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1. 发明授权

US10241361B2 Color film substrate, manufacturing method thereof and display device 有权
公开(公告)号：US10241361B2
公开(公告)日：2019-03-26
申请号：US15503046
申请日：2016-07-05
申请人： Boe Technology Group Co., Ltd. , Beijing Boe Display Technology Co., Ltd.
发明人： Zhichao Zhang , Tsungchieh Kuo , Zheng Liu , Mingxuan Liu , Shoukun Wang , Jingjing Jiang
IPC分类号： G02F1/1335
摘要： A color film substrate comprises: a basal substrate, a plurality of color filters of at least one color formed on the basal substrate, and a black matrix formed on the basal substrate. The black matrix has a plurality of openings one-to-one corresponding to the plurality of color filters of at least one color. In a cross section perpendicular to the basal substrate, an edge of the color filter and an opening edge of the black matrix have an overlapping region. According to the color film substrate, manufacturing method thereof and display device provided by the embodiments of the present disclosure, by applying the technology of halftone mask plate and positive/negative photoresist, the patterns for the plurality of color filters of the at least one color and the pattern of the black matrix can be formed with one filter mask plate.

2. 发明授权

US10146059B2 Parallax barrier and fabricating method thereof, display panel and display device 有权
公开(公告)号：US10146059B2
公开(公告)日：2018-12-04
申请号：US14436763
申请日：2014-09-23
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Huibin Guo , Zhenyu Zhang , Shoukun Wang , Liangliang Li , Yuchun Feng
IPC分类号： G02F1/1345 , G02F1/1333 , G02B27/22 , H04N13/04 , G02F1/1341 , G02F1/1343
摘要： The embodiments of the present invention disclose a parallax bather and a fabricating method thereof. The parallax barrier comprises a first transparent conducting layer (35), a second transparent conducting layer (36), and an insulating layer (37) between the first transparent conducting layer (35) and the second transparent conducting layer (36). The first transparent conductive layer (35) is formed into a plurality of signal electrode lines (350), and the second transparent conductive layer (36) is formed into a plurality of common electrode lines (360). The signal electrode lines (350) and the common electrode lines (360) are arranged alternately, and the common electrode lines (360) are located in a gap between adjacent signal electrode lines (350) with the insulating layer (37) in between.

3. 发明授权

US09711356B2 Method for manufacturing thin-film transistor by implanting ions into channel region for lowering leakage current 有权
公开(公告)号：US09711356B2
公开(公告)日：2017-07-18
申请号：US14466218
申请日：2014-08-22
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Shoukun Wang , Huibin Guo , Xiaowei Liu , Yuchun Feng , Zongjie Guo
IPC分类号： H01L21/02 , H01L21/225 , H01L21/265 , H01L27/12 , H01L29/66 , H01L29/786
CPC分类号： H01L21/02694 , H01L21/02592 , H01L21/2253 , H01L21/265 , H01L21/26513 , H01L27/1214 , H01L27/127 , H01L29/66742 , H01L29/66765 , H01L29/786 , H01L29/78669 , H01L29/78696
摘要： The present invention discloses a method for manufacturing a thin-film transistor, comprising the steps of: forming a semiconductor active layer, and a doped semiconductor active layer; forming a source-drain metal layer; forming a channel region; and implanting ions for lowering the TFT leakage current into the surface of the semiconductor active layer in the channel region via ion implantation after forming the channel region. The invention further relates to a thin-film transistor, a TFT array substrate and a display device. The invention has the following beneficial effects: by implanting ions for lowering the TFT leakage current into the channel region, the electrical performance of a TFT may be improved, and the thickness of a semiconductor active layer in a channel region may be changed controllably.

4. 发明授权

US09378953B2 Method for preparing polycrystalline metal oxide pattern 有权
标题翻译：制备多晶金属氧化物图案的方法
公开(公告)号：US09378953B2
公开(公告)日：2016-06-28
申请号：US14526777
申请日：2014-10-29
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Liangliang Li , Zongjie Guo , Huibin Guo , Shoukun Wang , Yuchun Feng , Xiaowei Liu
IPC分类号： H01L21/00 , H01L21/84 , H01L21/02 , C04B41/91 , C04B41/00 , C04B41/53
CPC分类号： H01L21/02691 , C04B41/0036 , C04B41/0072 , C04B41/5353 , C04B41/91 , H01L21/02422 , H01L21/02554 , H01L21/02565 , H01L21/02631 , H01L21/02686
摘要： Disclosed is a method for preparing a polycrystalline metal oxide pattern, characterized by comprising: annealing a predetermined region of an amorphous metal oxide film by laser, so as to convert the amorphous metal oxide in the predetermined region into a polycrystalline metal oxide; and etching the amorphous metal oxide outside of the predetermined region so as to remove it. By the method according to the present invention, firstly, the predetermined region of an amorphous metal oxide film is annealed by laser so as to convert the amorphous metal oxide into a polycrystalline metal oxide, and then, the amorphous metal oxide outside of the predetermined region is etched away, thereby a polycrystalline metal oxide pattern is formed. The method for preparing a polycrystalline metal oxide pattern according to the present invention is simple, and can effectively shorten the production period and save production costs.
摘要翻译：公开了一种制备多晶金属氧化物图案的方法，其特征在于包括：通过激光对预定区域的非晶金属氧化物膜进行退火，以将预定区域中的非晶态金属氧化物转化为多晶金属氧化物; 并且在预定区域外蚀刻非晶态金属氧化物以便将其去除。根据本发明的方法，首先，通过激光对非晶金属氧化物膜的预定区域进行退火，以将非晶金属氧化物转化为多晶金属氧化物，然后在预定区域外部的非晶态金属氧化物被蚀刻掉，从而形成多晶金属氧化物图案。根据本发明的多晶金属氧化物图案的制备方法简单，可以有效缩短生产周期，节省生产成本。

5. 发明授权

US09176053B1 Method for detecting an etching residue 有权
标题翻译：腐蚀残渣检测方法
公开(公告)号：US09176053B1
公开(公告)日：2015-11-03
申请号：US14349008
申请日：2013-08-09
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Linlin Wang , Xi Chen , Shoukun Wang , Jianfeng Yuan
IPC分类号： G01N21/94 , G01N21/3563 , G01N21/956 , G01N21/35
CPC分类号： G01N21/3563 , G01N21/94 , G01N21/956 , G01N21/95692 , G01N2021/3568 , G01N2021/3595 , G01N2201/061 , H01L22/12 , H01L27/127
摘要： The embodiments of the present invention provide a method for detecting an etching residue and relate to the field of display technologies, with the purpose of detecting an etching residue so as to improve product yield. The method comprises: fitting the boundary of a pattern in a position to be detected by film color difference, and positioning the pattern in a position to be detected, thereby acquiring the pattern in a position to be detected; testing an infrared spectrum of the pattern in a position to be detected, and obtaining an infrared spectrogram; determining whether the residue exists according to the infrared spectrogram. The method of the invention may be applicable for the detection of an etching residue during the process of preparing an array substrate or a cell substrate.
摘要翻译：本发明的实施例提供了一种用于检测蚀刻残留物并涉及显示技术领域的方法，其目的是检测蚀刻残留物以提高产品产量。该方法包括：通过胶片色差将图案的边界拟合在待检测的位置，并将图案定位在待检测的位置，从而获取待检测位置的图案; 在要检测的位置测试图案的红外光谱，并获得红外光谱图; 根据红外光谱图确定残留物是否存在。本发明的方法可适用于在制备阵列衬底或电池衬底的过程中检测蚀刻残留物。

6. 发明授权

US10847554B2 Method for fabricating array substrate motherboard, array substrate motherboard and detection method 有权
公开(公告)号：US10847554B2
公开(公告)日：2020-11-24
申请号：US16331766
申请日：2018-05-02
申请人： BEIJING BOE DISPLAY TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
发明人： Fangbin Fu , Huibin Guo , Shoukun Wang , Hao Han , Yongzhi Song
IPC分类号： H01L29/04 , H01L31/036 , H01L21/4763 , H01L27/12 , G01B11/14 , G06T7/00 , H01L21/027 , G03F7/16 , G03F7/20 , G03F7/26
CPC分类号： H01L27/1288 , G01B11/14 , G06T7/0006 , H01L21/0274 , G03F7/16 , G03F7/20 , G03F7/26 , G06T2207/30148
摘要： A method for fabricating an array substrate motherboard, an array substrate motherboard and a detection method are provided. The method for fabricating an array substrate motherboard includes depositing a first film on a substrate, wherein a first gap is present between the edge of the first film and the edge of the substrate, coating photoresist on the substrate on which the first film is deposited, and exposing and developing the photoresist to form a first scale pattern from the photoresist. One end of the first scale pattern is flush with the edge of the substrate and the other end covers the first film.

7. 发明授权

US10147643B2 Array substrate, manufacturing method thereof, and display device 有权
公开(公告)号：US10147643B2
公开(公告)日：2018-12-04
申请号：US15521079
申请日：2016-09-07
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Shoukun Wang , Huibin Guo , Yuchun Feng , Liangliang Li
IPC分类号： H01L21/77 , H01L27/12 , H01L21/3213 , H01L27/14
摘要： An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes: a base substrate, a signal line disposed on the base substrate, an extinction layer disposed between the base substrate and the signal line, the extinction layer being configured to reduce an ambient light when the array substrate is located on a light exiting side. An orthographic projection of the signal line in a plane of the base substrate is coincided with an orthographic projection of the extinction layer in the plane of the base substrate.

8. 发明授权

US10101626B2 Array substrate, display panel, display device, and method for fabricating array substrate 有权
公开(公告)号：US10101626B2
公开(公告)日：2018-10-16
申请号：US15324053
申请日：2016-01-29
申请人： Boe Technology Group Co., Ltd. , Beijing Boe Display Technology Co., Ltd.
发明人： Shoukun Wang , Huibin Guo , Yuchun Feng , Liangliang Li , Tsungchieh Kuo
IPC分类号： H01L33/00 , G02F1/136 , G02F1/1343 , G02F1/1368 , G02F1/1362 , H01L27/12 , G06F3/038 , G09G3/36 , G09G3/20
摘要： An array substrate, a display panel, a display device, and a method for fabricating an array substrate are provided. The array substrate comprises gate lines and data lines on a substrate plate which are insulated from each other and intersect to define sub-pixel units, and the data lines comprise a first data line and a second data line which are arranged side by side between two neighboring columns of sub-pixel units. Between two of the sub-pixel units which are neighbors in a column direction, at least a portion of the first data line is arranged in a layer different from the neighboring second data line. At least a part of the first data line is arranged in a layer different from that of the neighboring second data line, to overcome the problem of short circuit between dual data lines.

9. 发明授权

US09595547B2 Array substrate and method for repairing broken data line 有权
标题翻译：阵列基板和修复破碎数据线的方法
公开(公告)号：US09595547B2
公开(公告)日：2017-03-14
申请号：US14568813
申请日：2014-12-12
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Huibin Guo , Shoukun Wang , Liangliang Li , Yuchun Feng , Zongjie Guo
IPC分类号： H01L27/12 , H01L29/786
CPC分类号： H01L27/1259 , H01L27/1222 , H01L27/124 , H01L29/78663
摘要： The invention discloses an array substrate, and a method for repairing a broken data line on an array substrate. The method for repairing a broken data line on an array substrate includes steps: performing a treatment on a part of a semiconductor layer corresponding to an opening in a data line so that the part of the semiconductor layer becomes a conductive region, and the ends of the opening in the data line are electrically connected to each other by the conductive semiconductor layer. The above method for repairing a broken data line provided by the invention is not affected by the linewidth of the data line so that the broken data line can be repaired in the case that the linewidth of the data line is relatively small.
摘要翻译：本发明公开了一种阵列基板，以及在阵列基板上修复断线数据线的方法。用于修复阵列基板上的断裂数据线的方法包括以下步骤：对与数据线中的开口相对应的半导体层的一部分进行处理，使得半导体层的一部分变为导电区域，数据线中的开口通过导电半导体层彼此电连接。上述用于修复由本发明提供的断线数据线的方法不受数据线的线宽的影响，从而在数据线的线宽相对较小的情况下可以修复断线数据线。

10. 发明授权

US09414439B2 Baseplate supporting pin and baseplate supporting device using the same 有权
标题翻译：底板支撑销和底板支撑装置使用相同
公开(公告)号：US09414439B2
公开(公告)日：2016-08-09
申请号：US13984387
申请日：2013-03-19
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Shoukun Wang , Liang Sun
IPC分类号： H05B3/06 , H05B1/02 , H01L21/67 , H01L21/687
CPC分类号： H05B1/0288 , H01L21/67103 , H01L21/67109 , H01L21/68742
摘要： According to embodiments of present invention, a baseplate supporting pin is provided, which comprises: a pin body; a heating device embedded into the pin body; and a first control unit electrically connected to the heating device for controlling the heating device. Furthermore, according to embodiments of present invention, a baseplate supporting device is provided, which comprises: a baseplate support member; and a baseplate supporting pin, provided to ascend or descend through an opening formed in the baseplate supporting plate so as to support the baseplate thereon or place the baseplate on the baseplate support member, wherein the baseplate supporting pin comprises: a pin body; a heating device built in the pin body; and a first control unit electrically connected to the heating device for controlling the heating device. The baseplate supporting pin and the baseplate supporting device facilitate eliminating adverse effect caused by uneven heating of the baseplate.
摘要翻译：根据本发明的实施例，提供了一种底板支撑销，其包括：销体; 嵌入销体的加热装置; 以及电连接到加热装置用于控制加热装置的第一控制单元。此外，根据本发明的实施例，提供了一种基板支撑装置，其包括：基板支撑构件; 以及底板支撑销，其设置成通过形成在基板支撑板中的开口上升或下降，以便在其上支撑基板或将基板放置在基板支撑构件上，其中底板支撑销包括：销体; 内置在销体内的加热装置; 以及电连接到加热装置用于控制加热装置的第一控制单元。底板支撑销和底板支撑装置有助于消除由于底板不均匀加热引起的不利影响。

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