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    • 6. 发明申请
    • Solar Cell Element and Method for Manufacturing Solar Cell Element
    • 太阳能电池元件及制造太阳能电池元件的方法
    • US20100037946A1
    • 2010-02-18
    • US12443421
    • 2007-09-27
    • Rui YatabeKenichi KurobeYosuke Inomata
    • Rui YatabeKenichi KurobeYosuke Inomata
    • H01L31/0236H01L31/0232H01L31/00
    • H01L31/1864H01L21/18H01L21/2252H01L21/2255H01L31/022425H01L31/02363H01L31/04H01L31/068H01L31/1804Y02E10/52Y02E10/547Y02P70/521
    • [Object] To provide a method for manufacturing a solar cell element including a semiconductor substrate that includes a high-concentration dopant layer located near the surface of the semiconductor substrate and a low-concentration dopant layer located more inside the semiconductor substrate than the high-concentration dopant layer[Solving Means] A method includes' heating a semiconductor substrate having a first conductivity type in a first atmosphere which contains a dopant having a second conductivity type and which has a first dopant concentration; heating in a second atmosphere the semiconductor substrate heated in the first atmosphere, the second atmosphere having a second dopant concentration less than the first dopant concentration; and heating in a third atmosphere the semiconductor substrate heated in the second atmosphere, the third atmosphere having a third dopant concentration greater than the second dopant concentration.
    • 本发明提供一种太阳能电池元件的制造方法,该太阳能电池元件包括半导体基板,该半导体基板包括位于半导体基板的表面附近的高浓度掺杂剂层和位于半导体基板的内侧的低浓度掺杂剂层, 浓度掺杂剂层[解决方案]一种方法包括:在包含具有第二导电类型且具有第一掺杂剂浓度的掺杂剂的第一气氛中加热具有第一导电类型的半导体衬底; 在第二气氛中加热在第一气氛中加热的半导体衬底,第二气氛具有小于第一掺杂剂浓度的第二掺杂剂浓度; 以及在第三气氛中加热在所述第二气氛中加热的所述半导体衬底,所述第三气氛具有大于所述第二掺杂剂浓度的第三掺杂剂浓度。
    • 9. 发明授权
    • Method for producing a solar cell
    • 太阳能电池的制造方法
    • US07556741B2
    • 2009-07-07
    • US10650505
    • 2003-08-27
    • Yosuke InomataYuko Fukawa
    • Yosuke InomataYuko Fukawa
    • H01L21/306
    • H01L21/3065H01J37/32091H01J2237/334H01L21/67069
    • A dry etching apparatus including a plate 15 provided in parallel or nearly parallel with an RF electrode 9 to cover a substrate 1 placed on the RF electrode 9 directly or through a tray 24. The plate 15 is provided with planar or nearly planar obstacles 16 that inhibit a gas and plasma from passing through the plate 15 as well as opening portions 19. This makes it possible to achieve conditions under which etching residues attach to the surface of the substrate faster by trapping the etching residues in a space between the surface of the substrate 1 and the plate 15. Fine textures can be thus formed efficiently on the surface of the substrate (FIG. 4).
    • 一种干蚀刻装置,包括平行或几乎平行于RF电极9的板15,以直接或通过托盘24覆盖放置在RF电极9上的基板1.板15设置有平面或几乎平面的障碍物16, 阻止气体和等离子体通过板15以及开口部分19.这使得可以通过将蚀刻残留物捕获在基板的表面之间的空间中来实现蚀刻残留物更快地附着到基板的表面的条件 基板1和板15.因此,可以在基板的表面上有效地形成精细的纹理(图4)。
    • 10. 发明授权
    • Method for producing a solar cell
    • 太阳能电池的制造方法
    • US07556740B2
    • 2009-07-07
    • US10648429
    • 2003-08-26
    • Yosuke InomataKatsuhiko Shirasawa
    • Yosuke InomataKatsuhiko Shirasawa
    • H01L21/306
    • H01J37/32623H01J37/32082
    • A substrate processing apparatus that roughens the surface of a substrate through a dry etching method by covering the surface of the substrate to be processed with a plate provided with a number of opening portions. The plate is provided with the opening portions in such a manner that an open area ratio of the opening portions on the peripheral side is smaller than an open area ratio of the opening portions in the central portion when the plate is viewed in a plane. It is thus possible to form textures on the surface of the substrate efficiently and homogenously, which in turn makes it possible to manufacture highly efficient solar cells or the like at a low cost.
    • 一种基板处理装置,其通过用设置有多个开口部的板覆盖被处理基板的表面,通过干法蚀刻法使基板的表面粗糙化。 该板以这样一种方式设置开口部分,使得当在平面中观察板时,周边侧的开口部分的开口面积比小于中心部分中的开口部分的开口面积比。 因此,可以有效且均匀地在基板的表面上形成纹理,这又可以以低成本制造高效率的太阳能电池等。