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    • 4. 发明申请
    • METHOD FOR LOCALLY REMOVING A SURFACE LAYER, AND SOLAR CELL
    • 方法表层及太阳能电池的局部切除
    • WO2012022329A3
    • 2012-04-19
    • PCT/DE2011075152
    • 2011-06-28
    • CENTROTHERM PHOTOVOLTAICS AGKUEHN TINOTEPPE ANDREASFRIESS TOBIASESTURO-BRETON AINHOAKELLER STEFFEN
    • KUEHN TINOTEPPE ANDREASFRIESS TOBIASESTURO-BRETON AINHOAKELLER STEFFEN
    • H01L31/0224H01L31/0236H01L31/18
    • H01L29/34H01L21/268H01L31/02363H01L31/1804Y02E10/547Y02P70/521
    • The invention relates to a method for locally removing a surface layer (36) which is applied to a texture (30) of a textured substrate, wherein the texture (30) has a multiplicity of structure elements (32) with structure tips (34) and/or structure edges, having the steps of locally irradiating the texture (30) through the surface layer (36) by means of laser radiation which at least partially penetrates through the surface layer (36) and which is at least partially absorbed by the texture (30), the intensity of which laser radiation is set such that the texture (30) is locally melted by means of the laser radiation and subsequently recrystallized (16), wherein the surface layer (36) is locally opened in the region of the structure tips (34) and/or of the structure edges such that the openings around the structure tips (34) and/or the structure edges after the local irradiation of the texture (30) are completely surrounded by continuous, non-open regions of the surface layer (36), and removing (18) the recrystallized regions (38) of the texture (30) in an etching step by means of an etching medium, wherein the surface layer (36) outside the recrystallized regions (38) is used as an etching mask against the etching medium, and to a solar cell (70).
    • 一种用于局部去除的表面层(36),其被施加到织构的衬底的织构(30)的过程中,织构(30)包括多个结构元件(32),其具有结构顶部(34)和/或具有结构的边缘,其包括以下步骤 通过表面层的装置中的纹理(30)通过该表面层(36)的局部照射(36)至少部分地穿透和从纹理(30)至少部分地吸收激光辐射,其强度被设定为使得所述纹理(30)借助于 激光辐射局部熔化和下面(16)中重结晶,其特征在于,使得根据纹理(30)的局部照射到尖端的结构中的开口在结构尖端的区域中的表面层(36)(34)和/或结构边缘局部地打开的 (34)和/或围绕的表面层的连续的开放区域边缘结构(36)v 其中,从所述再结晶区域的表面层(36)远(38)用作抗蚀刻介质的蚀刻掩模通过蚀刻介质的装置在蚀刻步骤中的纹理(30)的再结晶区域(38)的包围ollständig,并除去(18),和 太阳能电池(70)。