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    • 3. 发明申请
    • Optical System, Use of an Optical System and Object Viewing Method Using an Optical System
    • 光学系统,光学系统的使用和使用光学系统的物体观察方法
    • US20100277793A1
    • 2010-11-04
    • US12223269
    • 2007-01-22
    • Christoph HaugerFritz StraehleRalf Kuschnereit
    • Christoph HaugerFritz StraehleRalf Kuschnereit
    • G02B21/22
    • G02B21/0012G02B21/361
    • The invention relates to an optical system for observing an object, having a first system part with at least one observation beam path and at least one second system part with at least one other observation beam path, wherein the at least two system parts have a common or separate first imaging stage and a different second imaging stage, wherein the first imaging stage has an objective, wherein the second imaging stage of the first system part is designed as visual or digital and the second imaging stage of the second system part is designed as visual or digital, in which a visual imaging stage has at least one eyepiece and a magnification system with different lenses and in which a digital imaging stage has at least one camera adapter and a magnification system with different lenses, and wherein the second imaging stage of the second system part is designed in such a way that it makes possible a higher optical resolution of the object to be observed than the second imaging stage of the first system part. In addition, the invention relates to the use of such an optical system according to the invention as well as a method for observing an object with an optical system according to the invention.
    • 本发明涉及一种用于观察物体的光学系统,具有具有至少一个观察光束路径的第一系统部分和具有至少一个其它观察光束路径的至少一个第二系统部分,其中所述至少两个系统部分具有共同的 或分离的第一成像级和不同的第二成像级,其中第一成像级具有目标,其中第一系统部分的第二成像级被设计为视觉或数字,并且第二系统部分的第二成像级被设计为 视觉或数字,其中视觉成像阶段具有至少一个目镜和具有不同透镜的放大系统,并且其中数字成像台具有至少一个相机适配器和具有不同透镜的放大系统,并且其中第二成像阶段 第二系统部分被设计成使得可以比第二成像阶段更高的待观察对象的光学分辨率 e第一系统部分。 此外,本发明涉及根据本发明的这种光学系统的使用以及根据本发明的用于观察物体的方法。
    • 10. 发明授权
    • Antireflection coating for ultraviolet light at large angles of incidence
    • 紫外线防反射涂层在大角度入射
    • US06967771B2
    • 2005-11-22
    • US10768665
    • 2004-02-02
    • Ralf KuschnereitHans-Jochen Paul
    • Ralf KuschnereitHans-Jochen Paul
    • G03F1/14C23C14/06G02B1/11G02B1/115H01L21/027H01S3/08G02B5/20
    • G02B1/115G02B1/11
    • Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70° to approx. 80°, particularly in the range between approx. 72° and approx. 76°. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72° and approx. 76°.
    • 仅提供三层或四层的抗反射多层涂层被提出用于生产具有最小的残留反射和高波长范围的紫外光的高透明度的抗激光光学部件。 150纳米至约 250 nm,大角度入射角约为 70°至约 80°,特别是在约 72°和约 76°。 对于入射p偏振紫外光,可以使用三层系统,其中低折射材料层,特别是氟化镁层布置在两层高折射材料之间,并且在特定波长的情况下,具有最低吸收能力 材料,特别是氧化铪或氧化铝。 例如,这允许在波长为248nm的情况下以大约1%的范围内的入射角实现可察觉小于1%的残留反射。 72°和约 76°。