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1. 发明专利

MY116621A METHOD AND APPARATUS FOR GRINDING BRITTLE MATERIALS 未知
公开(公告)号：MY116621A
公开(公告)日：2004-03-31
申请号：MYPI9401787
申请日：1994-07-08
申请人： CANON KK
发明人： KOZAKAI TAKASHI , YAMAMOTO HIRONORI , NAKAMURA NOBUO , TAKASHITA JUNJI , IMANARI TORU
IPC分类号： B24B1/00 , B24B7/22 , B24B13/00
摘要： PROVIDED ARE BRITTLE-MATERIAL MACHINING METHOD AND APPARATUS (200, 300) FOR REALIZING GRINDING IN A DUCTILE MODE REGION USING AN ORDINARY GRINDING APPARATUS.GRINDING OR POLISHING OF A WORKED SURFACE OF A WORKPIECE (57) CONSISTING OF A BRITTLE MATERIAL IS PERFORMED BY RELATIVE MOVEMENT BETWEEN THE WORKPIECE (57) AND A GRINDING WHEEL (102), WHICH COMPRISES INNUMERABLE ABRASIVE GRAINS (66) PROVIDED ON A SUPPORT BASE (60), WHILE THE GRINDING WHEEL (102) IS BROUGHT INTO PRESSURED CONTACT WITH THE WORKED SURFACE AT A PRESCRIBED PRESSURE.THE GRINDING OR POLISHING IS CARRIED OUT UPON SETTING THE PRESCRIBED PRESSURE.THE GRINDING OR POLISHING IS CARRIED OUT UPON SETTING THE PRESCRIBED PRESSUREIN SUCH A MANNER THAT DEPTH OF CUT D,INTO THE WORKED SURFACE,OF ABRASIVE GRAINS (66) AMONG THE INNUMERABLE NUMBER THEREOF THAT PARTICIPATE IN THE GRINDING OR POLISHING IS MADE LESS THAN A CRITICAL DEPTH OF CUT DC, WHICH IS MINIMUM DEPTH OF CUT AT WHICH BRITTLE FRACTURE IS PRODUCED IN THE WORKPIECE.

2. 发明专利

DE3118632A1 未知
公开(公告)号：DE3118632A1
公开(公告)日：1982-10-21
申请号：DE3118632
申请日：1981-05-11
申请人： CANON KK
发明人： ISOHATA JUNJI , YAMAMOTO HIRONORI
IPC分类号： G03F7/20 , G03B27/32

3. 发明专利

DE3446967A1 未知
公开(公告)号：DE3446967A1
公开(公告)日：1985-07-04
申请号：DE3446967
申请日：1984-12-21
申请人： CANON KK
发明人： SUZUTA MIKIO , YAMAMOTO HIRONORI , NAKAZAWA KAZUO
IPC分类号： H01L21/30 , B23Q1/26 , B23Q1/28 , G03F7/20 , G03F9/00 , G12B3/08 , G12B5/00 , H01L21/027 , H01L21/67 , H01L21/68 , G12B1/00
摘要： A precise movement device of the type for guiding a movable member with hydrostatic pressure or a magnetic field and moving the movable member substantially without a friction. The device includes a mechanism for supporting the movable member by the use of hydrostatic pressure or a magnetic field and for guiding the movement of the movable member, and includes a mechanism for generating a resistance against the movement of the movable member when the movable member is to be stopped, such that the movable member can be stopped at a desired position accurately and in a reduced time.

4. 发明专利

DE3202887A1 未知
公开(公告)号：DE3202887A1
公开(公告)日：1983-02-24
申请号：DE3202887
申请日：1982-01-29
申请人： CANON KK
发明人： ISOHATA JUNJI , YAMAMOTO HIRONORI
IPC分类号： G03B27/32 , G03F7/20 , G12B5/00 , H01L21/027 , H01L21/30 , H01L21/68 , G03F9/00
摘要： A projection-printing apparatus moves at least one of a mask and a wafer with precise rectilinearity along a guide relative to an optical system for projecting the image of the mask upon the wafer, and in a plane perpendicular to the optical axis of the optical system whereby the image of the mask is printed on the wafer.

5. 发明专利

DE3740561A1 未知
公开(公告)号：DE3740561A1
公开(公告)日：1988-07-21
申请号：DE3740561
申请日：1987-11-30
申请人： CANON KK
发明人： FURUKAWA MOTOMU , HIGOMURA MAKOTO , OHTSUKA MASARU , YAMAMOTO HIRONORI , OHKAWA SHINKICHI , MATSUSHITA KOICHI , KAWAI YASUO , KARIYA TAKAO , KUSUNOKI HARUYUKI , YAMAURA TOSHIHIKO
IPC分类号： G03F7/20 , G03F7/22 , G03F9/00 , H02K7/116
摘要： A stage device usable, e.g., in an X-ray exposure apparatus, for moving a semiconductor wafer placed in a vacuum ambience and held by a wafer chuck, is disclosed. In the stage device, the wafer chuck holds the wafer so that the surface of the wafer onto which a circuit pattern is to be transferred is placed in a vertical plane, and the wafer chuck is moved vertically and horizontally for step-and-repeat exposure of the wafer. The device includes a guide mechanism, locking mechanism and a constant-tension spring mechanism, to thereby ensure high-accuracy movement of the wafer chuck in the vertical direction as well as high-precision positioning of the wafer. Further, in the stage device, a drive source producing a drive to move the wafer chuck is disposed in a vacuum ambience while, on the other hand, the supply of operating fluids to air bearing assemblies, for guiding the movement of the wafer chuck, is achieved by use of metal pipes coupled by rotary joints. The wafer chuck is resiliently supported by one of the air bearing assemblies, such that the wafer chuck can be moved in the vacuum ambience very accurately and without difficulties.

6. 发明专利

DE2845580A1 未知
公开(公告)号：DE2845580A1
公开(公告)日：1979-04-26
申请号：DE2845580
申请日：1978-10-19
申请人： CANON KK
发明人： YAMAMOTO HIRONORI
IPC分类号： F16C32/06 , F16C29/02
摘要： A hydrostatic bearing component for reserving pressurized fluid in its one portion facing the surface of a supporting member. The component is provided with a recess to serve as a passage for the pressurized fluid, an orifice open to the recess, and a pressure supply communicating to the orifice, a ratio ( beta ) of a clearance Cs between the surface of the bearing component and the supporting surface to a clearance CR between the bottom surface of the recess and the supporting surface beta =Cs/CR being set in a range between 0.2 and 0.7.

7. 发明专利

DE3740561C2 未知
公开(公告)号：DE3740561C2
公开(公告)日：1997-07-10
申请号：DE3740561
申请日：1987-11-30
申请人： CANON KK
发明人： FURUKAWA MOTOMU , HIGOMURA MAKOTO , OHTSUKA MASARU , YAMAMOTO HIRONORI , OHKAWA SHINKICHI , MATSUSHITA KOICHI , KAWAI YASUO , KARIYA TAKAO , KUSUNOKI HARUYUKI , YAMAURA TOSHIHIKO
IPC分类号： G03F7/20 , G03F7/22 , G03F9/00 , G03B27/42 , G03B27/53
摘要： A stage device usable, e.g., in an X-ray exposure apparatus, for moving a semiconductor wafer placed in a vacuum ambience and held by a wafer chuck, is disclosed. In the stage device, the wafer chuck holds the wafer so that the surface of the wafer onto which a circuit pattern is to be transferred is placed in a vertical plane, and the wafer chuck is moved vertically and horizontally for step-and-repeat exposure of the wafer. The device includes a guide mechanism, locking mechanism and a constant-tension spring mechanism, to thereby ensure high-accuracy movement of the wafer chuck in the vertical direction as well as high-precision positioning of the wafer. Further, in the stage device, a drive source producing a drive to move the wafer chuck is disposed in a vacuum ambience while, on the other hand, the supply of operating fluids to air bearing assemblies, for guiding the movement of the wafer chuck, is achieved by use of metal pipes coupled by rotary joints. The wafer chuck is resiliently supported by one of the air bearing assemblies, such that the wafer chuck can be moved in the vacuum ambience very accurately and without difficulties.

8. 发明专利

DE3706833A1 未知
公开(公告)号：DE3706833A1
公开(公告)日：1987-09-10
申请号：DE3706833
申请日：1987-03-03
申请人： CANON KK
发明人： BAN MIKICHI , KAKUCHI OSAMU , YAMAMOTO HIRONORI , OHTSUKA MASARU , SHIBA OSAMU , HARA KAZUHIKO
IPC分类号： G01J3/26
摘要： Fabri-Pérot spectroscopy method comprises a step of directing a light beam at a first refraction angle to a first Fabri-Pérot interference plate and a step of directing a light beam transmitted through the first Fabri-Pérot interference plate to a second Fabri-Pérot interference plate at a second refraction angle, and Fabri-Pérot spectroscopy apparatus comprises Fabri-Pérot interference plates, a control device for changing a spacing between the Fabri-Pérot interference plates, a first optical device for directing a light beam to the first Fabri-Pérot interference plate at a first refraction angle, a second optical device for directing the light beam transmitted through the Fabri-Pérot interference plate at a second refraction angle different from the first refraction angle to the second Fabri-Pérot interference plate, and a seal for externally sealing the Fabri-Pérot interference plates. Gas for protecting the Fabri-Pérot interference plates is filled in the sealed space.

9. 发明专利

GB2115941B PROJECTION-PRINTING 未知
公开(公告)号：GB2115941B
公开(公告)日：1985-10-02
申请号：GB8202345
申请日：1982-01-27
申请人： CANON KK
发明人： ISOHATA JUNJI , YAMAMOTO HIRONORI
IPC分类号： G03B27/32 , G03F7/20 , G12B5/00 , H01L21/027 , H01L21/30 , H01L21/68 , G03B27/50
摘要： A projection-printing apparatus moves at least one of a mask and a wafer with precise rectilinearity along a guide relative to an optical system for projecting the image of the mask upon the wafer, and in a plane perpendicular to the optical axis of the optical system whereby the image of the mask is printed on the wafer.

10. 发明专利

GB2115941A PROJECTION-PRINTING 未知
公开(公告)号：GB2115941A
公开(公告)日：1983-09-14
申请号：GB8202345
申请日：1982-01-27
申请人： CANON KK
发明人： ISOHATA JUNJI , YAMAMOTO HIRONORI
IPC分类号： G03B27/32 , G03F7/20 , G12B5/00 , H01L21/027 , H01L21/30 , H01L21/68 , G03B27/50
摘要： A projection-printing apparatus moves at least one of a mask and a wafer with precise rectilinearity along a guide relative to an optical system for projecting the image of the mask upon the wafer, and in a plane perpendicular to the optical axis of the optical system whereby the image of the mask is printed on the wafer.

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