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1. 发明申请

WO9908156A8 LASER-ILLUMINATED STEPPER OR SCANNER WITH ENERGY SENSOR FEEDBACK 审中-公开
标题翻译：带有能量传感器反馈的激光照明的步进或扫描仪
公开(公告)号：WO9908156A8
公开(公告)日：1999-05-14
申请号：PCT/US9815974
申请日：1998-07-31
申请人： CYMER INC , SANDSTROM RICHARD L , DAS PALASH P , FOMENKOV IGOR V , BESAUCELE HERVE A , OZARSKI ROBERT G
发明人： SANDSTROM RICHARD L , DAS PALASH P , FOMENKOV IGOR V , BESAUCELE HERVE A , OZARSKI ROBERT G
IPC分类号： G03F7/20 , G03F7/22 , H01L21/027 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/104 , H01S3/134 , H01S3/225 , G03B27/42 , G03B27/54 , G03B27/60 , G03B27/72 , H01S3/10 , H01S3/18
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A laser-illuminated wafer-exposing system such as a stepper (20) or scanner having a first light intensity detector (44) located within the exposing system near a mask (36) and second light intensity detector (46) located near the output of the laser (12). A feedback control system (14) controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage. In a preferred embodiment the algorithm uses the pulse energy measured with the light intensity detector located near the mark to provide the feedback control and uses the light intensity detector at the output of the laser to assure that the output of the laser is maintained within a predetermined range.
摘要翻译：诸如步进器（20）或扫描器的激光照明晶片曝光系统具有位于曝光系统内靠近掩模（36）的第一光强度检测器（44）和位于靠近掩模（36）的输出处的第二光强度检测器激光器（12）。反馈控制系统（14）基于由至少一个检测器检测到的信号来控制激光器的输出。反馈控制系统包括用算法编程的处理器，该算法用于控制激光放电电压，以便在激光器以突发模式工作时在掩模上提供具有期望强度的光脉冲。该算法至少使用以下参数; 先前测量的脉冲能量，计算的能量误差，计算的剂量误差，脉冲能量随电压的变化率的值以及至少一个参考电压。在优选实施例中，算法使用位于标记附近的光强度检测器测量的脉冲能量来提供反馈控制，并使用激光器输出端处的光强度检测器来确保激光器的输出保持在预定的范围。

2. 发明专利

JPH11317556A LASER CHAMBER MINIMIZING SOUND WAVE AND SHOCK WAVE INTERFERENCE 失效
公开(公告)号：JPH11317556A
公开(公告)日：1999-11-16
申请号：JP5746399
申请日：1999-03-04
申请人： CYMER INC
发明人： JUHASZ TIBOR , UJAZDOWSKI RICHARD C , BESAUCELE HERVE A , OZARSKI ROBERT G , AZZOLA JAMES H
IPC分类号： H01S3/038 , H01S3/032 , H01S3/036 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To obtain a laser chamber which minimizes sound wave and shock wave interference. SOLUTION: A laser chamber 100 is equipped with an angled reflector 116, which reflects sound waves and shock waves to separate them from a laser discharge region 103, so as to enable the laser chamber 100 to be minimally affected by sound waves and shock wave interferences, and the angled reflector 116 is differently structured so as to enable sound and shock waves to disappear. For instance, the angled reflector 116 is provided with a regulated reflecting surface where grooves or holes are provided and which is high in sound/shock wave absorbing properties. A reflecting surface of high absorbing properties may be formed of felt metal or is equipped with a multilayered porous surface. The wall of the laser chamber 100 is so controlled as to enable reflected waves to interfere through absorption and scattering, to aid sound and shock waves to disappear, and a multilayered porous surface is used along a wall so as to absorb and scatter incident waves.

3. 发明专利

JP2000089011A DIFFRACTION GRATING AND MANUFACTURE THEREOF 失效
公开(公告)号：JP2000089011A
公开(公告)日：2000-03-31
申请号：JP25754199
申请日：1999-09-10
申请人： CYMER INC
发明人： OZARSKI ROBERT G , JOHN L CROWLEY
IPC分类号： G02B5/18 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To obtain a large high quality diffraction grating. SOLUTION: The large high quality diffraction grating, which has a carefully formed blaze angle and a defect-free reflection surface, is manufactured on a specially oriented substrate by the use of photolithography and micro machining techniques. Diffraction grating grooves 110 having the reflection surface corresponding to a specific crystal plane is formed by the anisotropic etching of a substrate by selecting a single crystal substrate with a known angle to the crystal plane, on the surface of which the substrate exists. The blaze angle of the diffraction grating is determined by an angle between the surface of the substrate and the specific crystal plane. Consequently, the large type high quality diffraction grating, which is, for example, to be used for a laser device or to be used as a master grating in the manufacture of a replica grating, is manufactured.

4. 发明专利

JP2000004057A HIGHLY RELIABLE MODULAR NARROW BAND PRODUCTION QUALITY KrF EXCIMER LASER 失效
公开(公告)号：JP2000004057A
公开(公告)日：2000-01-07
申请号：JP10840499
申请日：1999-03-11
申请人： CYMER INC
发明人： KNOWLES DAVID S , AZZOLA JAMES H , BESAUCELE HERVE A , DAS PALASH P , ERSHOV ALEXANDER I , FOMENKOV IGOR V , JUHASZ TIBOR , OZARSKI ROBERT G , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L , UJAZDOWSKI RICHARD C , WATSON TOM A , NESS RICHARD M
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To attain a stabilized wavelength ensuring long term production operation and highly reliable product quality by including a more accurate wave meter and a laser computer controller of novel pulse energy control algorithm. SOLUTION: A preionization unit includes, as an integrated component, a brushing element incorporated with an antitracking groove. A part of acoustic energy is reflected and absorbed by arranging acoustic baffles on the opposite sides of a laser chamber and dropped into a lower region of the laser chamber separated from an electrode. Gas flow from a blower 10 is forced to flow between electrodes 6A, 6B by means of an anode supporting bar 44. A wave meter blocks an output beam from the laser chamber by means of a partial reflector which transmits about 95.5% of beam energy and reflects about 4.5% thereof. Detector output is fed to a computer controller using a specified algorithm for regulating the laser charge voltage.

5. 发明专利

CA2322005C RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KRF EXCIMER LASER 未知
公开(公告)号：CA2322005C
公开(公告)日：2003-03-18
申请号：CA2322005
申请日：1999-02-16
申请人： CYMER INC
发明人： KNOWLES DAVID S , FOMENKOV IGOR V , OZARSKI ROBERT G , DAS PALASH P , BESAUCELE HERVE A , WATSON TOM A , AZZOLA JAMES H , NESS RICHARD M , PARTLO WILLIAM N , ROTHWEIL DANIEL A , UJAZDOWSKI RICHARD C , SANDSTROM RICHARD L , JUHASZ TIBOR , ERSHOV ALEXANDER I
IPC分类号： G03F7/20 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/097 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/22
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capabl e of producing 10 mJ laser pulses at 1000 Hz with a bandwith of about 0.6 pm o r less. The present invention is especially suited to long-term round-the-cloc k operation in the lithographic production of integrated circuits. Improvement s over prior art lasers include a single upstream preionizer tube (56) and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler (65) with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

6. 发明专利

DE69939105D1 未知
公开(公告)号：DE69939105D1
公开(公告)日：2008-08-28
申请号：DE69939105
申请日：1999-02-16
申请人： CYMER INC
发明人： KNOWLES DAVID S , AZZOLA JAMES H , BESAUCELE HERVE A , DAS PALASH P , ERSHOV ALEXANDER I , JUHASZ TIBOR , NESS RICHARD M , OZARSKI ROBERT G , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L , UJAZDOWSKI RICHARD C , WATSON TOM A , FOMENKOV IGOR V
IPC分类号： H01S3/038 , H01S3/22 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

7. 发明专利

DE69938777D1 未知
公开(公告)号：DE69938777D1
公开(公告)日：2008-07-03
申请号：DE69938777
申请日：1999-02-22
申请人： CYMER INC
发明人： JUHASZ TIBOR , UJAZDOWSKI RICHARD C , BESAUCELE HERVE A , OZARSKI ROBERT G , AZZOLA JAMES H
IPC分类号： H01S3/036 , H01S3/038 , H01S3/032 , H01S3/225
摘要： A laser chamber has angled reflectors that reflect acoustic and shock waves away from the laser discharge area to minimize acoustic and shock wave disturbances. The angled reflector may have different configurations to assist in the dissipation of the acoustic and shock waves. For example, the angled reflector may have a modulated reflective surface, such as having grooves or holes defined within the surface. Further, the angled reflector may have a reflective surface with acoustic and shock wave absorbing properties. The reflective surface with absorbent properties may be a felt metal or have multiple layered porous surfaces. In addition, the walls of the laser chamber may be modulated to assist in the dissipation of the acoustic waves and shock waves through absorption, scattering, and by generating interference within the reflected waves. Multiple layered porous surfaces may be used along the walls to absorb and scatter incident waves. The walls of the laser chamber may also be covered with an acoustic and shock wave absorbing material, such as felt metal. In other embodiments, the walls of the laser chamber are modulated with grooves, such as triangular or rectangular horizontal grooves, which scatter incident waves and generate interference within reflected waves.

8. 发明专利

HK1036365A1 MODULAR, NARROW-BAND KRF EXCIMER LASER 未知
公开(公告)号：HK1036365A1
公开(公告)日：2001-12-28
申请号：HK01104248
申请日：2001-06-19
申请人： CYMER INC
发明人： FOMENKOV IGOR V , KNOWLES DAVID S , AZZOLA JAMES H , BESAUCELE HERVE A , DAS PALASH P , ERSHOV ALEXANDER I , JUHASZ TIBOR , NESS RICHARD M , OZARSKI ROBERT G , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L , UJAZDOWSKI RICHARD C , WATSON TOM A
IPC分类号： H01S3/038 , G03F7/20 , H01S20090101 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

10. 发明专利

CA2322005A1 RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KRF EXCIMER LASER 未知
公开(公告)号：CA2322005A1
公开(公告)日：1999-09-10
申请号：CA2322005
申请日：1999-02-16
申请人： CYMER INC
发明人： ERSHOV ALEXANDER I , JUHASZ TIBOR , ROTHWEIL DANIEL A , SANDSTROM RICHARD L , DAS PALASH P , UJAZDOWSKI RICHARD C , WATSON TOM A , PARTLO WILLIAM N , OZARSKI ROBERT G , AZZOLA JAMES H , FOMENKOV IGOR V , KNOWLES DAVID S , BESAUCELE HERVE A , NESS RICHARD M
IPC分类号： G03F7/20 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/097 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/22
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capabl e of producing 10 mJ laser pulses at 1000 Hz with a bandwith of about 0.6 pm o r less. The present invention is especially suited to long-term round-the-cloc k operation in the lithographic production of integrated circuits. Improvement s over prior art lasers include a single upstream preionizer tube (56) and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler (65) with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

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