专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06767877B2 Method and system for chemical injection in silicon wafer processing 失效
标题翻译：硅晶片加工中的化学注入方法和系统
公开(公告)号：US06767877B2
公开(公告)日：2004-07-27
申请号：US10053364
申请日：2002-01-18
申请人： Chang Kuo , Ismail Kashkoush , Nick Yialamas , Gregory Skibinski
发明人： Chang Kuo , Ismail Kashkoush , Nick Yialamas , Gregory Skibinski
IPC分类号： B08B308
CPC分类号： B08B3/00 , H01L21/67086
摘要： Silicon wafers are treated with chemicals during the manufacture of integrated circuits according to the method of the invnention in the apparatus of the invention which comprises a process tank for cleaning, rinsing, and/or drying silicon wafers; a first chemical supply vessel suitable for being pressurized, fluidly coupled to the process tank; a chemical flow sensor for electronically monitoring the flow rate of chemical from the first hemical supply vessel; a first chemical flow metering valve for electronically controlling the flow rate of chemical from the first chemical supply vessel; a supply of hot DI water fluidly coupled to the process tank; a hot water metering valve for electronically controlling the flow rate of hot DI water from the supply of the hot DI water; a supply of cold DI water fluidly coupled to the process tank; a cold water metering means for electronically controlling the flow rate of cold DI water from the supply of cold DI water; water flow sensor means for electronically monitoring the flow rate of DI water; means for mixing the DI water and the first chemical to produce a solution of the first chemical in water; conductivity sensor means to electronically measure the conductivity of solution of the first chemical in water; temperature sensor means to electronically measure the temperature of the solution being supplied to the process tank; and control means for automatically adjusting the precise flow rate, temperature, pressure, and chemical concentration of solution supplied to the process tank.
摘要翻译：根据本发明的装置中的方法，在制造集成电路期间，用化学品处理硅晶片，其包括用于清洗，漂洗和/或干燥硅晶片的处理罐; 第一化学品供应容器，适于被加压，流体地联接到处理罐; 化学流量传感器，用于电子地监测来自第一个供血容器的化学物质的流量; 第一化学流量计量阀，用于电子控制来自第一化学品供应容器的化学品的流量; 供应流动耦合到处理罐的热去离子水; 一种热水计量阀，用于从热去离子水的供应电子控制热去离子水的流量; 供应流体耦合到处理罐的冷去离子水; 冷水计量装置，用于电子控制冷去离子水供应中冷去离子水的流量; 用于电子监测去离子水流量的水流传感器装置; 用于混合DI水和第一化学品以产生第一种化学品在水中的溶液的装置; 电导率传感器用于电子测量第一种化学品在水中的溶液的电导率; 温度传感器用于电子地测量供应给处理罐的溶液的温度; 以及用于自动调节提供给处理罐的溶液的精确流量，温度，压力和化学浓度的控制装置。

IPRDB

热门服务

关于我们

友情链接

联系方式