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1. 发明专利

JP2013087154A Base generator and photosensitive resin composition 审中-公开
标题翻译：基因发生器和感光树脂组合物
公开(公告)号：JP2013087154A
公开(公告)日：2013-05-13
申请号：JP2011227156
申请日：2011-10-14
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , AMANO HIROKO , TANIGUCHI TAKAHISA , SAKAYORI KATSUYA
IPC分类号： C09K3/00 , C07C235/34 , C07C235/36 , C07D307/14 , C08G59/66 , C08G75/04 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a base generator with a high catalyst activity efficiency and high solubility, usable as a curing catalyst for compounds having two or more epoxy groups and/or oxetane groups and a compound having two or more mercapto groups, and a photosensitive resin composition curable at low temperature and short time curing conditions with a preferable storage stability.SOLUTION: The base generator includes a specific structure for generating a base by electromagnetic wave irradiation and heating. The photosensitive resin composition includes the base generator, a compound having two or more epoxy groups and/or oxetane groups and a compound having two or more mercapto groups.
摘要翻译：要解决的问题：为了提供具有高催化剂活性效率和高溶解度的碱发生剂，可用作具有两个或更多个环氧基和/或氧杂环丁烷基的化合物的固化催化剂和具有两个或更多个巯基的化合物，以及在低温和短时间固化条件下可固化的光敏树脂组合物，具有优选的储存稳定性。解决方案：基座发生器包括用于通过电磁波照射和加热产生基座的特定结构。感光性树脂组合物包括碱发生剂，具有两个以上环氧基和/或氧杂环丁烷基的化合物和具有两个以上巯基的化合物。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2012241064A Base generator, photosensitive resin composition, pattern formation material comprising the photosensitive resin composition, and method for producing relief pattern and article using the composition 审中-公开
标题翻译：基因发生器，感光性树脂组合物，包含感光性树脂组合物的图案形成材料，以及使用该组合物制造消除图案和制品的方法
公开(公告)号：JP2012241064A
公开(公告)日：2012-12-10
申请号：JP2011110557
申请日：2011-05-17
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , AMANO HIROKO , AMAGAI YOSHITSUNA , MIYAKE ATSUYA , FUKUDA TOSHIHARU , SAKAYORI KATSUYA
IPC分类号： C09K3/00 , C07C235/34 , C07D295/16 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a base generator which is easy to purify and excellent in sensitivity, solvent solubility and affinity with a polymeric precursor to be combined therewith.SOLUTION: The base generator has a specific structure and generates a base by irradiation with electromagnetic wave and heating. The photosensitive resin composition includes: the base generator; and a polymeric precursor the reaction of which to an end product is accelerated by a basic substance, or by heating in the presence of the basic substance.
摘要翻译：要解决的问题：提供一种易于纯化的碱产生剂，并且与要与其组合的聚合物前体的灵敏度，溶剂溶解性和亲和性优异。解决方案：基座发生器具有特定的结构，并通过电磁波照射和加热产生基座。感光性树脂组合物包括：基底发生器; 以及聚合物前体，其与最终产物的反应被碱性物质加速，或通过在碱性物质存在下加热。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2012130906A Method for curing photocurable resin composition, and method of manufacturing relief pattern 审中-公开
标题翻译：光固化树脂组合物的固化方法及其制备方法
公开(公告)号：JP2012130906A
公开(公告)日：2012-07-12
申请号：JP2011259241
申请日：2011-11-28
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , FUKUDA TOSHIHARU , KAWAGUCHI KOJI , SAKAYORI KATSUYA
IPC分类号： B05D3/06 , C09D5/00 , C09D7/12 , C09D163/00 , C09D171/00 , C09D175/04 , C09D181/02 , C09D201/02 , C09K3/00
摘要： PROBLEM TO BE SOLVED: To provide a method for curing a photocurable resin composition, capable of controlling stepwisely and stably a cured condition in a desired condition and easily taking process margin; and to provide a method for making a relief pattern.SOLUTION: In the method for curing the photocurable resin composition, a base generating agent for generating a polyamine through photoisomerization reaction and intramolecular cyclization reaction by heating and a photocurable resin composition containing a specific polymer precursor are used, and storage elasticity of the resin composition at predetermined temperature is stepwisely changed by the steps 1 to 4. The method for manufacturing the relief pattern is also disclosed. A step 1 is for coating the photocurable resin composition on a base material and forming a coated film, a step 2 is for irradiating the coated film with light from the base material side or the coated film surface side, a step 3 is for heating the coated film and curing at least a part of the coated film, and a step 4 is for repeating the steps 2 and 3 to cure the coated film.
摘要翻译：要解决的问题：提供一种固化光固化性树脂组合物的方法，其能够在期望的条件下分步稳定地固化固化条件，并且容易获得加工余量; 并提供制作浮雕图案的方法。解决方案：在固化光固化性树脂组合物的方法中，使用通过光异构化反应产生多胺的基础发生剂和通过加热进行分子内环化反应和含有特定聚合物前体的光固化性树脂组合物，预定温度下的树脂组合物通过步骤1至步骤4逐步改变。还公开了浮雕图案的制造方法。步骤1是将光固化树脂组合物涂布在基材上并形成涂膜，步骤2用于从基材侧或涂膜表面侧的光照射涂布膜，步骤3用于加热涂覆膜并固化至少一部分涂膜，步骤4用于重复步骤2和3以固化涂膜。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2012082264A Tacky adhesive composition and tacky adhesive sheet 有权
标题翻译：胶粘剂组合物和粘合胶粘剂
公开(公告)号：JP2012082264A
公开(公告)日：2012-04-26
申请号：JP2010227662
申请日：2010-10-07
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KAWAGUCHI KOJI , SAKAYORI KATSUYA , TANIGUCHI TAKAHISA , UDAKA KOJUN , KATAYAMA ASAMI
IPC分类号： C09J201/06 , C09J7/00 , C09J11/06 , C09J163/00 , C09J201/00
摘要： PROBLEM TO BE SOLVED: To provide a tacky adhesive composition which can be cured at low temperature without generating an acid and has excellent workability, and in which usable life can be adjusted; and to provide a tacky adhesive sheet.SOLUTION: The tacky adhesive composition comprises: a base generating agent that generates a base by being heated after light irradiation; a curable compound that has at least one epoxy group in one molecule; and a thermoplastic resin having glass transition temperature (Tg) of -10 to 30°C. The content of the thermoplastic resin is 10-300 pts.mass based on 100 pts.mass of the curable compound.
摘要翻译：要解决的问题：提供一种可在低温下固化而不产生酸并具有优异的可加工性的粘性粘合剂组合物，并且其使用寿命可以调节; 并提供粘性粘合片。粘合剂组合物包括：通过在光照射之后被加热而产生碱的碱发生剂; 在一个分子中具有至少一个环氧基的可固化化合物; 和玻璃化转变温度（Tg）为-10〜30℃的热塑性树脂。热塑性树脂的含量为10-300质量度，基于100份可固化的化合物。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2012027364A Photosensitive resin composition and article using the same, and method for manufacturing relief pattern 有权
标题翻译：光敏树脂组合物及其使用方法，以及制造缓解图案的方法
公开(公告)号：JP2012027364A
公开(公告)日：2012-02-09
申请号：JP2010167997
申请日：2010-07-27
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： FUKUDA TOSHIHARU , SAKAYORI KATSUYA , KATAYAMA ASAMI
IPC分类号： G03F7/038 , C07D471/08 , C07F5/02 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that has high sensitivity and can obtain dissolution contrast regardless of the kind of polyimide precursors, and excellently shaped patterns while keeping a sufficient process margin as a result.SOLUTION: A photosensitive resin composition contains a compound represented by general formula [1], and polyimide precursors. (In the formula [1], Ar represents any group selected from group consisting of coumarinyl groups represented by general formula [I] and acenaphthenyl groups represented by general formula [II], and Yrepresents a specific quaternary ammonium group. Each symbol in the formulas is as defined in the specifications.)
摘要翻译：要解决的问题：提供一种具有高灵敏度并且可以获得溶解对比度的感光性树脂组合物，而不管聚酰亚胺前体的种类如何，并且具有优异的形状，同时保持足够的加工余量。光敏树脂组合物含有通式[1]表示的化合物和聚酰亚胺前体。（式[1]中，Ar表示通式[I]表示的香豆酰基和通式[II]表示的苊烯基的任意基团，Y 表示特定的季铵基，公式中的每个符号如规范中所定义。）版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2011068888A Base generator, photosensitive resin composition, pattern forming material composed of the photosensitive resin composition, pattern forming method and article using the photosensitive resin composition 有权
标题翻译：基础发生器，感光树脂组合物，形成光敏树脂组合物的图案形成材料，图案形成方法和使用感光树脂组合物的制品
公开(公告)号：JP2011068888A
公开(公告)日：2011-04-07
申请号：JP2010194315
申请日：2010-08-31
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , AMANO HIROKO , FUKUDA TOSHIHARU , SAKAYORI KATSUYA
IPC分类号： C09K3/00 , G03F7/004 , G03F7/038 , G03F7/075 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is excellent in resolution, is low-cost, and has a wide range of selection applicable to a structure of a polymer precursor of which the reaction to produce an end product is promoted by a basic substance or by heating in the presence of the basic substance, and to provide a base generator used for such a kind of photosensitive resin composition. SOLUTION: The base generator has a predetermined structure and generates a base with electromagnetic wave irradiation and heating, and the photosensitive resin composition includes the base generator and the polymer precursor of which the reaction to produce the end product is promoted by the basic substance or by heating in the presence of the basic substance. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种分辨率优异，成本低，并且具有广泛的选择范围的感光性树脂组合物，其适用于生产最终产品的反应的聚合物前体的结构由碱性物质促进，或者在碱性物质的存在下进行加热，提供用于这种感光性树脂组合物的基底发生剂。解决方案：基座发生器具有预定的结构，并产生具有电磁波照射和加热的基座，并且感光性树脂组合物包括基底发生器和产生最终产品的反应的聚合物前体由碱物质或通过在碱性物质存在下加热。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2011052214A Base generator, photosensitive resin composition, material for forming pattern including the photosensitive resin composition, and method for forming pattern, and article using the photosensitive resin composition 审中-公开
标题翻译：基因发生器，感光树脂组合物，形成图案的材料，包括感光树脂组合物，以及形成图案的方法和使用感光树脂组合物的制品
公开(公告)号：JP2011052214A
公开(公告)日：2011-03-17
申请号：JP2010176384
申请日：2010-08-05
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , FUKUDA TOSHIHARU , SAKAYORI KATSUYA
IPC分类号： C09K3/00 , C07C233/11 , C07D211/22 , C07D295/18 , G03F7/004 , G03F7/038 , G03F7/075
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in resolution, low in cost and wide in the range of an applicable choice due to a structure of a polymeric precursor facilitated with a reaction to an end product by a basic substance or by heating in the presence of the basic substance, and a base generator which can be used in such the photosensitive resin composition. SOLUTION: The base generator includes: having a specific structure; and generating a base by irradiation of an electromagnetic wave and heating. The photosensitive resin composition includes: containing the polymeric precursor facilitated with the reaction to the end product by the base generator and the basic substance, or by heating in the presence of the basic substance. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种在由于通过碱性物质与最终产物反应而促进的聚合物前体的结构的适用选择范围内的分辨率，低成本和宽范围内的光敏树脂组合物或通过在碱性物质的存在下加热，以及可用于这种感光性树脂组合物中的碱发生剂。解决方案：基座发生器包括：具有特定结构; 并通过电磁波的照射和加热产生基底。感光性树脂组合物包括：通过碱发生剂和碱性物质含有与最终产物反应促进的聚合物前体，或者在碱性物质的存在下加热。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2013194205A Base generator, photosensitive resin composition, pattern-forming material composed of the photosensitive resin composition, method for producing relief pattern by using the photosensitive resin composition, and article 审中-公开
标题翻译：基因发生器，感光性树脂组合物，由感光性树脂组合物构成的图案形成材料，使用感光性树脂组合物制造缓解图案的方法和文章
公开(公告)号：JP2013194205A
公开(公告)日：2013-09-30
申请号：JP2012065379
申请日：2012-03-22
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , AMANO HIROKO , SAKAYORI KATSUYA
IPC分类号： C09K3/00 , C07D295/18 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a base generator having excellent sensitivity and a wide application range of compounds to be combined.SOLUTION: There are provided a base generator expressed by chemical formula (1), a polymer precursor accelerating a reaction to form the final product by heating, and a photosensitive resin composition.
摘要翻译：要解决的问题：提供具有优异的灵敏度和广泛的化合物应用范围的基础发生器。组合物：提供由化学式（1）表示的基础发生器，加速反应以形成最终的聚合物前体加热产物，感光性树脂组合物。

9. 发明专利

JP2012171953A Method of producing base generating agent 有权
标题翻译：生产基质发生剂的方法
公开(公告)号：JP2012171953A
公开(公告)日：2012-09-10
申请号：JP2011038681
申请日：2011-02-24
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： TAKADA YOSHIHIRO , TSUBOI JUNICHI , MONMA YOSHINARI , KATAYAMA ASAMI , AMANO HIROKO , SAKAYORI KATSUYA
IPC分类号： C07D295/16
摘要： PROBLEM TO BE SOLVED: To provide a method of producing a base generating agent capable of producing inexpensively the highly sensitive base generating agent at a high yield in a low environmental load.SOLUTION: The method of producing the base generating agent expressed by General Formula (1) includes a process for reacting a benzaldehyde derivative expressed by General Formula (A), with an acetoamide derivative expressed by General Formula (B), in the presence of a base, in an organic solvent. In the General Formula (A), General Formula (B) and the General Formula (1), Ris hydrogen atom, or a protection group deprotected by heating and/or application of an electromagnetic wave, R, R, Rand Rare respectively independently hydrogen atoms, halogen atoms, hydroxide groups, mercapto groups, sulfide groups, silyl groups, silanol groups, nitro groups, nitroso groups, sulfino groups, sulfo groups, sulfonate groups, phosphino groups, phosphinyl groups, phosphono groups, phosphonate groups, amino groups, ammonio groups, azide groups, or organic groups, and may be same or different, R, R, Rand Rmay be coupled with two or more thereof, to form cyclic structure and may contain a coupling of hetero atom, Rand Rare respectively independently hydrogen atoms or organic groups, and may be same or different, and Rand Rmay be coupled each other to form cyclic structure and may contain a coupling of hetero atom (on condition that at least one of Rand Ris the organic group).
摘要翻译：待解决的问题：提供一种能够在低环境负荷下以高产率生产廉价地生产高敏感性碱性发生剂的碱产生剂的方法。解决方案：由通式（1）表示的碱产生剂的制造方法包括使由通式（A）表示的苯甲醛衍生物与通式（B）表示的乙酰胺衍生物反应的方法在有机溶剂中存在碱。在通式（A），通式（B）和通式（1）中，R 1是氢原子，或通过加热和/或应用脱保护的保护基团的电磁波，R 2 ，R 3 ，R 4 和卤素原子，氢氧基，巯基，硫醚基，甲硅烷基，硅烷醇基，硝基，亚硝基，亚磺酰基，磺基，磺酸酯基，膦基，氧膦基，膦酰基，膦酸酯基，氨基，氨基，叠氮基或有机基团，并且可以相同或不同，R 2 R 3 ，R 4 和R 5 可以与两个或以形成环状结构，并且可以含有杂原子的偶合，R 6分别独立地表示氢原子或orga nic组，并且可以相同或不同，并且R 6 和R 7 可以彼此耦合以形成循环结构，可以包含杂原子的偶合（条件是R 6 和R 7 中的至少一个是有机基团）。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2012077175A Curable resin composition and cured product of the same 有权
标题翻译：可固化树脂组合物及其固化产品
公开(公告)号：JP2012077175A
公开(公告)日：2012-04-19
申请号：JP2010222978
申请日：2010-09-30
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KAWAGUCHI KOJI , SAKAYORI KATSUYA , KATAYAMA ASAMI
IPC分类号： C08G59/50
摘要： PROBLEM TO BE SOLVED: To provide a curable resin composition excellent in heat resistance and a moisture permeation barrier property and to provide a cured product of the composition.SOLUTION: This curable resin composition includes a base generator for generating a base by at least light irradiation, and a curable compound having at least one or more epoxy groups in a molecule. The base generated by the base generator is represented by general formula (I). In general formula (I), Rrepresents 1-6C alkylene group or -C-R-C-, and Rrepresents phenylene group or naphthylene group.
摘要翻译：要解决的问题：提供耐热性和透湿阻隔性优异的固化性树脂组合物，提供组合物的固化物。解决方案：该可固化树脂组合物包括通过至少光照射产生碱的碱发生剂和在分子中具有至少一个或多个环氧基的可固化化合物。由基座发生器产生的基座由通式（I）表示。在通式（I）中，R 1表示1-6个碳原子的烷基或-CR 3，其中R 1， SP POS =“POST”> 2 表示亚苯基或亚萘基。版权所有（C）2012，JPO＆INPIT

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