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1. 发明申请

WO2006074969A1 PROCESS FOR THE POST-MODIFICATION OF HOMO AND COPOLYMERS PREPARED BY CONTROLLED FREE RADICAL POLYMERIZATION PROCESSES 审中-公开
标题翻译：通过控制的自由基聚合方法制备的共聚物改性方法
公开(公告)号：WO2006074969A1
公开(公告)日：2006-07-20
申请号：PCT/EP2006/050000
申请日：2006-01-02
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , KNISCHKA, Ralf , ECKSTEIN, Ernst , AUSCHRA, Clemens , MATSUMOTO, Akira
发明人： KNISCHKA, Ralf , ECKSTEIN, Ernst , AUSCHRA, Clemens , MATSUMOTO, Akira
IPC分类号： C08F2/38 , C08F8/12 , C08F8/14 , C08F8/32 , C08F8/46 , C08F4/00 , C08F20/00 , C08L101/00 , C09D7/12
CPC分类号： C08F2/38 , C08F4/00 , C08F8/14 , C08F220/18 , C08F2438/02 , C08F2810/30 , C08G81/025 , C09D7/47 , C09D7/65 , C09D17/00 , C08F293/005 , C08F120/18
摘要： The instant invention pertains to the preparation of polymers or copolymers wherein in a first step a controlled free radical polymerization process is carried out and in a second step the resulting polymer is modified by transesterification reactions. The final modified polymer or copolymer is useful as a dispersant for pigments. Further aspects of the invention are the thus prepared polymers or copolymers, a pigment concentrate containing the polymer or copolymer and a coating material containing the pigment concentrate.
摘要翻译：本发明涉及聚合物或共聚物的制备，其中在第一步骤中进行受控的自由基聚合方法，在第二步中，所得聚合物通过酯交换反应进行改性。最终的改性聚合物或共聚物可用作颜料的分散剂。本发明的其它方面是如此制备的聚合物或共聚物，含有聚合物或共聚物的颜料浓缩物和含有颜料浓缩物的涂料。

2. 发明申请

WO2007071497A1 OXIME ESTER PHOTOINITIATORS 审中-公开
标题翻译： OXIME ESTER照相机
公开(公告)号：WO2007071497A1
公开(公告)日：2007-06-28
申请号：PCT/EP2006/068254
申请日：2006-11-09
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , MATSUMOTO, Akira , TANABE, Junichi , KURA, Hisatoshi , OHWA, Masaki
发明人： MATSUMOTO, Akira , TANABE, Junichi , KURA, Hisatoshi , OHWA, Masaki
IPC分类号： C08F2/50 , C07C251/66 , G03F7/031
CPC分类号： G03F7/031 , B33Y70/00 , C07D209/86 , C07D409/06 , C08F2/50 , G03F7/0007 , G03F7/001
摘要： Compounds of the Formula (I) and (II) wherein M 1 , M 2 and M 3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO 2 or NR 14 ; provided that at least one of M 1 , M 2 or M 3 is a direct bond, CO, O, S, SO, SO 2 or NR 14 ; M 4 is a direct bond, CR" 3 R" 4 , CS, O, S, SO, or SO 2 ; Y is S or NR 18 ; R 1 for example is hydrogen, C 3 -C 8 cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R 2 for example is C 1 -C 20 alkyl; R" 2 has one of the meanings given for R 2 ; R 3 and R 4 are for example hydrogen, halogen, C 1 -C 20 alkyl; R' 3 , R' 4 , R" 3 and R" 4 indepedently of one another have one of the meanings given for R 3 and R 4 ; and R 5 is for example hydrogen, halogen, C 1 -C 20 alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译：式（I）和（II）的化合物（其中M 1，M 2和M 3）彼此独立地不具有键，直接键合，CO，O，S，SO，SO 2或NR 14; 条件是M 1，M 2或M 3 3中的至少一个是直接键，CO，O，S，SO，SO， SUB> 2 或NR 14; M 4是直接键合，CR“3”R“4，CS，O，S，SO或SO 2， / SUB>; Y是S或NR 18; R 1例如是氢，C 3 -C 8环烷基，苯基或萘基，它们都是任选取代的; R 2是例如C 1 -C 20烷基; R“2具有对R 2 2给出的含义之一; R 3和R 4是例如氢，卤素，C 1 -C 20烷基; R'3，R'4，R“，SUB > 3个和R“4个独立地具有对R 3和R 4给出的含义之一; R 式（I）的化合物中至少有两个是氢，卤素，C 1 -C 20烷基，存在肟酯基团;在光聚合反应中表现出意想不到的良好性能。

3. 发明申请

WO2004074242A2 HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 审中-公开
标题翻译：氢化衍生物及其作为有效酸的用途
公开(公告)号：WO2004074242A2
公开(公告)日：2004-09-02
申请号：PCT/EP2004/050096
申请日：2004-02-09
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , MURER, Peter , HINTERMANN, Tobias
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , MURER, Peter , HINTERMANN, Tobias
IPC分类号： C07D
CPC分类号： C07C251/48 , B33Y70/00 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/40 , C07D209/86 , C07D307/91 , C07D333/76 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： Compounds of the formula (I) or (II) wherein R 1 is C 1 -C 10 haloalkylsulfonyl, halobenzenesulfonyl, C 2 -C 10 haloalkanoyl, halobenzoyl; R 2 is halogen or C 1 -C 10 haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar' 1 is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D 1 -D-phenylene or -A r' 1 -A 1 -Y 1 -A 1 -A r' 1 -; wherein these radicals optionally are substituted; Ae', is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for exampfe a direct bond, -0-, -S-, or -NR 6 -; Y, inter alia is C 1 -C 18 alkylene; X is halogen; D is for example -0-, -S- or -NR 6 -; D, inter alia is C 1 -C 18 alkylene; are particularly suitable as photolatent acids in ArF resist technology.
摘要翻译：式（I）或（II）的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1例如为亚苯基，亚萘基，二亚苯基，亚杂芳基，氧联二苯基，亚苯基D-D1-D-亚苯基或-A''1-A1-Y1-A1-A' 其中这些基团任选被取代; Ae'是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部任意取代; A，是直接键合-O - ， - S-或-NR 6 - ; Y特别是C 1 -C 18亚烷基; X是卤素; D是例如-O-，-S-或-NR6-; D，特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特别适合作为光潜酸。

4. 发明申请

WO2002098870A1 SUBSTITUTED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 审中-公开
标题翻译：取代的氧化衍生物及其作为有效酸的用途
公开(公告)号：WO2002098870A1
公开(公告)日：2002-12-12
申请号：PCT/EP2002/005667
申请日：2002-05-23
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
IPC分类号： C07D333/20
CPC分类号： G03F7/0045 , B33Y70/00 , C07C309/00 , C07D333/36 , G03F7/0007 , G03F7/001 , G03F7/0382 , G03F7/0392 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oxime sulfonate compounds of the formula (I) and (II), wherein R 1 is C 1- C 12 alkyl, C 1 -C 4 haloalkyl, hydrogen, OR 9 , NR 10 R 11 , SR 12 or is phenyl which is unsubstituted or substituted by OH, C 1 -C 18 alkyl, halogen and/or C 1 -C 12 alkoxy; R 2 , R 3 , R 4 and R 5 are for example hydrogen or C 1 -C 12 alkyl; R 6 is for example is C 1 -C 18 alkylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl or phenylsulfonyl; R' 6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R 7 , R 8 and R 9 for example are hydrogen or C 1 -C 6 alkyl; R 10 and R 11 , are for example hydrogen or C 1 -C 18 alkyl; R 12 is for example hydrogen, phenyl or C 1 -C 18 alkyl; A is S, O, NR 13 , or a group of formula A1, A2 or A3, R 21 and R22 independently of one other have one of the meanings given for R 7 ; R 23 , R 24 , R 25 and R 26 independently of one another are for example hydrogen, C 1- C 4 alkyl, halogen or phenyl; Z is CR 22 or N; and Z 1 is CR 22 or N; and Z 1 is CR 22 or N; and Z 1 is CH 2- , S, O or NR 13 are particularly suitable as photo-latent acids in resist applications.
摘要翻译：式（I）和（II）的新的肟磺酸酯化合物，其中R 1是C 1 -C 12烷基，C 1 -C 4卤代烷基，氢，OR 9，NR 10 R 11，SR 12或是未取代或被OH，C 1 -C 18烷基，卤素和 /或C 1 -C 12烷氧基; R2，R3，R4和R5是例如氢或C1-C12烷基; R 6例如是C 1 -C 18烷基磺酰基，苯基-C 1 -C 3烷基磺酰基或苯基磺酰基; R 6是例如亚苯基二磺酰基或二苯基二磺酰基; R 7，R 8和R 9例如是氢或C 1 -C 6烷基; R10和R11是例如氢或C1-C18烷基; R 12例如为氢，苯基或C 1 -C 18烷基; A是S，O，NR 13或式A1，A2或A3的基团，R21和R22彼此独立地具有R7所给出的含义之一; R 23，R 24，R 25和R 26彼此独立地是例如氢，C 1 -C 4烷基，卤素或苯基; Z为CR22或N; Z1为CR22或N; Z1为CR22或N; 并且Z 1是CH 2 - ，S，O或NR 13在抗蚀剂应用中特别适合作为光潜伏酸。

5. 发明申请

WO2007062963A1 OXIME ESTER PHOTOINITIATORS 审中-公开
标题翻译： OXIME ESTER照相机
公开(公告)号：WO2007062963A1
公开(公告)日：2007-06-07
申请号：PCT/EP2006/068202
申请日：2006-11-08
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , MATSUMOTO, Akira , TANABE, Junichi , KURA, Hisatoshi , OHWA, Masaki
发明人： MATSUMOTO, Akira , TANABE, Junichi , KURA, Hisatoshi , OHWA, Masaki
IPC分类号： C07D209/86 , C07D209/88 , C07D403/10 , C07D407/10 , G03F7/004
CPC分类号： C07D209/86 , C07D209/88 , C07D403/10 , C07D409/06 , C07D409/10 , G03F7/031
摘要： Compounds of the formula (I), (II), and wherein R 1 , R 2 , R' 2 and R'" 2 for example are C 1 -C 20 alkyl; R 3 , R 4 , and R 5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R 3 , R 4 or R 5 is other than hydrogen or C 1 -C 20 alkyl; R 6 , R 7 , R 8 , R' 6 , R' 7 , R' 8 , R'' 6 , R" 7 , R'"6 and R'"7 for example independently of one another have one of the meanings as given for R 3 , R 4 , and R 5 ; and R 9 for example is C 1 -C 20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译：式（I），（II）和其中R 1，R 2，R'2和R“”的化合物 > 2 例如是C 1 -C 20烷基; R 3，R 4，和R 5，例如彼此独立地是氢或定义的取代基，条件是R 3，R 4或R 4中的至少一个， R 5不是氢或C 1 -C 20烷基; R 6，R 7， R 8，R 8，R 6，R“7，R 8，R”7， R 6，R“7，R”6和R“7例如彼此独立地具有R 3所给出的含义之一

6. 发明申请

WO2003067332A3 SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 审中-公开
公开(公告)号：WO2003067332A3
公开(公告)日：2003-08-14
申请号：PCT/EP2003/000821
申请日：2003-01-28
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , MURER, Peter
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , MURER, Peter
IPC分类号： G03F7/004
摘要： Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X 0 is -[CH 2 ] h -X or -CH=CH 2 ; h is 2, 3, 4, 5 or 6; R 1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R 1 , when n is 2, is for example optionally substituted phenylene or naphthylene; R 2 for example has one of the meanings of R 1 ; X is for example -OR 20 , -NR 21 R 22 , -SR 23 ; X' is -X 1 -A 3 -X 2 -; X 1 and X 2 are for example -O-, -S- or a direct bond; A 3 is e.g. phenylene; R 3 has for example one of the meanings given for R 1 ; R 4 has for example one of the meaning given for R 2 ; R 5 and R 6 e.g. are hydrogen; G i.a. is -S- or -O-; R 7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R 8 and R 9 e.g. are C 1 -C 18 alkyl; R 10 has one of the meanings given for R 7 ; R 11 i.a. is C 1 -C 18 alkyl; R 12 , R 13 , R 14 , R 15 R 16 , R 17 and R 18 for example are hydrogen or C 1 -C 18 alkyl; R 20 , R 21 , R 22 and R 23 i.a. are phenyl or C 1 -C 18 alkyl; give high resolution with good resist profile.

7. 发明申请

WO2002046507A3 ONIUM SALTS AND THE USE THEROF AS LATENT ACIDS 审中-公开
公开(公告)号：WO2002046507A3
公开(公告)日：2002-06-13
申请号：PCT/EP2001/013725
申请日：2001-11-26
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , OHWA, Masaki
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , OHWA, Masaki
IPC分类号： G03F7/004
摘要： A chemically amplified photoresist composition comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) as photosensitive acid donor, at least one compound of the formula Ia, Ib, Ic, IIb or IIc wherein R 1 is for example C 1 -C 5 alkyl, C 3 -C 30 cycloalkyl, C 1 -C 5 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 8 cycloalkenyl, C 6 -C 12 bicycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, or is a heteroaryl radical; all of which are unsubstituted or substituted; optionally some of the substituents form 5- or 6-membered rings with further substituents on the phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl ring or with one of the carbon atoms of the phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl ring; R' 1 is for example C 1 -C 12 alkylene , C 3 -C 30 cycloalkylene, phenylene, naphtylene, diphenylene, or oxydiphenylene, wherein these radicals are unsubstituted or substituted; A and B for example are a direct bond; Ar 1 and Ar 2 independently of each other for example are phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl, all of which are unsubstituted or are substituted; Ar 3 , Ar 4 and Ar 5 for example have one of the meanings given for Ar 1 and Ar 2 ; Y is for example C 3 -C 3 -C 30 cycloalkylene, phenylene, naphthylene, diphenylene, or oxydiphenylene, all of which are unsubstituted or substituted.

8. 发明授权

EP1177182B1 NOVEL PHOTOINITIATORS AND THEIR APPLICATIONS 有权
标题翻译：新型光引发剂及其应用
公开(公告)号：EP1177182B1
公开(公告)日：2006-11-29
申请号：EP00929446.3
申请日：2000-04-27
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： YAMATO, Hitoshi , OHWA, Masaki , ASAKURA, Toshikage , MATSUMOTO, Akira
IPC分类号： C07D295/10 , C07C323/54 , C08F2/50 , G03F7/031 , C08F295/00
CPC分类号： C07D295/108 , B33Y70/00 , C07C323/54 , C08F2/50 , C08F293/005 , C08F295/00 , C08L53/00 , C08L53/02 , C09D153/00 , C09D153/02 , C09J153/00 , C09J153/02 , G03F7/031 , Y10S522/904
摘要： Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI' inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is -NR3R4 or -OH; M1' is for example a group (c); R3' is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.

9. 发明公开

EP1320785A2 OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译： OREIMDERIVATE UND IHRE VERWENDUNG ALS LATENTESAÜRE
公开(公告)号：EP1320785A2
公开(公告)日：2003-06-25
申请号：EP01985295.3
申请日：2001-09-18
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： YAMATO, Hitoshi , ASAKURA, TOSHIKAGE , MATSUMOTO, Akira , OHWA, Masaki
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C309/63
CPC分类号： G03F7/0392 , B33Y70/00 , G03F7/0045 , G03F7/0382
摘要： New oxime sulfonate compounds of formula (I, II, III, IV, V, VI and VII) wherein R1 is for example C1-C18 alkylsulfonyl, R2 is halogen or C1-C10 haloalkyl; R3 is for example unsubstituted or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1-C12 alkylene; -O-C-bond or a O-Si-bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, -O-, or S-, or are C1-C12 alkylene or phenylene unsubstituted or substituted; Y1 is C1-C12 alkylene which is for example subsituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1-C12 alkylene; Y3 is e.g. a tetravalent radical of C1-C12 alkylene; X is halogen; Ar'1 is for example C1-C12 alkyl which is unsubstituted or substituted; Ar'1 is for example phenylene; provided that at least one of the radicals Ar'1, Ar'1, is substituted by 1 to 3 groups of (VIII), (IX), (X), (XI), (XII) and/or (XIII); M+ is e.g. (XIV); L- is for example halogen; R¿15?, R16, R17 and R18 are e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.
摘要翻译：式I，II，III，IV，V，VI和VII R 1的新的肟磺酸酯化合物是例如C 1 -C 18 >烷基磺酰基，R 2是卤素或C 1 -C 10卤代烷基; R 3是例如未取代的苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基; Ar 1是例如直接键合的C 1 -C 12亚烷基; -O-C键或在酸的作用下切割的-O-Si键; A 1，N 2，A 3，A 4，A 5， A 6，A 7，A 8，A 9，A 10， A 11和A 12是例如直接键，-O-或-S-，或者是C 1 -C 3 > 12个亚烷基或亚苯基未取代或取代; Y 1是例如被OR 4取代的C 1 -C 12亚烷基或SR _{7 ; Y 2是例如。 C 1 -C 12亚烷基的三价基团; Y 3是例如。 C 1 -C 12亚烷基的四价基团; X是卤素; Ar 1'是例如未取代或取代的C 1 -C 12烷基; Ar“1”是例如亚苯基; 条件是基团Ar 1'，Ar“1'中的至少一个被1至3个例如卤素取代; R 15，R 16，R 17和R 18，例如，氢或苯基; R 19，R 20，R 21，R 22，R 23和R 23分别为例如，苯基; 特别适用于光刻胶的制备。}

10. 发明授权

EP1392675B1 SUBSTITUTED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译：国际海运联合会副主席
公开(公告)号：EP1392675B1
公开(公告)日：2005-02-09
申请号：EP02732733.7
申请日：2002-05-23
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
IPC分类号： C07D333/20 , C07C309/66 , C07C309/73 , C07C215/62 , G03F7/004
CPC分类号： G03F7/0045 , B33Y70/00 , C07C309/00 , C07D333/36 , G03F7/0007 , G03F7/001 , G03F7/0382 , G03F7/0392 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1-C4haloalkyl, hydrogen, OR9, NR10R11, SR12 or is phenyl which is unsubstituted or substituted by OH, C1-C18alkyl, halogen and/or C1-C12alkoxy; R2, R3, R4 and R5 are for example hydrogen or C1-C12alkyl; R6 is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl or phenylsulfonyl; R'6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R7, R8 and R9 for example are hydrogen or C1-C6alkyl; R10 and R11, are for example hydrogen or C1-C18alkyl; R12 is for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13, or a group of formula A1, A2 or A3, R21 and R22 independently of one other have one of the meanings given for R7; R23, R24, R25 and R26 independently of one another are for example hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22 or N; and Z1 is CR22 or N; and Z1 is CR22 or N; and Z1 is CH2-, S, O or NR13 are particularly suitable as photo-latent acids in resist applications.
摘要翻译：式（I）和（II）的新的肟磺酸酯化合物，其中R 1是C 1 -C 12烷基，C _{-C _{12 烷氧基; R 2，R 3，R 4和R 5是例如氢或C 1， / SUB> -C _{12 烷基; R 6是例如C 1 -C 18烷基磺酰基，苯基-C 1 -C 1 - 3烷基磺酰基或苯基磺酰基; R 6'是例如亚苯基二磺酰基或二苯基二磺酰基; R 7，R 8和R 9例如是氢或C 1 -C 6烷基， / SUB>烷基; R 10和R 11是例如氢或C 1 -C 18烷基; R 12是例如氢，苯基或C 1 -C 18烷基; A是S，O，NR 13或式A1，A2或A3的基团，R 21和R 22彼此独立地具有对R给出的含义之一 _{7 ; R 23，R 24，R 25和R 26彼此独立地是例如氢，C 1 -C 6烷基， C 1 -C 4烷基，卤素或苯基; Z是CR 22或N; 并且Z 1是CR 22或N; 并且Z 1是CR 22或N; 并且Z 1是CH 2，S，O或NR 13特别适合作为抗蚀剂应用中的光潜伏酸。}}}}

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