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1. 发明授权

US08059266B2 Radiometric Kirk test 有权
标题翻译：辐射Kirk测试
公开(公告)号：US08059266B2
公开(公告)日：2011-11-15
申请号：US12236050
申请日：2008-09-23
申请人： David A. Hult , Heine Melle Mulder , Minne Cuperus
发明人： David A. Hult , Heine Melle Mulder , Minne Cuperus
IPC分类号： G01J1/00 , G03B27/42 , G03B27/32
CPC分类号： G01J1/04 , G01J1/0437 , G03B27/42 , G03F7/7085 , G03F7/70941
摘要： Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement. The ratio of the integrated dark area measurement result and integrated bright area measurement result is a measure of stray light present in the lithographic apparatus.
摘要翻译：使用辐射式Kirk测试（也称为扫描SAMOS测试）描述光刻设备中测量杂散光的系统和方法。本发明的辐射Kirk测试涉及在更大的明亮场内具有孤立暗区的测试图案。辐射Kirk测试包括在光刻系统的图像平面中的检测器的孔的至少两次连续或阶梯式扫描。在黑暗区域测量期间，检测器的孔径被定位成使得至少在一个点处，探测器的孔径在黑暗区域的图像内居中。在亮区测量中，探测器的孔径位于明场的图像内。对于暗区测量和亮区测量，相应地计算积分检测器信号。积分暗区测量结果与集成亮区测量结果的比值是光刻设备中存在的杂散光的量度。

2. 发明申请

US20090086179A1 Radiometric Kirk Test 有权
标题翻译：辐射Kirk测试
公开(公告)号：US20090086179A1
公开(公告)日：2009-04-02
申请号：US12236050
申请日：2008-09-23
申请人： David A. Hult , Heine Melle Mulder , Minne Cuperus
发明人： David A. Hult , Heine Melle Mulder , Minne Cuperus
IPC分类号： G01J1/00 , G03B27/42
CPC分类号： G01J1/04 , G01J1/0437 , G03B27/42 , G03F7/7085 , G03F7/70941
摘要： Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement. The ratio of the integrated dark area measurement result and integrated bright area measurement result is a measure of stray light present in the lithographic apparatus.
摘要翻译：使用辐射式Kirk测试（也称为扫描SAMOS测试）描述光刻设备中测量杂散光的系统和方法。本发明的辐射Kirk测试涉及在更大的明亮场内具有孤立暗区的测试图案。辐射Kirk测试包括在光刻系统的图像平面中的检测器的孔的至少两次连续或阶梯式扫描。在黑暗区域测量期间，检测器的孔径被定位成使得至少在一个点处，探测器的孔径在黑暗区域的图像内居中。在亮区测量中，探测器的孔径位于明场的图像内。对于暗区测量和亮区测量，相应地计算积分检测器信号。积分暗区测量结果与集成亮区测量结果的比值是光刻设备中存在的杂散光的量度。

3. 发明授权

US07525641B2 System and method for uniformity correction 有权
标题翻译：用于均匀校正的系统和方法
公开(公告)号：US07525641B2
公开(公告)日：2009-04-28
申请号：US11295517
申请日：2005-12-07
申请人： Richard C. Zimmerman , Eric B. Catey , David A. Hult , Alexander C. Kremer , Heine Melle Mulder , Hendrikus Robertus Marie Van Greevenbroek , Roberto B. Wiener
发明人： Richard C. Zimmerman , Eric B. Catey , David A. Hult , Alexander C. Kremer , Heine Melle Mulder , Hendrikus Robertus Marie Van Greevenbroek , Roberto B. Wiener
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G02B27/0012 , G02B7/346 , G03F7/70125 , G03F7/70191
摘要： A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.
摘要翻译：提供了一种用于均匀性校正的系统和方法。该系统包括以限定的构造插入到照明场中的多个翼状校正元件。相邻的有翼校正元件被重叠以最小化诱导的均匀性纹波。每个翼状校正元件在校正元件的纵向边缘上具有第一突出部，并且在相对的纵向边缘上具有第二突起。第一突起的倾斜边缘的斜率和第二突起的倾斜边缘的斜率与照明场的不均匀轮廓中的梯度的斜率相关联。此外，由校正元件的平坦尖端和第一和第二突起的倾斜边缘限定的角度与照明场的梯度的角度相关联。

4. 发明授权

US09563135B2 Process tuning with polarization 有权
标题翻译：极化过程调谐
公开(公告)号：US09563135B2
公开(公告)日：2017-02-07
申请号：US13239034
申请日：2011-09-21
申请人： Steven George Hansen , Heine Melle Mulder , Tsann-Bim Chiou
发明人： Steven George Hansen , Heine Melle Mulder , Tsann-Bim Chiou
IPC分类号： G03B27/68 , G03B27/54 , G03B27/32 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/7005 , G03F7/70625
摘要： A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points in a pupil plane of the illumination source; changing a polarization state of each pixel group and determining an incremental effect on each of the plurality of critical dimensions resulting from the change of polarization state; calculating a first plurality of sensitivity coefficients for each of the plurality of critical dimensions using the determined incremental effects; selecting an initial illumination source; iteratively calculating a lithographic metric as a result of a change of polarization state using the calculated first plurality of sensitivity coefficients, the change of the polarization state of the pixel group in the initial illumination source creating a modified illumination source; and adjusting the initial illumination source based on the iterative results of calculations.
摘要翻译：一种用于配置光刻设备的照明源的方法，所述方法包括将照明源分为像素组，每个像素组包括照明源的光瞳平面中的一个或多个照明源点; 改变每个像素组的偏振态，并确定由偏振状态改变导致的多个临界尺度中的每一个的增量效应; 使用所确定的增量效应来计算所述多个关键尺寸中的每一个的第一多个灵敏度系数; 选择初始照明源; 使用所计算的第一多个灵敏度系数来迭代地计算作为偏振态的变化的结果的光刻度量，所述初始照明源中的像素组的偏振状态的改变创建修改的照明源; 并根据迭代计算结果调整初始照明源。

5. 发明申请

US20140211189A1 RADIATION MODULATOR FOR A LITHOGRAPHY APPARATUS, A LITHOGRAPHY APPARATUS, A METHOD OF MODULATING RADIATION FOR USE IN LITHOGRAPHY, AND A DEVICE MANUFACTURING METHOD 有权
标题翻译：用于光刻设备的辐射调制器，光刻设备，用于在地平线中使用的调制辐射的方法和设备制造方法
公开(公告)号：US20140211189A1
公开(公告)日：2014-07-31
申请号：US14165334
申请日：2014-01-27
申请人： Dries SMEETS , Arno Jan Bleeker , Chris Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
发明人： Dries SMEETS , Arno Jan Bleeker , Chris Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
IPC分类号： G03F7/20 , G02F1/01
CPC分类号： G03F7/70191 , G03F7/70291
摘要： A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.
摘要翻译：公开了一种用于光刻设备的辐射调制器，光刻设备，调制用于光刻的辐射的方法，以及器件制造方法。用于光刻设备的辐射调制器可以具有支持波长小于450nm的辐射的多个波导，以及调制部，被配置为单独地调制在每个波导中传播的辐射，以便提供调制的多个输出光束。

6. 发明申请

US20130107238A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20130107238A1
公开(公告)日：2013-05-02
申请号：US13663924
申请日：2012-10-30
申请人： Heine Melle Mulder
发明人： Heine Melle Mulder
IPC分类号： G03F7/20 , G03F7/26
CPC分类号： G03F7/2008 , G03F7/26 , G03F7/70391 , G03F7/704 , G03F7/70575
摘要： A apparatus having a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.
摘要翻译：一种具有投影系统以将多个辐射束投影到衬底上的投影系统的装置，其中所述多个辐射束包括由第一波长范围内的辐射和第一组一个或多个辐射形成的第一组一个或多个辐射束在与第一波长范围不同的第二波长范围内的辐射形成的光束。该装置还具有一个色散元件，其配置成使得第一组的一个或多个辐射束以与第二组的一个或多个辐射束不同的角度入射在分散元件上，并且使得一个或多个辐射束从分散元件输出的第一和第二组基本上是平行的。

7. 发明授权

US08052289B2 Mirror array for lithography 有权
标题翻译：用于光刻的镜阵列
公开(公告)号：US08052289B2
公开(公告)日：2011-11-08
申请号：US11448152
申请日：2006-06-07
申请人： Marius Ravensbergen , Heine Melle Mulder
发明人： Marius Ravensbergen , Heine Melle Mulder
IPC分类号： G02B7/195 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/70116 , G03F7/70291 , G03F7/70858
摘要： A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the associated reflective element. The apparatus further includes a liquid in contact with at least a portion of the reflective elements.
摘要翻译：镜阵列装置包括被配置为支撑多个可单独调节的反射元件的载体。至少一个致动器与每个反射元件相关联，致动器被配置成调节相关联的反射元件的取向或位置。该装置还包括与至少一部分反射元件接触的液体。

8. 发明申请

US20090190197A1 Device control method and apparatus 有权
标题翻译：设备控制方法及装置
公开(公告)号：US20090190197A1
公开(公告)日：2009-07-30
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译：一种控制单独可控元件阵列的元件的方法。该方法包括改变驱动元件的驱动电压的频率。

9. 发明授权

US07030958B2 Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method 有权
标题翻译：光衰减器，辐射系统及其光刻设备及其制造方法
公开(公告)号：US07030958B2
公开(公告)日：2006-04-18
申请号：US10748849
申请日：2003-12-31
申请人： Cornelis Petrus Andreas Marie Luijkx , Vadim Yevgenyevich Banine , Hako Botma , Martinus Van Duijnhoven , Markus Franciscus Antonius Eurlings , Heine Melle Mulder , Johannes Hendrik Everhardus Aldegonda Muijderman , Cornelis Jacobus Van Duijn , Jan Jaap Krikke
发明人： Cornelis Petrus Andreas Marie Luijkx , Vadim Yevgenyevich Banine , Hako Botma , Martinus Van Duijnhoven , Markus Franciscus Antonius Eurlings , Heine Melle Mulder , Johannes Hendrik Everhardus Aldegonda Muijderman , Cornelis Jacobus Van Duijn , Jan Jaap Krikke
IPC分类号： G03B27/52
CPC分类号： G03F7/70191 , G03F7/70066 , G03F7/70116 , G03F7/70558
摘要： An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.
摘要翻译：光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。

10. 发明授权

US08885144B2 Illumination system and lithographic apparatus 有权
标题翻译：照明系统和光刻设备
公开(公告)号：US08885144B2
公开(公告)日：2014-11-11
申请号：US13114652
申请日：2011-05-24
申请人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
发明人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
IPC分类号： G02B5/08 , G03B27/32 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译：公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力一个或多个元素。

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