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    • 1. 发明申请
    • SUBSTRATE SUPPORT, SUBSTRATE PROCESSING DEVICE AND METHOD OF PLACING A SUBSTRATE
    • 基板支撑,基板处理装置和放置基板的方法
    • US20080295773A1
    • 2008-12-04
    • US12108320
    • 2008-04-23
    • Dieter HaasThomas BergerSimon Lau
    • Dieter HaasThomas BergerSimon Lau
    • C23C16/54
    • H01L21/68714H01L21/68Y10T29/49998
    • A substrate support for supporting a substrate in a processing chamber comprises a frame for carrying the substrate, at least a first fastening means fixedly attached to the frame for aligning the substrate relative to the frame, and at least a second fastening means movably attached to the frame, the second fastening means being movable relative to the frame and/or the substrate. Furthermore, a processing device comprises an edge exclusion projecting over a portion of the surface of the substrate in order to prevent processing of the portion of the surface of the substrate. A part of the edge exclusion may be moved into a gap between the edge(s) of the substrate and the frame element of the substrate support to form a labyrinth seal between the frame element and the edge of the substrate. A method of placing the substrate on the substrate support is also disclosed.
    • 用于在处理室中支撑衬底的衬底支撑件包括用于承载衬底的框架,至少一个固定地连接到框架上用于使衬底相对于框架对准的第一紧固装置,以及至少一个第二紧固装置, 第二紧固装置可相对于框架和/或基板移动。 此外,处理装置包括在衬底表面的一部分上突出的边缘排除,以防止衬底的表面部分的处理。 边缘排除的一部分可以移动到基板的边缘和基板支撑件的框架元件之间的间隙中,以在框架元件和基板的边缘之间形成迷宫式密封。 还公开了将衬底放置在衬底支撑件上的方法。
    • 2. 发明授权
    • Substrate support, substrate processing device and method of placing a substrate
    • 基板支撑,基板处理装置和放置基板的方法
    • US08323412B2
    • 2012-12-04
    • US12108320
    • 2008-04-23
    • Dieter HaasThomas BergerSimon Lau
    • Dieter HaasThomas BergerSimon Lau
    • C23C16/00B05C13/00
    • H01L21/68714H01L21/68Y10T29/49998
    • A substrate support for supporting a substrate in a processing chamber comprises a frame for carrying the substrate, at least a first fastening means fixedly attached to the frame for aligning the substrate relative to the frame, and at least a second fastening means movably attached to the frame, the second fastening means being movable relative to the frame and/or the substrate. Furthermore, a processing device comprises an edge exclusion projecting over a portion of the surface of the substrate in order to prevent processing of the portion of the surface of the substrate. A part of the edge exclusion may be moved into a gap between the edge(s) of the substrate and the frame element of the substrate support to form a labyrinth seal between the frame element and the edge of the substrate. A method of placing the substrate on the substrate support is also disclosed.
    • 用于在处理室中支撑衬底的衬底支撑件包括用于承载衬底的框架,至少一个固定地连接到框架上用于使衬底相对于框架对准的第一紧固装置,以及至少一个第二紧固装置, 第二紧固装置可相对于框架和/或基板移动。 此外,处理装置包括在衬底表面的一部分上突出的边缘排除,以防止衬底的表面部分的处理。 边缘排除的一部分可以移动到基板的边缘和基板支撑件的框架元件之间的间隙中,以在框架元件和基板的边缘之间形成迷宫式密封。 还公开了将衬底放置在衬底支撑件上的方法。
    • 5. 发明授权
    • Hot wire chemical vapor deposition (CVD) inline coating tool
    • 热线化学气相沉积(CVD)在线涂层工具
    • US08117987B2
    • 2012-02-21
    • US12873299
    • 2010-08-31
    • Dieter HaasPravin K. NarwankarRandhir P. S. Thakur
    • Dieter HaasPravin K. NarwankarRandhir P. S. Thakur
    • A61D3/00
    • C23C16/24C23C16/54H01L21/02532H01L21/0262
    • Methods and apparatus for hot wire chemical vapor deposition (HWCVD) are provided herein. In some embodiments, an inline HWCVD tool may include a linear conveyor for moving a substrate through the linear process tool; and a multiplicity of HWCVD sources, the multiplicity of HWCVD sources being positioned parallel to and spaced apart from the linear conveyor and configured to deposit material on the surface of the substrate as the substrate moves along the linear conveyor; wherein the substrate is coated by the multiplicity of HWCVD sources without breaking vacuum. In some embodiments, methods of coating substrates may include depositing a first material from an HWCVD source on a substrate moving through a first deposition chamber; moving the substrate from the first deposition chamber to a second deposition chamber; and depositing a second material from a second HWCVD source on the substrate moving through the second deposition chamber.
    • 本文提供了热线化学气相沉积(HWCVD)的方法和装置。 在一些实施例中,在线HWCVD工具可以包括用于通过线性处理工具移动衬底的线性输送机; 和多个HWCVD源,多个HWCVD源被定位成与线性传送器平行并与其间隔开,并且被配置为当衬底沿着线性传送器移动时将材料沉积在衬底的表面上; 其中所述基底被多个HWCVD源涂覆而不破坏真空。 在一些实施例中,涂覆基底的方法可以包括在移动通过第一沉积室的基底上沉积来自HWCVD源的第一材料; 将衬底从第一沉积室移动到第二沉积室; 以及将第二材料从第二HWCVD源沉积在移动通过第二沉积室的衬底上。
    • 7. 发明授权
    • Machine for coating a substrate, and module
    • 用于涂覆基材的机器和模块
    • US07972486B2
    • 2011-07-05
    • US11279047
    • 2006-04-07
    • Hans BuchbergerAndreas GeissJörg Krempel-HesseDieter Haas
    • Hans BuchbergerAndreas GeissJörg Krempel-HesseDieter Haas
    • C23C14/34
    • C23C14/56H01J37/32431H01J37/32458
    • A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.
    • 用于涂覆用于生产显示屏的透明基板的机器包括具有模块化设计的涂布室。 每个模块1具有腔室部分2,可移除地布置在腔室部分2中或在腔室部分2中的第一支撑件3,以及可移除地布置在第一支撑件3处的第二支撑件4.而第一支撑件3承载阴极 ,第二支撑件4形成为盖,在该盖处布置有用于在涂覆室中产生真空的泵。 载体3和4可以从腔室部分2侧向移除到可以在模块部件之间形成人员可接近的区域11a,11b。 以这种方式,机器的组件容易接近,例如用于维护目的。 可以在阴极和室内同时进行工作。