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1. 发明申请

WO2009053001A1 OPTISCHE VORRICHTUNG MIT VERBESSERTEM ABBILDUNGSVERHALTEN SOWIE VERFAHREN DAZU 审中-公开
标题翻译：具有改进的图像性能和方法，光学设备
公开(公告)号：WO2009053001A1
公开(公告)日：2009-04-30
申请号：PCT/EP2008/008815
申请日：2008-10-17
申请人： CARL ZEISS SMT AG , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , ZELLNER, Johannes
发明人： WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , ZELLNER, Johannes
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258
摘要： Die Erfindung betrifft eine optische Vorrichtung (10) mit verbessertem Abbildungsverhalten sowie ein Verfahren zum Verbessern des Abbildungsverhaltens der optischen Vorrichtung (10). Die optische Vorrichtung (10) weist eine Mehrzahl an optischen Elementen (28a-d) entlang einer Lichtausbreitungsrichtung der optischen Vorrichtung (10) zum Abbilden einer Struktur (20) in einer Objektebene (O) der optischen Vorrichtung (10) auf ein Substrat (22) in einer Bildebene (B) der optischen Vorrichtung (10) auf. Die optische Vorrichtung (10) weist im Kaltzustand zumindest einen ersten Abbildungsfehler auf, der einen zumindest zweiten, während des Betriebs durch Erwärmen zumindest eines der optischen Elemente (28a-d) verursachten Abbildungsfehler der optischen Vorrichtung (10) zumindest teilweise kompensiert.
摘要翻译：本发明涉及一种光学器件（10）具有改善的成像性能以及用于提高光学装置（10）的成像性能的方法。所述光学装置（10）包括多个光学元件（28A-D）沿所述光学装置（10）的光的传播方向在基板上的光学装置（10）的物平面（O）成像的结构（20）的（22 ）在该光学装置（10）的像平面（B）。所述光学装置（10）具有在冷态下至少通过加热光学元件中的至少一个（28A-D）在操作期间，其补偿光学器件（10）包括的像差至少第二，引起至少部分的第一像差。

2. 发明申请

WO2007131161A3 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 审中-公开
公开(公告)号：WO2007131161A3
公开(公告)日：2007-11-15
申请号：PCT/US2007/068227
申请日：2007-05-04
申请人： CARL ZEISS SMT AG , SHAFER, David , DODOC, Aurelian , FELDMANN,, Heiko , ZELLNER, Johannes , ULRICH, Wilhelm , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , FUERTER, Gerhard
发明人： SHAFER, David , DODOC, Aurelian , FELDMANN,, Heiko , ZELLNER, Johannes , ULRICH, Wilhelm , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , FUERTER, Gerhard
IPC分类号： G02B13/14 , G02B13/26 , G03F7/20
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

3. 发明申请

WO2009152959A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY COMPRISING A DEVICE FOR THE THERMAL MANIPULATION OF AN OPTICAL ELEMENT 审中-公开
标题翻译：包含用于光学元件的热处理的器件的半导体光刻机的投影曝光装置
公开(公告)号：WO2009152959A1
公开(公告)日：2009-12-23
申请号：PCT/EP2009/004006
申请日：2009-06-04
申请人： CARL ZEISS SMT AG , HAUF, Markus , BLEIDISTEL, Sascha , MIGURA, Sascha , MANN, Hans-Juergen , ENKISCH, Hartmut , ZELLNER, Johannes , SCHOTTNER, Michael , KRAEHMER, Daniel , TOTZECK, Michael , DODOC, Aurelian , HETZLER, Jochen , BEIERL, Helmut , ULRICH, Wilhelm
发明人： HAUF, Markus , BLEIDISTEL, Sascha , MIGURA, Sascha , MANN, Hans-Juergen , ENKISCH, Hartmut , ZELLNER, Johannes , SCHOTTNER, Michael , KRAEHMER, Daniel , TOTZECK, Michael , DODOC, Aurelian , HETZLER, Jochen , BEIERL, Helmut , ULRICH, Wilhelm
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70266
摘要： The invention relates to a projection exposure apparatus (16) for semiconductor lithography comprising a device for the thermal manipulation of an optical element (1,100), wherein the optical element (1,100) has a front side (2) for the reflection of electromagnetic radiation and a rear side (3,103), and wherein thermal actuators (4) for influencing the optical properties of the optical element (1,100) are present, which act on the optical element (1,100) from the rear side (3,103) thereof.
摘要翻译：本发明涉及一种用于半导体光刻的投影曝光装置（16），包括用于光学元件（1,100）的热操纵的装置，其中光学元件（1,100）具有用于反射电磁辐射的前侧（2）后侧（3,103），并且其中存在用于影响光学元件（1,100）的光学特性的热致动器（4），其从其后侧（3,103）作用在光学元件（1,100）上。

4. 发明申请

WO2004095137A1 PROJECTION OPTICAL SYSTEM 审中-公开
标题翻译：投影光学系统
公开(公告)号：WO2004095137A1
公开(公告)日：2004-11-04
申请号：PCT/EP2003/004245
申请日：2003-04-24
申请人： CARL ZEISS SMT AG , FEHR, Jean-Noel , MANN, Hans-Jürgen , ZELLNER, Johannes
发明人： FEHR, Jean-Noel , MANN, Hans-Jürgen , ZELLNER, Johannes
IPC分类号： G03F7/20
CPC分类号： G02B17/0657 , G03F7/70233 , G03F7/70825 , G03F7/70891 , G03F7/7095 , G03F7/70958
摘要： A projection exposure apparatus for transferring an image of a patterned reticle onto a substrate comprises an illumination optical system for generating and directing an exposure beam onto the reticle, and a projection optical system provided between the reticle and the substrate. The projection optical system has a plurality of imaging mirrors each having a mirror support made of a support material. The support materials are subject to thermal expansion during projection that induces imaging aberrations at substrate level. The support materials are selected such that an aberration merit function, which is indicative of the overall amount of at least one type of the thermally induced aberrations, is minimized by mutual compensation of contributions of the mirrors to the one type of thermally induced aberrations. As a result, the mirror supports will then generally be different and have, when heated during exposure, different coefficients of thermal expansion.
摘要翻译：用于将图案化掩模版的图像转印到基板上的投影曝光装置包括用于产生并将曝光光束引导到光罩上的照明光学系统，以及设置在标线片和基板之间的投影光学系统。投影光学系统具有多个成像镜，每个成像镜具有由支撑材料制成的反射镜支撑。支撑材料在投影期间经受热膨胀，从而在基底水平引起成像像差。选择支撑材料，使得通过相互补偿反射镜对于一种类型的热诱导像差的贡献来最小化指示至少一种类型的热诱导像差的总量的像差优点函数。结果，反射镜支撑件通常将是不同的，并且当在曝光期间加热时具有不同的热膨胀系数。

5. 发明申请

WO2010115500A1 IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE 审中-公开
标题翻译：使用这种类型的成像光学的成像光学和投影曝光安装
公开(公告)号：WO2010115500A1
公开(公告)日：2010-10-14
申请号：PCT/EP2010/001512
申请日：2010-03-11
申请人： CARL ZEISS SMT AG , MANN, Hans-Jürgen , ZELLNER, Johannes , DODOC, Aurelian , ZAHLTEN, Claus , MENKE, Christoph , PRETORIUS, Marco , ULRICH, Wilhelm , ROSTALSKI, Hans-Jürgen
发明人： MANN, Hans-Jürgen , ZELLNER, Johannes , DODOC, Aurelian , ZAHLTEN, Claus , MENKE, Christoph , PRETORIUS, Marco , ULRICH, Wilhelm , ROSTALSKI, Hans-Jürgen
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： An imaging optics (36) has a plurality of mirrors (M1 to M6), which image an object field (4) in an object plane (5) in an image field (8) in an image plane (9). A first mirror (M1) is arranged in the imaging beam path of imaging light after the object field (4) and a last mirror (M6) is arranged in the imaging beam path before the image field (8). In the unfolded imaging beam path, an impingement point of a chief ray (16), which belongs to a central object field point, on a useful face (23) of each of the mirrors (M1 to M6), which is configured to guide the imaging light (3), has a mirror spacing (Z M ) from the image plane (9). The mirror spacing (Z M1 ) of the first mirror (Ml) is greater than the mirror spacing (Z M6 ) of the last mirror (M6). The mirror spacing (z M3 ) of a fourth to last mirror (M3) is greater than the mirror spacing (z M1 ) of the first mirror (M1). In a further aspect of the invention, a reflection surface of at least one of the mirrors (M1 to M6) of the imaging optics (36) is configured as a static free form surface which cannot be described by a rotationally symmetrical function. This differs from an aspherical surface best adapted thereto, which can be described by a rotationally symmetrical function in that a normal (FNB) to a free form surface element (20) of a used region (23) of the free form surface, which is configured to guide the imaging light (3), adopts an angle (α) of a maximum of 70 μrad with a normal (FN) to a corresponding asphere surface element (22) of the aspherical surface (21). With the two aspects, a handleable combination of small imaging errors, manageable production and good throuhput for the imaging light results.
摘要翻译：成像光学器件（36）具有多个反射镜（M1至M6），其对图像平面（9）中的图像场（8）中的物体平面（5）中的物体场（4）进行成像。在物场（4）的成像光束路径中布置第一反射镜（M1），并且在图像场（8）之前的成像光束路径中布置最后一个反射镜（M6）。在展开成像光束路径中，属于中心物体场点的主射线（16）的撞击点位于每个反射镜（M1至M6）的有用面（23）上，其被配置为引导成像光（3）具有与图像平面（9）的反射镜间隔（ZM）。第一反射镜（M1）的反射镜间距（ZM1）大于最后一个反射镜（M6）的反射镜间距（ZM6）。第四至最后一个反射镜（M3）的反射镜间距（zM3）大于第一反射镜（M1）的反射镜间隔（zM1）。在本发明的另一方面，成像光学器件（36）的至少一个反射镜（M1至M6）的反射表面被构造为无法通过旋转对称功能描述的静态自由形式表面。这与最适合于其的非球面不同，其可以通过旋转对称的功能来描述，其中自由形式表面的使用区域（23）的自由形式表面元件（20）的法线（FNB）是被配置为引导成像光（3），将正常（FN）的最大值为70μrad的角度（a）与非球面（21）的对应的非球面表面元件（22）进行比较。通过这两个方面，可以组合小的成像错误，可管理的生产和成像光的良好输出结果。

6. 发明申请

WO2010112328A1 IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE 审中-公开
标题翻译：使用这种类型的成像光学的成像光学和投影曝光安装
公开(公告)号：WO2010112328A1
公开(公告)日：2010-10-07
申请号：PCT/EP2010/053341
申请日：2010-03-16
申请人： CARL ZEISS SMT AG , ZELLNER, Johannes , DODOC, Aurelian , PRETORIUS, Marco , MENKE, Christoph , ULRICH, Wilhelm , MANN, Hans-Jürgen
发明人： ZELLNER, Johannes , DODOC, Aurelian , PRETORIUS, Marco , MENKE, Christoph , ULRICH, Wilhelm , MANN, Hans-Jürgen
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An imaging optics (7) has a plurality of mirrors (M1 to M6), which image an object field (4) in an object plane (5) in an image field (8) in an image plane (9). A pupil plane (17) is arranged in the imaging beam path between the object field (4) and the image field (8). A stop (20) is arranged in the pupil plane (17). The pupil plane (17) is tilted, in other words adopts an angle (α) with respect to the object plane (5), which is greater than 0.1°. An imaging optics results, with which a handleable combination of small imaging errors, manageable production and good throughput for the imaging light is achieved.
摘要翻译：成像光学器件（7）具有多个反射镜（M1至M6），其对图像平面（9）中的图像场（8）中的物体平面（5）中的物体场（4）进行成像。在物场（4）和图像场（8）之间的成像光束路径中布置瞳平面（17）。在光瞳平面（17）中设置有一个止动件（20）。瞳平面（17）倾斜，换句话说，相对于物平面（5）采取大于0.1°的角度（a）。可以获得成像光学元件，实现了成像光的小成像误差，可管理生产和良好生产量的可处理组合。

7. 发明申请

WO2010028748A1 IMAGING OPTICAL SYSTEM 审中-公开
标题翻译：成像光学系统
公开(公告)号：WO2010028748A1
公开(公告)日：2010-03-18
申请号：PCT/EP2009/006171
申请日：2009-08-26
申请人： CARL ZEISS SMT AG , MANN, Hans-Jürgen , SCHÖPPACH, Armin , ZELLNER, Johannes
发明人： MANN, Hans-Jürgen , SCHÖPPACH, Armin , ZELLNER, Johannes
IPC分类号： G02B17/06 , G02B5/10 , G02B7/182 , G03F7/20
CPC分类号： G03F7/702 , G02B7/181 , G02B17/0657 , G02B17/0663 , G02B21/04 , G02B26/06 , G02B26/0825 , G03F7/70233 , G03F7/70266
摘要： An imaging optical system (31) with a plurality of mirrors (Ml to M6), which image an object field (4) in an object plane (5) into an image field (8) in an image plane (9), according to either one of the following configurations : a) a connecting axis (32), which is perpendicular to the object plane (5) and runs through the geometric centre point of the mirror (M2), which is spatially most closely adjacent to the object field (4), the mirror (M2) most closely adjacent to the object field (4), is arranged at a spacing (A) from the object field (4), which is greater than a spacing (B) of an entry pupil plane (30) of the imaging optical system (31), said pupil plane (30) lying in the beam path of the imaging light (3) upstream of the object field (4), from the object field (4); b) - with an entry pupil plane (30), which lies in the beam path of the imaging light (30) upstream of the object field (4), wherein the imaging light (3) is reflected on the object plane (5), - with a connecting axis (32) which is perpendicular to the object plane (5) and runs through the geometric centre point of the entry pupil, - wherein an intersection point (C) of the connecting axis (32) with the entry pupil plane (30) is closer to the object plane (5) than a first intersection point (D) in the beam path of the imaging light (3) downstream of the object field (4), of a main beam (33) of a central object field point with the connecting axis (32), - wherein at least one of the mirrors (M5, M6) has a through-opening (18, 19) for imaging light (3) to pass through; c) the imaging optical system (7; 31), spaced apart from a first mirror (M5), which is most closely adjacent to one of the two fields (4, 8) and is designated a neighbouring mirror, has a deformable further mirror (M3), which is arranged in a plane, which is optically conjugated to an arrangement plane of the neighbouring mirror (M5) in the imaging optical system (7; 31); d) a support body (21) of a mirror (M5), which is most closely adjacent to one of the two fields (4, 8), of the neighbouring mirror, is made of a material, the modulus of elasticity of which is at least twice as great as the modulus of elasticity of the material of the support body (22) of at least one of the other mirrors (M 1 to M4, M6).
摘要翻译：一种具有多个反射镜（M1至M6）的成像光学系统（31），其将目标平面（5）中的物体场（4）成像到图像平面（9）中的图像场（8），根据以下配置之一：a）垂直于物平面（5）并穿过反射镜（M2）的几何中心点的连接轴线（32），空间上最接近物体场（4）中，与物场（4）最紧密相邻的反射镜（M2）以与入射光瞳面（B）的间隔（B）大的距离物距离（A）的距离（A）（30）在所述物场（4）的上游位于所述成像光（3）的光束路径中的所述成像光学系统（31）的所述光束平面（30）中。 b） - 具有入射光瞳平面（30），其位于物场（4）上游的成像光（30）的光束路径中，其中成像光（3）在物平面（5）上被反射， - 具有垂直于物平面（5）并穿过入射光瞳的几何中心点的连接轴线（32），其中连接轴线（32）与入射光瞳的交点（C）平面（30）比物位（4）下游的成像光（3）的光束路径中的第一交点（D）更靠近物平面（5），主光束具有连接轴（32）的中心物体场点， - 其中至少一个反射镜（M5，M6）具有用于使光（3）成像通过的通孔（18,19） c）与第二反射镜（M5）间隔开的成像光学系统（7; 31），其与两个场（4,8）中的一个最接近并被指定为相邻的反射镜，具有可变形的另外的反射镜（M3），其布置在与所述成像光学系统（7; 31）中的相邻反射镜（M5）的配置平面光学共轭的平面中; d）与邻近反射镜的两个场（4,8）中的一个最紧密相邻的反射镜（M5）的支撑体（21）由材料制成，其弹性模量为是至少一个其它反射镜（M 1至M4，M6）的支撑体（22）的材料的弹性模量的至少两倍。

8. 发明申请

WO2009115180A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标的微观算法
公开(公告)号：WO2009115180A1
公开(公告)日：2009-09-24
申请号：PCT/EP2009/001448
申请日：2009-02-28
申请人： CARL ZEISS SMT AG , ZELLNER, Johannes , MANN, Hans-Jürgen , ENDRES, Martin
发明人： ZELLNER, Johannes , MANN, Hans-Jürgen , ENDRES, Martin
IPC分类号： G03F7/20
CPC分类号： G03F7/70316 , G02B17/0663 , G03F7/702 , G03F7/70233
摘要： A projection objective (7) for microlithography is used for imaging an object field (4) in an object plane (5) into an image field (8) in an image plane (9). The projection objective (7) comprises at least six mirrors (M1 to M6) of which at least one mirror has a freeform reflecting surface. According to one aspect of the invention, the ratio between an overall length (T) of the projection objective (7) and an object image shift (d OIS ) is smaller than 12. According to another aspect of the invention, the image plane (9) is the first field plane of the projection objective (7) downstream of the object plane (5). According to another aspect of the invention, the projection objective has a plurality of mirrors (M1 to M6), wherein the ratio between an overall length (T) and an object image shift (d OIS ) is smaller than 2.
摘要翻译：用于微光刻的投影物镜（7）用于将物平面（5）中的物场（4）成像为图像平面（9）中的图像场（8）。投影物镜（7）包括至少六个反射镜（M1至M6），其中至少一个反射镜具有自由形反射表面。根据本发明的一个方面，投影物镜（7）的总长（T）与物体像偏移（dOIS）之间的比率小于12.根据本发明的另一方面，图像平面（9 ）是物平面（5）下游的投影物镜（7）的第一场平面。根据本发明的另一方面，投影物镜具有多个反射镜（M1至M6），其中总长度（T）和物体图像偏移（dOIS）之间的比率小于2。

9. 发明申请

WO2005040925A1 EUV-PROJEKTIONSOBJEKTIV MIT SPIEGELN AUS MATERIALIEN MIT UNTERSCHIEDLICHEM VORZEICHEN DER STEIGUNG DER TEMPERATURABHÄNGIGKEIT DES WÄRMEAUSDEHNUNGSKOEFFIZIENTEN NAHE DER NULLDURCHGANGSTEMPERATUR 审中-公开
标题翻译：具有不同标牌材料接近零隧道温度的热膨胀系数的温度依赖性的斜率MIRROR EUV投影镜头
公开(公告)号：WO2005040925A1
公开(公告)日：2005-05-06
申请号：PCT/EP2003/010761
申请日：2003-09-27
申请人： CARL ZEISS SMT AG , DINGER, Udo , EISERT, Frank , KOEHLER, Stefan , OCHSE, Andreas , ZELLNER, Johannes , LOWISCH, Martin , LAUFER, Timo
发明人： DINGER, Udo , EISERT, Frank , KOEHLER, Stefan , OCHSE, Andreas , ZELLNER, Johannes , LOWISCH, Martin , LAUFER, Timo
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , B82Y10/00 , G02B1/00 , G02B5/0891 , G02B7/181 , G03F7/70891 , G21K1/062 , G21K2201/065
摘要： Ein Projektionsobjektiv (1) für kurze Wellenlängen, insbesondere für Wellenlängen λ
摘要翻译：投影透镜（1），用于短的波长，特别是对于波长的λ<具有多个反射镜（M1，M2，M3，M4，M5和M6），其位于精确地定位于光轴（5）的157纳米，提供。反射镜（M1，M2，M3，M4，M5和M6）包括多层涂层。至少两种不同的反射镜的材料作为温度的在过零的热膨胀系数的范围内的功能，特别是在尺寸的符号，不同之处设置系数的热膨胀的斜率。

10. 发明公开

EP2021854A2 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 审中-公开
标题翻译：四组镜头微光刻对称LENS
公开(公告)号：EP2021854A2
公开(公告)日：2009-02-11
申请号：EP07783270.7
申请日：2007-05-04
申请人： Carl Zeiss SMT AG
发明人： SHAFER, David , DODOC, Aurelian , FELDMANN,, Heiko , ZELLNER, Johannes , ULRICH, Wilhelm , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , FUERTER, Gerhard
IPC分类号： G02B13/14 , G02B13/26 , G03F7/20
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

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