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1. 发明申请

US20040174407A1 Ink jet recording head, manufacturing method therefor, and substrate for ink jet recording head manufacture 失效
标题翻译：喷墨记录头，其制造方法和喷墨记录头制造用基板
公开(公告)号：US20040174407A1
公开(公告)日：2004-09-09
申请号：US10745608
申请日：2003-12-29
申请人： Canon Kabushiki Kaisha
发明人： Kazuhiro Hayakawa , Makoto Terui
IPC分类号： B41J002/015
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1642
摘要： A base member for use for manufacturing an ink jet recording head, wherein the ink jet recording head includes a supply port for receiving liquid from an outside, an ejection outlet for ejecting the liquid, a liquid flow path, in fluid communication with the ejection outlet, for directing the liquid supplied from the supply port to the ejection outlet, an ejection pressure generating portion for generating pressure for ejecting the liquid, the generating portion being disposed at a part of the liquid flow path, and wherein the supply port is formed as a through-opening in a substrate on which an ejection pressure generation element constituting the ejection pressure generating portion, the base member includes a recessed portion formed in such a side of the substrate as is provided with the ejection pressure generation element, the recessed portion extends from an edge of the supply port to a neighborhood of the ejection pressure generation element; and a protection layer provided at least on a surface of a portion of the substrate surface constituting the recessed portion.
摘要翻译：用于制造喷墨记录头的基座构件，其中喷墨记录头包括用于从外部接收液体的供应口，用于喷射液体的喷射出口，与喷射口流体连通的液体流路用于将从所述供给口供给的液体引导到所述喷射口的喷射压力产生部，用于产生喷射液体的压力，所述发生部设置在所述液体流路的一部分，并且其中所述供给口形成为在其上构成喷射压力产生部分的喷射压力产生元件的基板上的通孔，所述基座部件包括形成在设置有喷射压力产生元件的基板的这一侧的凹部，所述凹部延伸从供给口的边缘到喷射压力产生元件的附近; 以及至少设置在构成所述凹部的所述基板表面的一部分的表面上的保护层。

2. 发明申请

US20040238485A1 Substrate processing method and ink jet recording head substrate manufacturing method 失效
标题翻译：基板加工方法和喷墨记录头基板的制造方法
公开(公告)号：US20040238485A1
公开(公告)日：2004-12-02
申请号：US10777108
申请日：2004-02-13
申请人： Canon Kabushiki Kaisha
发明人： Kazuhiro Hayakawa , Makoto Terui
IPC分类号： G11B005/127
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1629
摘要： A substrate (wafer) processing method capable of producing an ink jet recording head substrate in which the reverse surface thereof, that is, the surface having the larger of the two openings of the ink supply hole, is precisely covered by protective film to the very edge of the hole, comprising: a step for forming protective film on the substrate; a step for etching the surface of the protective film; a step for forming etching resistant film on the etched surface of the protective film; a step for forming an ink supply hole pattern through the etchant-resistant film and protective film; a step for forming the ink supply hole through the substrate by etching; a step for removing the portion of the protective film left projecting into the ink supply hole while forming the ink supply hole; and a step for removing the etchant-resistant film.
摘要翻译：能够制造喷墨记录头基板的基板（晶片）处理方法，其中其反面，即具有供墨孔的两个开口中较大的表面的表面被非常地保护膜精确地覆盖所述孔的边缘包括：在所述基板上形成保护膜的步骤; 蚀刻保护膜的表面的步骤; 在保护膜的蚀刻表面上形成耐蚀刻膜的步骤; 通过耐蚀刻膜和保护膜形成供墨孔图案的步骤; 通过蚀刻形成通过基板的供墨孔的步骤; 在形成供墨孔的同时除去留在供墨孔中的保护膜的部分的步骤; 以及去除耐蚀刻膜的步骤。

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