomonosulfate, potassium bisulfate and potassium sulfate as an auxiliary oxidizing agent, a compound containing NH
4
+ as etching inhibitor, and water.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供提高选择比的再现性的蚀刻液组合物[表示对IZO膜或ITO膜以外的膜的影响的指标，（IZO膜或ITO的蚀刻水平的比例膜）（其他膜的蚀刻水平）]和蚀刻步骤，蚀刻层叠在例如氧化铟系透明导电膜上电子部件的基板，不产生烟雾，并且对温度的稳定性高，并为IZO膜和ITO膜提供蚀刻方法。解决方案：用于氧化铟基透明导电膜的蚀刻液体组合物包括硫酸作为主要氧化剂，选自H 3 SB 3 PO 4，S / CH 3，CH 3，COOH，HClO 4，SB 3，H SB 2，SO 2和/ 包括硫酸钾钾，硫酸氢钾和硫酸钾作为辅助氧化剂，含有作为蚀刻抑制剂的NH SP> + / SP的化合物和水。版权所有（C）2006，JPO＆NCIPI

3. 发明申请

WO2011059280A3 NONAQUEOUS RESIST STRIPPER COMPOSITION 审中-公开
标题翻译：非耐酸性剥离剂组合物
公开(公告)号：WO2011059280A3
公开(公告)日：2011-10-20
申请号：PCT/KR2010008043
申请日：2010-11-15
申请人： DONGWOO FINE CHEM CO LTD , PARK MYUN-KYU , KIM JEONG-HYUN , LEE SEUNG-YONG , KIM BYOUNG-MOOK
发明人： PARK MYUN-KYU , KIM JEONG-HYUN , LEE SEUNG-YONG , KIM BYOUNG-MOOK
IPC分类号： G03F7/42
CPC分类号： G03F7/425
摘要： The present invention relates to a nonaqueous resist stripper composition comprising: (a) 5-30% by weight of a basic compound; (b) 20-80% by weight of an amide compound; (c) 10-70% by weight of a polar solvent; and (d) 0.0-10% by weight of an alkanolamine salt. The present invention provides a new resist stripper composition which can effectively remove, in a short time and without corrosion, the etching residue and resist transformed during a process of manufacturing a thin-film transistor used in a flat-panel display to realize the high resolution of the flat-panel display.
摘要翻译：本发明涉及非水性抗蚀剂剥离剂组合物，其包含：（a）5-30重量％的碱性化合物; （b）20-80重量％的酰胺化合物; （c）10-70重量％的极性溶剂; 和（d）0.0-10重量％的链烷醇胺盐。本发明提供了一种新的抗蚀剂剥离剂组合物，其能够在短时间内有效地除去在制造平板显示器中使用的薄膜晶体管的过程中所蚀刻的残留物和抗蚀剂，以实现高分辨率的平板显示器。

4. 发明申请

WO2011019189A3 RESIST STRIPPING SOLUTION COMPOSITION, AND METHOD FOR STRIPPING RESIST BY USING SAME 审中-公开
标题翻译：耐剥离性溶液组合物，以及使用它们剥离电阻的方法
公开(公告)号：WO2011019189A3
公开(公告)日：2011-06-23
申请号：PCT/KR2010005238
申请日：2010-08-10
申请人： DONGWOO FINE CHEM CO LTD , PARK MYUN-KYU , KIM TAE-HEE , KIM JEONG-HYUN , LEE SEUNG-YONG , KIM BYOUNG-MOOK
发明人： PARK MYUN-KYU , KIM TAE-HEE , KIM JEONG-HYUN , LEE SEUNG-YONG , KIM BYOUNG-MOOK
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , C11D11/0047
摘要： The present invention relates to a resist stripping solution composition, and a method for stripping resist by using the same. The resist stripping solution composition has an excellent removing power of resist patterns and dry and wet etching residue, and has an excellent corrosion resistance of a metal interconnect comprising aluminum and/or copper by containing a specific polyol compound. In addition, the resist stripping solution composition can treat a large number of substrates by containing a specific amide compound, thereby remarkably contributing to reduction of costs.
摘要翻译：抗蚀剂剥离溶液组合物本发明涉及抗蚀剂剥离溶液组合物及其使用方法。抗蚀剂剥离溶液组合物具有优异的抗蚀剂图案去除力和干蚀刻和湿蚀刻残留物，并且通过含有特定的多元醇化合物具有优异的包含铝和/或铜的金属互连的耐腐蚀性。此外，抗蚀剂剥离溶液组合物可以通过含有特定的酰胺化合物来处理大量的底物，从而显着地有助于降低成本。

5. 发明申请

WO2011052941A3 ETCHING COMPOSITION FOR TEXTURING CRYSTALLINE SILICON-BASED WAFER 审中-公开
标题翻译：蚀刻晶体硅基晶片的蚀刻组合物
公开(公告)号：WO2011052941A3
公开(公告)日：2011-10-27
申请号：PCT/KR2010007323
申请日：2010-10-25
申请人： DONGWOO FINE CHEM CO LTD , HONG HYUNG-PYO , LEE JAE-YOUN , LIM DAE-SUNG , LEE SEUNG-YONG
发明人： HONG HYUNG-PYO , LEE JAE-YOUN , LIM DAE-SUNG , LEE SEUNG-YONG
IPC分类号： C09K13/02
CPC分类号： C09K13/02 , H01L31/02363 , Y02E10/50
摘要： Disclosed is an etching composition for texturing a crystalline silicon-based wafer, including (A) 0.1 ~ 20 wt% of at least one alkaline compound, (B) 0.1 ~ 50 wt% of at least one cyclic compound having a boiling point of 100 ~ 400°C, and (C) the remainder of water, based on the total weight of the composition.
摘要翻译：本发明公开了一种用于纹理化晶体硅基晶片的蚀刻组合物，其包含（A）0.1〜20wt％的至少一种碱性化合物，（B）0.1〜50wt％的至少一种沸点为100 〜400℃，和（C）基于组合物总重量的剩余水。

6. 发明申请

WO2011046360A2 ALUMINUM PASTE FOR BACK ELECTRODE OF SOLAR CELL 审中-公开
标题翻译：太阳能电池背面电极铝粉
公开(公告)号：WO2011046360A2
公开(公告)日：2011-04-21
申请号：PCT/KR2010006993
申请日：2010-10-13
申请人： DONGWOO FINE CHEM CO LTD , LEE CHANG-MO , LEE SEUNG-YONG , LIM DAE-SUNG , CHOI HYUNG-SUB , HONG SEUNG-KWON
发明人： LEE CHANG-MO , LEE SEUNG-YONG , LIM DAE-SUNG , CHOI HYUNG-SUB , HONG SEUNG-KWON
IPC分类号： H01B1/22 , H01B1/04 , H01L31/042
CPC分类号： H01L31/022425 , H01B1/22 , H01L31/056 , Y02E10/52
摘要： Disclosed herein is an aluminum paste for a back electrode of a solar cell, comprising: aluminum powder in which aluminum powder having an average particle size (D50) of 4 ~ 6 µm and aluminum powder having an average particle size (D50) of 2 ~ 4 µm are mixed in a ratio of 6:4 ~ 9.5:0.5 by weight. The aluminum paste is advantageous in that since the contact between aluminum paste and a silicon wafer textured using two or more kinds of aluminum powder having a different average particle size is improved, the warpage of a solar cell can be prevented or the formation of aluminum bubbles or bumps and the occurrence of yellow discoloration can be minimized during a calcination process, the values of short circuit current (Isc) and open circuit voltage (Voc) can be greatly increased, and the efficiency of a solar cell can be remarkably improved.
摘要翻译：本发明公开了一种太阳能电池背面电极用铝膏，其特征在于，具有平均粒径（D50）为4〜6μm的铝粉末和平均粒径（D50）为2〜 4μm以6:4〜9.5:0.5的比例混合。铝浆的优点在于，由于使用两种或更多种具有不同平均粒径的铝粉进行纹理化的铝浆和硅晶片之间的接触被改善，所以可以防止太阳能电池的翘曲或铝泡沫的形成或凸起，并且在煅烧过程中黄色变色的发生可以最小化，可以大大提高短路电流（Isc）和开路电压（Voc）的值，并且可以显着提高太阳能电池的效率。

7. 发明申请

WO2011008051A3 COMPOSITION FOR REMOVING RESISTS USED WITH COPPER OR COPPER ALLOY 审中-公开
标题翻译：用铜或铜合金去除电阻的组合物
公开(公告)号：WO2011008051A3
公开(公告)日：2011-04-21
申请号：PCT/KR2010004671
申请日：2010-07-16
申请人： DONGWOO FINE CHEM CO LTD , HONG HYUNG-PYO , HONG HUN-PYO , KIM BYOUNG-MOOK , KIM TAE-HEE , LEE SEUNG-YONG
发明人： HONG HYUNG-PYO , HONG HUN-PYO , KIM BYOUNG-MOOK , KIM TAE-HEE , LEE SEUNG-YONG
IPC分类号： G03F7/42
CPC分类号： G03F7/425
摘要： The present invention relates to a composition for removing resists used with copper or copper alloy, comprising: (a) from 0.1 to 30 wt.% of an amine compound; and a (b) balance of an organic solvent.
摘要翻译：本发明涉及一种用于除去与铜或铜合金一起使用的抗蚀剂的组合物，其包含：（a）0.1至30重量％的胺化合物; 和（b）有机溶剂的平衡。

8. 发明申请

WO2011031089A3 CLEANING SOLUTION COMPOSITION 审中-公开
标题翻译：清洁溶液组合物
公开(公告)号：WO2011031089A3
公开(公告)日：2011-08-04
申请号：PCT/KR2010006174
申请日：2010-09-10
申请人： DONGWOO FINE CHEM CO LTD , YOON HYO-JOONG , BANG SOON-HONG , KIM SUNG-SIK , LEE SEUNG-YONG
发明人： YOON HYO-JOONG , BANG SOON-HONG , KIM SUNG-SIK , LEE SEUNG-YONG
IPC分类号： C11D3/30 , C11D3/28
CPC分类号： C11D7/3281 , C11D7/08 , C11D7/263 , C11D7/5022
摘要： The present invention relates to an aqueous cleaning solution composition for removing the contaminant formed in a channel portion of a thin film transition during a manufacturing process of a flat panel display (FPD), and a cleaning method using the same. The aqueous cleaning solution composition of the present invention has an excellent cleaning power against an organic contaminant, a metal-resist deposit, a metal oxide and a metal complex formed in a channel portion of a thin film transition, and also has excellent corrosion prevention of a metal interconnect formed on a substrate, particularly copper and copper alloy interconnects, and an insulating film. In addition, the aqueous cleaning solution composition of the present invention contains a large amount of deionized water and thus can be easily handled and is environmentally advantageous.
摘要翻译：本发明涉及用于在平板显示器（FPD）的制造过程期间去除在薄膜转变的沟道部分中形成的污染物的水性清洁溶液组合物以及使用该水性清洁溶液组合物的清洁方法。本发明的水性洗涤液组合物对形成于薄膜转变的沟道部的有机污染物，金属抗蚀剂堆积物，金属氧化物和金属配合物具有优异的洗净力，在衬底上形成的金属互连，特别是铜和铜合金互连，以及绝缘膜。此外，本发明的水性清洁溶液组合物含有大量的去离子水，因此可以容易地处理并且对环境有利。

9. 发明申请

WO2011028058A3 ALUMINUM PASTE FOR A BACK ELECTRODE OF SOLAR CELL 审中-公开
标题翻译：用于太阳能电池背电极的铝膏
公开(公告)号：WO2011028058A3
公开(公告)日：2011-07-14
申请号：PCT/KR2010005998
申请日：2010-09-03
申请人： DONGWOO FINE CHEM CO LTD , LEE CHANG-MO , LEE SEUNG-YONG , LIM DAE-SUNG , CHOI HYUNG-SUB , HONG SEUNG-KWON
发明人： LEE CHANG-MO , LEE SEUNG-YONG , LIM DAE-SUNG , CHOI HYUNG-SUB , HONG SEUNG-KWON
IPC分类号： H01L31/0224 , H01L31/042
CPC分类号： H01B1/22 , C03C3/064 , C03C8/02 , C03C8/18 , H01L24/03 , H01L24/05 , H01L31/022425 , H01L2224/05 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01033 , H01L2924/01038 , H01L2924/01047 , H01L2924/01074 , H01L2924/01082 , Y02E10/50
摘要： Disclosed herein is an aluminum paste for a back electrode of a solar cell, including, based on the total amount thereof: 65 ~ 75 wt% of aluminum powder having an average particle size dis¬ tribution of 0.01 ~ 5 µm; 0.01 ~ 5 wt% of glass frit; and 20 ~ 34.90 wt% of an organic vehicle solution. The aluminum paste is advantageous in that since the contact between aluminum paste and a textured silicon wafer is improved, the bowing of a solar cell can be prevented, and the formation of aluminum balls and/or bumps and the occurrence of yellow discoloration can be minimized during a co-firing process, the values of short circuit current (Isc) and open circuit voltage (Voc) can be greatly increased and the efficiency of a solar cell can be remarkably improved.
摘要翻译：本发明公开了一种用于太阳能电池背电极的铝浆，其基于其总量包括：65〜75wt％的平均粒径分布为0.01〜5μm的铝粉; 0.01〜5重量％的玻璃料; 和20〜34.90重量％的有机载体溶液。铝浆的优点在于，由于铝浆和纹理硅晶片之间的接触得到改善，所以可以防止太阳能电池弯曲，并且可以最小化铝球和/或凸块的形成以及黄色变色的发生在共烧过程中，短路电流（Isc）和开路电压（Voc）的值可以大大增加，并且太阳能电池的效率可以显着提高。

10. 发明申请

WO2011031028A3 RESIST STRIPPER COMPOSITION FOR FORMING COPPER-BASED WIRING 审中-公开
标题翻译：用于形成基于铜的接线的耐腐蚀剥离组合物
公开(公告)号：WO2011031028A3
公开(公告)日：2011-07-07
申请号：PCT/KR2010005854
申请日：2010-09-09
申请人： DONGWOO FINE CHEM CO LTD , HONG HUN-PYO , HONG HYUNG-PYO , KIM TAE-HEE , LEE SEUNG-YONG , KIM BYOUNG-MOOK
发明人： HONG HUN-PYO , HONG HYUNG-PYO , KIM TAE-HEE , LEE SEUNG-YONG , KIM BYOUNG-MOOK
IPC分类号： G03F7/42 , H01L21/306
CPC分类号： H01L21/31133 , G03F7/425
摘要： Disclosed is a resist stripper composition for forming copper-based wiring, which uses a compound containing sulfone and/or sulfine and/or an ester as the stripper and which can effectively prevent the corrosion of a conductive metal layer of copper or copper alloy wiring and an insulating layer of silicon oxide or silicon nitride which are disposed under the resist, even without the use of isopropanol as an intermediate cleaner, and also can cleanly remove the deteriorated and/or cured resist even at low temperature in a short period of time.
摘要翻译：公开了一种用于形成铜基布线的抗蚀剂剥离组合物，其使用含有砜和/或亚硫酸盐和/或酯作为剥离剂的化合物，并且可以有效地防止铜或铜合金布线的导电金属层的腐蚀，即使不使用异丙醇作为中间清洁剂，也可以在短时间内在低温下清洁地除去劣化的和/或固化的抗蚀剂，这种氧化硅或氮化硅的绝缘层设置在抗蚀剂下方。

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