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1. 发明授权

US06506620B1 Process for manufacturing micromechanical and microoptomechanical structures with backside metalization 有权
标题翻译：具有背面金属化的微机械和微机电结构的制造工艺
公开(公告)号：US06506620B1
公开(公告)日：2003-01-14
申请号：US09724515
申请日：2000-11-27
申请人： Bruce R. Scharf , Joel A. Kubby , Chuang-Chia Lin , Alex T. Tran , Andrew J. Zosel , Peter M. Gulvin , Jingkuang Chen
发明人： Bruce R. Scharf , Joel A. Kubby , Chuang-Chia Lin , Alex T. Tran , Andrew J. Zosel , Peter M. Gulvin , Jingkuang Chen
IPC分类号： H01L2100
CPC分类号： B81C1/00484 , B81B2201/042 , B81B2203/0118 , B81C1/00666 , B81C2201/0142
摘要： The present invention provides a micromechanical or microoptomechanical structure produced by a process comprising defining the structure in a single-crystal silicon layer separated by an insulator layer from a substrate layer; selectively etching the single crystal silicon layer; depositing and etching a polysilicon layer on the insulator layer, with remaining polysilicon forming mechanical elements of the structure; metalizing a backside of the structure; and releasing the formed structure.
摘要翻译：本发明提供了一种微机械或微机电结构，其通过包括限定由绝缘体层与衬底层分隔的单晶硅层中的结构的方法而产生; 选择性地蚀刻单晶硅层; 沉积和蚀刻绝缘体层上的多晶硅层，剩余的多晶硅形成结构的机械元件; 金属化结构的背面; 并释放形成的结构。

2. 发明授权

US06479315B1 Process for manufacturing micromechanical and microoptomechanical structures with single crystal silicon exposure step 有权
标题翻译：用单晶硅曝光步骤制造微机械和微机电结构的方法
公开(公告)号：US06479315B1
公开(公告)日：2002-11-12
申请号：US09724514
申请日：2000-11-27
申请人： Andrew J. Zosel , Peter M. Gulvin , Jingkuang Chen , Joel A. Kubby , Chuang-Chia Lin , Alex T. Tran
发明人： Andrew J. Zosel , Peter M. Gulvin , Jingkuang Chen , Joel A. Kubby , Chuang-Chia Lin , Alex T. Tran
IPC分类号： H01L2100
CPC分类号： B81C1/00666 , B81B2203/058 , B81C2201/014 , B81C2201/0164 , B81C2201/056 , G02B26/0833
摘要： The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a structure on a single crystal silicon layer separated by an insulator layer from a substrate layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilicon forming mechanical or optical elements of the structure; exposing a selected area of the single crystal silicon layer; and releasing the formed structure.
摘要翻译：本发明提供一种微机械或微机电结构。该结构通过包括在衬底层上限定由绝缘体层分离的单晶硅层上的结构的方法制造; 沉积和蚀刻单晶硅层上的多晶硅层，剩余的多晶硅形成结构的机械或光学元件; 暴露单晶硅层的选定区域; 并释放形成的结构。

3. 发明授权

US06661070B2 Micromechanical and microoptomechanical structures with single crystal silicon exposure step 失效
公开(公告)号：US06661070B2
公开(公告)日：2003-12-09
申请号：US10193804
申请日：2002-07-11
申请人： Andrew J. Zosel , Joel A. Kubby , Peter M. Gulvin , Chuang-Chia Lin , Jingkuang Chen , Alex T. Tran
发明人： Andrew J. Zosel , Joel A. Kubby , Peter M. Gulvin , Chuang-Chia Lin , Jingkuang Chen , Alex T. Tran
IPC分类号： H01L2982
CPC分类号： B81C1/00666 , B81B2203/058 , B81C2201/014 , B81C2201/0164 , B81C2201/056 , G02B26/0833
摘要： The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a structure on a single crystal silicon layer separated by an insulator layer from a substrate layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilcon forming mechanical or optical elements of the structure; exposing a selected area of the single crystal silicon layer; and releasing the formed structure.

4. 发明授权

US06479311B1 Process for manufacturing micromechanical and microoptomechanical structures with pre-applied patterning 有权
标题翻译：用预制图案化制造微机械和微机电结构的方法
公开(公告)号：US06479311B1
公开(公告)日：2002-11-12
申请号：US09724506
申请日：2000-11-27
申请人： Bruce R. Scharf , Joel A. Kubby , Jingkuang Chen , Peter M. Gulvin , Chuang-Chia Lin , Alex T. Tran
发明人： Bruce R. Scharf , Joel A. Kubby , Jingkuang Chen , Peter M. Gulvin , Chuang-Chia Lin , Alex T. Tran
IPC分类号： H01L2100
CPC分类号： B81C1/00666 , B81B2201/047 , B81B2203/0118
摘要： The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a pattern on a single crystal silicon layer separated by an insulator layer from a substrate layer; defining a structure in the single-crystal silicon layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilcon forming mechanical or optical elements of the structure; and releasing the formed structure.
摘要翻译：本发明提供一种微机械或微机电结构。该结构通过一种工艺制造，该方法包括在由绝缘体层与衬底层隔开的单晶硅层上限定图案; 限定单晶硅层中的结构; 沉积和蚀刻单晶硅层上的多晶硅层，其余的聚硅氧烷形成该结构的机械或光学元件; 并释放形成的结构。

5. 发明授权

US06413793B1 Method of forming protrusions on single crystal silicon structures built on silicon-on-insulator wafers 失效
标题翻译：在绝缘体上硅晶片上形成的单晶硅结构上形成突起的方法
公开(公告)号：US06413793B1
公开(公告)日：2002-07-02
申请号：US09858469
申请日：2001-05-17
申请人： Chuang-Chia Lin , Peter M. Gulvin , Alex T. Tran , Nena Liakopoulos
发明人： Chuang-Chia Lin , Peter M. Gulvin , Alex T. Tran , Nena Liakopoulos
IPC分类号： H01L2100
CPC分类号： B81B3/001
摘要： A semiconductor structure includes a substrate, a sacrificial layer formed on or over the substrate, and a structural layer formed on or over the sacrificial layer. At least one opening is formed in the structural layer. At least one opening is formed in the sacrificial layer below the at least one opening in the structural layer. The at least one opening in the structural layer and the at least one opening in the sacrificial layer are at least partially filled with a filler material. At least one portion of the structural layer is removed to define at least one microstructure. The sacrificial layer is removed such that the at least one microstructure is released from the substrate and the filler material forms one or more protrusions on the at least one microstructure, and/or one or more anchors anchoring the at least one microstructure to the substrate.
摘要翻译：半导体结构包括衬底，形成在衬底上或衬底上的牺牲层以及形成在牺牲层上或之上的结构层。在结构层中形成至少一个开口。在结构层中的至少一个开口下方的牺牲层中形成至少一个开口。结构层中的至少一个开口和牺牲层中的至少一个开口至少部分地填充有填充材料。去除结构层的至少一部分以限定至少一个微结构。去除牺牲层，使得至少一个微结构从衬底释放并且填充材料在至少一个微结构上形成一个或多个突起，和/或一个或多个将至少一个微结构锚定到衬底的锚固件。

6. 发明授权

US06987920B1 Waveguide structures and methods 失效
标题翻译：波导结构和方法
公开(公告)号：US06987920B1
公开(公告)日：2006-01-17
申请号：US10878834
申请日：2004-06-28
申请人： Kristine A. German , Peter M. Gulvin , Joel A. Kubby , Pinyen Lin , Xueyuan Liu , Yao Rong Wang
发明人： Kristine A. German , Peter M. Gulvin , Joel A. Kubby , Pinyen Lin , Xueyuan Liu , Yao Rong Wang
IPC分类号： G02B6/10
CPC分类号： G02B6/122 , G02B6/105
摘要： A waveguide structure has a base having a base height (h) above a substrate and a rectangular waveguide having a waveguide height (H) above the substrate and a waveguide width (W) between opposing sides of the waveguide.
摘要翻译：波导结构具有在基板上方具有基底高度（h）的基部和在基板上方具有波导高度（H）的矩形波导和波导的相对侧之间的波导宽度（W）。

7. 发明授权

US06985651B2 Thermal actuator with offset beam segment neutral axes and an optical waveguide switch including the same 失效
标题翻译：具有偏转光束段中性轴的热致动器和包括该中间轴的光波导开关
公开(公告)号：US06985651B2
公开(公告)日：2006-01-10
申请号：US10772693
申请日：2004-02-05
申请人： Jun Ma , Joel A. Kubby , Kristine A. German , Peter M. Gulvin , Pinyen Lin
发明人： Jun Ma , Joel A. Kubby , Kristine A. German , Peter M. Gulvin , Pinyen Lin
IPC分类号： G02B6/26 , G02B6/42 , H01H37/00
CPC分类号： B81B3/0018 , G02B6/3566 , G02B6/3576 , G02B6/3584
摘要： A thermal actuator comprises a substantially straight beam. The beam has a beam length and a beam mid-point. The beam comprises a plurality of beam segments with beam segment lengths. Each beam segment has a beam segment neutral axis, thus forming a corresponding plurality of beam segment neutral axes. The beam segment neutral axes are offset along the beam length based on a predetermined pattern. As the beam is heated by an included heating means, the beam buckles. The buckling of the beam, in turn, causes the beam mid-point to translate or move in the predetermined direction. The beam mid-point movement, in turn, operates an included optical waveguide switch. The heating means comprises any of Joule heating, eddy current heating, conduction heating, convection heating and radiation heating.
摘要翻译：热致动器包括基本上直的梁。光束具有光束长度和光束中点。梁包括具有梁段长度的多个梁段。每个光束段具有光束段中性轴线，从而形成相应的多个光束段中性轴线。光束段中性轴基于预定图案沿光束长度偏移。当束被加热装置加热时，光束弯曲。光束的弯曲又使光束中点在预定方向上平移或移动。光束中点运动依次运行附带的光波导开关。加热装置包括焦耳加热，涡流加热，传导加热，对流加热和辐射加热中的任何一种。

8. 发明授权

US06983088B2 Thermal actuator and an optical waveguide switch including the same 失效
标题翻译：热致动器和包括其的光波导开关
公开(公告)号：US06983088B2
公开(公告)日：2006-01-03
申请号：US10634941
申请日：2003-08-05
申请人： Joel A. Kubby , Jun Ma , Kristine A. German , Peter M. Gulvin , Pinyen Lin
发明人： Joel A. Kubby , Jun Ma , Kristine A. German , Peter M. Gulvin , Pinyen Lin
IPC分类号： G02B6/26 , G02B6/42 , H01H37/00
CPC分类号： G02B6/3576 , B81B3/0018 , G02B6/3566 , G02B6/3584
摘要： A thermal actuator comprises a plurality of substantially straight and parallel beams arranged to form a beam array. The midpoint of each beam is attached or coupled to an orthogonal coupling beam. Each array beam has a beam heating parameter with a corresponding beam heating parameter value. The beam heating parameter values vary across the beam array based on a predetermined pattern. As the beams are heated by an included heating means, the distribution of beam temperatures in the beam array becomes asymmetric, thus causing the beam array to buckle. The buckling of the beams in the beam array, in turn, causes the attached coupling beam to move in a predetermined direction. The coupling beam motion, in turn, operates an included optical waveguide switch. The beams in the beam array are heated by any of Joule heating, eddy current heating, conduction heating, convection heating and radiation heating.
摘要翻译：热致动器包括布置成形成束阵列的多个基本上直的和平行的光束。每个光束的中点附加或耦合到正交耦合光束。每个阵列光束具有具有对应的光束加热参数值的光束加热参数。光束加热参数值基于预定图案在波束阵列上变化。当束被加热装置加热时，光束阵列中光束温度的分布变得不对称，从而使光束阵列发生弯曲。光束阵列中的光束的弯曲又使连接的光束沿预定的方向移动。耦合光束运动反过来操作包括的光波导开关。光束阵列中的光束通过焦耳加热，涡流加热，传导加热，对流加热和辐射加热中的任何一种加热。

9. 发明授权

US06828887B2 Bistable microelectromechanical system based structures, systems and methods 失效
标题翻译：双稳态微机电系统的结构，系统和方法
公开(公告)号：US06828887B2
公开(公告)日：2004-12-07
申请号：US10063762
申请日：2002-05-10
申请人： Joel A. Kubby , Fuqian Yang , Jun Ma , Kristine A. German , Peter M. Gulvin
发明人： Joel A. Kubby , Fuqian Yang , Jun Ma , Kristine A. German , Peter M. Gulvin
IPC分类号： H01H5122
CPC分类号： G02B6/3508 , B81B3/0054 , B81B2201/032 , G02B6/3546 , G02B6/3568 , G02B6/3582 , G02B6/3596 , H01H2001/0042
摘要： A bistable microelectromechanical system (MEMS) based system comprises a micromachined beam having a first stable state, in which the beam is substantially stress-free and has a specified non-linear shape, and a second stable state. The curved shape may comprises a simple curve or a compound curve. In embodiments, the boundary conditions for the beam are fixed boundary conditions, bearing boundary conditions, spring boundary conditions, or a combination thereof. The system may further comprise an actuator arranged to move the beam between the first and second stable states and a movable element that is moved between a first position and a second position in accordance with the movement of the beam between the first and second stable states. The actuator may comprise one of a thermal actuator, an electrostatic actuator, a piezoelectric actuator and a magnetic actuator. The actuator may further comprise a thermal impact actuator or a zippering electrostatic actuator.
摘要翻译：基于双稳态微机电系统（MEMS）的系统包括具有第一稳定状态的微加工梁，其中梁基本上无应力且具有特定的非线性形状和第二稳定状态。弯曲形状可以包括简单曲线或复合曲线。在实施例中，梁的边界条件是固定的边界条件，轴承边界条件，弹簧边界条件或其组合。系统还可以包括致动器，其被布置成在第一和第二稳定状态之间移动梁，以及根据梁在第一和第二稳定状态之间的移动而在第一位置和第二位置之间移动的可动元件。致动器可以包括热致动器，静电致动器，压电致动器和磁致动器中的一个。致动器还可以包括热冲击致动器或拉链静电致动器。

10. 发明授权

US07298954B2 Waveguide shuttle MEMS variable optical attenuator 失效
标题翻译：波导梭MEMS可变光衰减器
公开(公告)号：US07298954B2
公开(公告)日：2007-11-20
申请号：US11154019
申请日：2005-06-16
申请人： Xueyuan Liu , Peter M. Gulvin , Kristine A. German , Yao Rong Wang , Jun Ma , Pinyen Lin , Joel A. Kubby , Kathleen A. Feinberg
发明人： Xueyuan Liu , Peter M. Gulvin , Kristine A. German , Yao Rong Wang , Jun Ma , Pinyen Lin , Joel A. Kubby , Kathleen A. Feinberg
IPC分类号： G02B6/26
CPC分类号： G02B6/358 , G02B6/266 , G02B6/3508 , G02B6/3544 , G02B6/357 , G02B6/3584 , G02B6/3594 , G02B6/3596
摘要： An improved waveguide shuttle optical switch design which provides the function of a variable optical attenuator (VOA). A small degree of intentional misalignment of the waveguide will create different levels of optical attenuation. By finely controlling the misalignment of a selected switched position, a single device may be realized that will provide the functions of both switching and attenuating or just attenuation alone. The optical MEMS device utilizes a latching mechanism in association with a thermal drive actuator for aligning a waveguide shuttle platform. The integration of the switching function and the VOA function reduce the optical loss which is otherwise unavoidable when the inevitable alternative of a separate switch and a separate VOA must necessarily be employed. The resultant improved device can also be applied for correcting the difference in optical intensity created by the manufacturing tolerances inherent in the fabrication of array waveguide gratings.
摘要翻译：提供了可变光衰减器（VOA）的功能的改进的波导穿梭光开关设计。波导的有意的不对准会导致不同程度的光衰减。通过精细地控制所选择的切换位置的未对准，可以实现单个设备，其将提供单独切换和衰减或仅仅衰减的功能。光学MEMS器件利用与用于对准波导穿梭平台的热驱动致动器相关联的闭锁机构。开关功能和VOA功能的集成减少光损耗，否则当必须采用单独的开关和单独的VOA的不可避免的替代方案时，光损失是不可避免的。所得到的改进的器件还可以用于校正由阵列波导光栅的制造中固有的制造公差产生的光强差。

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