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    • 4. 发明授权
    • Binders for thermographic materials
    • 用于热成像材料的粘合剂
    • US06306572B1
    • 2001-10-23
    • US09135637
    • 1998-08-17
    • Carlo UyttendaeleHuub Van AertFrank LouwetIvan Hoogmartens
    • Carlo UyttendaeleHuub Van AertFrank LouwetIvan Hoogmartens
    • G03C1498
    • G03C1/4989G03C1/04G03C1/49863G03C2200/36
    • A substantially light-insensitive black and white thermographic material including a support and a thermosensitive element, containing a substantially light-insensitive organic silver salt, a reducing agent therefor in thermal working relationship therewith and a binder, wherein the binder is a water-dispersible film-forming polymer with covalently bonded moieties with one or more acid groups or anhydrides thereof and the thermographic material is thermally developable under substantially water-free conditions; and a process for producing the substantially light-insensitive black and white thermographic material comprising the steps of: producing an aqueous dispersion of the substantially light-insensitive organic silver salt; producing one or more aqueous coating compositions containing together the aqueous dispersion of the substantially light-insensitive organic silver salt, the reducing agent and the binder; and applying the one or more aqueous coating compositions to the support thereby forming after drying the thermosensitive element.
    • 一种基本上不透光的黑色和白色热成像材料,包括支撑体和热敏元件,其含有基本上不受光敏的有机银盐,与其热加工关系的还原剂和粘合剂,其中粘合剂是水分散性膜 具有共价键合的部分与一个或多个酸基团或其酸酐并且热成像材料在基本上无水条件下可热显影; 以及用于生产基本上不透光的黑白热成像材料的方法,包括以下步骤:制备基本上不光敏的有机银盐的水分散体; 制备一种或多种含有基本上不光敏的有机银盐,还原剂和粘合剂的水性分散体的水性涂料组合物; 并且将一种或多种水性涂料组合物施加到载体上,从而在干燥热敏元件之后形成。
    • 6. 发明授权
    • Stabilizers for use in substantially light-insensitive thermographic recording materials
    • US07097961B2
    • 2006-08-29
    • US11127645
    • 2005-05-12
    • Frank LouwetJohan Loccufier
    • Frank LouwetJohan Loccufier
    • G03C1/494G03C1/34
    • G03C1/4989G03C1/49845Y10S430/165Y10S430/166
    • A substantially light-insensitive black and white monosheet thermographic recording material comprising a support and a thermosensitive element, said thermosensitive element containing a substantially light-insensitive organic silver salt, an organic reducing agent therefor in thermal working relationship therewith, at least one binder and at least one stabilizer represented by formula (I): wherein R1, R2, R3 and R4 are independently selected from the group consisting of a hydrogen atom, halogen atoms and aliphatic, alkoxy, nitro, acyl, sulfonyl, nitrile, alkaryl, aryl, amino, thioalkyl, aldehyde, urea, —O—(C═O)-alkyl, —O—(C═O)-aryl, —O—(C═O)—O-alkyl, —O—(C═O)—O-aryl, —NH—(C═O)-alkyl, —NH—(C═O)-aryl, —(C═O)—NH-alkyl, —(C═O)—NH-aryl, —NH—(SO2)-alkyl, —NH—(SO2)-aryl, —(SO2)—NH-alkyl, —(SO2)—NH-aryl groups; X is represented by -A(-M)n or is selected from the group consisting of substituted aliphatic groups, unsubstituted aliphatic groups, substituted cycloaliphatic groups, unsubstituted cycloaliphatic groups, substituted aromatic groups and unsubstituted aromatic groups where in each of said groups one or more of the chain or ring carbon atoms may be substituted by one of more atoms selected from the group consisting of S, O, Si, N and P atoms; n is 2, 3 or 4; A is selected from the group consisting of substituted aliphatic groups, unsubstituted aliphatic groups, substituted cycloaliphatic groups, unsubstituted cycloaliphatic groups, substituted aromatic groups and unsubstituted aromatic groups where in each of said groups one or more of the chain or ring carbon atoms may be substituted by one of more atoms selected from the group consisting of S, O, Si, N and P atoms; each (-M) is independently a substituted or unsubstituted group selected from the group consisting of -(2-S-imidazole) groups and -(2-S-imidazole) groups annelated with an aromatic ring system, the optional substituents for -M being selected from the group consisting of halogen atoms and aliphatic, alkoxy, nitro, acyl, sulfonyl, nitrile, alkaryl and aryl groups.
    • 8. 发明授权
    • Layer configuration with improved stability to sunlight exposure
    • 层状结构具有改善的阳光照射的稳定性
    • US07147936B2
    • 2006-12-12
    • US10642933
    • 2003-08-18
    • Frank LouwetGeert Van DyckJohan LoccufierBert GroenendaalHieronymus Andriessen
    • Frank LouwetGeert Van DyckJohan LoccufierBert GroenendaalHieronymus Andriessen
    • C07D211/021H01L51/50
    • C08G61/126C08L25/08C08L2666/06C09J165/00H01G11/48H01G11/56Y02E60/13Y10S428/917
    • A layer configuration on a support, the layer configuration comprising a layer containing a polymer containing optionally substituted 3,4-alkylenedioxythiophene structural units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, and a compound selected from the group consisting of polyphosphoric acids, polyphosphoric acid salts, thia-alkanedicarboxylic acids, cyclohexadiene compounds and polyhydroxy-compounds selected from the group consisting of tetronic acid derivatives; ortho-dihydroxybenzene compounds with at least one sulpho group, compounds according to formula (I): HO—CH2—CH(OH)—(CH2)m—S—CH2—C(R1)(R2)—CH2—S—(CH2)n—CH(OH)—CH2—OH  (I) wherein R1 and R2 are independently H, —OH or alkyl, and n and m are independently 1, 2 or 3; compounds according to formula (II): HO—(CH2)p—S—CH2—S—(CH2)q—OH  (II) wherein p and q are independently 2, 3 or 4; compounds hydrolyzable to tetronic acid derivatives; compounds hydrolyzable to compounds according to formula (I); and sulpho-substituted 2-thia-alkyl-benzimidazole compounds.
    • 在支撑体上的层构型,该层构型包括含有含有任选取代的3,4-亚烷基二氧噻吩结构单元的聚合物的层,其中两个烷氧基可以相同或不同,或一起代表任选取代的氧基 - 桥,以及选自多磷酸,多磷酸盐,硫杂烷二羧酸,环己二烯化合物和选自由以下组成的组的多羟基化合物的化合物:四氢酸衍生物; 具有至少一个磺酸基的邻二羟基苯化合物,根据式(I)的化合物:<?in-line-formula description =“In-line formula”end =“lead”?> HO-CH 2 -CH(OH) - (CH 2 CH 2)m -S- CH 2 -C(R 1) (R 2) - CH 2 -S-(CH 2)n - (CH 2)n - (CH 2) -CH 2 -O-OH(I)<β在线公式描述=“在线式”末端=“尾”→其中R 1和R 2, SUP> 2独立地是H,-OH或烷基,n和m独立地是1,2或3; 根据式(II)的化合物:<?in-line-formula description =“In-line Formulas”end =“lead”?> HO-(CH 2) > -S-CH 2 -S-(CH 2)2 -O-OH(II)<β在线配方说明书=“ 其中p和q独立地为2,3或4; 可水解成四氢酸衍生物的化合物; 可水解成根据式(I)的化合物的化合物的化合物; 和磺基取代的2-硫代 - 烷基 - 苯并咪唑化合物。
    • 10. 发明申请
    • Stabilizers for use in substantially light-insensitive thermographic recording materials
    • US20050255415A1
    • 2005-11-17
    • US11127645
    • 2005-05-12
    • Frank LouwetJohan Loccufier
    • Frank LouwetJohan Loccufier
    • G03C1/00G03C1/498
    • G03C1/4989G03C1/49845Y10S430/165Y10S430/166
    • A substantially light-insensitive black and white monosheet thermographic recording material comprising a support and a thermosensitive element, said thermosensitive element containing a substantially light-insensitive organic silver salt, an organic reducing agent therefor in thermal working relationship therewith, at least one binder and at least one stabilizer represented by formula (I): wherein R1, R2, R3 and R4 are independently selected from the group consisting of a hydrogen atom, halogen atoms and aliphatic, alkoxy, nitro, acyl, sulfonyl, nitrile, alkaryl, aryl, amino, thioalkyl, aldehyde, urea, —O—(C═O)-alkyl, —O—(C═O)-aryl, —O—(C═O)—O-alkyl, —O—(C═O)—O-aryl, —NH—(C═O)-alkyl, —NH—(C═O)-aryl, —(C═O)—NH-alkyl, —(C═O)—NH-aryl, —NH—(SO2)-alkyl, —NH—(SO2)-aryl, —(SO2)—NH-alkyl, —(SO2)—NH-aryl groups; X is represented by -A(-M)n or is selected from the group consisting of substituted aliphatic groups, unsubstituted aliphatic groups, substituted cycloaliphatic groups, unsubstituted cycloaliphatic groups, substituted aromatic groups and unsubstituted aromatic groups where in each of said groups one or more of the chain or ring carbon atoms may be substituted by one of more atoms selected from the group consisting of S, O, Si, N and P atoms; n is 2, 3 or 4; A is selected from the group consisting of substituted aliphatic groups, unsubstituted aliphatic groups, substituted cycloaliphatic groups, unsubstituted cycloaliphatic groups, substituted aromatic groups and unsubstituted aromatic groups where in each of said groups one or more of the chain or ring carbon atoms may be substituted by one of more atoms selected from the group consisting of S, O, Si, N and P atoms; each (-M) is independently a substituted or unsubstituted group selected from the group consisting of -(2-S-imidazole) groups and -(2-S-imidazole) groups annelated with an aromatic ring system, the optional substituents for -M being selected from the group consisting of halogen atoms and aliphatic, alkoxy, nitro, acyl, sulfonyl, nitrile, alkaryl and aryl groups.