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1. 发明授权

US08178819B2 Thermal flux processing by scanning a focused line beam 有权
标题翻译：通过扫描聚焦线束进行热通量处理
公开(公告)号：US08178819B2
公开(公告)日：2012-05-15
申请号：US11079785
申请日：2005-03-14
申请人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
发明人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
IPC分类号： B23K26/08 , B23K26/10
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2101/34 , B23K2101/40 , B23K2103/08 , B23K2103/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.
摘要翻译：热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。该台被配置为在其上接收基板。连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。检测模块位于路径内，被配置为检测连续波电磁辐射。

2. 发明申请

US20110095007A1 THERMAL FLUX PROCESSING BY SCANNING A FOCUSED LINE BEAM 有权
标题翻译：通过扫描聚焦线束的热通量处理
公开(公告)号：US20110095007A1
公开(公告)日：2011-04-28
申请号：US12980579
申请日：2010-12-29
申请人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
发明人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
IPC分类号： B23K26/06 , B23K26/08
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2101/34 , B23K2101/40 , B23K2103/08 , B23K2103/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.
摘要翻译：热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。该台被配置为在其上接收基板。连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。检测模块位于路径内，被配置为检测连续波电磁辐射。

3. 发明授权

US06987240B2 Thermal flux processing by scanning 有权
公开(公告)号：US06987240B2
公开(公告)日：2006-01-17
申请号：US10325497
申请日：2002-12-18
申请人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
发明人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
IPC分类号： B23K26/08 , B23K26/10
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2101/34 , B23K2101/40 , B23K2103/08 , B23K2103/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation. The computer system is coupled to the detection module.

4. 发明授权

US08829393B2 Scanned laser light source 有权
标题翻译：扫描激光光源
公开(公告)号：US08829393B2
公开(公告)日：2014-09-09
申请号：US13442128
申请日：2012-04-09
申请人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
发明人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
IPC分类号： B23K26/08 , B23K26/00 , B23K26/03 , B23K26/06 , C23C16/04 , B23K26/073 , H01L21/00 , B23K26/42 , H01L21/67 , C23C8/00 , B23K26/34 , C23C16/48 , B23K26/14 , G02B27/09 , B23K26/04 , B23K26/12 , C23C8/22 , C23C8/10 , H01L21/20
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2101/34 , B23K2101/40 , B23K2103/08 , B23K2103/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.
摘要翻译：热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。该台被配置为在其上接收基板。连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。检测模块位于路径内，被配置为检测连续波电磁辐射。

5. 发明授权

US08288685B2 Thermal flux processing by scanning a focused line beam 有权
公开(公告)号：US08288685B2
公开(公告)日：2012-10-16
申请号：US12980579
申请日：2010-12-29
申请人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
发明人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
IPC分类号： B23K26/08
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2101/34 , B23K2101/40 , B23K2103/08 , B23K2103/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

6. 发明申请

US20120205347A1 Scanned laser light source 有权
标题翻译：扫描激光光源
公开(公告)号：US20120205347A1
公开(公告)日：2012-08-16
申请号：US13442128
申请日：2012-04-09
申请人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
发明人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
IPC分类号： B23K26/08
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2101/34 , B23K2101/40 , B23K2103/08 , B23K2103/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.
摘要翻译：热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。该台被配置为在其上接收基板。连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。检测模块位于路径内，被配置为检测连续波电磁辐射。

7. 发明授权

US07875829B2 Thermal flux processing by scanning a focused line beam 有权
标题翻译：通过扫描聚焦线束进行热通量处理
公开(公告)号：US07875829B2
公开(公告)日：2011-01-25
申请号：US11561784
申请日：2006-11-20
申请人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
发明人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
IPC分类号： B23K26/08 , B23K26/10
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2101/34 , B23K2101/40 , B23K2103/08 , B23K2103/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.
摘要翻译：热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。该台被配置为在其上接收基板。连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。检测模块位于路径内，被配置为检测连续波电磁辐射。

8. 发明授权

US07872209B2 Thermal flux processing by scanning a focused line beam 有权
公开(公告)号：US07872209B2
公开(公告)日：2011-01-18
申请号：US11924298
申请日：2007-10-25
申请人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
发明人： Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
IPC分类号： B23K26/08 , B23K26/10
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2101/34 , B23K2101/40 , B23K2103/08 , B23K2103/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

9. 发明授权

US08288239B2 Thermal flux annealing influence of buried species 失效
标题翻译：埋藏物种的热通量退火影响
公开(公告)号：US08288239B2
公开(公告)日：2012-10-16
申请号：US10261379
申请日：2002-09-30
申请人： Dean C. Jennings , Amir Al-Bayati
发明人： Dean C. Jennings , Amir Al-Bayati
IPC分类号： H01L21/336
CPC分类号： H01L21/268 , B23K26/0738 , H01L21/26533 , H01L21/324
摘要： A method including introducing a species into a substrate including semiconductor material; and translating linearly focused electromagnetic radiation across a surface of the substrate, the electromagnetic radiation being sufficient to thermally influence the species. An apparatus including an electromagnetic radiation source; a stage having dimensions suitable for accommodating a semiconductor substrate within a chamber; an optical element disposed between the electromagnetic radiation source and the stage to focus radiation from the electromagnetic radiation source into a line having a length determined by the diameter of a substrate to be placed on the stage; and a controller coupled to the electromagnetic radiation source including machine readable program instructions that allow the controller to control the depth into which a substrate is exposed to the radiation.
摘要翻译：一种方法，包括将物质引入到包括半导体材料的基板中; 并且将线性聚焦的电磁辐射平移在衬底的表面上，电磁辐射足以热影响物质。一种包括电磁辐射源的设备; 具有适于容纳室内的半导体衬底的尺寸的平台; 设置在所述电磁辐射源和所述台之间的光学元件，用于将来自所述电磁辐射源的辐射聚焦成具有由要放置在所述台上的基板的直径确定的长度的线; 以及耦合到电磁辐射源的控制器，包括允许控制器控制衬底暴露于辐射的深度的机器可读程序指令。

10. 发明授权

US06200388B1 Substrate support for a thermal processing chamber 失效
标题翻译：用于热处理室的基板支撑
公开(公告)号：US06200388B1
公开(公告)日：2001-03-13
申请号：US09022134
申请日：1998-02-11
申请人： Dean C. Jennings
发明人： Dean C. Jennings
IPC分类号： C23C1600
CPC分类号： H01L21/68757 , C23C16/4581 , Y10S156/914
摘要： A semiconductor wafer support for use in a thermal processing chamber includes a shelf for receiving a semiconductor wafer. The wafer support is formed of a silicon carbide substrate having a polysilicon layer disposed on the substrate, and a silicon nitride layer disposed on the polysilicon layer. A method of forming the multi-layered semiconductor wafer support is also disclosed.
摘要翻译：用于热处理室的半导体晶片支架包括用于接收半导体晶片的搁板。晶片支撑体由具有设置在基板上的多晶硅层的碳化硅基板和设置在多晶硅层上的氮化硅层构成。还公开了形成多层半导体晶片载体的方法。

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