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1. 发明公开

EP2834832A2 INTEGRATED OPTICAL AND CHARGED PARTICLE INSPECTION APPARATUS 有权转让
标题翻译： INTEGRIERTE OPTISCHE INSPEKTIONSVORRICHTUNGFÜRGELADENE TEILCHEN
公开(公告)号：EP2834832A2
公开(公告)日：2015-02-11
申请号：EP13728546.6
申请日：2013-04-02
申请人： Delmic B.V. , Hoogenboom, Jacob Pieter , Kruit, Pieter , Liv, Nalan M. Sc , Zonnevylle, Aernout Christian
发明人： HOOGENBOOM, Jacob Pieter , KRUIT, Pieter , LIV, Nalan M. SC , ZONNEVYLLE, Aernout Christian
IPC分类号： H01J37/22
CPC分类号： H01J37/222 , G01C21/32 , G01C21/3484 , H01J37/22 , H01J37/226 , H01J37/228 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24475 , H01J2237/2806
摘要： An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.
摘要翻译：用于检查样品的装置装备有带电粒子柱，用于产生聚焦的带电粒子束以观察或改变样品，以及光学显微镜以观察样品上的感兴趣区域，如通过带电粒子束或相反亦然。该装置容纳有一个处理单元，该处理单元适于和装备以表示用柱产生的图像和用显微镜产生的图像。该单元还适于执行将图像中的一个图像中的感兴趣区域相互关联的对准过程，其中对准过程涉及检测由带电粒子束引起的光学图像的变化。

2. 发明申请

WO2013151421A3 INTEGRATED OPTICAL AND CHARGED PARTICLE INSPECTION APPARATUS 审中-公开
公开(公告)号：WO2013151421A3
公开(公告)日：2013-10-10
申请号：PCT/NL2013/000019
申请日：2013-04-02
申请人： DELMIC B.V. , HOOGENBOOM, Jacob Pieter , KRUIT, Pieter , LIV, Nalan M. SC , ZONNEVYLLE, Aernout Christiaan
发明人： HOOGENBOOM, Jacob Pieter , KRUIT, Pieter , LIV, Nalan M. SC , ZONNEVYLLE, Aernout Christiaan
IPC分类号： H01J37/22
摘要： The invention relates to an apparatus for inspecting a sample, equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa, the apparatus accommodated with a processing unit adapted and equipped for representing an image as generated with said column and an image as generated with said microscope, the unit further adapted for performing an alignment procedure mutually correlating a region of interest in one of said images wherein the alignment procedure involves detecting a change in the optical image as caused therein by the charged particle beam.

3. 发明申请

WO2012008836A4 INSPECTION APPARATUS AND REPLACEABLE DOOR FOR A VACUUM CHAMBER OF SUCH AN INSPECTION APPARATUS AND A METHOD FOR OPERATING AN INSPECTION APPARATUS 审中-公开
公开(公告)号：WO2012008836A4
公开(公告)日：2012-01-19
申请号：PCT/NL2011/050513
申请日：2011-07-14
申请人： DELMIC B.V. , KRUIT, Pieter , HOOGENBOOM, Jacob Pieter , ZONNEVYLLE, Aernout Christiaan
发明人： KRUIT, Pieter , HOOGENBOOM, Jacob Pieter , ZONNEVYLLE, Aernout Christiaan
IPC分类号： H01J37/22 , H01J37/256 , H01J37/28 , G01N21/00 , G01N23/225
摘要： An inspection apparatus is provided comprising in combination at least an optical microscope (2, 3, 4) and an ion- or electron microscope (7, 8) equipped with a source (7) for emitting a primary beam (9) of radiation to a sample (10) in a sample holder. The apparatus may comprise a detector (8) for detection of secondary radiation (11) backscattered from the sample and induced by the primary beam. The optical microscope is equipped with an light collecting device (2) to receive in use luminescence light (12) emitted by the sample and to focus it on a photon-detector (4).

4. 发明申请

WO2006126872A1 APPARATUS FOR THE GENERATION OF PARALLEL BEAMLETS 审中-公开
标题翻译：并联光束产生装置
公开(公告)号：WO2006126872A1
公开(公告)日：2006-11-30
申请号：PCT/NL2006/000260
申请日：2006-05-24
申请人： TECHNISCHE UNIVERSITEIT DELFT , KRUIT, Pieter , DRUGGEN, Matheus, Johannes van
发明人： KRUIT, Pieter , DRUGGEN, Matheus, Johannes van
IPC分类号： H01J37/04 , H01J37/30 , H01J37/26
CPC分类号： H01J37/3007 , H01J37/04 , H01J37/26 , H01J2237/31774
摘要： The invention relates to an apparatus for the generation of parallel beamlets, comprising a source for particles or radiation, a collimator and, placed between the source and the collimator, a beam splitter for dividing the beam from the source into beamlets, wherein a first macrolens is provided between the source and the beam splitter for forming a substantially parallel beam of rays or beam of particles, and in that between the beam splitter and the collimator, immediately after the beam splitter, a second macro- lens is provided.
摘要翻译：本发明涉及一种用于产生平行子束的装置，其包括用于粒子或辐射的源，准直器，以及放置在源极和准直器之间的分束器，用于将来自光源的光束分成子束，其中第一光束设置在源和分束器之间，用于形成基本上平行的射线束或粒子束，并且在分束器和准直器之间，在分束器之后，提供第二宏观透镜。

5. 发明申请

WO2006096052A3 MICRO X-RAY SOURCE 审中-公开
公开(公告)号：WO2006096052A3
公开(公告)日：2006-09-14
申请号：PCT/NL2006/000118
申请日：2006-03-08
申请人： TECHNISCHE UNIVERSITEIT DELFT , KRUIT, Pieter , HAGEN, Cornelis, Wouter , MULDER, Elvira, Hendrika
发明人： KRUIT, Pieter , HAGEN, Cornelis, Wouter , MULDER, Elvira, Hendrika
IPC分类号： H01J35/08 , H01J35/12
摘要： The invention relates to a micro X-ray source comprising a target acting as anode, and a cathode, which during operation interacts with the target and functions as electron source, wherein the target is embodied as a metal foil possessing a spot where the electrons from the electron source arrive, the metal foil being locally thinner at the spot.

6. 发明申请

WO2008013443A2 LITHOGRAPHY SYSTEM, METHOD OF HEAT DISSIPATION AND FRAME 审中-公开
标题翻译：光刻系统，散热方法和框架
公开(公告)号：WO2008013443A2
公开(公告)日：2008-01-31
申请号：PCT/NL2007/000181
申请日：2007-07-13
申请人： MAPPER LITHOGRAPHY IP B.V. , DANSBERG, Michel, Pieter , KRUIT, Pieter , WIELAND, Marco, Jan-Jaco
发明人： DANSBERG, Michel, Pieter , KRUIT, Pieter , WIELAND, Marco, Jan-Jaco
IPC分类号： G03F7/20
CPC分类号： G03F7/70875
摘要： The present invention relates to a lithography system for projecting an image or an image pattern on to a target such as a wafer. Energy that is accumulated in the target by the projection of the image or image pattern is removed from said target, such that expansion by local and/or overall heating is limited to a relevant pre-defined value, and wherein such heat removal is realised by the use of a phase transition in a heat absorbing material that is brought into thermal contact with said target. As a further elaboration, such material may be applied in combination with a further material having a superior coefficient of heat transport, and may be incorporated in an emulsion comprising a material having a superior coefficient of heat transfer. Said material may e.g. be adhered to a bottom face of the target, and may also be included in a frame.
摘要翻译：本发明涉及一种用于将图像或图像图案投射到诸如晶片的靶上的光刻系统。通过图像或图像图案的投影而累积在目标物中的能量从所述目标去除，使得通过局部和/或整体加热的膨胀被限制到相关的预定义值，并且其中这种除热由在与所述靶导致热接触的吸热材料中使用相变。作为进一步的阐述，这种材料可以与具有优异传热系数的另外的材料结合使用，并且可以结合在包含具有优良传热系数的材料的乳液中。所述材料可以例如粘附到目标的底面，并且也可以包括在框架中。

7. 发明申请

WO2007105939A1 LITHOGRAPHY SYSTEM AND PROJECTION METHOD 审中-公开
标题翻译： LITHOGRAPHY系统和投影方法
公开(公告)号：WO2007105939A1
公开(公告)日：2007-09-20
申请号：PCT/NL2007/000065
申请日：2007-03-09
申请人： MAPPER LITHOGRAPHY IP B.V. , KRUIT, Pieter , WIELAND, Marco, Jan-Jaco , STEENBRINK, Stijn, Willem, Karel, Herman , JAGER, Remco
发明人： KRUIT, Pieter , WIELAND, Marco, Jan-Jaco , STEENBRINK, Stijn, Willem, Karel, Herman , JAGER, Remco
IPC分类号： G03F7/20 , H01J37/317 , H01J37/302 , H01L21/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70383 , G03F7/70508 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31766 , H01J2237/31771 , H01L21/67282
摘要： The present invention relates a probe forming lithography system for generating an pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off”, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.
摘要翻译：本发明涉及一种探针形成光刻系统，用于使用黑白写入策略（即写入或不写入网格单元）在诸如晶片的目标表面上产生图案，从而在包含网格单元的网格上划分所述图案所述图案包括尺寸大于网格单元的尺寸的特征，在每个单元中，所述探针被切换为“开”或“关”，其中所述目标上的探针覆盖比网格单元大得多的表面积，并且其中在特征内，在探针尺寸的范围内以及所述系统可以基于的方法来实现黑白文字的位置相关分布。

8. 发明申请

WO2007032670A1 LITHOGRAPHY SYSTEM, SENSOR AND MEASURING METHOD 审中-公开
标题翻译： LITHOGRAPHY系统，传感器和测量方法
公开(公告)号：WO2007032670A1
公开(公告)日：2007-03-22
申请号：PCT/NL2006/000457
申请日：2006-09-14
申请人： MAPPER LITHOGRAPHY IP B.V. , KRUIT, Pieter , WIELAND, Marco, Jan, Jaco , SLOT, Erwin , TEEPEN, Tijs, Frans , STEENBRINK, Stijn, Willem, Karel, Herman
发明人： KRUIT, Pieter , WIELAND, Marco, Jan, Jaco , SLOT, Erwin , TEEPEN, Tijs, Frans , STEENBRINK, Stijn, Willem, Karel, Herman
IPC分类号： H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/244 , H01J37/3177
摘要： Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which the charged particle beams are converted into light beams by using a converter element, using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams, electronically reading out resulting signals from said detectors after exposure thereof by said light beams, utilising said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.
摘要翻译：用于测量带电粒子束系统的大量带电粒子束的特性的光刻系统，传感器和方法，特别是直接写入光刻系统，其中通过使用转换器元件将带电粒子束转换成光束，使用与所述转换器元件成一直线的一系列光敏检测器，例如二极管，CCD或CMOS器件，用于检测所述光束，用所述光束曝光之后，从所述检测器电子地读出所得到的信号，利用所述信号确定一个或多个光束特性的值，从而使用自动电子计算器，以及电子地调整带电粒子系统，以便校正超出所有或多个所述带电粒子束的规格范围值，每一个用于一个或多个属性，基于所述计算的属性值。

9. 发明申请

WO2007013802A1 MASKLESS LITHOGRAPHY SYSTEM WITH IMPROVED RELIABILITY 审中-公开
标题翻译：具有改进的可靠性的无色光刻系统
公开(公告)号：WO2007013802A1
公开(公告)日：2007-02-01
申请号：PCT/NL2006/000386
申请日：2006-07-25
申请人： MAPPER LITHOGRAPHY IP B.V. , STEENBRINK, Stijn, Willem, Herman, Karel , KRUIT, Pieter , WIELAND, Marco, Jan-Jaco
发明人： STEENBRINK, Stijn, Willem, Herman, Karel , KRUIT, Pieter , WIELAND, Marco, Jan-Jaco
IPC分类号： H01J37/317 , G03F7/20
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70425 , H01J2237/31757
摘要： The invention pertains to a maskless lithography system for transferring a pattern onto a surface of a target, comprising at least one beamlet optical unit for generating a plurality of beamlets, at least one measuring unit for measuring properties of each beamlet, at least one control unit for generating and delivering pattern data to said beamlet optical unit, said control unit being operationally coupled to said measuring unit for identifying invalid beamlets which have a measured property value outside a predefined range of values for said property at least one actuator for inducing a shift of said beamlet optical unit and said target with respect to one another, wherein said actuator is operationally coupled with said control unit, said control unit determining said shift, positioning valid beamlets at the position of said invalid beamlets, thus replacing said invalid beamlets with valid beamlets.
摘要翻译：本发明涉及用于将图案转移到目标表面上的无掩模光刻系统，包括至少一个用于产生多个小射束的小射束光学单元，至少一个测量单元，用于测量每个小束包括至少一个控制单元，用于产生图案数据并将其传送到所述小射束光学单元，所述控制单元可操作地耦合到所述测量单元，用于识别具有测量特性值超出预定范围值的无效小射束，至少一个致动器，用于引起所述子束光学单元和所述目标相对于彼此的移位，其中所述致动器与所述控制单元可操作地耦合，所述控制单元确定所述移位，在所述无效子束的位置处定位有效子束，从而用有效的子束代替所述无效的子束。

10. 发明申请

WO2006126880A3 SCANNING TRANSMISSION ELECTRON MICROSCOPE 审中-公开
公开(公告)号：WO2006126880A3
公开(公告)日：2006-11-30
申请号：PCT/NL2006/050120
申请日：2006-05-19
申请人： TECHNISCHE UNIVERSITEIT DELFT , KRUIT, Pieter
发明人： KRUIT, Pieter
IPC分类号： H01J37/26 , H01J37/244
摘要： The invention relates to a scanning transmission electron microscope comprising an electron source (1) , an electron accelerator (4) and deflection means (5) for directing electrons emitted by the electron source at an object (2) to be examined, and in addition a detector (7) for detecting electrons coming from the object and, connected to the detector, a device for processing the detected electrons so as to form an object image, wherein a beam splitter (3) is provided for dividing the electron beam from the electron source into beamlets to be directed at the object to be examined, and wherein the detector is designed for the detection of separate electron patterns that correspond to said beamlets .

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