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1. 发明申请

US20070206480A1 Polarization state detector systems and methods for read-out of multilevel oriented nano-structure optical media 有权
标题翻译：极化状态检测器系统和读取多层导向纳米结构光学介质的方法
公开(公告)号：US20070206480A1
公开(公告)日：2007-09-06
申请号：US11366569
申请日：2006-03-03
申请人： David Kuo , Neil Deeman , Shih-Fu Lee , Koichi Wago
发明人： David Kuo , Neil Deeman , Shih-Fu Lee , Koichi Wago
IPC分类号： G11B7/00
CPC分类号： G11B7/1398 , G11B7/131 , G11B7/1395 , G11B7/24088
摘要： A polarization detection system structured for optical read-out of disc-shaped optical data/information storage and retrieval media with surfaces comprised of pits or marks configured as multilevel oriented nano-structures (ONS) with varying pit or mark orientations and widths. The polarization detection system comprises: an optical beam source; a stage for mounting and rotating an optical disc medium about a central axis; at least one photodetector; a beam splitter positioned in an optical path between the source and stage, for directing an incident beam from the source onto an optical disc mounted on the stage and a return beam from the disc onto the photodetector; and an optical polarizer positioned in an optical path between the beam splitter and the at least one photodetector, for detection and analysis of changes in polarization of the return beam effected by variation of the orientation of the walls and/or widths of the pits or marks of the disc.
摘要翻译：一种偏振检测系统，其被构造用于光学读出盘形光学数据/信息存储和回收介质，其表面包括由具有不同凹坑或标记取向和宽度的多层定向纳米结构（ONS）构成的凹坑或标记。偏振检测系统包括：光束源; 用于围绕中心轴线安装和旋转光盘介质的台架; 至少一个光电检测器; 位于源极和级之间的光路中的分束器，用于将来自源的入射光束引导到安装在平台上的光盘上，以及从光盘到光电检测器的返回光束; 以及位于分束器和至少一个光电检测器之间的光路中的光学偏振器，用于检测和分析通过壁的取向的变化和/或凹坑或标记的宽度来实现的返回光束的偏振变化的光盘。

2. 发明申请

US20070195672A1 Writeable optical recording of multilevel oriented nano-structure discs 有权
标题翻译：多层导向纳米结构光盘的可写光学记录
公开(公告)号：US20070195672A1
公开(公告)日：2007-08-23
申请号：US11352239
申请日：2006-02-13
申请人： Duane Karns , Dieter Weller , William Challener , Edward Gage , David Kuo , Neil Deeman , Shih-Fu Lee , Koichi Wago
发明人： Duane Karns , Dieter Weller , William Challener , Edward Gage , David Kuo , Neil Deeman , Shih-Fu Lee , Koichi Wago
IPC分类号： G11B7/0045
CPC分类号： G11B7/24088 , G11B7/0045 , G11B7/08547 , G11B7/1362
摘要： A method of performing writable optical recording of a medium to form multilevel oriented nano-structures therein, comprises steps of providing a disc-shaped, writable recording medium having a planar surface; and encoding data/information in the medium by forming a plurality of multilevel nano-structured pits in the surface by scanning with a focused spot of optical energy to form at least one data track therein, including scanning the optical spot in a cross-track direction while rotating the disc about a central axis.
摘要翻译：一种执行介质的可写光学记录以在其中形成多层次取向的纳米结构的方法，包括提供具有平坦表面的盘形可写记录介质的步骤; 以及通过用聚焦的光能点扫描在表面中形成多个多层纳米结构的凹坑来形成介质中的数据/信息，以在其中形成至少一个数据轨迹，包括沿横向方向扫描光点同时围绕中心轴旋转盘。

3. 发明申请

US20070206453A1 Multilevel nano-structure optical media with oriented tracking marks 审中-公开
标题翻译：具有定向跟踪标记的多层纳米结构光学介质
公开(公告)号：US20070206453A1
公开(公告)日：2007-09-06
申请号：US11366609
申请日：2006-03-03
申请人： David Kuo , Neil Deeman , Shih-Fu Lee , Koichi Wago
发明人： David Kuo , Neil Deeman , Shih-Fu Lee , Koichi Wago
IPC分类号： G11B7/00
CPC分类号： G11B7/0938 , B82Y10/00 , G11B7/00745 , G11B7/0906 , G11B7/0912 , G11B7/24088
摘要： An optical data/information storage medium comprises a disk-shaped substrate with a data/information encoded surface having a plurality of concentric, radially spaced-apart data tracks formed therein, each of said data tracks comprising a plurality of spaced-apart, nano-dimensioned data pits or marks with different angular orientations with respect to a down-track direction of each data track. Each of the data tracks further comprises a plurality of spaced-apart, nano-dimensioned servo tracking pits or marks with a preselected angular orientation with respect to the down-track direction for use in obtaining radial error (RE) signals of a read-out head by means of radial push-pull (PP) or differential phase detection (DPD) tracking.
摘要翻译：光学数据/信息存储介质包括具有数据/信息编码表面的盘状衬底，其具有形成在其中的多个同心径向间隔开的数据轨道，每个所述数据轨道包括多个间隔开的纳米级衬底，相对于每个数据轨道的下行方向，具有不同角取向的尺寸数据凹坑或标记。每个数据轨道还包括多个间隔开的纳米尺寸的伺服跟踪凹坑或具有相对于下轨道方向的预选角度取向的标记，以用于获得读出的径向误差（RE）信号通过径向推挽（PP）或差分相位检测（DPD）跟踪来实现。

4. 发明授权

US08771529B1 Method for imprint lithography 有权
标题翻译：压印光刻方法
公开(公告)号：US08771529B1
公开(公告)日：2014-07-08
申请号：US12894640
申请日：2010-09-30
申请人： Kim Yang Lee , Bing Yen , David Kuo , Koichi Wago , Shih-Fu Lee , Dieter Weller
发明人： Kim Yang Lee , Bing Yen , David Kuo , Koichi Wago , Shih-Fu Lee , Dieter Weller
IPC分类号： B44C1/22
CPC分类号： B29C59/022 , G03F7/0002
摘要： A method of imprint lithography includes imprinting a first pattern with a first template on a first substrate of a lithographic template. A second pattern is imprinted with a second template on the substrate of the lithographic template. The first pattern and the second pattern at least partially overlap, thus forming a third pattern. The third pattern is lithographically formed on a second substrate with the lithographic template. In an embodiment, the first pattern is a concentric line pattern formed by thin film deposition. In an embodiment, the second pattern is a radial line pattern. In an embodiment the first pattern and the second pattern may have line frequency increased.
摘要翻译：压印光刻的方法包括在光刻模板的第一衬底上印刷具有第一模板的第一图案。第二图案在光刻模板的基底上印有第二模板。第一图案和第二图案至少部分重叠，从而形成第三图案。第三图案在具有光刻模板的第二基板上光刻形成。在一个实施例中，第一图案是通过薄膜沉积形成的同心线图案。在一个实施例中，第二图案是径向线图案。在一个实施例中，第一图案和第二图案可以具有增加的线频率。

5. 发明申请

US20050285053A1 Method and apparatus for electron beam processing of substrates 失效
标题翻译：用于基板电子束处理的方法和装置
公开(公告)号：US20050285053A1
公开(公告)日：2005-12-29
申请号：US10875629
申请日：2004-06-23
申请人： David Kuo , Christopher Formato , Neil Deeman , Sundeep Chauhan , Lawrence Bryant
发明人： David Kuo , Christopher Formato , Neil Deeman , Sundeep Chauhan , Lawrence Bryant
IPC分类号： G11B7/26 , H01J37/304 , H01L21/00 , H01L21/68
CPC分类号： H01L21/67259 , G11B7/261 , H01J2237/2025 , H01J2237/304 , H01L21/67253 , H01L21/681
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes two encoder wheels. One encoder wheel is configured to provide a rotational speed data signal to a rotational speed control system. Another encoder wheel is configured to provide a pattern generator clock signal at a higher frequency than the rotational speed data signal to a pattern generator. In one embodiment of the present invention, at least one of the encoder wheels is positioned adjacent the substrate to minimize torsional and differential movements between the at least one encoder wheel and the substrate.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于包括两个编码轮。一个编码轮构造成向转速控制系统提供转速数据信号。另一个编码器轮被配置为向图案发生器提供比转速数据信号更高的频率的模式发生器时钟信号。在本发明的一个实施例中，编码器轮中的至少一个定位成与基板相邻，以最小化编码轮和基板之间的扭转和差速运动。

6. 发明授权

US06979831B2 Method and apparatus for a formatter following electron beam substrate processing system 失效
标题翻译：格式化板跟随电子束基板处理系统的方法和装置
公开(公告)号：US06979831B2
公开(公告)日：2005-12-27
申请号：US10783584
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B5/596 , H01J37/00 , H01J37/304
CPC分类号： H01J37/302 , H01J37/3053
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为向模式发生器电路提供校正的图案生成器时钟信号。图案生成电路用于控制用于基板处理的电子束的调制。在本发明的一个方面，在衬底处理期间测量和处理转速的可重复偏差以校正这种可重复偏差以增加衬底图案写入精度。

7. 发明申请

US20060262693A1 Apparatus and method for writing multiple radial locations during a single rotation of a disk recording medium 审中-公开
标题翻译：在盘记录介质的单次旋转期间写入多个径向位置的装置和方法
公开(公告)号：US20060262693A1
公开(公告)日：2006-11-23
申请号：US11132198
申请日：2005-05-19
申请人： Neil Deeman , David Kuo , Christopher Formato , Sundeep Chauhan , Lawrence Bryant
发明人： Neil Deeman , David Kuo , Christopher Formato , Sundeep Chauhan , Lawrence Bryant
IPC分类号： G11B7/0045
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B9/10
摘要： An apparatus for and method of writing multiple radial locations during a single rotation by deflection and modulation of a recording beam, employs an electron beam with a width that is narrower than a radial width of the exposure pattern. Instead of employing multiple exposure passes, with each offset from the other by a certain radial distance, the apparatus performs the write of the pattern in a single pass. During this single pass, controlled by a single rotation of the turntable on which the disk recording medium is located, the electron beam is deflected in a radial direction by a required amount and modulated in synchronization with the radial deflection. This synchronization of the beam modulation with the beam deflection allows a plurality of tracks to be written or exposed in a single pass.
摘要翻译：通过记录光束的偏转和调制在单个旋转期间写入多个径向位置的装置和方法采用宽度比曝光图案的径向宽度窄的电子束。代替采用多个曝光通道，每个偏移距离彼此偏移一定的径向距离，设备以单次执行对图案的写入。在该单次通过期间，通过盘记录介质所在的转盘的单次旋转控制，电子束在径向上偏转所需量并与径向偏转同步地调制。光束调制与光束偏转的这种同步允许在单次通过中写入或曝光多个轨迹。

8. 发明申请

US20050185562A1 Method and apparatus for constant linear velocity electron beam substrate processing 有权
标题翻译：恒定线速度电子束衬底加工的方法和装置
公开(公告)号：US20050185562A1
公开(公告)日：2005-08-25
申请号：US10783263
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B9/10 , H01J37/302
CPC分类号： G11B7/26 , G11B5/8404 , G11B9/10 , H01J37/3023 , H01J2237/31735
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide an angular pattern generator clock signal and to a pattern generator circuit. The pattern generation circuit is configured to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, while the spindle shaft is rotated at a constant linear velocity, the pattern generation circuit controls the modulation of an electron beam such that written mark lengths are sized to be about constant in angular dimension.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为提供角度图形发生器时钟信号和模式发生器电路。图案生成电路被配置为控制用于基板处理的电子束的调制。在本发明的一个方面，当主轴以恒定的线速度旋转时，图案产生电路控制电子束的调制，使得书写标记长度的尺寸在角度尺寸上约为恒定。

9. 发明授权

US07382711B2 Method and apparatus for constant linear velocity electron beam substrate processing 有权
标题翻译：恒定线速度电子束衬底加工的方法和装置
公开(公告)号：US07382711B2
公开(公告)日：2008-06-03
申请号：US10783263
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B9/10
CPC分类号： G11B7/26 , G11B5/8404 , G11B9/10 , H01J37/3023 , H01J2237/31735
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide an angular pattern generator clock signal and to a pattern generator circuit. The pattern generation circuit is configured to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, while the spindle shaft is rotated at a constant linear velocity, the pattern generation circuit controls the modulation of an electron beam such that written mark lengths are sized to be about constant in angular dimension.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为提供角度图形发生器时钟信号和模式发生器电路。图案生成电路被配置为控制用于基板处理的电子束的调制。在本发明的一个方面，当主轴以恒定的线速度旋转时，图案产生电路控制电子束的调制，使得书写标记长度的尺寸在角度尺寸上约为恒定。

10. 发明申请

US20050184256A1 Method and apparatus for a formatter following electron beam substrate processing system 失效
公开(公告)号：US20050184256A1
公开(公告)日：2005-08-25
申请号：US10783584
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B5/596 , H01J37/00 , H01J37/304
CPC分类号： H01J37/302 , H01J37/3053
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.

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