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    • 3. 发明授权
    • Vertical BJT and SCR for ESD
    • 垂直BJT和SCR用于ESD
    • US08809905B2
    • 2014-08-19
    • US13339189
    • 2011-12-28
    • Wun-Jie LinChing-Hsiung LoJen-Chou Tseng
    • Wun-Jie LinChing-Hsiung LoJen-Chou Tseng
    • H01L29/66
    • H01L27/0262H01L29/732H01L29/74
    • An electrostatic discharge (ESD) protection device includes a well region formed from semiconductor material with a first doping type and a floating base formed from semiconductor material with a second doping type. The floating base is disposed vertically above the well region. The ESD also includes a first terminal receiving region formed from semiconductor material with a third doping type. The first terminal receiving region is disposed vertically above the floating base. The ESD further includes a second terminal receiving region. The second terminal receiving region is laterally spaced apart from the first terminal receiving region by silicon trench isolation (STI) region. In some embodiments, the second terminal receiving region is formed from semiconductor material with the third doping type to form a bipolar junction transmitter (BJT) or with a fourth doping type to form a silicon controlled rectifier (SCR).
    • 静电放电(ESD)保护装置包括由具有第一掺杂类型的半导体材料和由具有第二掺杂类型的半导体材料形成的浮动基底形成的阱区。 浮动底座垂直设置在井区域上方。 ESD还包括由具有第三掺杂类型的半导体材料形成的第一端子接收区域。 第一端子接收区域垂直设置在浮动基座上方。 ESD还包括第二终端接收区域。 第二端子接收区域通过硅沟槽隔离(STI)区域与第一端子接收区域横向间隔开。 在一些实施例中,第二端子接收区域由具有第三掺杂类型的半导体材料形成以形成双极结发送器(BJT)或具有第四掺杂类型以形成可控硅整流器(SCR)。
    • 8. 发明申请
    • Vertical BJT and SCR for ESD
    • 垂直BJT和SCR用于ESD
    • US20130168732A1
    • 2013-07-04
    • US13339189
    • 2011-12-28
    • Wun-Jie LinChing-Hsiung LoJen-Chou Tseng
    • Wun-Jie LinChing-Hsiung LoJen-Chou Tseng
    • H01L29/73H01L21/331
    • H01L27/0262H01L29/732H01L29/74
    • An electrostatic discharge (ESD) protection device includes a well region formed from semiconductor material with a first doping type and a floating base formed from semiconductor material with a second doping type. The floating base is disposed vertically above the well region. The ESD also includes a first terminal receiving region formed from semiconductor material with a third doping type. The first terminal receiving region is disposed vertically above the floating base. The ESD further includes a second terminal receiving region. The second terminal receiving region is laterally spaced apart from the first terminal receiving region by silicon trench isolation (STI) region. In some embodiments, the second terminal receiving region is formed from semiconductor material with the third doping type to form a bipolar junction transmitter (BJT) or with a fourth doping type to form a silicon controlled rectifier (SCR).
    • 静电放电(ESD)保护装置包括由具有第一掺杂类型的半导体材料和由具有第二掺杂类型的半导体材料形成的浮动基底形成的阱区。 浮动底座垂直设置在井区域上方。 ESD还包括由具有第三掺杂类型的半导体材料形成的第一端子接收区域。 第一端子接收区域垂直设置在浮动基座上方。 ESD还包括第二终端接收区域。 第二端子接收区域通过硅沟槽隔离(STI)区域与第一端子接收区域横向间隔开。 在一些实施例中,第二端子接收区域由具有第三掺杂类型的半导体材料形成以形成双极结发送器(BJT)或具有第四掺杂类型以形成可控硅整流器(SCR)。