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1. 发明授权

US08766542B2 Field-emission electron gun and method for controlling same 有权
标题翻译：场发射电子枪及其控制方法
公开(公告)号：US08766542B2
公开(公告)日：2014-07-01
申请号：US13577998
申请日：2011-01-19
申请人： Boklae Cho , Shigeru Kokubo , Hisaya Murakoshi , Hisao Nitta
发明人： Boklae Cho , Shigeru Kokubo , Hisaya Murakoshi , Hisao Nitta
IPC分类号： H01J7/24
CPC分类号： H01J29/98 , H01J37/073 , H01J2237/022 , H01J2237/0653 , H01J2237/1825
摘要： The disclosed charged particle beam apparatus includes a field-emission electron source including single crystal of tungsten; a vacuum chamber having the electron source therein; an exhausting system for exhausting the vacuum chamber; a filament connected to the electron source to let flow a current through the electron source and thereby heat the electron source; a power supply for letting a current flow through the filament; an ammeter for measuring a total current emitted from the electron source; and a controlling unit for exercising control to cause the power supply to let a current flow through the filament when the total current measured periodically has become a predetermined ratio or less as compared with a total current from the electron source found immediately after first electron beam emission, or a total current from the electron beam found immediately after a current is let flow through the filament.
摘要翻译：所公开的带电粒子束装置包括：场致发射电子源，其包括钨的单晶; 其中具有电子源的真空室; 用于排出真空室的排气系统; 连接到电子源的灯丝，使电流流过电子源，从而加热电子源; 用于使电流流过灯丝的电源; 用于测量从电子源发射的总电流的电流表; 以及控制单元，用于当与在第一电子束发射之后立即发现的电子源的总电流相比，当周期性测量的总电流已经变为预定比率或更小时，进行控制以使电源使电流流过灯丝，或者在电流流过灯丝之后立即发现来自电子束的总电流。

2. 发明申请

US20130200788A1 FIELD-EMISSION ELECTRON GUN AND METHOD FOR CONTROLLING SAME 有权
标题翻译：场发射电子枪及其控制方法
公开(公告)号：US20130200788A1
公开(公告)日：2013-08-08
申请号：US13577998
申请日：2011-01-19
申请人： Boklae Cho , Shigeru Kokubo , Hisaya Murakoshi , Hisao Nitta
发明人： Boklae Cho , Shigeru Kokubo , Hisaya Murakoshi , Hisao Nitta
IPC分类号： H01J29/98
CPC分类号： H01J29/98 , H01J37/073 , H01J2237/022 , H01J2237/0653 , H01J2237/1825
摘要： The disclosed charged particle beam apparatus includes a field-emission electron source including single crystal of tungsten; a vacuum chamber having the electron source therein; an exhausting system for exhausting the vacuum chamber; a filament connected to the electron source to let flow a current through the electron source and thereby heat the electron source; a power supply for letting a current flow through the filament; an ammeter for measuring a total current emitted from the electron source; and a controlling unit for exercising control to cause the power supply to let a current flow through the filament when the total current measured periodically has become a predetermined ratio or less as compared with a total current from the electron source found immediately after first electron beam emission, or a total current from the electron beam found immediately after a current is let flow through the filament.
摘要翻译：所公开的带电粒子束装置包括：场致发射电子源，其包括钨的单晶; 其中具有电子源的真空室; 用于排出真空室的排气系统; 连接到电子源的灯丝，使电流流过电子源，从而加热电子源; 用于使电流流过灯丝的电源; 用于测量从电子源发射的总电流的电流表; 以及控制单元，用于当与在第一电子束发射之后立即发现的电子源的总电流相比，当周期性测量的总电流已经变为预定比率或更小时，进行控制以使电源使电流流过灯丝，或者在电流流过灯丝之后立即发现来自电子束的总电流。

3. 发明申请

US20120104272A1 CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM DEVICE 审中-公开
标题翻译：充电颗粒枪和充电颗粒光束装置
公开(公告)号：US20120104272A1
公开(公告)日：2012-05-03
申请号：US13381343
申请日：2010-06-11
申请人： Boklae Cho , Shigeru Kokubo , Hisaya Murakoshi
发明人： Boklae Cho , Shigeru Kokubo , Hisaya Murakoshi
IPC分类号： G21K5/00 , H01J3/26
CPC分类号： H01J37/06 , H01J37/1472 , H01J37/18 , H01J2237/06316
摘要： The present invention provides a charged particle gun including: a charged particle source (1); an extraction electrode (2); an opening (14) through which a charged particle beam passes; and a barrier provided in an area defined by connecting the charged particle source to the opening, the barrier serving to prevent molecules existing in a downstream vacuum chamber from passing through the opening to adsorb onto the charged particle source. Accordingly, the molecules existing in the downstream lower-vacuum chamber can be prevented from adsorbing onto the charged particle source, so that current noise can be reduced. This enables stable operations of the charged particle beam gun and a charged particle beam device including the charged particle beam gun.
摘要翻译：本发明提供一种带电粒子枪，包括：带电粒子源（1）; 提取电极（2）; 带电粒子束通过的开口（14）; 以及设置在通过将带电粒子源连接到开口所限定的区域中的屏障，所述屏障用于防止存在于下游真空室中的分子通过所述开口以吸附到带电粒子源上。因此，可以防止存在于下游下真空室中的分子吸附到带电粒子源上，从而可以降低电流噪声。这使得带电粒子束枪和包括带电粒子束枪的带电粒子束装置的稳定操作成为可能。

4. 发明授权

US08772735B2 Charged particle beam apparatus, and method of controlling the same 有权
标题翻译：带电粒子束装置及其控制方法
公开(公告)号：US08772735B2
公开(公告)日：2014-07-08
申请号：US13666119
申请日：2012-11-01
申请人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
发明人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
IPC分类号： H01J1/304
CPC分类号： H01J1/304 , H01J37/073 , H01J37/265 , H01J2237/022 , H01J2237/06325 , H01J2237/0653 , H01J2237/0656
摘要： A charged particle beam apparatus includes a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10−8 Pa or less. The apparatus uses electron beams emitted to have an electron-beam-center radiation angle of 1×10−2 sr or less, and uses the electric current thereof, the second order differentiation of which is negative or zero with respect to time, and which reduces at a rate of 10% or less per hour. A heating unit is provided for the field emission electron source, and a detection unit is provided for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
摘要翻译：带电粒子束装置包括场致发射电子源，用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在1×10 -8 Pa以下的真空排气单元。该装置使用发射的电子束具有1×10 -2 sr以下的电子束中心辐射角，并使用其电流，其二阶微分相对于时间为负或为零，其中以每小时10％或更少的速度减少。为场发射电子源提供加热单元，为电子束的电流提供检测单元。重复加热场致发射电子源以使电子束的电流保持在规定值以上。

5. 发明申请

US20110089336A1 CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME 有权
标题翻译：充电颗粒光束装置及其控制方法
公开(公告)号：US20110089336A1
公开(公告)日：2011-04-21
申请号：US12999075
申请日：2009-06-10
申请人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
发明人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
IPC分类号： H01J27/26 , H01J27/00
CPC分类号： H01J1/304 , H01J37/073 , H01J37/265 , H01J2237/022 , H01J2237/06325 , H01J2237/0653 , H01J2237/0656
摘要： Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vaccume exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1 10−2 str or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
摘要翻译：提供一种带电粒子束装置，其能够发射具有高亮度和窄能量宽度的稳定电子束。带电粒子束装置包括场致发射电子源，用于向场致发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在10×10 8 Pa以下的疫苗排气单元。该装置构成为使用发射的电子束中心辐射角为1×10 -2 str以下的电子束，并使用其电流，其二阶微分为负或相对于时间为零，并以每小时10％或更少的速率减少。带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。重复加热场致发射电子源以使电子束的电流保持在规定值以上。

6. 发明授权

US08319193B2 Charged particle beam apparatus, and method of controlling the same 有权
标题翻译：带电粒子束装置及其控制方法
公开(公告)号：US08319193B2
公开(公告)日：2012-11-27
申请号：US12999075
申请日：2009-06-10
申请人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
发明人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
IPC分类号： H01J27/26
CPC分类号： H01J1/304 , H01J37/073 , H01J37/265 , H01J2237/022 , H01J2237/06325 , H01J2237/0653 , H01J2237/0656
摘要： Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1×10−2sr or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
摘要翻译：提供一种带电粒子束装置，其能够发射具有高亮度和窄能量宽度的稳定电子束。带电粒子束装置包括场发射电子源，用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在10×10 8 Pa以下的真空排气单元。该装置构成为使用发射的电子束中心辐射角为1×10-2sr以下的电子束，并使用其电流，其二阶微分为负或相对于时间为零，并以每小时10％或更少的速率减少。带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。重复加热场致发射电子源以使电子束的电流保持在规定值以上。

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