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    • 8. 发明授权
    • Ultra fine fiber polishing pad
    • 超细纤维抛光垫
    • US07762873B2
    • 2010-07-27
    • US12119580
    • 2008-05-13
    • Chung-Chih FengChen-Hsiang ChaoI-Peng Yao
    • Chung-Chih FengChen-Hsiang ChaoI-Peng Yao
    • B24D11/00
    • B24D11/003B24B37/24Y10T428/24612
    • A polishing pad includes a body having a polymer layer and a polishing layer. The polymer layer has opposite first and second faces. The polymer layer includes a plurality of first ultrafine fibers and a polymer bonding the first ultrafine fibers together. The polishing layer is formed on the first face of the polymer layer. The polishing layer includes a plurality of second ultrafine fibers and is free of the polymer. The first and second ultrafine fibers are identical to each other. The second ultrafine fibers have a first concentration of ultrafine fibers by volume higher than 80% a total volume of the polishing layer. The first ultrafine fibers of the polymer layer have a second concentration of ultrafine fibers by volume to a total volume of the polymer layer. The first concentration is higher than the second concentration.
    • 抛光垫包括具有聚合物层和抛光层的主体。 聚合物层具有相对的第一和第二面。 聚合物层包括多个第一超细纤维和将第一超细纤维结合在一起的聚合物。 抛光层形成在聚合物层的第一面上。 抛光层包括多个第二超细纤维,并且不含聚合物。 第一和第二超细纤维彼此相同。 第二超细纤维的第一浓度的超细纤维的体积高于抛光层的总体积的80%。 聚合物层的第一超细纤维具有体积至聚合物层的总体积的超细纤维的第二浓度。 第一浓度高于第二浓度。
    • 10. 发明申请
    • POLISHING PAD HAVING GROOVE STRUCTURE FOR AVOIDING THE POLISHING SURFACE STRIPPING
    • 用于避免抛光表面剥落的抛光结构的抛光垫
    • US20090258587A1
    • 2009-10-15
    • US12139525
    • 2008-06-16
    • Chung-Chih FengWei-Te LiuYung-Chang HungChun-Ta WangI-Peng Yao
    • Chung-Chih FengWei-Te LiuYung-Chang HungChun-Ta WangI-Peng Yao
    • B24D11/00
    • B24B37/26
    • The present invention relates to a polishing pad having a groove structure for avoiding the polishing surface stripping. The polishing pad of present invention includes a base material and a grinding layer. The base material has a surface. The grinding layer is disposed on the surface, and part of the surface around the edge of the base material is exposed. The grinding layer has a plurality of first grooves and second grooves, and the first grooves cross the second grooves to define a plurality of grinding areas. The exposed part of the surface around the edge of the base material is located between the first grooves, the second grooves and the edge of the polishing pad. Whereby, the polishing pad of present invention is capable to contain more grinding liquid, and is contributive to clean the small grinded pieces. Furthermore, the grinding layer does not have acute structure and is not easy to peel to form the small grinded pieces. Therefore, the grinding quality and grinding effect can be improved.
    • 本发明涉及一种具有用于避免抛光表面剥离的凹槽结构的抛光垫。 本发明的抛光垫包括基材和研磨层。 基材具有表面。 磨削层设置在表面上,并且暴露基体材料边缘周围的一部分表面。 研磨层具有多个第一凹槽和第二凹槽,并且第一凹槽与第二凹槽交叉以限定多个研磨区域。 围绕基材边缘的表面的暴露部分位于第一凹槽,第二凹槽和抛光垫的边缘之间。 因此,本发明的抛光垫能够容纳更多的研磨液,并且有助于清洁小的研磨件。 此外,研磨层不具有尖锐的结构,并且不容易剥离以形成小的研磨件。 因此,可以提高研磨质量和研磨效果。