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1. 发明申请

US20140314651A1 Process and Apparatus for Improving the Operation of Wet Scrubbers 审中-公开
公开(公告)号：US20140314651A1
公开(公告)日：2014-10-23
申请号：US14190789
申请日：2014-02-26
申请人： Christopher R. Smyrniotis , Kent W. Schulz , Emelito P. Rivera , Ian Saratovsky , Vasudeo S. Gavaskar
发明人： Christopher R. Smyrniotis , Kent W. Schulz , Emelito P. Rivera , Ian Saratovsky , Vasudeo S. Gavaskar
IPC分类号： B01D53/68
CPC分类号： B01D53/68 , B01D53/502 , B01D53/75 , B01D53/78 , B01D2251/404 , B01D2251/60 , B01D2255/20761 , B01D2257/2045 , B01D2257/302 , B01D2258/0283 , F23J15/04 , F23J2219/10 , F23J2219/20 , F23J2219/40
摘要： The description relates to improving the operation of wet scrubbers, especially those based on calcium carbonate, by reducing the quantities of soluble chlorides in the combustion gases fed to the scrubbers. By converting gaseous HCl in the combustion gases to a solid copper chloride and removing it before the chloride reaches the scrubber, the reactivity of the scrubbing slurry will be better maintained. Combustion gases are treated with an aqueous copper compound referred to as copper-bearing chloride remediator (CBCR). The process is preferably implemented by identifying locations within a combustor for feeding the CBCR, determining the physical form and injection parameters for the CBCR and injecting the CBCR under conditions effective to reduce HCl and/or sulfur oxides. Effective temperatures for introducing the CBCRs are preferably within the range of from about 250° to 900° F. Among the more preferred CBCRs are copper compositions including copper, an organic moiety and/or an ammonia moiety. One composition of this type is copper diamine diacetate, which has an empirical formula of C2H7CuNO2.

2. 发明授权

US09289721B2 Process and apparatus for improving the operation of wet scrubbers 有权
标题翻译：改进湿式洗涤器操作的方法和装置
公开(公告)号：US09289721B2
公开(公告)日：2016-03-22
申请号：US14190900
申请日：2014-02-26
申请人： Christopher R. Smyrniotis , Kent W. Schulz , Emelito P. Rivera , Ian Saratovsky , Vasudeo S. Gavaskar
发明人： Christopher R. Smyrniotis , Kent W. Schulz , Emelito P. Rivera , Ian Saratovsky , Vasudeo S. Gavaskar
IPC分类号： B01D53/50 , B01D53/68 , B01D53/74 , B01D53/75 , B01D53/78 , F23J15/04
CPC分类号： B01D53/68 , B01D53/502 , B01D53/75 , B01D53/78 , B01D2251/404 , B01D2251/60 , B01D2255/20761 , B01D2257/2045 , B01D2257/302 , B01D2258/0283 , F23J15/04 , F23J2219/10 , F23J2219/20 , F23J2219/40
摘要： The operation of wet scrubbers, especially those based on calcium carbonate, is improved by reducing the quantities of soluble chlorides in the combustion gases fed to the scrubbers. HCl in the combustion gases is converted to a solid copper chloride and removed before the chloride reaches the scrubber. Combustion gases are treated with an aqueous copper compound referred to as copper-bearing chloride remediator (CBCR). Effective temperatures for introducing the CBCRs are preferably within the range of from about 250° to 900° F. Among the more preferred CBCRs are copper compositions including copper, an organic moiety and/or an ammonia moiety.
摘要翻译：通过减少供给到洗涤器的燃烧气体中的可溶性氯化物的量，改进湿式洗涤器，特别是基于碳酸钙的洗涤器的操作。在燃烧气体中的HCl转化为固体氯化铜并在氯化物到达洗涤器之前除去。燃烧气体用被称为含铜氯化物补救剂（CBCR）的水性铜化合物处理。用于引入CBCR的有效温度优选在约250°至900°F的范围内。更优选的CBCR是铜组合物，包括铜，有机部分和/或氨部分。

3. 发明申请

US20140241970A1 Process and Apparatus for Improving the Operation of Wet Scrubbers 有权
标题翻译：改善湿式洗涤器运行的工艺和装置
公开(公告)号：US20140241970A1
公开(公告)日：2014-08-28
申请号：US14190900
申请日：2014-02-26
申请人： Christopher R. Smyrniotis , Kent W. Schulz , Emelito P. Rivera , Ian Saratovsky , Vasudeo S. Gavaskar
发明人： Christopher R. Smyrniotis , Kent W. Schulz , Emelito P. Rivera , Ian Saratovsky , Vasudeo S. Gavaskar
IPC分类号： B01D53/68
CPC分类号： B01D53/68 , B01D53/502 , B01D53/75 , B01D53/78 , B01D2251/404 , B01D2251/60 , B01D2255/20761 , B01D2257/2045 , B01D2257/302 , B01D2258/0283 , F23J15/04 , F23J2219/10 , F23J2219/20 , F23J2219/40
摘要： The description relates to improving the operation of wet scrubbers, especially those based on calcium carbonate, by reducing the quantities of soluble chlorides in the combustion gases fed to the scrubbers. By converting gaseous HCl in the combustion gases to a solid copper chloride and removing it before the chloride reaches the scrubber, the reactivity of the scrubbing slurry will be better maintained. Combustion gases are treated with an aqueous copper compound referred to as copper-bearing chloride remediator (CBCR). The process is preferably implemented by identifying locations within a combustor for feeding the CBCR, determining the physical form and injection parameters for the CBCR and injecting the CBCR under conditions effective to reduce HCl and/or sulfur oxides. Effective temperatures for introducing the CBCRs are preferably within the range of from about 250° to 900° F. Among the more preferred CBCRs are copper compositions including copper, an organic moiety and/or an ammonia moiety. One composition of this type is copper diamine diacetate, which has an empirical formula of C2H7CuNO2.
摘要翻译：该描述涉及通过减少供给到洗涤器的燃烧气体中的可溶性氯化物的量来改进湿式洗涤器的操作，特别是基于碳酸钙的操作。通过将燃烧气体中的气态HCl转化为固体氯化铜，并在氯化物到达洗涤器之前将其去除，洗涤浆料的反应性将得到更好的保持。燃烧气体用被称为含铜氯化物补救剂（CBCR）的水性铜化合物处理。该方法优选通过识别用于供给CBCR的燃烧器内的位置，确定CBCR的物理形式和注入参数并在有效降低HCl和/或硫氧化物的条件下注入CBCR来实现。用于引入CBCR的有效温度优选在约250°至900°F的范围内。更优选的CBCR是铜组合物，包括铜，有机部分和/或氨部分。这种类型的一种组合物是具有C2H7CuNO2经验式的铜二胺二乙酸酯。

4. 发明申请

US20120276275A1 SULFUR CONTAINING SILICA PARTICLE 有权
标题翻译：含硫硅胶颗粒
公开(公告)号：US20120276275A1
公开(公告)日：2012-11-01
申请号：US13269116
申请日：2011-10-07
申请人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C08K5/541 , C12H1/00 , A23L2/70 , B01J21/08
CPC分类号： A23L2/80 , B01J21/08 , B01J21/12 , B01J35/1019 , B01J35/1042 , B01J35/1047 , B01J35/1061 , B01J37/03 , B82Y30/00 , C01B33/12 , C01B33/18 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/14 , C08K3/36 , C08K5/548 , C08K9/06 , C08K2201/006
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzOaF.B: wherein M is at least one of the following: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein F optionally exists and comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300, and the molar ratio of a/z is dependent on the nature of the metal oxide. B comprises a hygroscopic solid and preferably comprises at least one alkaline earth oxide, lanthanide oxide, or combinations thereof.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）yMzOaF.B：其中M是以下至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中F任选地存在并且包含以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积覆盖率为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300，并且a / z的摩尔比取决于金属氧化物的性质。 B包含吸湿性固体，优选包含至少一种碱土金属氧化物，镧系元素氧化物或其组合。

5. 发明申请

US20130036946A1 SILICA PARTICLE MANUFACTURING PROCESS 有权
标题翻译：二氧化硅颗粒制造工艺
公开(公告)号：US20130036946A1
公开(公告)日：2013-02-14
申请号：US13269159
申请日：2011-10-07
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C09C1/30
CPC分类号： C01B33/12 , C01B33/1415 , C01B33/18 , C01B33/187 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C01P2006/16 , C09C1/02 , C09C1/3081
摘要： Methods of forming a silica-containing products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species; (d) adjusting the pH of the solution to greater than 7; and (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (f) optionally filtering and drying the SCP; The SCP is then added to a hygroscopic solid such that the resulting product comprises a metal oxide-doped or metal sulfide-doped silica-containing product deposited on a substrate selected from hydrated alkaline earth oxide, lanthanide oxide, and combinations thereof.
摘要翻译：公开了形成含二氧化硅的产品的方法。一种方法包括：（a）提供pH小于或等于7的溶液中含有的含二氧化硅的前体（SCP）; （b）任选地用一种或多种金属物质掺杂SCP; （d）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS; （e）任选地过滤和干燥SCP; 和（f）任选地使来自步骤e的干燥产物与官能团反应。另一种方法包括：（a）提供包含在pH大于7的溶液中的含二氧化硅的前体（SCP）; （b）将溶液的pH调节至小于或等于7; （c）任选地用一种或多种金属物质掺杂SCP; （d）将溶液的pH调节至大于7; 和（e）向溶液中加入有效量的盐，使溶液的电导率大于或等于4mS; （f）任选地过滤和干燥SCP; 然后将SCP加入到吸湿固体中，使得所得产物包含沉积在选自水合碱土金属氧化物，镧系元素氧化物及其组合的底物上的金属氧化物掺杂或金属硫化物掺杂的含二氧化硅的产物。

6. 发明授权

US08974762B2 Silica particle manufacturing process 有权
标题翻译：二氧化硅颗粒制造工艺
公开(公告)号：US08974762B2
公开(公告)日：2015-03-10
申请号：US13269159
申请日：2011-10-07
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C01B33/02 , C01F7/00 , C01B33/12 , C01B33/141 , C01B33/18 , C09C1/02 , C09C1/30 , C01B33/187
CPC分类号： C01B33/12 , C01B33/1415 , C01B33/18 , C01B33/187 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C01P2006/16 , C09C1/02 , C09C1/3081
摘要： Methods of forming a silica-containing products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species; (d) adjusting the pH of the solution to greater than 7; and (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (f) optionally filtering and drying the SCP. The SCP is then added to a hygroscopic solid such that the resulting product comprises a metal oxide-doped or metal sulfide-doped silica-containing product deposited on a substrate selected from hydrated alkaline earth oxide, lanthanide oxide, and combinations thereof.
摘要翻译：公开了形成含二氧化硅的产品的方法。一种方法包括：（a）提供pH小于或等于7的溶液中含有的含二氧化硅的前体（SCP）; （b）任选地用一种或多种金属物质掺杂SCP; （d）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS; （e）任选地过滤和干燥SCP; 和（f）任选地使来自步骤e的干燥产物与官能团反应。另一种方法包括：（a）提供包含在pH大于7的溶液中的含二氧化硅的前体（SCP）; （b）将溶液的pH调节至小于或等于7; （c）任选地用一种或多种金属物质掺杂SCP; （d）将溶液的pH调节至大于7; 和（e）向溶液中加入有效量的盐，使溶液的电导率大于或等于4mS; （f）可选地过滤和干燥SCP。然后将SCP加入到吸湿固体中，使得所得产物包含沉积在选自水合碱土金属氧化物，镧系元素氧化物及其组合的底物上的金属氧化物掺杂或金属硫化物掺杂的含二氧化硅的产物。

7. 发明授权

US08377194B2 Sulfur containing silica particle 有权
标题翻译：含硫二氧化硅颗粒
公开(公告)号：US08377194B2
公开(公告)日：2013-02-19
申请号：US13242618
申请日：2011-09-23
申请人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C01B33/00 , C01B33/113 , C01B17/00 , C09D1/00
CPC分类号： C09C1/28 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C08K3/36 , C09C1/3054 , C09D7/61 , C09D7/69
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF.B. M comprises at least one metal or metalloid cation S is a sulfur-based species. F optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5. B is a hygroscopic solid at a water to solid molar ratio of 0.1-6 and preferably comprises at least one alkaline earth oxide or lanthanide oxide.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）yMzSaF.B。 M包含至少一种金属或准金属阳离子S是基于硫的物质。 F任选存在，F是以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300或约0.5至约100，并且a / z的摩尔比为约0.5 B是水与固体摩尔比为0.1-6的吸湿性固体，优选包含至少一种碱土金属氧化物或镧系元素氧化物。

8. 发明授权

US08932549B2 Sulfur containing silica particle 有权
标题翻译：含硫二氧化硅颗粒
公开(公告)号：US08932549B2
公开(公告)日：2015-01-13
申请号：US13269116
申请日：2011-10-07
申请人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C01B33/18 , C01B33/12 , A23L2/80 , B01J37/03 , B01J21/08 , B01J21/12 , B01J35/10 , B82Y30/00 , C08K9/06 , C08K3/36 , C08K5/548
CPC分类号： A23L2/80 , B01J21/08 , B01J21/12 , B01J35/1019 , B01J35/1042 , B01J35/1047 , B01J35/1061 , B01J37/03 , B82Y30/00 , C01B33/12 , C01B33/18 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/14 , C08K3/36 , C08K5/548 , C08K9/06 , C08K2201/006
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzOaF.B: wherein M is at least one of the following: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein F optionally exists and comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300, and the molar ratio of a/z is dependent on the nature of the metal oxide. B comprises a hygroscopic solid and preferably comprises at least one alkaline earth oxide, lanthanide oxide, or combinations thereof.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）yMzOaF.B：其中M是以下至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中F任选地存在并且包含以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积覆盖率为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300，并且a / z的摩尔比取决于金属氧化物的性质。 B包含吸湿性固体，优选包含至少一种碱土金属氧化物，镧系元素氧化物或其组合。

9. 发明申请

US20120245025A1 SULFUR CONTAINING SILICA PARTICLE 有权
标题翻译：含硫硅胶颗粒
公开(公告)号：US20120245025A1
公开(公告)日：2012-09-27
申请号：US13242618
申请日：2011-09-23
申请人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Cheng
发明人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Cheng
IPC分类号： B01J20/10 , B82Y30/00
CPC分类号： C09C1/28 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C08K3/36 , C09C1/3054 , C09D7/61 , C09D7/69
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF.B, M comprises at least one metal or metalloid cation. S is a sulfur-based species. F optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5. B is a hygroscopic solid at a water to solid molar ratio of 0.1-6 and preferably comprises at least one alkaline earth oxide or lanthanide oxide.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）y M z S a F B，M包含至少一种金属或准金属阳离子。 S是硫类物质。 F任选存在，F是以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300或约0.5至约100，并且a / z的摩尔比为约0.5 B是水与固体摩尔比为0.1-6的吸湿性固体，优选包含至少一种碱土金属氧化物或镧系元素氧化物。

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