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1. 发明申请

WO2003067332A3 SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 审中-公开
公开(公告)号：WO2003067332A3
公开(公告)日：2003-08-14
申请号：PCT/EP2003/000821
申请日：2003-01-28
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , MURER, Peter
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , MURER, Peter
IPC分类号： G03F7/004
摘要： Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X 0 is -[CH 2 ] h -X or -CH=CH 2 ; h is 2, 3, 4, 5 or 6; R 1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R 1 , when n is 2, is for example optionally substituted phenylene or naphthylene; R 2 for example has one of the meanings of R 1 ; X is for example -OR 20 , -NR 21 R 22 , -SR 23 ; X' is -X 1 -A 3 -X 2 -; X 1 and X 2 are for example -O-, -S- or a direct bond; A 3 is e.g. phenylene; R 3 has for example one of the meanings given for R 1 ; R 4 has for example one of the meaning given for R 2 ; R 5 and R 6 e.g. are hydrogen; G i.a. is -S- or -O-; R 7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R 8 and R 9 e.g. are C 1 -C 18 alkyl; R 10 has one of the meanings given for R 7 ; R 11 i.a. is C 1 -C 18 alkyl; R 12 , R 13 , R 14 , R 15 R 16 , R 17 and R 18 for example are hydrogen or C 1 -C 18 alkyl; R 20 , R 21 , R 22 and R 23 i.a. are phenyl or C 1 -C 18 alkyl; give high resolution with good resist profile.

2. 发明申请

WO2002046507A3 ONIUM SALTS AND THE USE THEROF AS LATENT ACIDS 审中-公开
公开(公告)号：WO2002046507A3
公开(公告)日：2002-06-13
申请号：PCT/EP2001/013725
申请日：2001-11-26
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , OHWA, Masaki
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , OHWA, Masaki
IPC分类号： G03F7/004
摘要： A chemically amplified photoresist composition comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) as photosensitive acid donor, at least one compound of the formula Ia, Ib, Ic, IIb or IIc wherein R 1 is for example C 1 -C 5 alkyl, C 3 -C 30 cycloalkyl, C 1 -C 5 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 8 cycloalkenyl, C 6 -C 12 bicycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, or is a heteroaryl radical; all of which are unsubstituted or substituted; optionally some of the substituents form 5- or 6-membered rings with further substituents on the phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl ring or with one of the carbon atoms of the phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl ring; R' 1 is for example C 1 -C 12 alkylene , C 3 -C 30 cycloalkylene, phenylene, naphtylene, diphenylene, or oxydiphenylene, wherein these radicals are unsubstituted or substituted; A and B for example are a direct bond; Ar 1 and Ar 2 independently of each other for example are phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl, all of which are unsubstituted or are substituted; Ar 3 , Ar 4 and Ar 5 for example have one of the meanings given for Ar 1 and Ar 2 ; Y is for example C 3 -C 3 -C 30 cycloalkylene, phenylene, naphthylene, diphenylene, or oxydiphenylene, all of which are unsubstituted or substituted.

3. 发明申请

WO2004074242A2 HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 审中-公开
标题翻译：氢化衍生物及其作为有效酸的用途
公开(公告)号：WO2004074242A2
公开(公告)日：2004-09-02
申请号：PCT/EP2004/050096
申请日：2004-02-09
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , MURER, Peter , HINTERMANN, Tobias
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , MURER, Peter , HINTERMANN, Tobias
IPC分类号： C07D
CPC分类号： C07C251/48 , B33Y70/00 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/40 , C07D209/86 , C07D307/91 , C07D333/76 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： Compounds of the formula (I) or (II) wherein R 1 is C 1 -C 10 haloalkylsulfonyl, halobenzenesulfonyl, C 2 -C 10 haloalkanoyl, halobenzoyl; R 2 is halogen or C 1 -C 10 haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar' 1 is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D 1 -D-phenylene or -A r' 1 -A 1 -Y 1 -A 1 -A r' 1 -; wherein these radicals optionally are substituted; Ae', is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for exampfe a direct bond, -0-, -S-, or -NR 6 -; Y, inter alia is C 1 -C 18 alkylene; X is halogen; D is for example -0-, -S- or -NR 6 -; D, inter alia is C 1 -C 18 alkylene; are particularly suitable as photolatent acids in ArF resist technology.
摘要翻译：式（I）或（II）的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1例如为亚苯基，亚萘基，二亚苯基，亚杂芳基，氧联二苯基，亚苯基D-D1-D-亚苯基或-A''1-A1-Y1-A1-A' 其中这些基团任选被取代; Ae'是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部任意取代; A，是直接键合-O - ， - S-或-NR 6 - ; Y特别是C 1 -C 18亚烷基; X是卤素; D是例如-O-，-S-或-NR6-; D，特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特别适合作为光潜酸。

4. 发明申请

WO2002098870A1 SUBSTITUTED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 审中-公开
标题翻译：取代的氧化衍生物及其作为有效酸的用途
公开(公告)号：WO2002098870A1
公开(公告)日：2002-12-12
申请号：PCT/EP2002/005667
申请日：2002-05-23
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
IPC分类号： C07D333/20
CPC分类号： G03F7/0045 , B33Y70/00 , C07C309/00 , C07D333/36 , G03F7/0007 , G03F7/001 , G03F7/0382 , G03F7/0392 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oxime sulfonate compounds of the formula (I) and (II), wherein R 1 is C 1- C 12 alkyl, C 1 -C 4 haloalkyl, hydrogen, OR 9 , NR 10 R 11 , SR 12 or is phenyl which is unsubstituted or substituted by OH, C 1 -C 18 alkyl, halogen and/or C 1 -C 12 alkoxy; R 2 , R 3 , R 4 and R 5 are for example hydrogen or C 1 -C 12 alkyl; R 6 is for example is C 1 -C 18 alkylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl or phenylsulfonyl; R' 6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R 7 , R 8 and R 9 for example are hydrogen or C 1 -C 6 alkyl; R 10 and R 11 , are for example hydrogen or C 1 -C 18 alkyl; R 12 is for example hydrogen, phenyl or C 1 -C 18 alkyl; A is S, O, NR 13 , or a group of formula A1, A2 or A3, R 21 and R22 independently of one other have one of the meanings given for R 7 ; R 23 , R 24 , R 25 and R 26 independently of one another are for example hydrogen, C 1- C 4 alkyl, halogen or phenyl; Z is CR 22 or N; and Z 1 is CR 22 or N; and Z 1 is CR 22 or N; and Z 1 is CH 2- , S, O or NR 13 are particularly suitable as photo-latent acids in resist applications.
摘要翻译：式（I）和（II）的新的肟磺酸酯化合物，其中R 1是C 1 -C 12烷基，C 1 -C 4卤代烷基，氢，OR 9，NR 10 R 11，SR 12或是未取代或被OH，C 1 -C 18烷基，卤素和 /或C 1 -C 12烷氧基; R2，R3，R4和R5是例如氢或C1-C12烷基; R 6例如是C 1 -C 18烷基磺酰基，苯基-C 1 -C 3烷基磺酰基或苯基磺酰基; R 6是例如亚苯基二磺酰基或二苯基二磺酰基; R 7，R 8和R 9例如是氢或C 1 -C 6烷基; R10和R11是例如氢或C1-C18烷基; R 12例如为氢，苯基或C 1 -C 18烷基; A是S，O，NR 13或式A1，A2或A3的基团，R21和R22彼此独立地具有R7所给出的含义之一; R 23，R 24，R 25和R 26彼此独立地是例如氢，C 1 -C 4烷基，卤素或苯基; Z为CR22或N; Z1为CR22或N; Z1为CR22或N; 并且Z 1是CH 2 - ，S，O或NR 13在抗蚀剂应用中特别适合作为光潜伏酸。

5. 发明申请

WO2007147782A2 OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS 审中-公开
标题翻译： OXIME硫酸盐及其作为酸性物质的用途
公开(公告)号：WO2007147782A2
公开(公告)日：2007-12-27
申请号：PCT/EP2007/055936
申请日：2007-06-15
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , NISHIMAE, Yuichi , IWAI, Takeshi , IRIE, Makiko , NAKAYAMA, Kazuhiko
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , NISHIMAE, Yuichi , IWAI, Takeshi , IRIE, Makiko , NAKAYAMA, Kazuhiko
IPC分类号： G03F7/039 , G03F7/027 , C07C309/00 , G03C1/73
CPC分类号： G03F7/0045 , C07C309/00 , C07C2603/18 , C08F20/36 , G03F7/0046 , G03F7/0397
摘要： Compounds of the formula (I), (Il) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R' 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optinally substituted by a group of formula (IV); Ar' 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar 1 ' comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.
摘要翻译：式（I），（II）或（III）的化合物，其中R 1是例如C 1 -C 18烷基磺酰基， C 1 -C 10卤代烷基磺酰基，樟脑磺酰基，苯基-C 1 -C 3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲基磺酰基或杂芳基磺酰基，R 1'是例如亚苯基二磺酰基，R 2是例如CN，C 1 -C 10 （IV）取代的卤代烷基或C 1 -C 10 - 卤代烷基; Ar 1是例如被式（IV）基团取代的苯基; Ar'1是例如任选被式（IV）的基团取代的亚苯基; 彼此独立的A 1，A 2，A 3和A 3是例如氢，卤素，CN或C 1〜 SUB> -C _{18 烷基; D 2是例如直接键合O，（CO）O，（CO）S，SO 2，OSO 2或C < SUB> 1 -C _{18 亚烷基; 或A 3和D 2一起形成C 3〜C 30环烯基; 或者它们所连接的烯属不饱和双键的碳一起形成C 3 -C 3亚烷基， 30 环烷基; D 3和D 4，例如彼此独立地是直接键，O，S，C 1 -C 18， / SUB>亚烷基或C 3 -C 30亚环烷基，条件是基团R 2，Ar 1中的至少一个，或者是式（Ⅳ）所示的基团。适合作为光潜酸供体，并用于制备用于化学放大光致抗蚀剂的相应聚合物。}}

6. 发明申请

WO2006008250A2 OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 审中-公开
标题翻译： OXIME衍生物及其作为有用的酸的用途
公开(公告)号：WO2006008250A2
公开(公告)日：2006-01-26
申请号：PCT/EP2005/053296
申请日：2005-07-11
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , HINTERMANN, Tobias
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , HINTERMANN, Tobias
IPC分类号： C07C309/65
CPC分类号： C07C309/67 , B33Y70/00 , C07C309/65 , C07C309/73 , C07C309/74 , C07C309/75 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/66 , C07D209/86 , C07F9/097 , G03F7/0007 , G03F7/0045 , G03F7/0382 , G03F7/0392 , Y10S430/12
摘要： The invention pertain to novel photoacid generator compounds of the formula (I, II or III), Wherein R 1 is for example C 1 -C 18 alkylsulfonyl or phenylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, , naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R 1 is a group (a, b or c); X 1 , X 2 and X 3 independently of each other are O or S; R' 1 is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R 2 is halogen or C 1 -C 10 haloalkyl; X is halogen; Ar 1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar' 1 is heteroarylene, optionally substituted; R 8 , R 9 , R 10 and R 11 for example are C 1 -C 6 alkyl which is unsubstituted or substituted by halogen; or R 8 , R 9 and R 10 are phenyl which is unsubstituted or substituted by C 1 -C 4 alkyl or halogen; or R 10 and R 11 together are 1,2-phenylene or C 2 -C 6 alkylene which is unsubstituted or substituted by C 1 -C 4 alkyl or halogen.
摘要翻译：本发明涉及式（I，II或III）的新型光致酸产生剂化合物，其中R 1是例如C 1 -C 18 烷基磺酰基或苯基磺酰基，苯基-C 1 -C 3烷基磺酰基，全部任意取代的萘磺酰基，蒽磺酰基或菲基磺酰基，或R 1是一组（a，b或c）; X 1，X 2和X 3彼此独立地为O或S; R 1'是例如。亚苯基二磺酰基，亚苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，全部任选被取代; R 2是卤素或C 1 -C 10卤代烷基; X是卤素; Ar 1是例如联苯基或芴基，或者是取代的萘基; Ar'1'是亚杂芳基，任选被取代; R 8，R 9，R 10和R 11是例如C 1〜N 未取代或被卤素取代的C 1 -C 6烷基; 或R 8，R 9和R 10是未被取代或被C 1 -C 3烷基取代的苯基，烷基或卤素; 或R 10和R 11一起是1,2-亚苯基或C 2 -C 6 -C 6亚烷基，其是未取代或被C 1 -C 4烷基或卤素取代。

7. 发明公开

EP1769286A2 OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 有权
标题翻译： OXIM-DERIVATE UND IHRE VERWENDUNG ALS LATENTESÄUREN
公开(公告)号：EP1769286A2
公开(公告)日：2007-04-04
申请号：EP05774169.6
申请日：2005-07-11
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , HINTERMANN, Tobias
IPC分类号： G03F7/004 , C07C309/65 , C07C309/67 , C07C309/73 , C07C309/74 , C07C309/75 , C07C381/00 , C07D209/86 , C07F9/09 , G02B5/20
CPC分类号： C07C309/67 , B33Y70/00 , C07C309/65 , C07C309/73 , C07C309/74 , C07C309/75 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/66 , C07D209/86 , C07F9/097 , G03F7/0007 , G03F7/0045 , G03F7/0382 , G03F7/0392 , Y10S430/12
摘要： The invention pertain to novel photoacid generator compounds of the formula (I, II or III), Wherein R1 is for example C1-C18alkylsulfonyl or phenylsulfonyl, phenyl-C1-C3alkylsulfonyl, , naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R1 is a group (a, b or c); X1, X2 and X3 independently of each other are O or S; R'1 is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R2 is halogen or C1-C10haloalkyl; X is halogen; Ar1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar'1 is heteroarylene, optionally substituted; R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.
摘要翻译：本发明涉及式I，II或III的新型光致酸产生剂化合物，其中R 1为例如C 1 -C 18烷基磺酰基或苯基磺酰基，苯基-C 1 -C 3烷基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，全部任意取代，或R 1为基团X 1 ，X2和X3彼此独立地为O或S; R'1是例如苯二磺酰基，萘二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，均为任意取代的; R2是卤素或C1-C10卤代烷基; X是卤素; Ar1为例如联苯基或芴基，或为取代的萘基; Ar'1是杂亚芳基，任选被取代; R8，R9，R10和R11例如是未被取代或被卤素取代的C1-C6烷基; 或R 8，R 9和R 10为未被取代或被C 1 -C 4烷基或卤素取代的苯基; 或R 10和R 11一起是1,2-亚苯基或未被取代或被C 1 -C 4烷基或卤素取代的C 2 -C 6亚烷基。

8. 发明授权

EP1392675B1 SUBSTITUTED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译：国际海运联合会副主席
公开(公告)号：EP1392675B1
公开(公告)日：2005-02-09
申请号：EP02732733.7
申请日：2002-05-23
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
IPC分类号： C07D333/20 , C07C309/66 , C07C309/73 , C07C215/62 , G03F7/004
CPC分类号： G03F7/0045 , B33Y70/00 , C07C309/00 , C07D333/36 , G03F7/0007 , G03F7/001 , G03F7/0382 , G03F7/0392 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1-C4haloalkyl, hydrogen, OR9, NR10R11, SR12 or is phenyl which is unsubstituted or substituted by OH, C1-C18alkyl, halogen and/or C1-C12alkoxy; R2, R3, R4 and R5 are for example hydrogen or C1-C12alkyl; R6 is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl or phenylsulfonyl; R'6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R7, R8 and R9 for example are hydrogen or C1-C6alkyl; R10 and R11, are for example hydrogen or C1-C18alkyl; R12 is for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13, or a group of formula A1, A2 or A3, R21 and R22 independently of one other have one of the meanings given for R7; R23, R24, R25 and R26 independently of one another are for example hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22 or N; and Z1 is CR22 or N; and Z1 is CR22 or N; and Z1 is CH2-, S, O or NR13 are particularly suitable as photo-latent acids in resist applications.
摘要翻译：式（I）和（II）的新的肟磺酸酯化合物，其中R 1是C 1 -C 12烷基，C _{-C _{12 烷氧基; R 2，R 3，R 4和R 5是例如氢或C 1， / SUB> -C _{12 烷基; R 6是例如C 1 -C 18烷基磺酰基，苯基-C 1 -C 1 - 3烷基磺酰基或苯基磺酰基; R 6'是例如亚苯基二磺酰基或二苯基二磺酰基; R 7，R 8和R 9例如是氢或C 1 -C 6烷基， / SUB>烷基; R 10和R 11是例如氢或C 1 -C 18烷基; R 12是例如氢，苯基或C 1 -C 18烷基; A是S，O，NR 13或式A1，A2或A3的基团，R 21和R 22彼此独立地具有对R给出的含义之一 _{7 ; R 23，R 24，R 25和R 26彼此独立地是例如氢，C 1 -C 6烷基， C 1 -C 4烷基，卤素或苯基; Z是CR 22或N; 并且Z 1是CR 22或N; 并且Z 1是CR 22或N; 并且Z 1是CH 2，S，O或NR 13特别适合作为抗蚀剂应用中的光潜伏酸。}}}}

9. 发明授权

EP1124832B1 OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译： OREIMDERIVATE UND IHRE VERWENDUNG ALS LATENTESAÜRE
公开(公告)号：EP1124832B1
公开(公告)日：2002-11-20
申请号：EP99950753.6
申请日：1999-10-18
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , BIRBAUM, Jean-Luc , DIETLIKER, Kurt
IPC分类号： C07F9/11 , C07F9/17 , C07F7/10 , C07C251/58 , C07C251/62 , C07D333/36 , G03C1/73 , G03F7/004 , G03F7/075 , C08K5/45 , C08K5/521 , C08K5/5475
CPC分类号： C07C255/64 , B33Y70/00 , C07D333/36 , Y10S430/114 , Y10S430/117 , Y10S430/12
摘要： New oxime derivatives of formula (I) or (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R'1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen, phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6- or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
摘要翻译：式（I）的新肟衍生物或。（II），其中m为0或1; R1尤其是苯基，萘基，蒽基，菲基或杂芳基; R'1例如为C 2 -C 12亚烷基，亚苯基，亚萘基; R2是CN; R3是C2-C6卤代烷酰基，卤代苯甲酰基，磷酰基或有机甲硅烷基; R4，R5，R10和R11尤其是氢，C1-C6烷基，C1-C6烷氧基; R6尤其是氢苯基，C1-C12烷基; R 7和R 8尤其是氢，C 1 -C 12烷基; 或者R 7和R 8与它们所键合的氮原子一起形成5-，6-或7-元环; R 9为例如C 1 -C 12烷基; A特别是S，O，NR7a; 可用作潜酸，特别是在光致抗蚀剂中。

10. 发明公开

EP1163553A1 OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS 有权
标题翻译： OEXIMDERIVATE UND IHRE VERWENDUNG ALS PHOTOINITIATOREN
公开(公告)号：EP1163553A1
公开(公告)日：2001-12-19
申请号：EP00920439.7
申请日：2000-02-21
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： KURA, Hisatoshi , YAMATO, Hitoshi , OHWA, Masaki , DIETLIKER, Kurt
IPC分类号： G03F7/031 , C07C381/00 , C07C309/66 , C07C309/73 , C07D307/54
CPC分类号： G03F7/031 , B33Y70/00 , C07C309/66 , C07C309/73 , C07C323/57 , C07C381/00 , C07D307/66 , C07D333/36 , C07D339/08 , C07F9/097 , C07F9/655345 , C08F2/50 , Y10S430/12 , Y10S430/123
摘要： Radically photopolymerizable compositions comprising (a) at least one ethylenically unsaturated photopolymerizable compound; (b) as photoinitiator, at least one compound of formulae (I, II, III, IV, V and/or VI), wherein m is 0 or 1; n is 0, 1, 2 or 3; x is 1 or 2; R1 is inter alia phenyl, naphthyl, anthracyl or phenanthryl, a heteroaryl radical, C2-C12alkenyl, C4-C8cycloalkenyl, or C6-C12bicycloalkenyl; R'1 is inter alia C2-C12alkylene, or phenylene; R2 has one of the meanings of R1 or inter alia is phenyl; y is 1 or 2; R3 if x is 1 inter alia is C1-C18alkylsulfonyl, or phenyl-C1-C3alkylsulfonyl, R3 if x is 2, is for example C2-C12alkylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, or C1-C8alkyl; R6, R7, R8 inter alia are hydrogen, R26Y-, or phenyl; R9 inter alia is C5-C8cycloalkyl, or phenyl; A is for example -S-, -O-, or -NR10- ; Q is C1-C8-alkylene optionally interrupted by -O-; X is -O- or -NR9-; R10 inter alia is hydrogen, or phenyl; and (c) at least one coinitiator; are especially suitable for the preparation of colour filter systems.
摘要翻译：自由基光聚合组合物，其包含（a）至少一种烯属不饱和光聚合化合物; （b）作为光引发剂，至少一种式I，II，III和/或IV的化合物，其中m为0或1; n为0,1,2或3; x为1或2; R 1特别是苯基，萘基，蒽基或菲基，杂芳基，C 2 -C 12烯基，C 4 -C 8环烯基或C 6 -C 12双环烯基; R'1特别是C 2 -C 12亚烷基或亚苯基; R 2具有R 1的含义或特别是苯基; y为1或2; R 3如果x是1，特别是C 1 -C 18烷基磺酰基或苯基-C 1 -C 3烷基磺酰基，如果x是2，R 3是例如C 2 -C 12亚烷基二磺酰基; R 4和R 5特别是氢，卤素或C 1 -C 8烷基; A是例如-S-，-O-或-NR 10 - ; R 10尤其是氢或苯基; 和（c）至少一种共引发剂; 特别适用于制备滤色器系统。

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