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1. 发明申请

US20090232384A1 Mask Making Decision for Manufacturing (DFM) on Mask Quality Control 有权
标题翻译：面罩制造决策（DFM）面膜质量控制
公开(公告)号：US20090232384A1
公开(公告)日：2009-09-17
申请号：US12048043
申请日：2008-03-13
申请人： Chih-Chiang Tu , Chien-Chao Huang
发明人： Chih-Chiang Tu , Chien-Chao Huang
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types; and repairing the plurality of pattern features on the mask according to the inspecting of the plurality of pattern features.
摘要翻译：本公开提供了一种制造掩模的方法。该方法包括将多个模式特征分配给不同的数据类型; 在掩模上写入多个图案特征; 根据分配的数据类型检查具有不同检查灵敏度的多个图案特征; 以及根据所述多个图案特征的检查来修复所述掩模上的所述多个图案特征。

2. 发明授权

US07444199B2 Method for preparing mask and wafer data files 有权
标题翻译：掩模和晶圆数据文件的制作方法
公开(公告)号：US07444199B2
公开(公告)日：2008-10-28
申请号：US11626218
申请日：2007-01-23
申请人： Hsin-Ying Lee , Chien-Chao Huang , Chih-Chiang Tu
发明人： Hsin-Ying Lee , Chien-Chao Huang , Chih-Chiang Tu
IPC分类号： G06F19/00 , G06F17/50 , G05B19/42
CPC分类号： G03F1/68 , Y10S707/99945 , Y10S707/99948
摘要： A method for converting a data file into a writer file for a mask writer is provided. A plurality of sub-files is created from the data file. The plurality of sub-files is transferred to the mask writer. A plurality of writer files is created from the plurality of sub-files at the mask writer. The transferring the plurality of sub-files to the mask writer, creating a plurality of writer files from the plurality of sub-files at the mask writer, and checking the plurality of transferred sub-files at the mask writer are executed in parallel in a single process.
摘要翻译：提供了一种用于将数据文件转换成用于掩码写入器的写入器文件的方法。从数据文件创建多个子文件。多个子文件被传送到掩码写入器。在掩码写入器处从多个子文件创建多个写入器文件。将多个子文件传送到掩码写入器，在掩码写入器处从多个子文件创建多个写入器文件，并且在掩码写入器处检查多个传送的子文件，并行执行单一过程。

3. 发明申请

US20080263501A1 System, Method, and Computer-Readable Medium for Performing Data Preparation for a Mask Design 有权
标题翻译：用于进行掩模设计数据准备的系统，方法和计算机可读介质
公开(公告)号：US20080263501A1
公开(公告)日：2008-10-23
申请号：US11738844
申请日：2007-04-23
申请人： Peng-Ren Chen , Chien-Chao Huang , Chih-Chiang Tu
发明人： Peng-Ren Chen , Chien-Chao Huang , Chih-Chiang Tu
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method, computer-readable medium, and system for performing data preparation are provided. An integrated circuit design is received, and a plurality of pre-optical proximity correction processes are invoked such that the plurality of pre-optical proximity correction processes are performed in parallel. An optical proximity correction process is invoked in response to a determination that each of the plurality of pre-optical proximity correction processes have completed. A post-optical proximity correction process is invoked in response to a determination that the optical proximity correction process has completed
摘要翻译：提供了一种用于执行数据准备的方法，计算机可读介质和系统。接收集成电路设计，并且调用多个预光学邻近校正处理，使得并行地执行多个预光学邻近校正处理。响应于多个预光学邻近校正处理中的每一个已经完成的确定来调用光学邻近校正处理。响应于光学邻近校正处理已经完成的确定，调用后光学邻近校正处理

4. 发明申请

US20120211675A1 MASK MAKING DECISION FOR MANUFACTURING (DFM) ON MASK QUALITY CONTROL 有权
标题翻译：制造（DFM）掩蔽质量控制制作决定
公开(公告)号：US20120211675A1
公开(公告)日：2012-08-23
申请号：US13398165
申请日：2012-02-16
申请人： Chih-Chiang Tu , Chien-Chao Huang
发明人： Chih-Chiang Tu , Chien-Chao Huang
IPC分类号： G01N21/956 , G21K5/00
CPC分类号： G03F1/84
摘要： The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types; and repairing the plurality of pattern features on the mask according to the inspecting of the plurality of pattern features.
摘要翻译：本公开提供了一种制造掩模的方法。该方法包括将多个模式特征分配给不同的数据类型; 在掩模上写入多个图案特征; 根据分配的数据类型检查具有不同检查灵敏度的多个图案特征; 以及根据所述多个图案特征的检查来修复所述掩模上的所述多个图案特征。

5. 发明授权

US08120767B2 Mask making decision for manufacturing (DFM) on mask quality control 有权
标题翻译：面罩制作决策（DFM）对面罩质量控制
公开(公告)号：US08120767B2
公开(公告)日：2012-02-21
申请号：US12048043
申请日：2008-03-13
申请人： Chih-Chiang Tu , Chien-Chao Huang
发明人： Chih-Chiang Tu , Chien-Chao Huang
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G03F1/84
摘要： The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types; and repairing the plurality of pattern features on the mask according to the inspecting of the plurality of pattern features.
摘要翻译：本公开提供了一种制造掩模的方法。该方法包括将多个模式特征分配给不同的数据类型; 在掩模上写入多个图案特征; 根据分配的数据类型检查具有不同检查灵敏度的多个图案特征; 以及根据所述多个图案特征的检查来修复所述掩模上的所述多个图案特征。

6. 发明授权

US07571421B2 System, method, and computer-readable medium for performing data preparation for a mask design 有权
标题翻译：用于执行掩模设计的数据准备的系统，方法和计算机可读介质
公开(公告)号：US07571421B2
公开(公告)日：2009-08-04
申请号：US11738844
申请日：2007-04-23
申请人： Peng-Ren Chen , Chien-Chao Huang , Chih-Chiang Tu
发明人： Peng-Ren Chen , Chien-Chao Huang , Chih-Chiang Tu
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method, computer-readable medium, and system for performing data preparation are provided. An integrated circuit design is received, and a plurality of pre-optical proximity correction processes are invoked such that the plurality of pre-optical proximity correction processes are performed in parallel. An optical proximity correction process is invoked in response to a determination that each of the plurality of pre-optical proximity correction processes have completed. A post-optical proximity correction process is invoked in response to a determination that the optical proximity correction process has completed.
摘要翻译：提供了一种用于执行数据准备的方法，计算机可读介质和系统。接收集成电路设计，并且调用多个预光学邻近校正处理，使得并行地执行多个预光学邻近校正处理。响应于多个预光学邻近校正处理中的每一个已经完成的确定来调用光学邻近校正处理。响应于光学邻近校正处理已经完成的确定，调用后光学邻近校正处理。

7. 发明授权

US08319962B2 Mask making decision for manufacturing (DFM) on mask quality control 有权
公开(公告)号：US08319962B2
公开(公告)日：2012-11-27
申请号：US13398165
申请日：2012-02-16
申请人： Chih-Chiang Tu , Chien-Chao Huang
发明人： Chih-Chiang Tu , Chien-Chao Huang
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G03F1/84
摘要： The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types; and repairing the plurality of pattern features on the mask according to the inspecting of the plurality of pattern features.

8. 发明申请

US20080114483A1 Method for Preparing Mask and Wafer Data Files 有权
标题翻译：掩模和晶片数据文件的准备方法
公开(公告)号：US20080114483A1
公开(公告)日：2008-05-15
申请号：US11626218
申请日：2007-01-23
申请人： Hsin-Ying Lee , Chien-Chao Huang , Chih-Chiang Tu
发明人： Hsin-Ying Lee , Chien-Chao Huang , Chih-Chiang Tu
IPC分类号： G06F19/00
CPC分类号： G03F1/68 , Y10S707/99945 , Y10S707/99948
摘要： A method for converting a data file into a writer file for a mask writer is provided. A plurality of sub-files is created from the data file. The plurality of sub-files is transferred to the mask writer. A plurality of writer files is created from the plurality of sub-files at the mask writer. The transferring the plurality of sub-files to the mask writer, creating a plurality of writer files from the plurality of sub-files at the mask writer, and checking the plurality of transferred sub-files at the mask writer are executed in parallel in a single process.
摘要翻译：提供了一种用于将数据文件转换成用于掩码写入器的写入器文件的方法。从数据文件创建多个子文件。多个子文件被传送到掩码写入器。在掩码写入器处从多个子文件创建多个写入器文件。将多个子文件传送到掩码写入器，在掩码写入器处从多个子文件创建多个写入器文件，并且在掩码写入器处检查多个传送的子文件，并行执行单一过程。

9. 发明授权

US08981557B2 Method for forming photovoltaic cell, and resulting photovoltaic cell 有权
标题翻译：用于形成光伏电池的方法，以及所得到的光伏电池
公开(公告)号：US08981557B2
公开(公告)日：2015-03-17
申请号：US13621318
申请日：2012-09-17
申请人： Chih-Chiang Tu , Chun-Lang Chen
发明人： Chih-Chiang Tu , Chun-Lang Chen
IPC分类号： H01L23/48 , H01L23/52 , H01L29/40 , G03F7/00 , B82Y10/00 , B82Y40/00 , H01L31/0224 , H01L31/068 , H01L31/18
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01L31/022425 , H01L31/022441 , H01L31/068 , H01L31/1804 , Y02E10/52 , Y02E10/547 , Y02P70/521
摘要： A photovoltaic cell manufacturing method is disclosed. Methods include manufacturing a photovoltaic cell having a selective emitter and buried contact (electrode) structure utilizing nanoimprint technology. The methods include providing a semiconductor substrate having a first surface and a second surface opposite the first surface; forming a first doped region in the semiconductor substrate adjacent to the first surface; performing a nanoimprint process and an etching process to form a trench in the semiconductor substrate, the trench extending into the semiconductor substrate from the first surface; forming a second doped region in the semiconductor substrate within the trench, the second doped region having a greater doping concentration than the first doped region; and filling the trench with a conductive material. The nanoimprint process uses a mold to define a location of an electrode line layout.
摘要翻译：公开了一种光伏电池的制造方法。方法包括利用纳米压印技术制造具有选择性发射极和埋入接触（电极）结构的光伏电池。所述方法包括提供具有第一表面和与第一表面相对的第二表面的半导体衬底; 在所述半导体衬底中邻近所述第一表面形成第一掺杂区; 执行纳米压印工艺和蚀刻工艺以在半导体衬底中形成沟槽，沟槽从第一表面延伸到半导体衬底中; 在所述沟槽内的所述半导体衬底中形成第二掺杂区域，所述第二掺杂区域具有比所述第一掺杂区域更大的掺杂浓度; 并用导电材料填充沟槽。纳米压印工艺使用模具来定义电极线布局的位置。

10. 发明申请

US20130323625A1 Systems and Methods for Lithography Masks 有权
标题翻译：光刻面具的系统和方法
公开(公告)号：US20130323625A1
公开(公告)日：2013-12-05
申请号：US13486015
申请日：2012-06-01
申请人： Chih-Chiang Tu , Hsin-Chang Lee , Jong-Yuh Chang , Chia-Jen Chen , Chun-Lang Chen
发明人： Chih-Chiang Tu , Hsin-Chang Lee , Jong-Yuh Chang , Chia-Jen Chen , Chun-Lang Chen
IPC分类号： G03F1/00 , G03F1/26 , G03F1/36 , G03F1/50
CPC分类号： G03F1/36 , G03F1/50 , G03F1/58 , G03F1/80
摘要： Structure of mask blanks and masks, and methods of making masks are disclosed. The new mask blank and mask comprise a tripe etching stop layer to prevent damages to the quartz substrate when the process goes through etching steps three times. The triple etching stop layer may comprise a first sub-layer of tantalum containing nitrogen (TaN), a second sub-layer of tantalum containing oxygen (TaO), and a third sub-layer of TaN. Alternatively, the triple etching stop layer may comprise a first sub-layer of SiON material, a second sub-layer of TaO material, and a third sub-layer of SiON material. Another alternative may be one layer of low etching rate MoxSiyONz material which can prevent damages to the quartz substrate when the process goes through etching steps three times. The island mask is defined on the mask blank by using various optical proximity correction rules.
摘要翻译：公开了掩模毛坯和掩模的结构，以及制造掩模的方法。当过程经过蚀刻步骤三次时，新的掩模坯料和掩模包括三层蚀刻停止层，以防止损坏石英基板。三重蚀刻停止层可以包括含有氮（TaN）的钽的第一子层，含有氧（TaO）的钽的第二子层和TaN的第三子层。或者，三重蚀刻停止层可以包括SiON材料的第一子层，TaO材料的第二子层和SiON材料的第三子层。另一个替代方案可以是一层低蚀刻速率的MoxSiyONz材料，当该工艺经过蚀刻步骤三次时，其可以防止对石英衬底的损坏。通过使用各种光学邻近校正规则在掩模空白上定义岛掩模。

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