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1. 发明申请

US20060139745A1 Projection system for a lithograhic apparatus 有权
标题翻译：光刻设备投影系统
公开(公告)号：US20060139745A1
公开(公告)日：2006-06-29
申请号：US11019672
申请日：2004-12-23
申请人： Cheng-Qun Gui , Pieter De Jager , Robert Harned , Nora-Jean Harned
发明人： Cheng-Qun Gui , Pieter De Jager , Robert Harned , Nora-Jean Harned
IPC分类号： G02B7/182
CPC分类号： G03F7/70275 , G02B17/002 , G02B17/008 , G02B17/0812 , G03F7/70233
摘要： A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.
摘要翻译：一种用于具有多个镜像成像系统的光刻设备的投影系统。在一个实施例中，镜像成像系统布置成两行，每行垂直于投影系统的扫描方向。每个镜像成像系统都具有相关的成像领域。镜像成像系统以排除扫描方向上的相邻成像场之间的间隙的方式排列。每个镜像成像系统包括与凹面镜同心地布置的凹面镜和凸面镜。凹面镜具有可独立移动的第一反射镜部分和第二反射镜部分。在一个实施例中，每个镜像成像系统具有相关联的相位，并且一行中的镜像成像系统与另一行中的镜像成像系统定位成180度异相。

2. 发明申请

US20070195304A1 Large field of view projection optical system with aberration correctability 有权
标题翻译：大视野投影光学系统具有像差校正能力
公开(公告)号：US20070195304A1
公开(公告)日：2007-08-23
申请号：US11646609
申请日：2006-12-28
申请人： Robert Harned , Cheng-Qun Gui , Pieter De Jager
发明人： Robert Harned , Cheng-Qun Gui , Pieter De Jager
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G02B17/061 , G03F7/70233 , G03F7/70308 , G03F7/706 , G03F7/70791
摘要： An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.
摘要翻译：用于制造平板显示器（FPD）的曝光系统包括适于支撑掩模版的掩模版台。衬底台适于支撑衬底。反射光学系统适于将掩模版成像到基底上。反射光学系统包括主镜，包括第一镜和第二镜以及次镜。当通过第一反射镜，次反射镜和第二反射镜的反射将掩模版的图像投影到基板上时，反射光学系统具有足够的自由度用于三阶像差的对准和校正。

3. 发明申请

US20070206172A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20070206172A1
公开(公告)日：2007-09-06
申请号：US11717174
申请日：2007-03-13
申请人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
发明人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
IPC分类号： G03B27/72
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.

4. 发明申请

US20060132750A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060132750A1
公开(公告)日：2006-06-22
申请号：US11018927
申请日：2004-12-22
申请人： Cheng-Qun Gui , Pieter De Jager , Robert-Han Munnig Schmidt
发明人： Cheng-Qun Gui , Pieter De Jager , Robert-Han Munnig Schmidt
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

5. 发明申请

US20060001847A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060001847A1
公开(公告)日：2006-01-05
申请号：US10880435
申请日：2004-06-30
申请人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam of radiation, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate supported on a substrate table. The projection system comprises an array of lenses located at a spacing from the substrate such that each lens in the array focuses a respective part of the patterned beam onto the substrate. A displacement system causes relative displacement between the lens array and the substrate. A particle detector is positioned to detect particles on the substrate which are approaching the lens array as a result of relative displacement between the lens array and the substrate. A free working distance control system is arranged to increase the spacing between the lens array and the substrate in response to detection of a particle by the detector such that the lens array is moved away from the substrate as relative displacement causes the detected particle to pass the lens array. Thus damage to the lens array as a result of for example scratching by particles carried on the substrate surface can be avoided.
摘要翻译：一种光刻设备和方法，其中照明系统提供投影辐射束，图案化系统将光束赋予其横截面中的图案，并且投影系统将图案化的光束投影到支撑在衬底上的衬底的目标部分上表。投影系统包括位于与衬底间隔的透镜阵列，使得阵列中的每个透镜将图案化束的相应部分聚焦到衬底上。位移系统导致透镜阵列和基底之间的相对位移。定位粒子检测器以检测由于透镜阵列和基底之间的相对位移而正在接近透镜阵列的基底上的颗粒。布置一个自由的工作距离控制系统以响应于检测器检测到的颗粒而增加透镜阵列和基板之间的间距，使得透镜阵列相对于基板移动离开基板，因为相对位移导致检测到的颗粒通过镜头阵列因此，可以避免由于例如由承载在基板表面上的颗粒划伤而导致的透镜阵列的损坏。

6. 发明申请

US20060098175A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060098175A1
公开(公告)日：2006-05-11
申请号：US10983336
申请日：2004-11-08
申请人： Pieter De Jager , Cheng-Qun Gui , Jacob Klinkhamer , Eduard Hoeberichts
发明人： Pieter De Jager , Cheng-Qun Gui , Jacob Klinkhamer , Eduard Hoeberichts
IPC分类号： G03B27/00
CPC分类号： G03F7/70475 , G03F7/70275 , G03F7/70291 , G03F7/70358
摘要： A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. A maximum intensity of a first part of each beam directed towards a first portion of the track can be greater than a maximum intensity of a second part of that beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.
摘要翻译：一种用于曝光衬底的光刻设备和方法。照明系统提供一系列由单独可控元件的阵列构图的辐射束。图案化的光束通过透镜阵列投射到基板的目标部分上。阵列中的每个透镜将图案化束的相应部分朝向衬底引导。位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。投影系统被定位成使得每个光束沿着衬底上的一系列轨道中的相应一个被扫描。轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并且被两个梁扫描。朝向轨道的第一部分的每个光束的第一部分的最大强度可以大于朝向轨道的第二部分的该光束的第二部分的最大强度，使得第一部分和第二部分轨道暴露于基本上相同的最大强度的辐射。相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。

7. 发明申请

US20050179884A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050179884A1
公开(公告)日：2005-08-18
申请号：US10779823
申请日：2004-02-18
申请人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
发明人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
摘要翻译：提供了一种用于将照明系统的辐射分配到两个或更多个图案形成装置的辐射分布系统，每个图案装置用于构图辐射束，随后将其投影到衬底上。

8. 发明申请

US20070242246A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20070242246A1
公开(公告)日：2007-10-18
申请号：US11733327
申请日：2007-04-10
申请人： Cheng-Qun GUI , Pieter De Jager , Robert-Han Munnig Schmidt
发明人： Cheng-Qun GUI , Pieter De Jager , Robert-Han Munnig Schmidt
IPC分类号： G03B27/42 , G01B3/00
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，包括用于将光束横截面赋予图案的独立可控元件阵列的图案化装置，用于支撑衬底的衬底台以及包含微透镜的投影系统阵列，用于将光束投影到基板的目标部分上。提供误差补偿器，用于提供用于补偿微透镜阵列中的位置误差的影响的误差校正值，并且提供灰度调制器，用于根据纠错值按顺序将驱动信号提供给图案化装置的可控元件以通过相对于图案的其它部分改变图案的一些部分的强度来补偿微透镜阵列中位置误差的影响。

9. 发明申请

US20050186509A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050186509A1
公开(公告)日：2005-08-25
申请号：US11091905
申请日：2005-03-29
申请人： Johannes Gijsbertsen , Pieter De Jager , Michiel Nijkerk
发明人： Johannes Gijsbertsen , Pieter De Jager , Michiel Nijkerk
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03C5/00 , H01L21/311
CPC分类号： G03F9/7053
摘要： A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.
摘要翻译：光刻投影装置包括一个对准传感器，该对准传感器具有一个电子束源，该电子束源被构造和布置成提供一个电子束，用于冲击基板上的一个对准标记;以及一个后向散射电子检测器，被构造和布置成检测从该对准反向散射的电子标记。对准传感器与投影系统和投射辐射无关，是离轴对准传感器。

10. 发明申请

US20060139609A1 Methods and systems for lithographic beam generation 有权
标题翻译：光刻光束生成的方法和系统
公开(公告)号：US20060139609A1
公开(公告)日：2006-06-29
申请号：US11023628
申请日：2004-12-29
申请人： Johannes Baselmans , Anastasius Bruinsma , Pieter De Jager , Robert-Han Munnig Schmidt , Henri Vink
发明人： Johannes Baselmans , Anastasius Bruinsma , Pieter De Jager , Robert-Han Munnig Schmidt , Henri Vink
IPC分类号： G03B27/72
CPC分类号： G03F7/7005
摘要： A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.
摘要翻译：光刻照明装置和方法包括从多个对应的辐射源接收多个源辐射束，沿着公共光束路径偏转多个源辐射束，从而产生投影辐射束，将辐射束投射到横截面图案，以及将图案化的投影辐射束投影到基板的目标部分上。

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