会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明授权
    • Wind tower service lift
    • 风塔服务电梯
    • US08016268B2
    • 2011-09-13
    • US12130922
    • 2008-05-30
    • David OliphantJared QuilterTodd AndersenThomas Conroy
    • David OliphantJared QuilterTodd AndersenThomas Conroy
    • B66D1/26
    • B66B9/187
    • An apparatus used for maintaining a wind tower structure wherein the wind tower structure may have a plurality of legs and may be configured to support a wind turbine above the ground in a better position to interface with winds. The lift structure may be configured for carrying objects and have a guide system and drive system for mechanically communicating with a primary cable, rail or other first elongate member attached to the wind tower structure. The drive system and guide system may transmit forces that move the lift relative to the cable and thereby relative to the wind tower structure. A control interface may be included for controlling the amount and direction of the power into the guide system and drive system thereby causing the guide system and drive system to move the lift relative to said first elongate member such that said lift moves relative to said wind tower structure.
    • 一种用于维持风塔结构的装置,其中风塔结构可以具有多个支腿,并且可以被配置为将风力涡轮机支撑在地面上方的更好的位置以与风相接触。 提升结构可以被构造成用于携带物体,并且具有用于与附接到风塔结构的主缆索,导轨或其它第一细长构件机械地连通的导向系统和驱动系统。 驱动系统和引导系统可传递相对于电缆移动升降机并因此相对于风塔结构的力。 可以包括控制界面以控制导入系统和驱动系统的动力的数量和方向,从而导致引导系统和驱动系统相对于第一细长构件移动升降机,使得升降机相对于所述风塔移动 结构体。
    • 8. 发明申请
    • WIND TOWER SERVICE LIFT
    • 风塔服务提升
    • US20090294219A1
    • 2009-12-03
    • US12130922
    • 2008-05-30
    • David OliphantJared QuilterTodd AndersenThomas Conroy
    • David OliphantJared QuilterTodd AndersenThomas Conroy
    • B66B9/16B66B9/00B66B9/187B66B1/00
    • B66B9/187
    • An apparatus used for maintaining a wind tower structure wherein the wind tower structure may have a plurality of legs and may be configured to support a wind turbine above the ground in a better position to interface with winds. The lift structure may be configured for carrying objects and have a guide system and drive system for mechanically communicating with a primary cable, rail or other first elongate member attached to the wind tower structure. The drive system and guide system may transmit forces that move the lift relative to the cable and thereby relative to the wind tower structure. A control interface may be included for controlling the amount and direction of the power into the guide system and drive system thereby causing the guide system and drive system to move the lift relative to said first elongate member such that said lift moves relative to said wind tower structure.
    • 一种用于维持风塔结构的装置,其中风塔结构可以具有多个支腿,并且可以被配置为将风力涡轮机支撑在地面上方的更好的位置以与风相接触。 提升结构可以被构造成用于携带物体,并且具有用于与附接到风塔结构的主缆索,导轨或其它第一细长构件机械地连通的导向系统和驱动系统。 驱动系统和引导系统可传递相对于电缆移动升降机并因此相对于风塔结构的力。 可以包括控制界面,用于控制导入系统和驱动系统的动力的数量和方向,从而导致引导系统和驱动系统相对于所述第一细长构件移动升降机,使得升降机相对于所述风塔移动 结构体。
    • 9. 发明申请
    • Method for implanter angle verification and calibration
    • 注塑机角度校验和校准方法
    • US20060138355A1
    • 2006-06-29
    • US11025474
    • 2004-12-29
    • Duofeng YueJeffrey LoeweckeJieJie XuThomas Conroy
    • Duofeng YueJeffrey LoeweckeJieJie XuThomas Conroy
    • H01J37/304
    • H01L21/26513H01L22/14H01L22/20
    • Methods (300, 400) are described for calibrating the implantation angle of an ion implanter utilized in the manufacture of semiconductor products. One method (300) includes implanting (330) phosphorous ions into a pilot wafer held by a wafer platen held at a starting implantation angle in the ion implanter. The phosphorous implantation into a p-doped substrate of the pilot or blank wafer, for example, forms a semiconductive sheet. The method (300) then includes changing the implantation angle (340), and implanting another wafer (330) with phosphorous ions. The angle changing (340) and implanting (330) of other wafers continues in this manner until all wafers or angles are implanted (350) as desired. The phosphorous implanted wafers are then measured (360) with a four-point probe, for example, to obtain the sheet resistance of all the implanted wafers. The difference between the sheet resistances of the wafers at each corresponding implant angle is then obtained (370) to determine a functional relationship between the sheet resistance and the implantation angle. Finally, the functional relationship is then used to calibrate (380) the implantation angle of the implanter. For example, the lowest sheet resistance of the functional relationship may be determined, the relationship normalized to the lowest sheet resistance, then a zero degree implantation angle of the implanter is calibrated to to coincide with the lowest sheet resistance measurement.
    • 描述了用于校准在制造半导体产品中使用的离子注入机的注入角度的方法(300,400)。 一种方法(300)包括将磷离子注入到由离子注入机中以起始注入角度保持的晶片压板保持的导向晶片中。 例如,导入或空白晶片的p掺杂衬底中的磷注入形成半导体片。 然后,方法(300)包括改变注入角度(340),以及用磷离子注入另一个晶片(330)。 其他晶片的角度变化(340)和植入(330)以这种方式继续,直到根据需要植入所有晶片或角度(350)。 然后用四点探针测量磷植入的晶片(360),以获得所有植入的晶片的薄层电阻。 然后获得晶片在每个对应植入角度的薄层电阻之间的差异(370),以确定薄层电阻和注入角度之间的函数关系。 最后,功能关系用于校准(380)植入器的植入角度。 例如,可以确定功能关系的最低薄层电阻,将其与最低薄层电阻标准化的关系,然后将注入机的零度注入角度校准为与最低薄层电阻测量一致。