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    • 6. 发明申请
    • Array Substrate, Its Manufacturing Method, and Display Device
    • 阵列基板,其制造方法和显示装置
    • US20150311222A1
    • 2015-10-29
    • US14310826
    • 2014-06-20
    • BOE TECHNOLOGY GROUP CO., LTD.BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
    • Jinchao BaiYao LiuLiangliang LiXiangqian DingZongjie Guo
    • H01L27/12
    • H01L27/124H01L23/5226H01L2924/0002H01L2924/00
    • The present invention provides an array substrate, its manufacturing method, and a display device. The array substrate comprises a gate metal layer, a gate insulating layer, a source/drain metal layer, first common electrode lines arranged on an identical layer to the gate metal layer, a first via hole arranged in the gate insulating layer and corresponding to the first common electrode line, a source/drain metal filling part arranged within the first via hole, a second via hole in communication with the first via hole, and a transparent connection part. The first common electrode lines are, by means of the transparent connection part and the source/drain metal filling part, in electrical connection with each other through the second via hole. According to the present invention, it is able to reduce the depth of the via holes in the array substrate, and improve the uneven diffusion of an alignment layer.
    • 本发明提供阵列基板,其制造方法和显示装置。 阵列基板包括栅极金属层,栅极绝缘层,源极/漏极金属层,布置在与栅极金属层相同的层上的第一公共电极线,布置在栅极绝缘层中并对应于栅极金属层的第一通孔 第一公共电极线,设置在第一通孔内的源极/漏极金属填充部,与第一通孔连通的第二通孔和透明连接部。 第一公共电极线通过透明连接部分和源极/漏极金属填充部分通过第二通孔彼此电连接。 根据本发明,能够减小阵列基板中的通孔的深度,并且可以改善取向层的不均匀扩散。