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    • 1. 发明授权
    • Apparatus and method for controlling vapor phase within an enclosure
    • 用于控制外壳内气相的装置和方法
    • US5229899A
    • 1993-07-20
    • US884262
    • 1992-05-08
    • Charles A. BrownThomas A. GregoryChristopher G. KellerHerman R. WendtArthur R. Zingher
    • Charles A. BrownThomas A. GregoryChristopher G. KellerHerman R. WendtArthur R. Zingher
    • G11B25/04G11B33/14
    • G11B25/043G11B33/1453G11B33/1446
    • The vapor drain is a device that permits steady state control of the composition of the atmosphere within a substantially sealed enclosure. For any fabricated enclosure the will be sources of vapor phase molecules: molecules evaporating from a deliberately installed lubricant reservoir, molecules outgassed from components, and molecules diffusing in from the outside world. The purpose of the vapor drain is to minimize the second two classes of molecules in the composition of the enclosure atmosphere as they are considered to be contaminants. An example application is a rigid disk magnetic data storage device which requires a monomelecular layer of lubricant on the disk and slider surfaces. The vapor drains suppresses the contaminant population by capturing a portion of all three sources of molecules in the vapor phase. The vapor drain is a filter which has an active element of at least one of activated carbon, silica gel, activated alumina, synthetic zeolite, and other material with a large surface to volume ratio with the ability to adsorb vapor components from the atmosphere.
    • 蒸汽排放是允许在基本上密封的外壳内对气氛的组成进行稳态控制的装置。 对于任何制造的外壳,将是气相分子的来源:从故意安装的润滑剂储存器蒸发的分子,从组分脱气的分子和从外部扩散的分子。 蒸气排放的目的是使外壳气氛的组成中的第二两类分子最小化,因为它们被认为是污染物。 一个示例应用是刚性盘磁数据存储装置,其需要在盘和滑块表面上的单分子润滑剂层。 蒸汽排放通过捕获气相中所有三个分子源的一部分来抑制污染物群体。 蒸气排放是具有活性炭,硅胶,活性氧化铝,合成沸石和其它具有大的表面积与体积比的材料中的至少一种的活性元素的过滤器,其具有吸附大气中蒸气成分的能力。
    • 2. 发明授权
    • Vapor drain system
    • 蒸气排放系统
    • US5346518A
    • 1994-09-13
    • US35999
    • 1993-03-23
    • Robert J. BasemanCharles A. BrownBenjamin N. EldridgeLaura B. RothmanHerman R. WendtJames T. YehArthur R. Zingher
    • Robert J. BasemanCharles A. BrownBenjamin N. EldridgeLaura B. RothmanHerman R. WendtJames T. YehArthur R. Zingher
    • B65D85/86B65G1/00H01L21/673H01L21/677B65B5/00B65D81/26B65D85/62F17C11/00
    • H01L21/67366B65G1/00H01L21/67393
    • During wafer fabrication, a transportable enclosure, such as a Standard Manufacturing InterFace (SMIF) pod encloses a nascent product, such as a semiconductor wafer, to protect the wafer against contamination during manufacture, storage or transportation. However chemical vapors emitted inside the pod can accumulate in the air and degrade wafers during subsequent fabrication. In order to absorb the vapors inside a closed pod, a vapor removal element typically including an activated carbon absorber, covered by a particulate-filtering vapor-permeable barrier, and covered by a guard plate with holes is disposed within the enclosure. A vapor removal element is disposed closely adjacent to each respective wafer. Alternatively, a single vapor removal element is located inside the enclosure. In certain instances, a fan or thermo-buoyant circulation causes any vapors located inside the enclosure to a vapor removal element for removal. Alternatively a porous vapor removal element may be disposed for removing vapors from air entering the enclosure. In another embodiment a vapor removal element is integrated with the back face of each wafer.
    • 在晶片制造期间,诸如标准制造界面(SMIF)的可移动外壳包围新生产品,例如半导体晶片,以在制造,存储或运输期间保护晶片免受污染。 然而,发射在荚内的化学气体可能积聚在空气中,并在随后的制造过程中降解晶片。 为了吸收封闭的容器内的蒸气,通常包括活性炭吸收器的蒸气去除元件被覆盖有颗粒过滤蒸气可透过的屏障并被具有孔的保护板覆盖。 蒸汽去除元件被设置为紧邻每个相应的晶片。 或者,单个蒸气去除元件位于外壳内。 在某些情况下,风扇或热浮动循环使得位于外壳内部的任何蒸气成为除去蒸气的元件。 或者,可以设置多孔蒸气去除元件以从进入外壳的空气中除去蒸汽。 在另一个实施例中,蒸气去除元件与每个晶片的背面一体化。
    • 6. 发明申请
    • System and Method for Software Debugging
    • 软件调试的系统和方法
    • US20080077780A1
    • 2008-03-27
    • US10565618
    • 2004-07-23
    • Arthur R. Zingher
    • Arthur R. Zingher
    • G06F9/00
    • G06F11/3636G06F11/3648
    • The software debugging system provides a processor that is executing a software process, and the software process has a bug or other failure. A fast-response reporter circuit connects to a low level asset in the processor, such as a reorder buffer, commit buffer, or high speed data path. The fast response reporter circuit is configured to selectively extract data from the low-level asset, and the extracted data is transmitted to an evidence file for review and analysis. In one arrangement, a fast-response sentry circuit also connects to a low-level asset in the processor, and is configured to monitor for a predefined event. When the predefined event occurs, the fast-response sentry circuit causes an action to occur, such as activation of the reporter fast-response circuit.
    • 软件调试系统提供了一个正在执行软件过程的处理器,并且软件进程有一个错误或其他故障。 快速响应记者电路连接到处理器中的低级别资产,例如重排序缓冲器,提交缓冲器或高速数据路径。 快速响应报告器电路被配置为从低级别资产中选择性地提取数据,并将提取的数据传送到证据文件进行审查和分析。 在一种安排中,快速响应报警电路还连接到处理器中的低级别资产,并且被配置为监视预定事件。 当预定义的事件发生时,快速响应信号电路引起动作发生,例如报告器快速响应电路的激活。