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1. 发明申请

US20060001847A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060001847A1
公开(公告)日：2006-01-05
申请号：US10880435
申请日：2004-06-30
申请人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam of radiation, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate supported on a substrate table. The projection system comprises an array of lenses located at a spacing from the substrate such that each lens in the array focuses a respective part of the patterned beam onto the substrate. A displacement system causes relative displacement between the lens array and the substrate. A particle detector is positioned to detect particles on the substrate which are approaching the lens array as a result of relative displacement between the lens array and the substrate. A free working distance control system is arranged to increase the spacing between the lens array and the substrate in response to detection of a particle by the detector such that the lens array is moved away from the substrate as relative displacement causes the detected particle to pass the lens array. Thus damage to the lens array as a result of for example scratching by particles carried on the substrate surface can be avoided.
摘要翻译：一种光刻设备和方法，其中照明系统提供投影辐射束，图案化系统将光束赋予其横截面中的图案，并且投影系统将图案化的光束投影到支撑在衬底上的衬底的目标部分上表。投影系统包括位于与衬底间隔的透镜阵列，使得阵列中的每个透镜将图案化束的相应部分聚焦到衬底上。位移系统导致透镜阵列和基底之间的相对位移。定位粒子检测器以检测由于透镜阵列和基底之间的相对位移而正在接近透镜阵列的基底上的颗粒。布置一个自由的工作距离控制系统以响应于检测器检测到的颗粒而增加透镜阵列和基板之间的间距，使得透镜阵列相对于基板移动离开基板，因为相对位移导致检测到的颗粒通过镜头阵列因此，可以避免由于例如由承载在基板表面上的颗粒划伤而导致的透镜阵列的损坏。

2. 发明申请

US20060098175A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060098175A1
公开(公告)日：2006-05-11
申请号：US10983336
申请日：2004-11-08
申请人： Pieter De Jager , Cheng-Qun Gui , Jacob Klinkhamer , Eduard Hoeberichts
发明人： Pieter De Jager , Cheng-Qun Gui , Jacob Klinkhamer , Eduard Hoeberichts
IPC分类号： G03B27/00
CPC分类号： G03F7/70475 , G03F7/70275 , G03F7/70291 , G03F7/70358
摘要： A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. A maximum intensity of a first part of each beam directed towards a first portion of the track can be greater than a maximum intensity of a second part of that beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.
摘要翻译：一种用于曝光衬底的光刻设备和方法。照明系统提供一系列由单独可控元件的阵列构图的辐射束。图案化的光束通过透镜阵列投射到基板的目标部分上。阵列中的每个透镜将图案化束的相应部分朝向衬底引导。位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。投影系统被定位成使得每个光束沿着衬底上的一系列轨道中的相应一个被扫描。轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并且被两个梁扫描。朝向轨道的第一部分的每个光束的第一部分的最大强度可以大于朝向轨道的第二部分的该光束的第二部分的最大强度，使得第一部分和第二部分轨道暴露于基本上相同的最大强度的辐射。相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。

3. 发明授权

US07684009B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07684009B2
公开(公告)日：2010-03-23
申请号：US11647426
申请日：2006-12-29
申请人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
摘要翻译：一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。位移系统导致透镜阵列和基板之间的位移。颗粒检测器检测正在接近透镜阵列的基板上的颗粒。响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。因此可以避免对透镜阵列的损坏。

4. 发明申请

US20070109510A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070109510A1
公开(公告)日：2007-05-17
申请号：US11647426
申请日：2006-12-29
申请人： Pieter Willem De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter Willem De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
摘要翻译：一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。位移系统导致透镜阵列和基板之间的位移。颗粒检测器检测正在接近透镜阵列的基板上的颗粒。响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。因此可以避免对透镜阵列的损坏。

5. 发明授权

US07158208B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07158208B2
公开(公告)日：2007-01-02
申请号：US10880435
申请日：2004-06-30
申请人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.

6. 发明授权

US07609362B2 Scanning lithographic apparatus and device manufacturing method 有权
标题翻译：扫描光刻设备和器件制造方法
公开(公告)号：US07609362B2
公开(公告)日：2009-10-27
申请号：US10983336
申请日：2004-11-08
申请人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Jacob Fredrik Friso Klinkhamer , Eduard Hoeberichts
发明人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Jacob Fredrik Friso Klinkhamer , Eduard Hoeberichts
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/70475 , G03F7/70275 , G03F7/70291 , G03F7/70358
摘要： A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. A maximum intensity of a first part of each beam directed towards a first portion of the track can be greater than a maximum intensity of a second part of that beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.
摘要翻译：一种用于曝光衬底的光刻设备和方法。照明系统提供一系列由单独可控元件的阵列构图的辐射束。图案化的光束通过透镜阵列投射到基板的目标部分上。阵列中的每个透镜将图案化束的相应部分朝向衬底引导。位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。投影系统被定位成使得每个光束沿着衬底上的一系列轨道中的相应一个被扫描。轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并且被两个梁扫描。朝向轨道的第一部分的每个光束的第一部分的最大强度可以大于朝向轨道的第二部分的该光束的第二部分的最大强度，使得第一部分和第二部分轨道暴露于基本上相同的最大强度的辐射。相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。

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