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    • 1. 发明授权
    • Method of processing multilayer film
    • 多层膜加工方法
    • US08512809B2
    • 2013-08-20
    • US12751734
    • 2010-03-31
    • Christian Maria Anton HellerAnil Raj DuggalDennis Joseph CoyleMin YanAhmet Gün ErlatRi-an Zhao
    • Christian Maria Anton HellerAnil Raj DuggalDennis Joseph CoyleMin YanAhmet Gün ErlatRi-an Zhao
    • B05D3/10
    • C23C16/403C23C16/045C23C16/402C23C16/45525C23C26/00
    • A method of processing a multilayer film is provided. The method includes providing a substrate film having a substrate film first surface and a substrate film second surface. The method also includes providing a barrier layer adjacent to the substrate film second surface. The barrier layer has at least one opening allowing fluid communication between the substrate film and an outer surface of the barrier layer. Further, the method includes contacting the substrate film first surface with a first reactant and finally contacting the outer surface of the barrier layer with a second reactant, said second reactant being reactive with said first reactant. The method of contacting the substrate film first surface to the first reactant and contacting the outer surface of the barrier layer to the second reactant is carried out under conditions under which reaction between said first reactant and the second reactant results in a formation of a reaction layer.
    • 提供了一种处理多层膜的方法。 该方法包括提供具有基底膜第一表面和基底膜第二表面的基底膜。 该方法还包括提供与衬底膜第二表面相邻的阻挡层。 阻挡层具有允许衬底膜和阻挡层的外表面之间流体连通的至少一个开口。 此外,该方法包括使基底膜第一表面与第一反应物接触,最后使阻挡层的外表面与第二反应物接触,所述第二反应物与所述第一反应物反应。 将基材膜第一表面与第一反应物接触并使阻挡层的外表面与第二反应物接触的方法在所述第一反应物和第二反应物之间的反应导致形成反应层的条件下进行 。