专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110083318A1 QUARTZ GUARD RING CENTERING FEATURES 有权
标题翻译： QUARTZ GUARD戒指中心特点
公开(公告)号：US20110083318A1
公开(公告)日：2011-04-14
申请号：US12967717
申请日：2010-12-14
申请人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
发明人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
IPC分类号： B23P11/00
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568 , Y10T29/49002
摘要： An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.
摘要翻译：一种电极组件和使外环围绕用于半导体衬底处理的等离子体反应室中的电极组件对中的方法。该方法包括将外环围绕电极组件的背衬构件的外表面定位，并且在外环和背衬构件之间插入至少一个定心元件。定心元件可以是容纳在背衬构件的外表面上的空腔中的多个弹簧加载的定心元件，定心元件具有适于接触外圈的第一端和适于容纳弹簧的第二端。外环围绕背衬构件的外表面，使得多个弹簧加载的定心元件位于背衬构件的外表面和外环的内表面之间。

2. 发明授权

US07875824B2 Quartz guard ring centering features 有权
标题翻译：石英护环中心功能
公开(公告)号：US07875824B2
公开(公告)日：2011-01-25
申请号：US11701507
申请日：2007-02-02
申请人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
发明人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
IPC分类号： B23K10/00
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568 , Y10T29/49002
摘要： An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.
摘要翻译：一种电极组件和使外环围绕用于半导体衬底处理的等离子体反应室中的电极组件对中的方法。该方法包括将外环围绕电极组件的背衬构件的外表面定位，并且在外环和背衬构件之间插入至少一个定心元件。定心元件可以是容纳在背衬构件的外表面上的空腔中的多个弹簧加载的定心元件，定心元件具有适于接触外圈的第一端和适于容纳弹簧的第二端。外环围绕背衬构件的外表面，使得多个弹簧加载的定心元件位于背衬构件的外表面和外环的内表面之间。

3. 发明申请

US20080099120A1 Quartz guard ring centering features 有权
标题翻译：石英护环中心功能
公开(公告)号：US20080099120A1
公开(公告)日：2008-05-01
申请号：US11701507
申请日：2007-02-02
申请人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
发明人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
IPC分类号： B31B1/60
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568 , Y10T29/49002
摘要： An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.
摘要翻译：一种电极组件和使外环围绕用于半导体衬底处理的等离子体反应室中的电极组件对中的方法。该方法包括将外环围绕电极组件的背衬构件的外表面定位，并且在外环和背衬构件之间插入至少一个定心元件。定心元件可以是容纳在背衬构件的外表面上的空腔中的多个弹簧加载的定心元件，定心元件具有适于接触外圈的第一端和适于容纳弹簧的第二端。外环围绕背衬构件的外表面，使得多个弹簧加载的定心元件位于背衬构件的外表面和外环的内表面之间。

4. 发明授权

US08084705B2 Quartz guard ring centering features 有权
公开(公告)号：US08084705B2
公开(公告)日：2011-12-27
申请号：US12967717
申请日：2010-12-14
申请人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
发明人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
IPC分类号： B23K10/00
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568 , Y10T29/49002
摘要： An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.

5. 发明申请

US20080099448A1 Quartz guard ring 有权
标题翻译：石英护环
公开(公告)号：US20080099448A1
公开(公告)日：2008-05-01
申请号：US11701430
申请日：2007-02-02
申请人： Dean J. Larson , Daniel Brown , Saurabh J. Ullal
发明人： Dean J. Larson , Daniel Brown , Saurabh J. Ullal
IPC分类号： B23K9/00
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper electrode, a backing member attachable to an upper surface of the upper electrode, and an outer ring. The outer ring surrounds an outer surface of the backing member and is located above the upper surface of the upper electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。组件包括上电极，可附接到上电极的上表面的背衬构件和外环。外环围绕背衬构件的外表面并且位于上电极的上表面上方。

6. 发明授权

US07939778B2 Plasma processing chamber with guard ring for upper electrode assembly 有权
标题翻译：等离子处理室，带有用于上电极组件的保护环
公开(公告)号：US07939778B2
公开(公告)日：2011-05-10
申请号：US12357989
申请日：2009-01-22
申请人： Dean J. Larson , Daniel Brown , Saurabh J. Ullal
发明人： Dean J. Larson , Daniel Brown , Saurabh J. Ullal
IPC分类号： B23K10/00
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568
摘要： A plasma processing chamber, which includes an upper electrode assembly, a lower electrode assembly, and a plasma confinement assembly. The upper electrode assembly includes an upper electrode, a backing member, the backing member attachable to an upper surface of the upper electrode, and a guard ring surrounding an outer surface of the backing member and located above the upper surface of the upper electrode, wherein the guard ring is configured to provide an inner gap between the outer surface of the backing member and an inner periphery of the guard ring. The lower electrode assembly is adapted to receive a semiconductor substrate. The plasma confinement assembly is separated from an outer periphery of the upper electrode and the backing member by the guard ring.
摘要翻译：一种等离子体处理室，其包括上电极组件，下电极组件和等离子体限制组件。上部电极组件包括上部电极，背衬构件，可附着到上部电极的上表面的背衬构件和围绕背衬构件的外表面并位于上部电极的上表面上的保护环，其中保护环被构造成在背衬构件的外表面和保护环的内周之间提供内部间隙。下电极组件适于接收半导体衬底。等离子体限制组件通过防护环与上电极和背衬构件的外周分离。

7. 发明申请

US20090127234A1 PLASMA PROCESSING CHAMBER WITH GUARD RING FOR UPPER ELECTRODE ASSEMBLY 有权
标题翻译：具有用于上电极组件的保护环的等离子体加工室
公开(公告)号：US20090127234A1
公开(公告)日：2009-05-21
申请号：US12357989
申请日：2009-01-22
申请人： Dean J. Larson , Daniel Brown , Saurabh J. Ullal
发明人： Dean J. Larson , Daniel Brown , Saurabh J. Ullal
IPC分类号： H01L21/3065 , B23K10/00 , C23F1/00
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568
摘要： A plasma processing chamber, which includes an upper electrode assembly, a lower electrode assembly, and a plasma confinement assembly. The upper electrode assembly includes an upper electrode, a backing member, the backing member attachable to an upper surface of the upper electrode, and a guard ring surrounding an outer surface of the backing member and located above the upper surface of the upper electrode, wherein the guard ring is configured to provide an inner gap between the outer surface of the backing member and an inner periphery of the guard ring. The lower electrode assembly is adapted to receive a semiconductor substrate. The plasma confinement assembly is separated from an outer periphery of the upper electrode and the backing member by the guard ring.
摘要翻译：一种等离子体处理室，其包括上电极组件，下电极组件和等离子体限制组件。上部电极组件包括上部电极，背衬构件，可附着到上部电极的上表面的背衬构件和围绕背衬构件的外表面并位于上部电极的上表面上的保护环，其中保护环被构造成在背衬构件的外表面和保护环的内周之间提供内部间隙。下电极组件适于接收半导体衬底。等离子体限制组件通过防护环与上电极和背衬构件的外周分离。

8. 发明授权

US07482550B2 Quartz guard ring 有权
标题翻译：石英护环
公开(公告)号：US07482550B2
公开(公告)日：2009-01-27
申请号：US11701430
申请日：2007-02-02
申请人： Dean J. Larson , Daniel Brown , Saurabh J. Ullal
发明人： Dean J. Larson , Daniel Brown , Saurabh J. Ullal
IPC分类号： B23K10/00
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper electrode, a backing member attachable to an upper surface of the upper electrode, and an outer ring. The outer ring surrounds an outer surface of the backing member and is located above the upper surface of the upper electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。组件包括上电极，可附接到上电极的上表面的背衬构件和外环。外环围绕背衬构件的外表面并且位于上电极的上表面上方。

9. 发明授权

US11134221B1 Automated system and method for detecting, identifying and tracking wildlife 有权
公开(公告)号：US11134221B1
公开(公告)日：2021-09-28
申请号：US15819713
申请日：2017-11-21
申请人： Daniel Brown
发明人： Daniel Brown
IPC分类号： H04N7/18 , G01S19/42 , H04N5/262 , H04W4/80 , G06F3/0484 , G01C21/16 , G06F16/29
摘要： A system for autonomously photographing wildlife includes a camera apparatus, camera mount and actuating unit. The camera apparatus records video data may include a camera, a memory and a processing system which includes a processor and an image analysis module including computer executable instructions stored in the memory. The image analysis module receives a video data file; performs an image analysis of discrete portions of the video data file; detects motion within each respective discrete portion; determines whether the detected motion is caused by an animal; calculates an outline for the animal; and stores a selected discrete portion of the video data file in the memory. The selected discrete portion includes an outline of the animal. The camera mount receives the camera thereon and the actuating unit couples the camera to the camera mount and is actuatable to tilt and/or pan the camera.

10. 发明授权

US08982922B2 Very high power laser chamber optical improvements 有权
标题翻译：超大功率激光腔的光学改进
公开(公告)号：US08982922B2
公开(公告)日：2015-03-17
申请号：US13588170
申请日：2012-08-17
申请人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
发明人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
IPC分类号： H01S3/08 , G02B5/04 , G02B5/12 , H01S3/034 , H01S3/00 , H01S3/081 , H01S3/225
CPC分类号： G02B5/04 , G02B5/12 , H01S3/0057 , H01S3/0346 , H01S3/081 , H01S3/225
摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
摘要翻译：所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。还公开了一种确定光学部件的主切割的方法。还公开了包括至少一个初级切割光学部件的激光器。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式