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1. 发明申请

WO2009127368A1 METHOD FOR ANALYZING MASKS FOR PHOTOLITHOGRAPHY 审中-公开
标题翻译：用于分析胶片的方法
公开(公告)号：WO2009127368A1
公开(公告)日：2009-10-22
申请号：PCT/EP2009/002668
申请日：2009-04-09
申请人： CARL ZEISS SMS GMBH , STROESSNER, Ulrich , SCHERUEBL, Thomas
发明人： STROESSNER, Ulrich , SCHERUEBL, Thomas
IPC分类号： G03F7/20
CPC分类号： G03F7/70666 , G03F7/705 , G03F7/70608
摘要： The invention relates to a method for analyzing masks for photolithography. In this method, an aerial image of the mask for a first focus setting is generated and stored in an aerial image data record. The aerial image data record is transferred to an algorithm that simulates a photolithographic wafer exposure on the basis of this data record. In this case, the simulation is carried out for a plurality of mutually different energy doses. Then, at a predetermined height from the wafer surface, contours which separate regions with photoresist from those regions without photoresist are in each case determined. The result, that is to say the contours, are stored for each of the energy doses in each case in a contour data record with the energy dose as a parameter. Finally, the contour data records are combined to form a three-dimensional multicontour data record with the reciprocal of the energy dose as a third dimension, and, on the basis of the transitions from zero to values different than zero in the contours, a three-dimensional profile of the reciprocal of the energy dose depending on the position on the mask is generated. This profile, the so-called effective aerial image, is output or stored or automatically evaluated. The same can also occur with sections through said profile.
摘要翻译：本发明涉及一种用于分析光刻掩模的方法。在该方法中，生成用于第一焦点设置的掩模的空间图像并将其存储在空中图像数据记录中。将空间图像数据记录转移到基于该数据记录模拟光刻晶片曝光的算法。在这种情况下，对多个相互不同的能量剂量进行模拟。然后，在距离晶片表面的预定高度处，分别确定了与光致抗蚀剂区域分开的区域。在能量剂量作为参数的轮廓数据记录中，在每种情况下，为每个能量剂量存储结果，也就是说轮廓。最后，轮廓数据记录被组合以形成具有作为第三维度的能量剂量的倒数的三维多轨道数据记录，并且基于在轮廓中从零到不同于零的值的过渡，三产生根据掩模上的位置的能量剂量的倒数的三维轮廓。该配置文件，即所谓的有效航空图像，被输出或存储或自动评估。通过所述剖面也可能发生同样的情况。

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