专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2007147782A2 OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS 审中-公开
标题翻译： OXIME硫酸盐及其作为酸性物质的用途
公开(公告)号：WO2007147782A2
公开(公告)日：2007-12-27
申请号：PCT/EP2007/055936
申请日：2007-06-15
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , NISHIMAE, Yuichi , IWAI, Takeshi , IRIE, Makiko , NAKAYAMA, Kazuhiko
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , NISHIMAE, Yuichi , IWAI, Takeshi , IRIE, Makiko , NAKAYAMA, Kazuhiko
IPC分类号： G03F7/039 , G03F7/027 , C07C309/00 , G03C1/73
CPC分类号： G03F7/0045 , C07C309/00 , C07C2603/18 , C08F20/36 , G03F7/0046 , G03F7/0397
摘要： Compounds of the formula (I), (Il) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R' 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optinally substituted by a group of formula (IV); Ar' 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar 1 ' comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.
摘要翻译：式（I），（II）或（III）的化合物，其中R 1是例如C 1 -C 18烷基磺酰基， C 1 -C 10卤代烷基磺酰基，樟脑磺酰基，苯基-C 1 -C 3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲基磺酰基或杂芳基磺酰基，R 1'是例如亚苯基二磺酰基，R 2是例如CN，C 1 -C 10 （IV）取代的卤代烷基或C 1 -C 10 - 卤代烷基; Ar 1是例如被式（IV）基团取代的苯基; Ar'1是例如任选被式（IV）的基团取代的亚苯基; 彼此独立的A 1，A 2，A 3和A 3是例如氢，卤素，CN或C 1〜 SUB> -C _{18 烷基; D 2是例如直接键合O，（CO）O，（CO）S，SO 2，OSO 2或C < SUB> 1 -C _{18 亚烷基; 或A 3和D 2一起形成C 3〜C 30环烯基; 或者它们所连接的烯属不饱和双键的碳一起形成C 3 -C 3亚烷基， 30 环烷基; D 3和D 4，例如彼此独立地是直接键，O，S，C 1 -C 18， / SUB>亚烷基或C 3 -C 30亚环烷基，条件是基团R 2，Ar 1中的至少一个，或者是式（Ⅳ）所示的基团。适合作为光潜酸供体，并用于制备用于化学放大光致抗蚀剂的相应聚合物。}}

2. 发明申请

WO2003067332A3 SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 审中-公开
公开(公告)号：WO2003067332A3
公开(公告)日：2003-08-14
申请号：PCT/EP2003/000821
申请日：2003-01-28
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , MURER, Peter
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , MURER, Peter
IPC分类号： G03F7/004
摘要： Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X 0 is -[CH 2 ] h -X or -CH=CH 2 ; h is 2, 3, 4, 5 or 6; R 1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R 1 , when n is 2, is for example optionally substituted phenylene or naphthylene; R 2 for example has one of the meanings of R 1 ; X is for example -OR 20 , -NR 21 R 22 , -SR 23 ; X' is -X 1 -A 3 -X 2 -; X 1 and X 2 are for example -O-, -S- or a direct bond; A 3 is e.g. phenylene; R 3 has for example one of the meanings given for R 1 ; R 4 has for example one of the meaning given for R 2 ; R 5 and R 6 e.g. are hydrogen; G i.a. is -S- or -O-; R 7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R 8 and R 9 e.g. are C 1 -C 18 alkyl; R 10 has one of the meanings given for R 7 ; R 11 i.a. is C 1 -C 18 alkyl; R 12 , R 13 , R 14 , R 15 R 16 , R 17 and R 18 for example are hydrogen or C 1 -C 18 alkyl; R 20 , R 21 , R 22 and R 23 i.a. are phenyl or C 1 -C 18 alkyl; give high resolution with good resist profile.

3. 发明申请

WO2002046507A3 ONIUM SALTS AND THE USE THEROF AS LATENT ACIDS 审中-公开
公开(公告)号：WO2002046507A3
公开(公告)日：2002-06-13
申请号：PCT/EP2001/013725
申请日：2001-11-26
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , OHWA, Masaki
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , OHWA, Masaki
IPC分类号： G03F7/004
摘要： A chemically amplified photoresist composition comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) as photosensitive acid donor, at least one compound of the formula Ia, Ib, Ic, IIb or IIc wherein R 1 is for example C 1 -C 5 alkyl, C 3 -C 30 cycloalkyl, C 1 -C 5 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 8 cycloalkenyl, C 6 -C 12 bicycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, or is a heteroaryl radical; all of which are unsubstituted or substituted; optionally some of the substituents form 5- or 6-membered rings with further substituents on the phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl ring or with one of the carbon atoms of the phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl ring; R' 1 is for example C 1 -C 12 alkylene , C 3 -C 30 cycloalkylene, phenylene, naphtylene, diphenylene, or oxydiphenylene, wherein these radicals are unsubstituted or substituted; A and B for example are a direct bond; Ar 1 and Ar 2 independently of each other for example are phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl, all of which are unsubstituted or are substituted; Ar 3 , Ar 4 and Ar 5 for example have one of the meanings given for Ar 1 and Ar 2 ; Y is for example C 3 -C 3 -C 30 cycloalkylene, phenylene, naphthylene, diphenylene, or oxydiphenylene, all of which are unsubstituted or substituted.

4. 发明申请

WO2006008250A2 OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 审中-公开
标题翻译： OXIME衍生物及其作为有用的酸的用途
公开(公告)号：WO2006008250A2
公开(公告)日：2006-01-26
申请号：PCT/EP2005/053296
申请日：2005-07-11
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , HINTERMANN, Tobias
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , HINTERMANN, Tobias
IPC分类号： C07C309/65
CPC分类号： C07C309/67 , B33Y70/00 , C07C309/65 , C07C309/73 , C07C309/74 , C07C309/75 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/66 , C07D209/86 , C07F9/097 , G03F7/0007 , G03F7/0045 , G03F7/0382 , G03F7/0392 , Y10S430/12
摘要： The invention pertain to novel photoacid generator compounds of the formula (I, II or III), Wherein R 1 is for example C 1 -C 18 alkylsulfonyl or phenylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, , naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R 1 is a group (a, b or c); X 1 , X 2 and X 3 independently of each other are O or S; R' 1 is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R 2 is halogen or C 1 -C 10 haloalkyl; X is halogen; Ar 1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar' 1 is heteroarylene, optionally substituted; R 8 , R 9 , R 10 and R 11 for example are C 1 -C 6 alkyl which is unsubstituted or substituted by halogen; or R 8 , R 9 and R 10 are phenyl which is unsubstituted or substituted by C 1 -C 4 alkyl or halogen; or R 10 and R 11 together are 1,2-phenylene or C 2 -C 6 alkylene which is unsubstituted or substituted by C 1 -C 4 alkyl or halogen.
摘要翻译：本发明涉及式（I，II或III）的新型光致酸产生剂化合物，其中R 1是例如C 1 -C 18 烷基磺酰基或苯基磺酰基，苯基-C 1 -C 3烷基磺酰基，全部任意取代的萘磺酰基，蒽磺酰基或菲基磺酰基，或R 1是一组（a，b或c）; X 1，X 2和X 3彼此独立地为O或S; R 1'是例如。亚苯基二磺酰基，亚苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，全部任选被取代; R 2是卤素或C 1 -C 10卤代烷基; X是卤素; Ar 1是例如联苯基或芴基，或者是取代的萘基; Ar'1'是亚杂芳基，任选被取代; R 8，R 9，R 10和R 11是例如C 1〜N 未取代或被卤素取代的C 1 -C 6烷基; 或R 8，R 9和R 10是未被取代或被C 1 -C 3烷基取代的苯基，烷基或卤素; 或R 10和R 11一起是1,2-亚苯基或C 2 -C 6 -C 6亚烷基，其是未取代或被C 1 -C 4烷基或卤素取代。

5. 发明申请

WO2004074242A2 HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 审中-公开
标题翻译：氢化衍生物及其作为有效酸的用途
公开(公告)号：WO2004074242A2
公开(公告)日：2004-09-02
申请号：PCT/EP2004/050096
申请日：2004-02-09
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , MURER, Peter , HINTERMANN, Tobias
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , MURER, Peter , HINTERMANN, Tobias
IPC分类号： C07D
CPC分类号： C07C251/48 , B33Y70/00 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/40 , C07D209/86 , C07D307/91 , C07D333/76 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： Compounds of the formula (I) or (II) wherein R 1 is C 1 -C 10 haloalkylsulfonyl, halobenzenesulfonyl, C 2 -C 10 haloalkanoyl, halobenzoyl; R 2 is halogen or C 1 -C 10 haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar' 1 is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D 1 -D-phenylene or -A r' 1 -A 1 -Y 1 -A 1 -A r' 1 -; wherein these radicals optionally are substituted; Ae', is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for exampfe a direct bond, -0-, -S-, or -NR 6 -; Y, inter alia is C 1 -C 18 alkylene; X is halogen; D is for example -0-, -S- or -NR 6 -; D, inter alia is C 1 -C 18 alkylene; are particularly suitable as photolatent acids in ArF resist technology.
摘要翻译：式（I）或（II）的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1例如为亚苯基，亚萘基，二亚苯基，亚杂芳基，氧联二苯基，亚苯基D-D1-D-亚苯基或-A''1-A1-Y1-A1-A' 其中这些基团任选被取代; Ae'是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部任意取代; A，是直接键合-O - ， - S-或-NR 6 - ; Y特别是C 1 -C 18亚烷基; X是卤素; D是例如-O-，-S-或-NR6-; D，特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特别适合作为光潜酸。

6. 发明申请

WO2002098870A1 SUBSTITUTED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 审中-公开
标题翻译：取代的氧化衍生物及其作为有效酸的用途
公开(公告)号：WO2002098870A1
公开(公告)日：2002-12-12
申请号：PCT/EP2002/005667
申请日：2002-05-23
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
IPC分类号： C07D333/20
CPC分类号： G03F7/0045 , B33Y70/00 , C07C309/00 , C07D333/36 , G03F7/0007 , G03F7/001 , G03F7/0382 , G03F7/0392 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oxime sulfonate compounds of the formula (I) and (II), wherein R 1 is C 1- C 12 alkyl, C 1 -C 4 haloalkyl, hydrogen, OR 9 , NR 10 R 11 , SR 12 or is phenyl which is unsubstituted or substituted by OH, C 1 -C 18 alkyl, halogen and/or C 1 -C 12 alkoxy; R 2 , R 3 , R 4 and R 5 are for example hydrogen or C 1 -C 12 alkyl; R 6 is for example is C 1 -C 18 alkylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl or phenylsulfonyl; R' 6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R 7 , R 8 and R 9 for example are hydrogen or C 1 -C 6 alkyl; R 10 and R 11 , are for example hydrogen or C 1 -C 18 alkyl; R 12 is for example hydrogen, phenyl or C 1 -C 18 alkyl; A is S, O, NR 13 , or a group of formula A1, A2 or A3, R 21 and R22 independently of one other have one of the meanings given for R 7 ; R 23 , R 24 , R 25 and R 26 independently of one another are for example hydrogen, C 1- C 4 alkyl, halogen or phenyl; Z is CR 22 or N; and Z 1 is CR 22 or N; and Z 1 is CR 22 or N; and Z 1 is CH 2- , S, O or NR 13 are particularly suitable as photo-latent acids in resist applications.
摘要翻译：式（I）和（II）的新的肟磺酸酯化合物，其中R 1是C 1 -C 12烷基，C 1 -C 4卤代烷基，氢，OR 9，NR 10 R 11，SR 12或是未取代或被OH，C 1 -C 18烷基，卤素和 /或C 1 -C 12烷氧基; R2，R3，R4和R5是例如氢或C1-C12烷基; R 6例如是C 1 -C 18烷基磺酰基，苯基-C 1 -C 3烷基磺酰基或苯基磺酰基; R 6是例如亚苯基二磺酰基或二苯基二磺酰基; R 7，R 8和R 9例如是氢或C 1 -C 6烷基; R10和R11是例如氢或C1-C18烷基; R 12例如为氢，苯基或C 1 -C 18烷基; A是S，O，NR 13或式A1，A2或A3的基团，R21和R22彼此独立地具有R7所给出的含义之一; R 23，R 24，R 25和R 26彼此独立地是例如氢，C 1 -C 4烷基，卤素或苯基; Z为CR22或N; Z1为CR22或N; Z1为CR22或N; 并且Z 1是CH 2 - ，S，O或NR 13在抗蚀剂应用中特别适合作为光潜伏酸。

7. 发明申请

WO2009150074A1 SULFONIUM DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 审中-公开
标题翻译：磺胺衍生物及其作为有效酸的用途
公开(公告)号：WO2009150074A1
公开(公告)日：2009-12-17
申请号：PCT/EP2009/056703
申请日：2009-06-02
申请人： BASF SE , NISHIMAE, Yuichi , ASAKURA, Toshikage , YAMATO, Hitoshi
发明人： NISHIMAE, Yuichi , ASAKURA, Toshikage , YAMATO, Hitoshi
IPC分类号： C07D327/08 , C07D339/08 , G03F7/00
CPC分类号： C07D339/08 , C07D327/08
摘要： Compounds of the formula (I), wherein R 1 , R 2 and R 3 for example are hydrogen, halogen, CN, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, (CO)R 8 , (CO)OR 4 , or (CO)NR 5 R 6 ; Y is O, S or CO; D 2 , D 3 and D 4 for example are a direct bond, O, S, NR 7 , CO, O(CO), (CO)O, S(CO), (CO)S, NR 7 (CO), (CO)NR 7 , SO, SO 2 , or OSO 2 , C 1 -C 18 alkylene, C 3 -C 30 cycloalkylene, C 2 -C 12 alkenylene, C 4 -C 30 cycloalkenylene, Ar 1 ; Ar 1 , Ar 2 and Ar 3 are for example phenylene, R 4 , R 5 , R 6 , R 7 and R 8 are for example hydrogen, C 3 -C 30 cycloalkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 C 3 -alkyl; X - is Formulae (IA), (IB) or (IC); R 10 is for example C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, camphoryl, phenyl-C 1 -C 3 alkyl, C 3 -C 30 cycloalkyl; and R 11 , R 12 , R 13 , R 14 and R 15 are for example C 1 -C 10 haloalkyl; are useful as polymerizable photolatent acids.
摘要翻译：式（I）化合物，其中R1，R2和R3例如是氢，卤素，CN，C1-C18烷基，C1-C10卤代烷基，（CO）R8，（CO）OR4或（CO）NR5R6; Y为O，S或CO; D2，D3和D4例如是直接键合，O，S，NR7，CO，O（CO），（CO）O，S（CO），（CO）S，NR7（CO） SO，SO 2或OSO 2，C 1 -C 18亚烷基，C 3 -C 30亚环烷基，C 2 -C 12亚烯基，C 4 -C 30环亚烯基，Ar 1; Ar 1，Ar 2和Ar 3是例如亚苯基，R 4，R 5，R 6，R 7和R 8是例如氢，C 3 -C 30环烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基; X-是式（IA），（IB）或（IC）; R 10例如为C 1 -C 18烷基，C 1 -C 10卤代烷基，樟脑基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基; R 11，R 12，R 13，R 14和R 15例如为C 1 -C 10卤代烷基; 可用作可聚合的光潜酸。

8. 发明申请

WO2011104127A1 LATENT ACIDS AND THEIR USE 审中-公开
标题翻译：专利酸及其使用
公开(公告)号：WO2011104127A1
公开(公告)日：2011-09-01
申请号：PCT/EP2011/051995
申请日：2011-02-10
申请人： BASF SE , YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , TANAKA, Keita , NISHIMAE, Yuichi
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , TANAKA, Keita , NISHIMAE, Yuichi
IPC分类号： C07C309/08 , C07C309/12 , C07C311/53 , C07C333/06 , C07C381/12 , C07C25/18 , G03F7/004 , G03F7/039 , C07D209/00 , C07D241/00 , C07D265/00 , C07D311/00 , C07D235/00
CPC分类号： C07C381/12 , C07C25/18 , C07C309/08 , C07C309/12 , C07C311/53 , C07C333/06 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D207/28 , C07D233/38 , C07D241/08 , C07D295/205 , C07D295/215 , C07D493/08 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： The invention pertains to a compound generating an acid of the formula (I) or (II), for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes, Formula (I) and Formula (II), wherein X is CH 2 or CO; Y is O, NR 4 , S, O(CO), O(CO)O, O(CO)NR 4 , OSO 2 , O(CS), or O(CS)NR 4 ; R 1 is for example C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 2 -C 18 alkyl, interrupted C 3 -C 30 cycloalkyl, interrupted C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 4 -C 30 cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R 1 is NR 12 R 13 ; R 2 and R 3 are for example C 3 -C 30 cycloalkylene, C 3 -C 30 cycloalkyl-C 1 -C 18 alkylene, C 1 -C 18 alkylene, C 1 -C 10 haloalkylene, C 2 -C 12 alkenylene, C 4 -C 30 cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R 4 is for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl; R 12 and R 13 are for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, Ar, (CO)R 15 , (CO)OR 15 or SO 2 R 15 ; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.
摘要翻译：本发明涉及产生式（I）或（II）的酸的化合物，例如相应的锍盐和碘鎓盐，以及相应的磺酰肟，式（I）和式（II），其中X是CH 2或CO ; Y是O，NR4，S，O（CO），O（CO）O，O（CO）NR4，OSO2，O（CS）或O（CS）NR4; R 1是例如C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，间断的C 2 -C 18烷基，间断的C 3 -C 30环烷基，间断的C 3 -C 30环烷基-C 1 -C 18烷基，间断的C 4 -C 30环烯基，苯基，萘基，蒽基，菲基，联苯基，芴基或杂芳基，全部未取代或被取代; 或R1是NR12R13; R2和R3是例如C 3 -C 30亚环烷基，C 3 -C 30环烷基-C 1 -C 18亚烷基，C 1 -C 18亚烷基，C 1 -C 10卤代亚烷基，C 2 -C 12亚烯基，C 4 -C 30环亚烯基，亚苯基，亚萘基，亚蒽基，亚菲基，亚联苯基或亚杂芳基。全部未取代或取代; R4是例如C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12链烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基; R 12和R 13例如为C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基，Ar，（CO）R 15 CO）OR15或SO2R15; 并且Ar是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，全部是未取代或取代的。

9. 发明申请

WO2010046240A1 SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 审中-公开
标题翻译：磺胺衍生物及其作为酸性物质的用途
公开(公告)号：WO2010046240A1
公开(公告)日：2010-04-29
申请号：PCT/EP2009/063095
申请日：2009-10-08
申请人： BASF SE , YAMATO, Hitoshi , ASAKURA, Toshikage , NISHIMAE, Yuichi
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , NISHIMAE, Yuichi
IPC分类号： C07C381/12 , G03F7/00
CPC分类号： C07C381/12 , C07C317/04 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0392 , Y10S430/122 , Y10S430/123 , Y10S430/124 , Y10S430/125 , Y10S430/126
摘要： Compounds of the formula (I), wherein Ar 1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar 2 and Ar 3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar 1 and Ar 2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C 3 -C 30 cycloalkyl or C 1 -C 18 alkyl; and R 1 , R 2 and R 3 independently of each other are for example C 1 -C 10 haloalkyl; are effective photoacid generators (PAG).
摘要翻译：式（I）的化合物，其中Ar1为未取代或取代的亚苯基或亚联苯; Ar2和Ar3例如彼此独立地为苯基，萘基，联苯基或杂芳基，全部为取代基; 或Ar1和Ar2与直接键O，S或（CO）一起形成稠环体系; R是例如氢，C 3 -C 30环烷基或C 1 -C 18烷基; 并且R 1，R 2和R 3彼此独立地是例如C 1 -C 10卤代烷基; 是有效的光酸产生剂（PAG）。

10. 发明申请

WO2009047105A1 SULPHONIUM SALT INITIATORS 审中-公开
标题翻译：硫酸钡发射器
公开(公告)号：WO2009047105A1
公开(公告)日：2009-04-16
申请号：PCT/EP2008/062587
申请日：2008-09-22
申请人： CIBA HOLDING INC. , HAYOZ, Pascal , YAMATO, Hitoshi , ASAKURA, Toshikage
发明人： HAYOZ, Pascal , YAMATO, Hitoshi , ASAKURA, Toshikage
IPC分类号： C07D307/83 , C07D333/22 , C07D333/32 , C07D333/34 , C07D333/64 , G03F7/004
CPC分类号： C07D307/83 , B33Y70/00 , C07D307/82 , C07D333/22 , C07D333/32 , C07D333/34 , C07D333/64
摘要： Compounds of the Formula (I), wherein L 1 , L' 1 , L" 1 , L 2 , L' 2 , L" 2 , L 3 , L' 3 , L" 3 , L 4 , L' 4 and L" 4 for example are hydrogen or COT; R, R' and R" for example are hydrogen,C 6 -C 12 aryl or C 3 -C 20 heteroaryl; X, X' and X" for exampleare O, S, single bond, NR a or NCOR a , T is for example hydrogen, C 1 -C 20 alkyl, C 3 -C 12 cycloalkyl, C 2 - C 20 alkenyl, C 5 -C 12 cycloalkenyl, C 7 -C 18 cycloalkylenaryl, C 5 -C 18 cycloalkylenheteroaryl, C 6 - C 14 aryl, providedthat at least one of R, R' or R" is unsubstitutedor substituted C 3 - C 20 heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：例如式（I）的化合物，其中L1，L 1，L“1，L2，L'2，L”2，L3，L'3，L“3，L4，L'4和L”4 是氢或COT; 例如R，R'和R“为氢，C 6 -C 12芳基或C 3 -C 20杂芳基; X，X'和X”例如为O，S，单键，NR a或NCOR a，T为例如氢，C 1 -C 20烷基， C 1 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 7 -C 18环亚烷基芳基，C 5 -C 18环烷基杂芳基，C 6 -C 14芳基，其中R，R'或R“中的至少一个为未取代或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子;适合作为光潜酸产生剂。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式