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1. 发明授权

US07525641B2 System and method for uniformity correction 有权
标题翻译：用于均匀校正的系统和方法
公开(公告)号：US07525641B2
公开(公告)日：2009-04-28
申请号：US11295517
申请日：2005-12-07
申请人： Richard C. Zimmerman , Eric B. Catey , David A. Hult , Alexander C. Kremer , Heine Melle Mulder , Hendrikus Robertus Marie Van Greevenbroek , Roberto B. Wiener
发明人： Richard C. Zimmerman , Eric B. Catey , David A. Hult , Alexander C. Kremer , Heine Melle Mulder , Hendrikus Robertus Marie Van Greevenbroek , Roberto B. Wiener
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G02B27/0012 , G02B7/346 , G03F7/70125 , G03F7/70191
摘要： A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.
摘要翻译：提供了一种用于均匀性校正的系统和方法。该系统包括以限定的构造插入到照明场中的多个翼状校正元件。相邻的有翼校正元件被重叠以最小化诱导的均匀性纹波。每个翼状校正元件在校正元件的纵向边缘上具有第一突出部，并且在相对的纵向边缘上具有第二突起。第一突起的倾斜边缘的斜率和第二突起的倾斜边缘的斜率与照明场的不均匀轮廓中的梯度的斜率相关联。此外，由校正元件的平坦尖端和第一和第二突起的倾斜边缘限定的角度与照明场的梯度的角度相关联。

2. 发明授权

US07714984B2 Residual pupil asymmetry compensator for a lithography scanner 有权
标题翻译：用于光刻扫描仪的残余瞳孔不对称补偿器
公开(公告)号：US07714984B2
公开(公告)日：2010-05-11
申请号：US11692614
申请日：2007-03-28
申请人： David A. Hult
发明人： David A. Hult
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70133 , G03F7/70141
摘要： A uniformity correction system may be used as an actuator for the correction of asymmetry scan-integrated illumination pupil fill that varies in the non-scanning direction of a lithography system. Instead of minimizing asymmetric opaque element insertion, opaque elements are inserted into an illumination beam to introduce an additional pupil asymmetry into the illumination beam. The compensating pupil asymmetry substantially nulls the original pupil asymmetry. To introduce the pupil asymmetry, a first opaque element can be moved into or out of the illumination beam in tandem with a second, opposing opaque element. Iterative feedback of both uniformity and pupil asymmetry ensure that both are substantially simultaneously optimized.
摘要翻译：可以使用均匀性校正系统作为校正在光刻系统的非扫描方向上变化的不对称扫描集成照明光瞳填充的致动器。代替使非对称不透明元件插入最小化，将不透明元件插入到照明光束中以将额外的光瞳不对称性引入到照明光束中。补偿光瞳不对称性使得原始瞳孔不对称性基本上为零。为了引入瞳孔不对称，可以将第一不透明元件与第二相对的不透明元件串联移入或移出照明束。均匀性和瞳孔不对称性的迭代反馈确保两者基本上同时优化。

3. 发明授权

US08085383B2 System, method, and apparatus for scanning detector for fast and frequent illumination uniformity correction module 失效
标题翻译：用于扫描检测器的快速和频率照明均匀性校正模块的系统，方法和装置
公开(公告)号：US08085383B2
公开(公告)日：2011-12-27
申请号：US11259088
申请日：2005-10-27
申请人： David A. Hult
发明人： David A. Hult
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/7085 , G03F7/70066 , G03F7/70558
摘要： Provided is a reticle masking blade system, including a reticle-masking blade device. Also included is a detector array mounted on an edge of a blade of the blade device.
摘要翻译：提供了一种掩模版掩模刀片系统，其包括掩模版掩模刀片装置。还包括安装在刀片装置的刀片的边缘上的检测器阵列。

4. 发明授权

US08059266B2 Radiometric Kirk test 有权
标题翻译：辐射Kirk测试
公开(公告)号：US08059266B2
公开(公告)日：2011-11-15
申请号：US12236050
申请日：2008-09-23
申请人： David A. Hult , Heine Melle Mulder , Minne Cuperus
发明人： David A. Hult , Heine Melle Mulder , Minne Cuperus
IPC分类号： G01J1/00 , G03B27/42 , G03B27/32
CPC分类号： G01J1/04 , G01J1/0437 , G03B27/42 , G03F7/7085 , G03F7/70941
摘要： Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement. The ratio of the integrated dark area measurement result and integrated bright area measurement result is a measure of stray light present in the lithographic apparatus.
摘要翻译：使用辐射式Kirk测试（也称为扫描SAMOS测试）描述光刻设备中测量杂散光的系统和方法。本发明的辐射Kirk测试涉及在更大的明亮场内具有孤立暗区的测试图案。辐射Kirk测试包括在光刻系统的图像平面中的检测器的孔的至少两次连续或阶梯式扫描。在黑暗区域测量期间，检测器的孔径被定位成使得至少在一个点处，探测器的孔径在黑暗区域的图像内居中。在亮区测量中，探测器的孔径位于明场的图像内。对于暗区测量和亮区测量，相应地计算积分检测器信号。积分暗区测量结果与集成亮区测量结果的比值是光刻设备中存在的杂散光的量度。

5. 发明申请

US20090086179A1 Radiometric Kirk Test 有权
标题翻译：辐射Kirk测试
公开(公告)号：US20090086179A1
公开(公告)日：2009-04-02
申请号：US12236050
申请日：2008-09-23
申请人： David A. Hult , Heine Melle Mulder , Minne Cuperus
发明人： David A. Hult , Heine Melle Mulder , Minne Cuperus
IPC分类号： G01J1/00 , G03B27/42
CPC分类号： G01J1/04 , G01J1/0437 , G03B27/42 , G03F7/7085 , G03F7/70941
摘要： Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement. The ratio of the integrated dark area measurement result and integrated bright area measurement result is a measure of stray light present in the lithographic apparatus.
摘要翻译：使用辐射式Kirk测试（也称为扫描SAMOS测试）描述光刻设备中测量杂散光的系统和方法。本发明的辐射Kirk测试涉及在更大的明亮场内具有孤立暗区的测试图案。辐射Kirk测试包括在光刻系统的图像平面中的检测器的孔的至少两次连续或阶梯式扫描。在黑暗区域测量期间，检测器的孔径被定位成使得至少在一个点处，探测器的孔径在黑暗区域的图像内居中。在亮区测量中，探测器的孔径位于明场的图像内。对于暗区测量和亮区测量，相应地计算积分检测器信号。积分暗区测量结果与集成亮区测量结果的比值是光刻设备中存在的杂散光的量度。

6. 发明申请

US20080239258A1 Residual Pupil Asymmetry Compensator for a Lithography Scanner 有权
标题翻译：用于光刻扫描仪的残留瞳孔不对称补偿器
公开(公告)号：US20080239258A1
公开(公告)日：2008-10-02
申请号：US11692614
申请日：2007-03-28
申请人： David A. Hult
发明人： David A. Hult
IPC分类号： G03B43/00 , G03B27/02
CPC分类号： G03F7/70191 , G03F7/70133 , G03F7/70141
摘要： A uniformity correction system may be used as an actuator for the correction of asymmetry scan-integrated illumination pupil fill that varies in the non-scanning direction of a lithography system. Instead of minimizing asymmetric opaque element insertion, opaque elements are inserted into an illumination beam to introduce an additional pupil asymmetry into the illumination beam. The compensating pupil asymmetry substantially nulls the original pupil asymmetry. To introduce the pupil asymmetry, a first opaque element can be moved into or out of the illumination beam in tandem with a second, opposing opaque element. Iterative feedback of both uniformity and pupil asymmetry ensure that both are substantially simultaneously optimized.
摘要翻译：可以使用均匀性校正系统作为校正在光刻系统的非扫描方向上变化的不对称扫描集成照明光瞳填充的致动器。代替使非对称不透明元件插入最小化，将不透明元件插入到照明光束中以将额外的光瞳不对称性引入到照明光束中。补偿光瞳不对称性使得原始瞳孔不对称性基本上为零。为了引入瞳孔不对称，可以将第一不透明元件与第二相对的不透明元件串联移入或移出照明束。均匀性和瞳孔不对称性的迭代反馈确保两者基本上同时优化。

7. 发明授权

US07388647B2 Method and system for real time uniformity feedback 失效
标题翻译：用于实时均匀性反馈的方法和系统
公开(公告)号：US07388647B2
公开(公告)日：2008-06-17
申请号：US11029510
申请日：2005-01-06
申请人： David A. Hult
发明人： David A. Hult
IPC分类号： G03B27/42
CPC分类号： G03F7/70133
摘要： Provided are a method and system for projecting an illumination beam to an image plane. The method includes producing a sample of the illumination beam and projecting the sample to a secondary image plane. Next, an illumination uniformity profile associated with the projected sample is measured while the received illumination beam is being projected to the image plane.
摘要翻译：提供了一种用于将照明光束投影到像平面的方法和系统。该方法包括产生照明光束的样本并将样本投影到次级像面。接下来，在接收到的照射光束被投影到图像平面的同时测量与投影样本相关联的照明均匀性分布。

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