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1. 发明授权

US06696227B2 Shift multi-exposure method 有权
标题翻译：移位多曝光法
公开(公告)号：US06696227B2
公开(公告)日：2004-02-24
申请号：US10016893
申请日：2001-12-13
申请人： Chung-Wei Hsu , Ron-Fu Chu
发明人： Chung-Wei Hsu , Ron-Fu Chu
IPC分类号： G03F720
CPC分类号： G03F7/70466
摘要： The present invention provides a shift multi-exposure method for defining a regular pattern by a photomask. The method comprises the following steps. First, a photoresist layer comprising a first region and a second region is formed on a substrate. Then, a first pattern is defined on the first region by the photomask. Next, the photomask is moved a predetermined distance, and a second pattern is defined on the second region by the photomask. Finally, development is performed to display the first pattern and the second pattern on the photoresist layer.
摘要翻译：本发明提供一种用于通过光掩模定义规则图案的偏移多曝光方法。该方法包括以下步骤。首先，在基板上形成包括第一区域和第二区域的光致抗蚀剂层。然后，通过光掩模在第一区域上定义第一图案。接下来，将光掩模移动预定距离，并且通过光掩模在第二区域上限定第二图案。最后，进行显影以在光致抗蚀剂层上显示第一图案和第二图案。

2. 发明申请

US20110026634A1 WIRELESS TRANSMITTER AND RELATED MULTIMEDIA SYSTEM 有权
标题翻译：无线发射机及相关多媒体系统
公开(公告)号：US20110026634A1
公开(公告)日：2011-02-03
申请号：US12828233
申请日：2010-06-30
申请人： Cheng-Hsiung Hsu , Chung-Wei Hsu , Cheng-Yen Wen , Chun-Chia Kuo
发明人： Cheng-Hsiung Hsu , Chung-Wei Hsu , Cheng-Yen Wen , Chun-Chia Kuo
IPC分类号： H04L27/10 , H04L25/03
CPC分类号： H04L27/10 , H04B1/3822
摘要： A wireless transmitter includes a first filtering unit coupled to a first cable for outputting a first DC source transmitted on the first cable, a first power converting unit for converting the first DC source into a second DC source, a second filtering unit for eliminating noise in the second DC source, a first DC blocking unit for blocking the second DC source and outputting a second frequency modulation (FM) signal, an amplifier for amplifying the second FM signal to generate a first FM signal, and a second DC blocking unit coupled to the amplifier and the first cable, for outputting the first FM signal to the first cable, such that the first FM signal is transmitted to the air through the first cable as a transmitting antenna.
摘要翻译：无线发射机包括耦合到第一电缆的第一滤波单元，用于输出在第一电缆上传输的第一直流电源，第一电力转换单元，用于将第一直流电源转换为第二直流电源;第二滤波单元，第二DC源，用于阻断第二DC源并输出第二频率调制（FM）信号的第一DC阻断单元，用于放大第二FM信号以产生第一FM信号的放大器，以及耦合到放大器和第一电缆，用于将第一FM信号输出到第一电缆，使得第一FM信号作为发射天线通过第一电缆传输到空气。

3. 发明申请

US20080014509A1 Method for improved manufacturability and patterning of sub-wavelength contact hole mask 失效
标题翻译：改进亚波长接触孔掩模的可制造性和图案化的方法
公开(公告)号：US20080014509A1
公开(公告)日：2008-01-17
申请号：US11647599
申请日：2006-12-29
申请人： Chung-Wei Hsu , Douglas Van Den Broeke , Jang Chen
发明人： Chung-Wei Hsu , Douglas Van Den Broeke , Jang Chen
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： A method of applying optical proximity correction features to a mask having a target pattern comprising a plurality of features to be imaged. The method includes the steps of defining a set of process parameters to be utilized to image the mask; determining an interference map based on the process parameters and the target pattern; defining an area of influence which represents the area about a given feature in the target pattern in which scattering bars will be utilized in the mask; and disposing a scattering bar in the mask adjacent the given feature in a location indicated by said interference map only within the area of influence of the given feature.
摘要翻译：一种将光学邻近校正特征应用于具有包括要成像的多个特征的目标图案的掩模的方法。该方法包括以下步骤：定义要用于对掩模进行成像的一组过程参数; 基于过程参数和目标模式确定干涉图; 定义影响区域，其表示在掩模中将使用散射条的目标图案中的给定特征的区域; 以及仅在给定特征的影响区域内，在由所述干涉图指示的位置中的与给定特征相邻的掩模中布置散射条。

4. 发明授权

US06605393B2 Alternative PSM with new phase conflict canceling method 有权
标题翻译：具有新相位冲突消除方法的替代PSM
公开(公告)号：US06605393B2
公开(公告)日：2003-08-12
申请号：US09847485
申请日：2001-05-02
申请人： Chung-Wei Hsu
发明人： Chung-Wei Hsu
IPC分类号： G03F900
CPC分类号： G03F1/30 , G03F1/28
摘要： An alternative PSM, including: a first transparent region in 0 degree phase, formed on the surface of a transparent substrate; and a second transparent region in 180 degree phase, constructed of a concave portion of the transparent substrate. The first transparent region and the second transparent region are alternatively arranged. A third transparent region in 85-95 degree phase, constructed of a translucent layer, is formed on the border between the first transparent region and the second transparent region. The third transparent region in 85-95 degree phase used as a light intensity buffer so as to effectively cancel phase conflict.
摘要翻译：一种替代的PSM，包括：形成在透明基板的表面上的0度相位的第一透明区域; 以及由透明基板的凹部构成的180度相位的第二透明区域。交替布置第一透明区域和第二透明区域。在第一透明区域和第二透明区域之间的边界上形成由半透明层构成的85-95度相位的第三透明区域。 85-95度相位的第三透明区域用作光强度缓冲区，以有效地消除相位冲突。

5. 发明授权

US08442438B2 Wireless transmitter and related multimedia system 有权
标题翻译：无线发射机及相关多媒体系统
公开(公告)号：US08442438B2
公开(公告)日：2013-05-14
申请号：US12828233
申请日：2010-06-30
申请人： Cheng-Hsiung Hsu , Chung-Wei Hsu , Cheng-Yen Wen , Chun-Chia Kuo
发明人： Cheng-Hsiung Hsu , Chung-Wei Hsu , Cheng-Yen Wen , Chun-Chia Kuo
IPC分类号： H04B1/00
CPC分类号： H04L27/10 , H04B1/3822
摘要： A wireless transmitter includes a first filtering unit coupled to a first cable for outputting a first DC source transmitted on the first cable, a first power converting unit for converting the first DC source into a second DC source, a second filtering unit for eliminating noise in the second DC source, a first DC blocking unit for blocking the second DC source and outputting a second frequency modulation (FM) signal, an amplifier for amplifying the second FM signal to generate a first FM signal, and a second DC blocking unit coupled to the amplifier and the first cable, for outputting the first FM signal to the first cable, such that the first FM signal is transmitted to the air through the first cable as a transmitting antenna.
摘要翻译：无线发射机包括耦合到第一电缆的第一滤波单元，用于输出在第一电缆上传输的第一直流电源，第一电力转换单元，用于将第一直流电源转换为第二直流电源;第二滤波单元，第二DC源，用于阻断第二DC源并输出第二频率调制（FM）信号的第一DC阻断单元，用于放大第二FM信号以产生第一FM信号的放大器，以及耦合到放大器和第一电缆，用于将第一FM信号输出到第一电缆，使得第一FM信号作为发射天线通过第一电缆传输到空气。

6. 发明授权

US08266834B2 Display frame and support unit thereof 有权
标题翻译：显示框架及其支撑单元
公开(公告)号：US08266834B2
公开(公告)日：2012-09-18
申请号：US12852823
申请日：2010-08-09
申请人： Chun-Lung Chen , Kuei-Lai Huang , Chung-Wei Hsu , Kai-Teng Cheng
发明人： Chun-Lung Chen , Kuei-Lai Huang , Chung-Wei Hsu , Kai-Teng Cheng
IPC分类号： E04G3/00
CPC分类号： F16M11/10 , F16M13/00 , F16M2200/04
摘要： The instant disclosure provides a photo-frame-type display and a support unit thereof. The display has a display frame unit having a bottom portion disposable on a working surface. The support unit comprises a connecting base unit fixedly disposed to the back of the display frame unit, an inclining module pivotally coupled to the connecting base unit, and a rebounding module on the back of the display frame unit in elastic connection with the inclining module. The photo-frame-type display may be disposed on a tabletop in a fashion resembling a traditional photo frame, and the support unit is capable of steadily sustaining the display frame unit in a steep inclining configuration suitable for touch-screen/handwriting operations.
摘要翻译：本公开提供了一种相框型显示器及其支撑单元。显示器具有显示框架单元，其具有在工作表面上一次性的底部部分。支撑单元包括固定地设置在显示框单元背面的连接基座单元，可枢转地连接到连接基座单元的倾斜模块和与倾斜模块弹性连接的显示框单元背面的回弹模块。照相框式显示器可以类似于传统相框的方式设置在桌面上，并且支持单元能够以适合于触摸屏/手写操作的陡倾斜配置稳定地维持显示框单元。

7. 发明授权

US07614034B2 Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology 失效
标题翻译：使用接口映射技术生成用于放置散射条特征的OPC规则的方法和装置
公开(公告)号：US07614034B2
公开(公告)日：2009-11-03
申请号：US11594248
申请日：2006-11-08
申请人： Douglas Van Den Broeke , Sangbong Park , Chung-Wei Hsu , Jang Fung Chen
发明人： Douglas Van Den Broeke , Sangbong Park , Chung-Wei Hsu , Jang Fung Chen
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： G03F1/36
摘要： A method of applying optical proximity correction features to a mask having a plurality of features to be imaged. The method includes the steps of defining a set of process parameters to be utilized to image the mask; defining a set of pitch ranges corresponding to pitches exhibited by the plurality of features to be imaged; determining an interference map for at least one of the pitch ranges; and generating a set of rules for positioning scattering bars adjacent the plurality of features based on the interference map, where the set of rules governs scattering bar placement for features having a pitch which falls within the pitch range utilized to generate the interference map.
摘要翻译：将光学邻近校正特征应用于具有要成像的多个特征的掩模的方法。该方法包括以下步骤：定义要用于对掩模进行成像的一组过程参数; 定义对应于待成像的多个特征所展示的间距的一组音调范围; 确定所述音高范围中的至少一个的干涉图; 以及基于所述干涉图来生成用于定位与所述多个特征相邻的散射条的一组规则，其中所述规则集合管理具有落在用于生成所述干涉图的所述音调范围内的音调的特征的散射棒放置。

8. 发明授权

US07604909B2 Method for improved manufacturability and patterning of sub-wavelength contact hole mask 失效
标题翻译：改进亚波长接触孔掩模的可制造性和图案化的方法
公开(公告)号：US07604909B2
公开(公告)日：2009-10-20
申请号：US11647599
申请日：2006-12-29
申请人： Chung-Wei Hsu , Douglas Van Den Broeke , Jang Fung Chen
发明人： Chung-Wei Hsu , Douglas Van Den Broeke , Jang Fung Chen
IPC分类号： G03F1/00 , G03F5/00
CPC分类号： G03F1/36
摘要： A method of applying optical proximity correction features to a mask having a target pattern comprising a plurality of features to be imaged. The method includes the steps of defining a set of process parameters to be utilized to image the mask; determining an interference map based on the process parameters and the target pattern; defining an area of influence which represents the area about a given feature in the target pattern in which scattering bars will be utilized in the mask; and disposing a scattering bar in the mask adjacent the given feature in a location indicated by said interference map only within the area of influence of the given feature.
摘要翻译：一种将光学邻近校正特征应用于具有包括要成像的多个特征的目标图案的掩模的方法。该方法包括以下步骤：定义要用于对掩模进行成像的一组过程参数; 基于过程参数和目标模式确定干涉图; 定义影响区域，其表示在掩模中将使用散射条的目标图案中的给定特征的区域; 以及仅在给定特征的影响区域内，在由所述干涉图指示的位置中的与给定特征相邻的掩模中布置散射条。

9. 发明申请

US20070122719A1 Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology 失效
标题翻译：使用接口映射技术生成用于放置散射条特征的OPC规则的方法和装置
公开(公告)号：US20070122719A1
公开(公告)日：2007-05-31
申请号：US11594248
申请日：2006-11-08
申请人： Douglas Van Den Broeke , Sangbong Park , Chung-Wei Hsu , Jang Chen
发明人： Douglas Van Den Broeke , Sangbong Park , Chung-Wei Hsu , Jang Chen
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： G03F1/36
摘要： A method of applying optical proximity correction features to a mask having a plurality of features to be imaged. The method includes the steps of defining a set of process parameters to be utilized to image the mask; defining a set of pitch ranges corresponding to pitches exhibited by the plurality of features to be imaged; determining an interference map for at least one of the pitch ranges; and generating a set of rules for positioning scattering bars adjacent the plurality of features based on the interference map, where the set of rules governs scattering bar placement for features having a pitch which falls within the pitch range utilized to generate the interference map.
摘要翻译：将光学邻近校正特征应用于具有要成像的多个特征的掩模的方法。该方法包括以下步骤：定义要用于对掩模进行成像的一组过程参数; 定义对应于待成像的多个特征所展示的间距的一组音调范围; 确定所述音高范围中的至少一个的干涉图; 以及基于所述干涉图来生成用于定位与所述多个特征相邻的散射条的一组规则，其中所述规则集合管理具有落在用于生成所述干涉图的所述音调范围内的音调的特征的散射棒放置。

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