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1. 发明申请

WO2005031468A1 NEAR-FIELD LIGHT GENERATING METHOD NEAR-FIELD EXPOSURE MASK AND NEAR-FIELD EXPOSURE METHOD AND APPARATUS 审中-公开
标题翻译：近场发光方法近场曝光掩膜及近场曝光方法及装置
公开(公告)号：WO2005031468A1
公开(公告)日：2005-04-07
申请号：PCT/JP2004/014445
申请日：2004-09-24
申请人： CANON KABUSHIKI KAISHA , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
发明人： MIZUTANI, Natsuhiko , YAMADA, Tomohiro
IPC分类号： G03F7/20
CPC分类号： G03F7/70325 , G01Q60/22 , G01Q80/00 , G03F1/50 , G03F7/2014 , G03F7/7035 , G11B7/122 , G11B7/1387 , G11B2005/0005 , G11B2005/0021
摘要： A near-field light generating method for forming a fine light spot at a portion adjacent to a fine opening having a size of not more than a wavelength of light on a light outgoing side of the fine opening by irradiating the fine opening with the light includes a step of forming a light spot having a length and a width which are substantially equal to each other by the fine opening. The fine opening has a rectangular shape having a length and a width which are different from each other.
摘要翻译：在通过用光照射微细开口而在微细开口的光出射侧具有不大于光的波长的微细孔的部分附近的部分处形成微细光斑的近场光产生方法包括：通过微细开口形成长度和宽度大致相等的光点的步骤。精细开口具有彼此不同的长度和宽度的矩形形状。

2. 发明申请

WO2007100112A1 METHOD FOR DESIGNING LIGHT TRANSMISSION DEVICE, OPTICAL ELEMENT AND SENSOR 审中-公开
标题翻译：用于设计光传输装置，光学元件和传感器的方法
公开(公告)号：WO2007100112A1
公开(公告)日：2007-09-07
申请号：PCT/JP2007/054108
申请日：2007-02-26
申请人： CANON KABUSHIKI KAISHA , OGINO, Masaya , YAMADA, Tomohiro , NISHIUMA, Satoru , MIZUTANI, Natsuhiko , KURODA, Ryo
发明人： OGINO, Masaya , YAMADA, Tomohiro , NISHIUMA, Satoru , MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： G02B5/20 , G02B5/18
CPC分类号： G02B5/008 , G02B5/204
摘要： The present invention provides a method for designing a light transmission device, which adjusts a wavelength region of a spectrum of transmitted light without expanding a width of a transmission spectrum and without lowering the transmittance. The method for designing a light transmission device having a metal thin film, and a rectangular aperture which is formed in a plane of the metal thin film, has a long side and a short side and makes light pass therethrough, wherein the short side has a dimension smaller than a wavelength of incident light, and the long side is determined to have such a dimension that a peak wavelength at which the transmittance of light passing through the rectangular aperture is maximal can be a predetermined value.
摘要翻译：本发明提供了一种用于设计光透射装置的方法，其调节透射光谱的波长区域，而不会扩大透射光谱的宽度并且不降低透射率。用于设计具有金属薄膜的光传输装置和形成在金属薄膜的平面中的矩形孔的方法具有长边和短边，使光通过，其中短边具有尺寸小于入射光的波长，并且长边被确定为具有通过矩形孔径的光的透射率最大的峰值波长的尺寸可以是预定值。

3. 发明申请

WO2004114024A3 EXPOSURE METHOD AND EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2004114024A3
公开(公告)日：2004-12-29
申请号：PCT/JP2004/009283
申请日：2004-06-24
申请人： CANON KABUSHIKI KAISHA , KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
发明人： KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
IPC分类号： G03F7/20
摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings . For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.

4. 发明申请

WO2004114024A2 EXPOSURE METHOD AND APPARATUS, EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光方法和装置，曝光掩模和装置制造方法
公开(公告)号：WO2004114024A2
公开(公告)日：2004-12-29
申请号：PCT/JP2004/009283
申请日：2004-06-24
申请人： CANON KABUSHIKI KAISHA , KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
发明人： KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
IPC分类号： G03F7/20
CPC分类号： G03F7/70325 , B82Y10/00 , G03F1/50 , G03F7/2014
摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings . For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.
摘要翻译：公开了一种曝光方法和装置，曝光掩模和装置制造方法，其中具有相互邻接关系形成的多个开口的遮光构件的第一表面被放置在曝光物体侧，并且将光投射到遮光构件从其第二表面侧使得曝光对象的曝光是基于从开口泄漏的近场光进行的。对于曝光，分别通过相邻的开口并绕到第一表面侧的表面等离子体激元波之间产生干涉，并且在其基础上，在曝光对象中产生具有降低的光强度的部分，使得曝光通过使用减小的光强度部分进行。

5. 发明申请

WO2008126666A1 SENSING APPARATUS 审中-公开
标题翻译：感应装置
公开(公告)号：WO2008126666A1
公开(公告)日：2008-10-23
申请号：PCT/JP2008/055609
申请日：2008-03-17
申请人： CANON KABUSHIKI KAISHA , FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , KURODA, Ryo
发明人： FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： G01N21/55
CPC分类号： G01N21/553 , G01N21/7743
摘要： A sensing apparatus comprises a sensing element having a metal member of a periodic structure formed on a substrate, a light source for projecting a light beam to the sensing element, and a photosensor for sensing the light beam from the sensing element, wherein the sensing element has an optical waveguide layer between the substrate and the metal member, and the light beam illuminated from the light source and propagating in the optical waveguide layer and the light of a Rayleigh mode formed by the metal member are phase-matched.
摘要翻译：感测装置包括具有形成在基板上的周期性结构的金属构件的感测元件，用于将光束投射到感测元件的光源和用于感测来自感测元件的光束的光电传感器，其中感测元件在基板和金属构件之间具有光波导层，并且从光源照射并在光波导层中传播的光束和由金属构件形成的瑞利模式的光相位匹配。

6. 发明申请

WO2006132425A1 NEAR-FIELD EXPOSURE MASK, METHOD OF PRODUCING THAT MASK, NEAR-FIELD EXPOSURE APPARATUS HAVING THAT MASK, AND RESIST PATTERN FORMING METHOD 审中-公开
标题翻译：近场曝光掩模，生产掩模的方法，具有掩模的近场曝光装置和耐蚀图案形成方法
公开(公告)号：WO2006132425A1
公开(公告)日：2006-12-14
申请号：PCT/JP2006/311887
申请日：2006-06-07
申请人： CANON KABUSHIKI KAISHA , ITO, Toshiki , MIZUTANI, Natsuhiko , YAMAGUCHI, Takako
发明人： ITO, Toshiki , MIZUTANI, Natsuhiko , YAMAGUCHI, Takako
IPC分类号： G03F1/14
CPC分类号： G03F1/50 , B82Y10/00 , G03F7/70325 , G03F7/7035
摘要： Disclosed is a near-field exposure mask having a light blocking layer formed on a substrate, the light blocking layer having an opening with an opening width narrower than a wavelength of an exposure light source, wherein exposure of an object to be exposed is carried out by use of near-field light to be produced at the opening while the exposure mask and the object to be exposed are placed in contact with. each other, an important feature residing in that the light blocking layer is provided by a film that contains silicon in a range from 50% to 100% in terms of mole fraction.
摘要翻译：公开了一种具有在基板上形成的遮光层的近场曝光掩模，该遮光层具有开口宽度比曝光光源的波长窄的开口，其中进行曝光对象的曝光通过使曝光掩模和待曝光的物体接触而在开口处产生的近场光。彼此之间的重要特征在于，阻光层由含有以摩尔分数计50％至100％范围内的硅的膜提供。

7. 发明申请

WO2008047733A1 NEAR FIELD EXPOSURE MASK, METHOD OF FORMING RESIST PATTERN USING THE MASK, AND METHOD OF PRODUCING DEVICE 审中-公开
标题翻译：近场曝光掩模，使用掩模形成电阻图案的方法，以及制造装置的方法
公开(公告)号：WO2008047733A1
公开(公告)日：2008-04-24
申请号：PCT/JP2007/070015
申请日：2007-10-05
申请人： CANON KABUSHIKI KAISHA , ITO, Toshiki , MIZUTANI, Natsuhiko , TERAO, Akira
发明人： ITO, Toshiki , MIZUTANI, Natsuhiko , TERAO, Akira
IPC分类号： G03F1/14 , G03F7/20
CPC分类号： G03F7/2014 , B82Y10/00 , G03F1/50 , G03F7/70325
摘要： Provided are a near field exposure mask which can suppress heat generation of a mask during exposure and can also suppress variation in size of a resist pattern for each shot, and a resist pattern forming method using the same. The near field exposure mask includes a transparent mask matrix 10; a light shielding layer 12 @formed above the transparent mask matrix 10 and containing silicon; a reflective layer 11 formed between the transparent mask matrix 10 and the light shielding layer 12; and an opening pattern provided in the reflective layer 11 and the light shielding layer 12 and being less in size than an exposure wavelength É (nm), wherein the reflectance at an interface between the transparent mask matrix 10 and the reflective layer 11 is higher than a reflectance at an interface between a transparent mask matrix and a light shielding layer formed on the transparent mask matrix and containing silicon of a near field exposure mask which has no reflective layer between the transparent mask matrix and the light shielding layer.
摘要翻译：提供一种能够抑制曝光时的掩模的发热的近场曝光掩模，并且还可以抑制每个镜头的抗蚀剂图案的尺寸的变化，以及使用其的抗蚀剂图案形成方法。近场曝光掩模包括透明掩模矩阵10; 形成在透明掩模矩阵10上方并含有硅的遮光层12; 形成在透明掩模矩阵10和遮光层12之间的反射层11; 以及设置在反射层11和遮光层12中并且尺寸小于曝光波长É（nm）的开口图案，其中透明掩模矩阵10和反射层11之间的界面处的反射率高于在透明掩模矩阵和形成在透明掩模矩阵上的遮光层之间的界面处的反射率，并且包含在透明掩模矩阵和遮光层之间没有反射层的近场曝光掩模的硅。

8. 发明申请

WO2006004177A1 NEAR-FIELD EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING THE SAME 审中-公开
标题翻译：近场曝光方法及使用其的装置制造方法
公开(公告)号：WO2006004177A1
公开(公告)日：2006-01-12
申请号：PCT/JP2005/012528
申请日：2005-06-30
申请人： CANON KABUSHIKI KAISHA , MIZUTANI, Natsuhiko , KURODA, Ryo
发明人： MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： H01L21/027
CPC分类号： G03F7/7035 , B82Y10/00 , G03F7/70325
摘要： Disclosed is a near-field exposure method including a process of bringing a light blocking film with a plurality of small openings each having an opening width not greater than a wavelength of exposure light, into close contact with a photoresist layer provided on a surface of a substrate, and a process of projecting exposure light from an exposure light source to the light blocking film to transfer an opening pattern of the light blocking film to the photoresist layer, wherein, on the basis of a correlation between (a) a distance from a node of a standing wave to be produced in the photoresist layer to the light blocking film and (b) a light intensity distribution of near-field light to be produced in the photoresist layer adjacent the light blocking film, the distance from the standing wave node to the light blocking film is determined so as to provide a desired light intensity distribution.
摘要翻译：公开了一种近场曝光方法，包括使具有不大于曝光光的波长的开口宽度的多个小开口的遮光膜与设置在曝光光的表面上的光致抗蚀剂层紧密接触的工艺以及将曝光光源的曝光光投射到遮光膜以将遮光膜的开口图案转印到光致抗蚀剂层的处理，其中，基于（a）距离在光致抗蚀剂层中产生的阻挡膜的驻波的节点和（b）在与阻光膜相邻的光致抗蚀剂层中要产生的近场光的光强度分布，与驻波结点的距离确定遮光膜以提供期望的光强度分布。

9. 发明申请

WO2005015311A2 NEAR-FIELD EXPOSURE METHOD AND APPARATUS, NEAR-FIELD EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：近场曝光方法和装置，近场曝光掩模和装置制造方法
公开(公告)号：WO2005015311A2
公开(公告)日：2005-02-17
申请号：PCT/JP2004/011648
申请日：2004-08-06
申请人： CANON KABUSHIKI KAISHA , MIZUTANI, Natsuhiko
发明人： MIZUTANI, Natsuhiko
IPC分类号： G03F7/00
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/703 , G03F7/70325
摘要： Disclosed is a near-field exposure method and apparatus, a near-field exposure mask, and a device manufacturing method, wherein exposure is carried out on the basis of near field light. Specifically, the near-field exposure method disclosed is arranged so that a pressure difference is applied to between a front face and a rear face of an elastically deformable exposure mask to cause deformation of the exposure mask in accordance with a substrate to be exposed and to cause the exposure mask surface to follow a surface irregularity state of the substrate such that these surfaces are closely contacted to each other, for exposure based on near field light. The pressure difference applied to between the front and rear faces of the exposure mask is set at a predetermnined pressure difference corresponding to surface roughness of the substrate to be exposed.
摘要翻译：公开了近场曝光方法和装置，近场曝光掩模和装置制造方法，其中基于近场光进行曝光。具体地说，所公开的近场曝光方法被布置成在可弹性变形的曝光掩模的正面和背面之间施加压力差，以使曝光掩模根据待曝光的基板而变形，并且使得曝光掩模表面遵循基板的表面不规则状态，使得这些表面彼此紧密接触，用于基于近场光的曝光。施加到曝光掩模的前表面和后表面之间的压力差设定为对应于待曝光的基板的表面粗糙度的预定压差。

10. 发明申请

WO2012020716A1 MAGNETIC GRADIOMETER AND MAGNETIC SENSING METHOD 审中-公开
标题翻译：磁力梯度计和磁感测方法
公开(公告)号：WO2012020716A1
公开(公告)日：2012-02-16
申请号：PCT/JP2011/067999
申请日：2011-08-01
申请人： CANON KABUSHIKI KAISHA , MIZUTANI, Natsuhiko , KOBAYASHI, Tetsuo
发明人： MIZUTANI, Natsuhiko , KOBAYASHI, Tetsuo
IPC分类号： G01R33/26 , G01R33/022
CPC分类号： G01R33/26 , G01R33/022 , G01R33/028
摘要： A gradiometer in which a probe beam for reading sequentially passes through two magnetic field measurement regions to obtain signals according to magnetic flux densities of the respective regions is formed using an optically pumped magnetometer. In particular, in a gradiometer using a high sensitivity optically pumped magnetometer, a geometric arrangement enabling obtainment of a large signal from a dipole moment as a signal source is defined.
摘要翻译：使用光泵浦磁力计形成其中用于读取的探测光束依次通过两个磁场测量区域以获得根据各个区域的磁通密度的信号的梯度计。特别地，在使用高灵敏度光泵浦磁力计的梯度计中，定义了能够从作为信号源的偶极矩获得大信号的几何布置。

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