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1. 发明授权

US06979831B2 Method and apparatus for a formatter following electron beam substrate processing system 失效
标题翻译：格式化板跟随电子束基板处理系统的方法和装置
公开(公告)号：US06979831B2
公开(公告)日：2005-12-27
申请号：US10783584
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B5/596 , H01J37/00 , H01J37/304
CPC分类号： H01J37/302 , H01J37/3053
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为向模式发生器电路提供校正的图案生成器时钟信号。图案生成电路用于控制用于基板处理的电子束的调制。在本发明的一个方面，在衬底处理期间测量和处理转速的可重复偏差以校正这种可重复偏差以增加衬底图案写入精度。

2. 发明申请

US20050285053A1 Method and apparatus for electron beam processing of substrates 失效
标题翻译：用于基板电子束处理的方法和装置
公开(公告)号：US20050285053A1
公开(公告)日：2005-12-29
申请号：US10875629
申请日：2004-06-23
申请人： David Kuo , Christopher Formato , Neil Deeman , Sundeep Chauhan , Lawrence Bryant
发明人： David Kuo , Christopher Formato , Neil Deeman , Sundeep Chauhan , Lawrence Bryant
IPC分类号： G11B7/26 , H01J37/304 , H01L21/00 , H01L21/68
CPC分类号： H01L21/67259 , G11B7/261 , H01J2237/2025 , H01J2237/304 , H01L21/67253 , H01L21/681
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes two encoder wheels. One encoder wheel is configured to provide a rotational speed data signal to a rotational speed control system. Another encoder wheel is configured to provide a pattern generator clock signal at a higher frequency than the rotational speed data signal to a pattern generator. In one embodiment of the present invention, at least one of the encoder wheels is positioned adjacent the substrate to minimize torsional and differential movements between the at least one encoder wheel and the substrate.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于包括两个编码轮。一个编码轮构造成向转速控制系统提供转速数据信号。另一个编码器轮被配置为向图案发生器提供比转速数据信号更高的频率的模式发生器时钟信号。在本发明的一个实施例中，编码器轮中的至少一个定位成与基板相邻，以最小化编码轮和基板之间的扭转和差速运动。

3. 发明申请

US20060262693A1 Apparatus and method for writing multiple radial locations during a single rotation of a disk recording medium 审中-公开
标题翻译：在盘记录介质的单次旋转期间写入多个径向位置的装置和方法
公开(公告)号：US20060262693A1
公开(公告)日：2006-11-23
申请号：US11132198
申请日：2005-05-19
申请人： Neil Deeman , David Kuo , Christopher Formato , Sundeep Chauhan , Lawrence Bryant
发明人： Neil Deeman , David Kuo , Christopher Formato , Sundeep Chauhan , Lawrence Bryant
IPC分类号： G11B7/0045
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B9/10
摘要： An apparatus for and method of writing multiple radial locations during a single rotation by deflection and modulation of a recording beam, employs an electron beam with a width that is narrower than a radial width of the exposure pattern. Instead of employing multiple exposure passes, with each offset from the other by a certain radial distance, the apparatus performs the write of the pattern in a single pass. During this single pass, controlled by a single rotation of the turntable on which the disk recording medium is located, the electron beam is deflected in a radial direction by a required amount and modulated in synchronization with the radial deflection. This synchronization of the beam modulation with the beam deflection allows a plurality of tracks to be written or exposed in a single pass.
摘要翻译：通过记录光束的偏转和调制在单个旋转期间写入多个径向位置的装置和方法采用宽度比曝光图案的径向宽度窄的电子束。代替采用多个曝光通道，每个偏移距离彼此偏移一定的径向距离，设备以单次执行对图案的写入。在该单次通过期间，通过盘记录介质所在的转盘的单次旋转控制，电子束在径向上偏转所需量并与径向偏转同步地调制。光束调制与光束偏转的这种同步允许在单次通过中写入或曝光多个轨迹。

4. 发明申请

US20050185562A1 Method and apparatus for constant linear velocity electron beam substrate processing 有权
标题翻译：恒定线速度电子束衬底加工的方法和装置
公开(公告)号：US20050185562A1
公开(公告)日：2005-08-25
申请号：US10783263
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B9/10 , H01J37/302
CPC分类号： G11B7/26 , G11B5/8404 , G11B9/10 , H01J37/3023 , H01J2237/31735
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide an angular pattern generator clock signal and to a pattern generator circuit. The pattern generation circuit is configured to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, while the spindle shaft is rotated at a constant linear velocity, the pattern generation circuit controls the modulation of an electron beam such that written mark lengths are sized to be about constant in angular dimension.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为提供角度图形发生器时钟信号和模式发生器电路。图案生成电路被配置为控制用于基板处理的电子束的调制。在本发明的一个方面，当主轴以恒定的线速度旋转时，图案产生电路控制电子束的调制，使得书写标记长度的尺寸在角度尺寸上约为恒定。

5. 发明授权

US07382711B2 Method and apparatus for constant linear velocity electron beam substrate processing 有权
标题翻译：恒定线速度电子束衬底加工的方法和装置
公开(公告)号：US07382711B2
公开(公告)日：2008-06-03
申请号：US10783263
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B9/10
CPC分类号： G11B7/26 , G11B5/8404 , G11B9/10 , H01J37/3023 , H01J2237/31735
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide an angular pattern generator clock signal and to a pattern generator circuit. The pattern generation circuit is configured to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, while the spindle shaft is rotated at a constant linear velocity, the pattern generation circuit controls the modulation of an electron beam such that written mark lengths are sized to be about constant in angular dimension.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为提供角度图形发生器时钟信号和模式发生器电路。图案生成电路被配置为控制用于基板处理的电子束的调制。在本发明的一个方面，当主轴以恒定的线速度旋转时，图案产生电路控制电子束的调制，使得书写标记长度的尺寸在角度尺寸上约为恒定。

6. 发明申请

US20050184256A1 Method and apparatus for a formatter following electron beam substrate processing system 失效
公开(公告)号：US20050184256A1
公开(公告)日：2005-08-25
申请号：US10783584
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B5/596 , H01J37/00 , H01J37/304
CPC分类号： H01J37/302 , H01J37/3053
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.

7. 发明申请

US20050286391A1 Method and apparatus for focused beam processing of recording media 审中-公开
标题翻译：记录媒体聚焦光束处理方法和装置
公开(公告)号：US20050286391A1
公开(公告)日：2005-12-29
申请号：US10875820
申请日：2004-06-23
申请人： Christopher Formato , Neil Deeman
发明人： Christopher Formato , Neil Deeman
IPC分类号： C09K19/00 , G03C5/00 , G11B7/09 , G11B7/125
CPC分类号： G11B7/0946 , G11B7/1275
摘要： Embodiments of the invention generally provide a light source substrate processing system. In one embodiment, the present invention provides a spindle motor coupled to a substrate support member. A light source assembly is supported above a substrate disposed on the substrate support member. In another embodiment, the light source assembly includes a movable optical assembly disposed between a pair of light sources and the substrate support member to focus a pair of light beams onto a portion of the substrate surface. Each of the light beams has a different wavelength. The optical assembly includes a plurality of lenses configured to adjust the focal plane of each light beam such that their focal points about converge on a substrate surface location. The focal points of the two light beams about coincide with various movements of at least a portion of the optical assembly. In one embodiment of the present invention, a focus correction assembly is configured to adjust the focal plane of at least one of the light beams in response to temperature fluctuations to maintain the focal points of the two light beams within a desired range of focal points disposed relative a surface of a substrate being processed.
摘要翻译：本发明的实施例通常提供一种光源基板处理系统。在一个实施例中，本发明提供一种联接到基板支撑构件的主轴电动机。光源组件被支撑在设置在基板支撑构件上的基板的上方。在另一实施例中，光源组件包括设置在一对光源和基板支撑构件之间的可移动光学组件，以将一对光束聚焦到基板表面的一部分上。每个光束具有不同的波长。光学组件包括多个透镜，其被配置为调节每个光束的焦平面，使得它们的焦点大约会聚在衬底表面位置上。两个光束的焦点与光学组件的至少一部分的各种运动重合。在本发明的一个实施例中，焦点校正组件被配置为响应于温度波动来调节至少一个光束的焦平面，以将两个光束的焦点保持在所设置的焦点的期望范围内相对于正在处理的衬底的表面。

8. 发明授权

US06954323B2 Compensation for non-linearity in the servo writing process by program pattern delay 失效
标题翻译：通过程序模式延迟对伺服写入过程中的非线性进行补偿
公开(公告)号：US06954323B2
公开(公告)日：2005-10-11
申请号：US10358487
申请日：2003-02-05
申请人： Neil Deeman , Christopher Formato
发明人： Neil Deeman , Christopher Formato
IPC分类号： G11B5/012 , G11B5/596 , G11B5/09
CPC分类号： G11B5/59633 , G11B5/012 , G11B5/59627
摘要： Hard disk servo data is recorded on a stamper master or a hard disk with a timing offset that converts the arc described by the servo data writer's rotary actuator into the arc described by the disk drive's rotary actuator.
摘要翻译：将硬盘伺服数据记录在压模主机或具有定时偏移的硬盘上，该定时偏移将伺服数据写入器的旋转执行器所描述的电弧转换成由磁盘驱动器的旋转执行器描述的弧。

9. 发明授权

US07105280B1 Utilizing permanent master for making stampers/imprinters for patterning of recording media 失效
标题翻译：利用永久主人制作刻印机/打印机来记录媒体的图案化
公开(公告)号：US07105280B1
公开(公告)日：2006-09-12
申请号：US10436057
申请日：2003-05-13
申请人： Neil Deeman , Gennady Gauzner , Christopher Formato , Nobuo Kurataka
发明人： Neil Deeman , Gennady Gauzner , Christopher Formato , Nobuo Kurataka
IPC分类号： G11B5/20
CPC分类号： G11B5/855 , B81C99/009
摘要： A method of manufacturing a stamper/imprinter for use in patterning of a recording medium, comprising sequential steps of: (a) providing a permanent master comprising a body of a substantially rigid material having a surface with a topographical pattern formed therein comprising a patterned plurality of spaced-apart recesses with a plurality of non-recessed areas therebetween, the topographical pattern corresponding to a pattern to be formed in a recording medium; (b) forming a layer of a substantially rigid material over the surface of the permanent master with the topographical pattern formed therein; (c) separating the layer of a substantially rigid material from the master, the layer of a substantially rigid material having an imprinting surface with a topographical pattern formed therein replicating the topographical pattern of the permanent master; and (d) repeating steps (b) and (c) multiple times with the permanent master provided in step (a) to form a plurality of stampers/imprinters.
摘要翻译：一种用于制造用于记录介质图案化的压模/打印机的方法，包括以下顺序的步骤：（a）提供永久性主机，其包括具有形成在其中的形状图案的表面的基本刚性材料的主体，包括图案化多个间隔开的凹部，其间具有多个非凹陷区域，所述形状图案对应于要在记录介质中形成的图案; （b）在永久性主体的表面上形成基本上刚性的材料层，其中形成有形貌图案; （c）将基本上刚性的材料层与主体分离，具有压印表面的基本刚性材料的层，其中形成有形成图形的图案，复制永久性主体的形貌图案; 和（d）用步骤（a）中提供的永久主机重复步骤（b）和（c）多次以形成多个冲压机/冲压机。

10. 发明申请

US20080093336A1 Process for fabricating patterned magnetic recording media 有权
标题翻译：制造图案化磁记录介质的方法
公开(公告)号：US20080093336A1
公开(公告)日：2008-04-24
申请号：US11583845
申请日：2006-10-20
申请人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
IPC分类号： B44C1/22 , C03C25/68
CPC分类号： G11B5/855 , G11B5/667 , G11B5/732
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译：一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

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