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    • 8. 发明专利
    • METHOD FOR ROLL JOINT
    • JPS58145319A
    • 1983-08-30
    • JP2847882
    • 1982-02-24
    • HITACHI LTD
    • TAKEUCHI MAMORUMASUMOTO TSUTOMUSUZUKI SHIZUOKOGA KAZUO
    • B21D39/10B21D39/04
    • PURPOSE:To perform a roll joint without causing the generation of cracks in main pipes, by expanding plural concentric pipes which have different diameters respectively and duplicated pipe ends with the aids of expanding rolls provided to the inside of said pipes, and restricting the expanding work basing on the quantity of displacement detected by sensors which are provided to the outside. CONSTITUTION:The one end of the 1st pipe 10 is inserted into the one end of the 2nd pipe 11, and expanding rolls are installed in the inner circumferential side of the pipe 10, and displacement sensors 13 and 14 are installed at the positions located on the same outer circumference of the pipe 11 and symmetrically with respect to the pipe axis. And when a mandrel shaft 2 is rotated and simultaneously advanced to the left, expanding rolls 3 retained by a housing 3a expand the pipes radially by delta0 the initial displacement quantity, while the rolls 3 are rotating, to roll-joint the pipe 10 to the pipe 11. At that time, the pipes are expanded so that the radial displacement quantity delta of the rolls 3 is delta=delta0+deltar, and the displacement quantity deltar of the outer pipe 11 is detected by the sensors 13 and 14 to stop the expanding work at the time when the deltar attains a prescribed value.
    • 10. 发明专利
    • MASK CORRECTING METHOD
    • JPS63128348A
    • 1988-05-31
    • JP27399386
    • 1986-11-19
    • HITACHI LTD
    • KOGA KAZUO
    • G03F1/00G03F1/72H01L21/027
    • PURPOSE:To perform correction with high reliability without correcting directly a defective part, by superimposing a first mask in which a prescribed pattern is formed on a second mask in which an auxiliary pattern complementing the defective part of the mask is formed. CONSTITUTION:By superimposing the first mask 1 in which the prescribed pattern 4 is formed on the surface of a transparent substrate 3a on the second mask 2 constituted by the formation of the auxiliary pattern 5 which complements the pattern defective part 6 at a place corresponding to the defective part 6 of the first mask 1, the correction of the pattern defective part 6 in the first mask 1 is performed. In other words, since the auxiliary pattern 5 which complements the pattern defective part 6 in the first mask 1 is formed at the place corresponding to the second mask 2, no defective part 6 is transferred on an object to be transferred by using the masks 1 and 2 after superimposing them, even without correcting the defective part 6 directly. In such way, the correction of the defective part 6 can be attained indirectly, and a mask correction technique with high reliability can be offered.