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1. 发明申请

WO2009043790A2 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：微压印技术的投影目标
公开(公告)号：WO2009043790A2
公开(公告)日：2009-04-09
申请号：PCT/EP2008/062835
申请日：2008-09-25
申请人： CARL ZEISS SMT AG , BEIERL, Helmut , FELDMANN, Heiko , HETZLER, Jochen , TOTZECK, Michael
发明人： BEIERL, Helmut , FELDMANN, Heiko , HETZLER, Jochen , TOTZECK, Michael
IPC分类号： G03F7/20 , G02B13/14
CPC分类号： G03F7/70341 , G02B1/02 , G02B21/33 , G03F7/70941
摘要： An assembly 11 of a projection objective for microlithography comprises a number of optical elements and an aperture 14. The optical element of the assembly 11 before the last optical element oriented towards the image is a planar convex lens 12, whose convex surface 2b is oriented towards the object, and whose planar surface 2a is oriented towards the image. As a last optical element of the assembly 11 oriented towards the image, an optical terminal element 17 is provided which comprises a planar plate 19. Between the planar surface 2b of the lens 12 and the planar plate 19 of the optical terminal element 17, thus at the object oriented surface of the planar plate, and also on the image oriented surface of the planar plate of the terminal element 17 a respective immersion liquid 13b or 13a is provided. The planar plate is thus in contact with the immersion liquids 13a and 13b on both sides. By this configuration it is assured that contaminations within the immersion liquid 13a disposed on the image oriented side do not impair the planar convex lens 12. Replacing the terminal element 17 or the planar plate 19 of the terminal element 17, however, is easily possible, as soon as their imaging properties become insufficient through contamination or other impairments.
摘要翻译：用于微光刻的投影物镜的组件11包括多个光学元件和孔14.在朝向图像定向的最后一个光学元件之前的组件11的光学元件是平面凸透镜12 ，其凸面2b朝向物体取向，并且其平面表面2a朝向图像取向。作为朝向图像定向的组件11的最后一个光学元件，提供包括平面板19的光学终端元件17.因此，在透镜12的平面表面2b和光学终端元件17的平面平板19之间在平面板的物体定向表面上以及在终端元件17的平面板的图像定向表面上提供相应的浸没液体13b或13a。因此平面板在两侧与浸液13a和13b接触。通过这种配置，可以确保设置在图像取向侧的浸液13a内的污染不会损害平面凸透镜12.然而，更换端子元件17或端子元件17的平板19是容易的，只要其成像特性因污染或其他损伤而变得不足。

2. 发明申请

WO2009152959A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY COMPRISING A DEVICE FOR THE THERMAL MANIPULATION OF AN OPTICAL ELEMENT 审中-公开
标题翻译：包含用于光学元件的热处理的器件的半导体光刻机的投影曝光装置
公开(公告)号：WO2009152959A1
公开(公告)日：2009-12-23
申请号：PCT/EP2009/004006
申请日：2009-06-04
申请人： CARL ZEISS SMT AG , HAUF, Markus , BLEIDISTEL, Sascha , MIGURA, Sascha , MANN, Hans-Juergen , ENKISCH, Hartmut , ZELLNER, Johannes , SCHOTTNER, Michael , KRAEHMER, Daniel , TOTZECK, Michael , DODOC, Aurelian , HETZLER, Jochen , BEIERL, Helmut , ULRICH, Wilhelm
发明人： HAUF, Markus , BLEIDISTEL, Sascha , MIGURA, Sascha , MANN, Hans-Juergen , ENKISCH, Hartmut , ZELLNER, Johannes , SCHOTTNER, Michael , KRAEHMER, Daniel , TOTZECK, Michael , DODOC, Aurelian , HETZLER, Jochen , BEIERL, Helmut , ULRICH, Wilhelm
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70266
摘要： The invention relates to a projection exposure apparatus (16) for semiconductor lithography comprising a device for the thermal manipulation of an optical element (1,100), wherein the optical element (1,100) has a front side (2) for the reflection of electromagnetic radiation and a rear side (3,103), and wherein thermal actuators (4) for influencing the optical properties of the optical element (1,100) are present, which act on the optical element (1,100) from the rear side (3,103) thereof.
摘要翻译：本发明涉及一种用于半导体光刻的投影曝光装置（16），包括用于光学元件（1,100）的热操纵的装置，其中光学元件（1,100）具有用于反射电磁辐射的前侧（2）后侧（3,103），并且其中存在用于影响光学元件（1,100）的光学特性的热致动器（4），其从其后侧（3,103）作用在光学元件（1,100）上。

3. 发明申请

WO2006077145A2 HOLOGRAM AND METHOD OF MANUFACTURING AN OPTICAL ELEMENT USING A HOLOGRAM 审中-公开
标题翻译： HOLOGRAM和使用HOLOGRAM制造光学元件的方法
公开(公告)号：WO2006077145A2
公开(公告)日：2006-07-27
申请号：PCT/EP2006/000518
申请日：2006-01-20
申请人： CARL ZEISS SMT AG , HETZLER, Jochen , BEDER, Susanne , FELDMANN, Heiko
发明人： HETZLER, Jochen , BEDER, Susanne , FELDMANN, Heiko
IPC分类号： G01B9/021 , G01B11/24
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441
摘要： A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer Ia directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.
摘要翻译：制造光学元件（5）的方法包括使用将测量光（23a）引导到光学表面上的干涉仪1a来测试光学元件的光学表面（3），其中测量光穿过两个连续的全息图（44,48）设置在光学表面上游的测量光束的光束路径中。

4. 发明申请

WO2008110239A1 DIFFRACTIVE COMPONENT, INTERFEROMETER ARRANGEMENT, METHOD FOR QUALIFYING A DUAL DIFFRACTION GRATING, METHOD OF MANUFACTURING AN OPTICAL ELEMENT, AND INTERFEROMETRIC METHOD 审中-公开
标题翻译：衍射成分，干涉仪布置，双折射光栅的鉴定方法，制造光学元件的方法和干涉法
公开(公告)号：WO2008110239A1
公开(公告)日：2008-09-18
申请号：PCT/EP2008/001022
申请日：2008-02-11
申请人： CARL ZEISS SMT AG , SCHULTE, Stefan , HETZLER, Jochen , FREIMANN, Rolf , DREHER, Matthias , DÖRBAND, Bernd
发明人： SCHULTE, Stefan , HETZLER, Jochen , FREIMANN, Rolf , DREHER, Matthias , DÖRBAND, Bernd
IPC分类号： G01B9/02 , G02B5/18 , G02B5/32
CPC分类号： G02B27/4233 , G01N21/4788 , G01N2021/4792 , G02B5/1819 , G02B5/1823 , G02B27/4261
摘要： A diffractive component comprises a grating (25) including plural regions (A, A', B) of different types, wherein the gratings in the different regions differ with respect to lattice period and orientation. The different regions can be arranged according to an irregular pattern. Further, the gratings of the different types can be inverse to each other, or parameters of grating forming structures can vary between regions of the different types. A structural parameter of a dual grating is determined using a first phase function of the dual grating. A deviation of a surface of an optical element from a target surface is determined in an interferometric measurement using a second phase function of the dual grating taking into account the determined structural parameter of the grating. In an interferometric method using a diffraction grating harbouring different phase functions in different types of regions arranged in a superlattice for measuring a surface of an object perturbing superlattice diffraction orders are destructively interfered by adapting the diffraction grating having a periodicity of the superlattice that varies across the grating.
摘要翻译：衍射分量包括包括不同类型的多个区域（A，A'，B）的光栅（25），其中不同区域中的光栅相对于晶格周期和取向不同。可以根据不规则图案布置不同的区域。此外，不同类型的光栅可以彼此相反，或者光栅形成结构的参数可以在不同类型的区域之间变化。使用双光栅的第一相位函数来确定双光栅的结构参数。考虑到确定的光栅的结构参数，使用双光栅的第二相位函数在干涉测量中确定光学元件与目标表面的偏差。在使用在布置在超晶格中的不同类型的区域中具有不同相位函数的衍射光栅的干涉测量方法中，用于测量物体扰动超晶格衍射级的表面的衍射光栅通过使具有超过晶格周期性变化的周期性的衍射光栅受到破坏性干扰光栅。

5. 发明申请

WO2009007087A1 OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE 审中-公开
标题翻译：光学元件和校准包含波形结构的测量装置的方法
公开(公告)号：WO2009007087A1
公开(公告)日：2009-01-15
申请号：PCT/EP2008/005547
申请日：2008-07-08
申请人： CARL ZEISS SMT AG , HETZLER, Jochen , SCHILLKE, Frank , SCHULTE, Stefan , FREIMANN, Rolf , DÖRBAND, Bernd
发明人： HETZLER, Jochen , SCHILLKE, Frank , SCHULTE, Stefan , FREIMANN, Rolf , DÖRBAND, Bernd
IPC分类号： B24B13/06
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： An optical element has an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0,2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
摘要翻译：光学元件具有光学表面，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值0， 2nm，其中长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

6. 发明申请

WO2009007087A9 OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE 审中-公开
公开(公告)号：WO2009007087A9
公开(公告)日：2009-01-15
申请号：PCT/EP2008/005547
申请日：2008-07-08
申请人： CARL ZEISS SMT AG , HETZLER, Jochen , SCHILLKE, Frank , SCHULTE, Stefan , FREIMANN, Rolf , DÖRBAND, Bernd
发明人： HETZLER, Jochen , SCHILLKE, Frank , SCHULTE, Stefan , FREIMANN, Rolf , DÖRBAND, Bernd
IPC分类号： B24B13/06
摘要： An optical element has an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0,2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.

7. 发明申请

WO2009006914A1 METHOD OF MEASURING A DEVIATION OF AN ACTUAL SHAPE FROM A TARGET SHAPE OF AN OPTICAL SURFACE 审中-公开
标题翻译：测量光学表面目标形状的实际形状偏差的方法
公开(公告)号：WO2009006914A1
公开(公告)日：2009-01-15
申请号：PCT/EP2007/006014
申请日：2007-07-06
申请人： CARL ZEISS SMT AG , HETZLER, Jochen , LIESCH, Christoph
发明人： HETZLER, Jochen , LIESCH, Christoph
IPC分类号： G01B9/021 , G01B11/24
CPC分类号： G01B9/021 , G01B11/2441 , G01M11/025 , G01M11/0271
摘要： A method of measuring a deviation of an actual shape from a target shape of an optical surface of a test object, wherein the target shape is symmetrical about a rotational axis, the optical surface comprises an apex being traversed by the rotational axis, and a sub area of the optical surface includes the apex, comprises the steps of: generating an incoming light wave; diffracting the incoming light wave at a diffractive surface of a diffractive optical element and thereby generating a test wave having a wave front in the shape of the target shape, wherein the test wave is incident on the optical surface in auto collimation such that the test wave covers the apex of the optical surface and each single ray of the test wave being incident on the subareas of the optical surface is tilted with respect to a surface normal of the diffractive surface when emanating from the diffractive element; and interferometrically measuring a wave front of the test wave having interacted with the optical surface.
摘要翻译：一种测量实际形状与测试对象的光学表面的目标形状的偏差的方法，其中所述目标形状关于旋转轴线对称，所述光学表面包括通过所述旋转轴线横穿的顶点，以及子光学表面的面积包括顶点，包括以下步骤：产生入射光波; 将入射光波衍射到衍射光学元件的衍射表面，从而产生具有目标形状的波前的测试波，其中测试波在自动准直中入射到光学表面上，使得测试波覆盖光学表面的顶点，入射在光学表面的子区域上的测试波的每个单个射线相对于从衍射元件发射时的衍射表面的表面法线倾斜; 并且干涉测量与光学表面相互作用的测试波的波前。

8. 发明申请

WO2008152087A1 PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影曝光系统
公开(公告)号：WO2008152087A1
公开(公告)日：2008-12-18
申请号：PCT/EP2008/057369
申请日：2008-06-12
申请人： CARL ZEISS SMT AG , HETZLER, Jochen , GRUNER, Toralf
发明人： HETZLER, Jochen , GRUNER, Toralf
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , G03F7/70258 , G03F7/70308
摘要： A projection exposure system for microlithography comprises at least one optical system, for example a lithography lens comprising at least one bi-asphere (1) with two aspheres (2,3). In accordance with the invention, the projection exposure system has a manipulator which compensates tilting of the aspherical axes A2, A3 of the two aspheres (2,3) by tilting bi-asphere (1) about two mutually perpendicular axes RX and RY such that the projection properties of the optical system are optimized. In addition, a centering manipulator can be provided that executes translations TX and TY for the purpose of aligning the axes A2 and A3 with respect to the optical axis OA. With the aid of the inventive system, it is possible, with the bi-asphere (1) already mounted at the lens, using the projection parameters from the system itself, to perform an alignment of the lens (1), in particular tilting, for the purpose of optimizing the projection parameters of the lithography lens.
摘要翻译：用于微光刻的投影曝光系统包括至少一个光学系统，例如包括至少一个具有两个非球面（2,3）的双 - 非球面（1）的光刻透镜。根据本发明，投影曝光系统具有通过围绕两个相互垂直的轴线RX和RY倾斜双非球面（1）来补偿两个非球面（2,3）的非球面轴线A2，A3的倾斜的操纵器，使得优化了光学系统的投影特性。此外，可以提供定心操纵器，其执行平移TX和TY以便相对于光轴OA对准轴A2和A3。借助于本发明的系统，借助于系统本身的投影参数，双透镜（1）已经安装在透镜上，可以执行透镜（1）的对准，特别是倾斜，为了优化光刻透镜的投影参数。

9. 发明公开

EP1842027A2 HOLOGRAM AND METHOD OF MANUFACTURING AN OPTICAL ELEMENT USING A HOLOGRAM 审中-公开
标题翻译：全息图和方法用于生产光学材料用全息图
公开(公告)号：EP1842027A2
公开(公告)日：2007-10-10
申请号：EP06703920.6
申请日：2006-01-20
申请人： Carl Zeiss SMT AG
发明人： HETZLER, Jochen , BEDER, Susanne , FELDMANN, Heiko
IPC分类号： G01B9/021 , G01B11/24
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441
摘要： A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer Ia directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.

10. 发明申请

WO2011020690A2 METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES, MIRROR OF A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY, AND PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：用于生产具有至少两个反射镜的镜子的方法，用于微结构的投影曝光装置的镜子和投影曝光装置
公开(公告)号：WO2011020690A2
公开(公告)日：2011-02-24
申请号：PCT/EP2010/061148
申请日：2010-07-30
申请人： CARL ZEISS SMT GMBH , HETZLER, Jochen , MUELLER, Ralf , SINGER, Wolfgang
发明人： HETZLER, Jochen , MUELLER, Ralf , SINGER, Wolfgang
CPC分类号： G02B17/0647 , G02B13/143 , G03F7/70233 , G03F7/70958
摘要： The invention relates to a mirror (M) of a projection exposure apparatus for rnicrolithography for the structured exposure of a light-sensitive material and to a method for producing a mirror (M), The mirror (M) according to the Invention has a substrate body (B), a first mirror surface (S) and a second mirror surface (S5). The first mirror surface (S) is formed on a first side (VS) of the substrate body (3). The second mirror surface (S') is formed on a second side (RS) of the substrate body (B), said second side being different from the first side of the substrate body (B). The mirror (M) according to the invention can be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.
摘要翻译：本发明涉及用于感光材料的结构曝光的微光刻用投影曝光装置的反射镜（M）及其制造方法（M）。根据本发明的反射镜（M）具有基板主体（B），第一镜面（S）和第二镜面（S5）。第一镜面（S）形成在基体（3）的第一侧（VS）上。第二镜面（S'）形成在基板主体（B）的第二侧（RS）上，所述第二侧与基板主体（B）的第一侧不同。根据本发明的镜子（M）可以具体地实现，使得基底主体（B）由玻璃陶瓷材料制成。

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